公开(公告)号：US20090101816A1

公开(公告)日：2009-04-23

申请号：US12073892

申请日：2008-03-11

申请人： Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa ,  Toshifumi Kimba ,  Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Kenichi Suematsu ,  Yutaka Tabe ,  Ryo Tajima ,  Keiichi Tohyama

发明人： Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa ,  Toshifumi Kimba ,  Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Kenichi Suematsu ,  Yutaka Tabe ,  Ryo Tajima ,  Keiichi Tohyama

IPC分类号： G01N23/00 ,  A61N5/00

CPC分类号： H01J37/20 ,  G01N23/2204 ,  G01N23/225 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/202 ,  H01J2237/2441 ,  H01J2237/2446 ,  H01J2237/2801 ,  H01J2237/2817 ,  H01L21/6833 ,  H01L2223/54466

摘要： A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 25•1, then forms an image under a desired magnification in the direction of a sample W to produce a crossover. When the crossover is passed, electrons as noises are removed from the crossover with an aperture, an adjustment is made so that the crossover becomes a parallel electron beam to irradiate the substrate in a desired sectional form. The electron beam is produced such that the unevenness of illuminance is 10% or less. Electrons emitted from the sample W are detected by a detector 25•11.

摘要翻译： 提供了一种用于进一步提高速度的系统，即提高SEM型检查装置中的生产量。 用于检查基板的表面的检查装置产生从电子束源25.1发射的电子的交叉，然后在样品W的方向上以期望的倍率形成图像以产生交叉。 当交叉通过时，作为噪声的电子从具有孔的交叉点移除，进行调整，使得交叉成为平行电子束以以期望的分段形式照射基板。 产生电子束，使照度不均匀为10％以下。 由检测器25.11检测从样品W发射的电子。

公开(公告)号：US07521692B2

公开(公告)日：2009-04-21

申请号：US11896519

申请日：2007-09-04

申请人： Masahiro Hatakeyama ,  Tohru Satake ,  Takeshi Murakami ,  Kenji Watanabe ,  Nobuharu Noji

发明人： Masahiro Hatakeyama ,  Tohru Satake ,  Takeshi Murakami ,  Kenji Watanabe ,  Nobuharu Noji

IPC分类号： G01K1/08 ,  H01J3/14 ,  H01J3/26

CPC分类号： H01J37/222 ,  G01N21/956 ,  H01J37/224 ,  H01J37/244 ,  H01J2237/2445 ,  H01J2237/2447 ,  H01R13/2421 ,  H04N5/2253 ,  Y10S439/935

摘要： An electron beam apparatus comprises a TDI sensor 64 and a feed-through device 50. The feed-through device has a socket contact 54 for interconnecting a pin 52 attached to a flanged 51 for separating different environments and the other pin 53 making a pair with the pin 52, in which the pin 52, the other pin 53 and the socket contact 54 together construct a connecting block, and the socket contact 54 has an elastic member 61. Accordingly, even if a large number of connecting blocks are provided, the connecting force may be kept to such a low level as to prevent the breakage in the sensor. The pin 53 is connected with the TDI sensor 64, in which a pixel array has been adaptively configured based on the optical characteristic of an image projecting optical system. That sensor has a number of integration stages that can reduce the field of view of the image projecting optical system to as small as possible so that a maximal acceptable distortion within the field of view may be set larger. Further, the number of integration stage may be determined such that the data rate of the TDI sensor would not be reduced but the number of pins would not be increased as much as possible. Preferably, the number of line count may be almost equal to the number of integration stages.

摘要翻译： 电子束装置包括TDI传感器64和馈通装置50.馈通装置具有插座触点54，用于互连连接到凸缘51的引脚52，用于分离不同的环境，而另一个引脚53与 销52，销52，另一销53和插座接触54一起构成连接块，插座触头54具有弹性构件61.因此，即使设置了大量的连接块， 连接力可以保持在如此低的水平，以防止传感器中的破损。 引脚53与TDI传感器64连接，其中像素阵列已经基于图像投影光学系统的光学特性被自适应地配置。 该传感器具有可以将图像投影光学系统的视野尽可能地减小的多个积分级，使得视野内的最大可接受失真可以被设定得更大。 此外，可以确定积分级的数量，使得TDI传感器的数据速率不会降低，但是引脚的数量不会尽可能多地增加。 优选地，行计数的数量可以几乎等于积分级数。

公开(公告)号：US07499162B2

公开(公告)日：2009-03-03

申请号：US11475667

申请日：2006-06-26

申请人： Yukihiro Shibata ,  Shunji Maeda ,  Kazuo Yamaguchi ,  Minoru Yoshida ,  Atsushi Yoshida ,  Kenji Oka ,  Kenji Watanabe

