Abstract:
An exemplary MIM capacitor may include a first metal plate, a dielectric layer on the first metal plate, a second metal plate on the dielectric layer, a via layer on the second metal plate, and a third metal plate on the via layer where the second metal plate has a tapered outline with a first side and a second side longer than the first side such that the second side provides a lower resistance path for a current flow.
Abstract:
A three-dimensional (3D) orthogonal inductor pair is embedded in and supported by a substrate, and has a first inductor having a first coil that winds around a first winding axis and a second inductor having a second coil that winds around a second winding axis. The second winding axis is orthogonal to the first winding axis. The second winding axis intersects the first winding axis at an intersection point that is within the substrate.
Abstract:
An integrated circuit device includes a substrate. The integrated circuit device also includes a first conductive stack including a back-end-of-line (BEOL) conductive layer at a first elevation with reference to the substrate. The integrated circuit device also includes a second conductive stack including the BEOL conductive layer at a second elevation with reference to the substrate. The second elevation differs from the first elevation.
Abstract:
An integrated circuit device includes a piezoelectric substrate having a first surface and a second surface opposite the first surface. The device also includes a first electrode and a second electrode on the first surface of the piezoelectric substrate, the first electrode having a first width and the second electrode having a second width. The device further includes a third electrode and a fourth electrode on the second surface of the piezoelectric substrate, the third electrode having a third width that is substantially the same as the second width, and the fourth electrode having a fourth width that is substantially the same as the first width. The first and third electrodes operate as part of a first portion of a microelectromechanical systems (MEMS) resonator, and the second and fourth electrodes operate as part of a second portion of the MEMS resonator.
Abstract:
A lateral metal insulator metal (MIM) capacitor includes a first conductive plate, and a dielectric layer on a sidewall(s) and a first surface of the first conductive plate adjacent to the sidewall(s). The capacitor also includes a second conductive plate on a portion of the dielectric layer that is on the sidewall(s) and on a portion of the dielectric layer that covers a portion of the first surface of the first conductive plate. A sidewall capacitance is also greater than a surface capacitance of the capacitor.
Abstract:
A resonator includes a piezoelectric core, a set of electrodes, and at least one ground terminal. The electrodes are arranged on the piezoelectric core and also includes at least one input electrode having a first width and at least one output electrode having a second width that differs from the first width. The ground terminal is also on the piezoelectric core.
Abstract:
A filter includes a glass substrate having through substrate vias. The filter also includes capacitors supported by the glass substrate. The capacitors may have a width and/or thickness less than a printing resolution. The filter also includes a 3D inductor within the substrate. The 3D inductor includes a first set of traces on a first surface of the glass substrate coupled to the through substrate vias. The 3D inductor also includes a second set of traces on a second surface of the glass substrate coupled to opposite ends of the through substrate vias. The second surface of the glass substrate is opposite the first surface of the glass substrate. The through substrate vias and traces operate as the 3D inductor. The first set of traces and the second set of traces may also have a width and/or thickness less than the printing resolution.
Abstract:
Disclosed is an apparatus including a plurality of vias each having a defined shape, wherein each of the plurality of vias includes a first two-dimensional conductive layer plated on a first side of a substrate, the first two-dimensional conductive layer having the defined shape, a second two-dimensional conductive layer plated on a second side of the substrate, the second two-dimensional conductive layer having the defined shape, and a via conductively coupling the first two-dimensional conductive layer to the second two-dimensional conductive layer. The apparatus further includes a plurality of interconnects configured to conductively couple the plurality of vias, wherein the first two-dimensional conductive layer and the second two-dimensional conductive layer of each of the plurality of vias are perpendicular to the plurality of interconnects.
Abstract:
A conductive bump assembly may include a passive substrate. The conductive bump assembly may also include a conductive bump pad supported by the passive substrate and surrounded by a first passivation layer opening. The conductive bump assembly may further include a second passivation layer opening on the passive substrate. The second passivation layer opening may be merged with the first passivation layer opening surrounding the conductive bump pad proximate an edge of the passive substrate. The conductive bump assembly may also include a conductive bump on the conductive bump pad.
Abstract:
An integrated radio frequency (RF) circuit structure may include a resistive substrate material and a switch. The switch may be arranged in a silicon on insulator (SOI) layer supported by the resistive substrate material. The integrated RF circuit structure may also include an isolation layer coupled to the SOI layer. The integrated RF circuit structure may further include a filter, composed of inductors and capacitors. The filter may be arranged on a surface of the integrated RF circuit structure, opposite the resistive substrate material. In addition, the switch may be arranged on a first surface of the isolation layer.