发明人： Yukihiro Shibata ,  Shunji Maeda ,  Kazuo Yamaguchi ,  Minoru Yoshida ,  Atsushi Yoshida ,  Kenji Oka ,  Kenji Watanabe

IPC分类号： G01J4/00

CPC分类号： G01N21/21 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G02B21/0016

摘要： A defect inspecting apparatus includes a sample mounting device for mounting a sample; lighting and detecting apparatus for illuminating a patterned sample mounted on a mount and detecting the optical image of the reflected light obtained therefrom. Also included is a display for displaying the optical image detected by this lighting and detecting apparatus; an optical parameter setting device for setting and displaying optical parameters for the lighting and detecting apparatus on the display; and optical parameter adjusting apparatus for adjusting optical parameters set for the lighting and detecting apparatus according to the optical parameters set by the optical parameter setting apparatus; a storage device for storing comparative image data; and a defect detecting device for detecting defects from patterns formed on the sample by comparing the optical image detected by the optical image detecting apparatus with the comparative image data stored in the storage.

摘要翻译： 缺陷检查装置包括用于安装样品的样品安装装置; 照明和检测装置，用于照亮安装在安装件上的图案样品，并检测由其获得的反射光的光学图像。 还包括用于显示由该照明和检测装置检测的光学图像的显示器; 用于在显示器上设置和显示照明和检测装置的光学参数的光学参数设置装置; 以及光学参数调整装置，用于根据由所述光学参数设定装置设定的光学参数来调整对所述照明和检测装置设定的光学参数; 用于存储比较图像数据的存储装置; 以及缺陷检测装置，用于通过将由光学图像检测装置检测的光学图像与存储在存储器中的比较图像数据进行比较来检测在样本上形成的图案的缺陷。

公开(公告)号：US07483560B2

公开(公告)日：2009-01-27

申请号：US10679290

申请日：2003-10-07

申请人： Chle Shishido ,  Ryo Nakagaki ,  Maki Tanaka ,  Kenji Watanabe ,  Yuya Toyoshima

发明人： Chle Shishido ,  Ryo Nakagaki ,  Maki Tanaka ,  Kenji Watanabe ,  Yuya Toyoshima

IPC分类号： G06K9/00

CPC分类号： H01L22/34 ,  G01N21/956 ,  G06T7/0004 ,  G06T2207/30148 ,  H01L2924/0002 ,  H01L2924/00

摘要： In a method of measuring a three dimensional shape of an arbitrary fine pattern on a semiconductor device, an optical measurement system carries out a measurement to obtain cross-section information, and an electron microscope obtains an electron beam image of the arbitrary fine pattern. Plane information and cross-section information obtained from the electron beam image of the arbitrary fine pattern are combined to measure the three dimensional shape of the arbitrary fine pattern.

摘要翻译： 在半导体装置中测定任意精细图案的三维形状的方法中，光学测量系统进行测量以获得横截面信息，并且电子显微镜获得任意精细图案的电子束图像。 从任意精细图案的电子束图像获得的平面信息和横截面信息被组合以测量任意精细图案的三维形状。

公开(公告)号：US07423267B2

公开(公告)日：2008-09-09

申请号：US11528673

申请日：2006-09-28

申请人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Kenji Watanabe ,  Takao Kato ,  Hirosi Sobukawa ,  Tsutomu Karimata ,  Shoji Yoshikawa ,  Toshifumi Kimba ,  Shin Oowada ,  Mutsumi Saito ,  Muneki Hamashima

发明人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Kenji Watanabe ,  Takao Kato ,  Hirosi Sobukawa ,  Tsutomu Karimata ,  Shoji Yoshikawa ,  Toshifumi Kimba ,  Shin Oowada ,  Mutsumi Saito ,  Muneki Hamashima

IPC分类号： G01N23/00

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G01N23/225 ,  H01J37/06 ,  H01J37/063 ,  H01J37/073 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J37/3174 ,  H01J2237/0435 ,  H01J2237/0635 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/2446 ,  H01J2237/24485 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817

摘要： The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.

摘要翻译： 本发明提供了一种用于用一次电子束照射样品的电子束装置，以通过用于评估样品表面的照射来检测从样品表面产生的二次电子束。 在电子束装置中，电子枪具有用于发射一次电子束的阴极。 阴极包括用于发射一次电子束的多个发射器，其以在主电光系统的光轴为中心的圆周彼此分开布置。 多个发射器被布置成使得当多个发射器投射到与一次电子束扫描的方向平行的直线上时，直线上的所得点以相等的间隔隔开。

公开(公告)号：US07411207B2

公开(公告)日：2008-08-12

申请号：US11782760

申请日：2007-07-25

申请人： Hidetoshi Nishiyama ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Akira Hamamatsu ,  Kenji Watanabe ,  Tetsuya Watanabe ,  Takahiro Jingu

发明人： Hidetoshi Nishiyama ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Akira Hamamatsu ,  Kenji Watanabe ,  Tetsuya Watanabe ,  Takahiro Jingu

IPC分类号： G01N21/88

CPC分类号： G01N21/274 ,  G01N21/47 ,  G01N21/4738 ,  G01N21/8806 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  G01N2021/8854

摘要： An apparatus for inspecting particles and/or pattern defects of an object under inspection. Data processing means obtains information on size of the particles and/or the pattern defects from an intensity of the scattered light detected by the light detecting means by referring to a relationship between an intensity of scattered light from a standard particle and a size of the standard particle, and using a calibration coefficient for compensating for a change in intensity of the light of the illuminating means from a predetermined intensity.

摘要翻译： 一种用于检查被检查物体的颗粒和/或图案缺陷的装置。 数据处理装置通过参考来自标准粒子的散射光的强度与标准尺寸之间的关系，从光检测装置检测到的散射光的强度获得关于颗粒尺寸和/或图案缺陷的信息 并且使用用于从预定强度补偿照明装置的光的强度变化的校准系数。

公开(公告)号：US20080099697A1

公开(公告)日：2008-05-01

申请号：US11898358

申请日：2007-09-11

申请人： Kenji Watanabe ,  Takeshi Murakami ,  Ryo Tajima ,  Masahiro Hatakeyama ,  Masatoshi Tsuneoka ,  Nobuharu Noji

发明人： Kenji Watanabe ,  Takeshi Murakami ,  Ryo Tajima ,  Masahiro Hatakeyama ,  Masatoshi Tsuneoka ,  Nobuharu Noji

IPC分类号： G21K5/10

CPC分类号： H01J37/28 ,  H01J37/026 ,  H01J37/153 ,  H01J37/29 ,  H01J2237/0047 ,  H01J2237/1532 ,  H01J2237/216

摘要： [Problem] To adjust astigmatism quickly with a simple algorithm by utilizing an autofocus estimation value of an image obtained from a pattern formed on a sample. [Means] A charged particle beam apparatus 300 for observing and estimating a sample W by applying a charged particle beam to sample W to detect secondary charged particles, such as electrons emitted from the sample, reflected electrons and backscattered electrons comprises astigmatism adjusting means 17 for adjusting astigmatism of the charged particle beam. Astigmatism adjusting means 17 is supplied with a correction voltage which maximizes a focus estimation value obtained from a pattern formed on sample W. Astigmatism adjusting means 17 is a multipole including a plurality of pairs of electrodes or coils facing each other to place the optical axis of the charged particle beam at the center. Also disclosed is a charged particle beam apparatus 400 capable of observation and estimation of a sample surface in a condition where no charge up exists over the whole sample W.

摘要翻译： [问题]通过利用从样品上形成的图案获得的图像的自动聚焦估计值，通过简单的算法快速调节像散。 用于通过对样品W施加带电粒子束以检测从样品发射的电子，反射电子和反向散射电子的二次带电粒子来观察和估计样品W的带电粒子束装置300包括散光调节装置17，用于 调整带电粒子束的散光。 散光调节装置17被提供校正电压，该校正电压使得从样本W上形成的图案获得的聚焦估计值最大化。散光调节装置17是包括多对电极或线圈彼此面对的多极，以将光轴 带电粒子束在中心。 还公开了一种能够在整个样品W上不存在电荷的情况下能够观察和估计样品表面的带电粒子束装置400。

公开(公告)号：US07336303B2

公开(公告)日：2008-02-26

申请号：US10347585

申请日：2003-01-22

申请人： Kenichi Shimomura ,  Yoshikazu Kondo ,  Youichi Kato ,  Kenji Watanabe

发明人： Kenichi Shimomura ,  Yoshikazu Kondo ,  Youichi Kato ,  Kenji Watanabe

IPC分类号： H04N5/262

CPC分类号： G06T3/4007 ,  H04N5/232 ,  H04N5/23296 ,  H04N5/2628 ,  H04N5/3454 ,  H04N5/361

摘要： An imaging control unit specifies a scan region, including an effective pixel region and a blanking region, of an image based on a magnification for electronic zooming, and converts an input optical signal into an electrical signal by scanning the scan region. The imaging control unit reads the electrical signal stored and delivers the electrical signal to an image sensor unit as picture data. An RW control unit stores the picture data in a register based on the magnification for electronic zooming, and then reads the picture data at a predetermined frame rate. A resolution converter performs interpolation processing of the picture data based on the magnification for electronic zooming.

摘要翻译： 成像控制单元基于用于电子变焦的放大率来指定包括图像的有效像素区域和消隐区域的扫描区域，并且通过扫描扫描区域将输入的光学信号转换为电信号。 成像控制单元读取存储的电信号并将电信号传送到图像传感器单元作为图像数据。 RW控制单元基于用于电子变焦的放大率将图像数据存储在寄存器中，然后以预定帧速率读取图像数据。 分辨率转换器基于用于电子变焦的倍率执行图像数据的插值处理。

公开(公告)号：US20080039511A1

公开(公告)日：2008-02-14

申请号：US11587862

申请日：2005-05-16

申请人： Isao Takemura ,  Kenji Watanabe ,  Kunio Oshima ,  Nobuaki Ito ,  Junpei Haruta ,  Hidetaka Hiyama ,  Masatoshi Chihiro ,  Hideki Kawasome ,  Yoko Sakamoto ,  Hironobu Ishiyama ,  Takumi Sumida ,  Kazuhiko Fujita ,  Hideki Kitagaki

发明人： Isao Takemura ,  Kenji Watanabe ,  Kunio Oshima ,  Nobuaki Ito ,  Junpei Haruta ,  Hidetaka Hiyama ,  Masatoshi Chihiro ,  Hideki Kawasome ,  Yoko Sakamoto ,  Hironobu Ishiyama ,  Takumi Sumida ,  Kazuhiko Fujita ,  Hideki Kitagaki

IPC分类号： A61K31/425 ,  A61P17/00 ,  C07D277/00

CPC分类号： C07D495/04 ,  C07D277/24 ,  C07D277/56 ,  C07D417/06

摘要： An object of the present invention is to provide a novel thiazole compound with specific inhibitory activity against phosphodiesterase 4. The present invention provides a compound represented by Formula (1), an optical isomer thereof, or a salt thereof: wherein R1 is a di-C1-6 alkoxyphenyl group; R2 is any one of the following groups (a) to (t): (a) a phenyl group; (b) a naphthyl group; (c) a pyridyl group; (d) a furyl group; (e) a thienyl group; (f) an isoxazolyl group; (g) a thiazolyl group; (h) a pyrrolyl group; (i) an imidazolyl group; (j) a tetrazolyl group; (k) a pyrazinyl group; (l) a thienothienyl group; (m) a benzothienyl group; (n) an indolyl group; (o) a benzimidazolyl group; (p) an indazolyl group; (q) a quinolyl group; (r) a 1,2,3,4-tetrahydroquinolyl group; (s) a quinoxalinyl group; and (t) a 1,3-benzodioxolyl group; and A is any one of the following groups (i) to (vi): (i) —CO—B— wherein B is a C1-6 alkylene group; (ii) —CO—Ba wherein Ba is a C2-6 alkenylene group; (iii) —CH(OH)—B—; (iv) —COCH(COOR3)-Bb- wherein R3 is a C1-6 alkyl group and Bb is a C1-6 alkylene group; and (v) -Bc- wherein Bc is a C2-6 alkylene group.

摘要翻译： 本发明的目的是提供一种对磷酸二酯酶4具有特异抑制活性的噻唑类化合物。本发明提供式（1）表示的化合物，其光学异构体或其盐：其中R1是二 C 1-6烷氧基苯基; R2是下述（a）〜（t）中的任一个：（a）苯基; （b）萘基; （c）吡啶基; （d）呋喃基; （e）噻吩基; （f）异恶唑基; （g）噻唑基; （h）吡咯基; （i）咪唑基; （j）四唑基; （k）吡嗪基; （1）噻吩并噻吩基; （m）苯并噻吩基; （n）吲哚基; （o）苯并咪唑基; （p）吲唑基; （q）喹啉基; （r）1,2,3,4-四氢喹啉基; 喹喔啉基; 和（t）1,3-苯并二恶唑基; A为下列基团（i）至（vi）中的任何一个：（i）-CO-B-其中B为C 1-6亚烷基; （ⅱ）-CO-Ba，其中Ba为C 2-6亚烯基; （ⅲ）-CH（OH）-B-; （ⅳ）-COCH（COOR3）-Bb-，其中R3是C 1-6烷基，Bb是C 1-6亚烷基; 和（v）-Bc-其中Bc是C 2-6亚烷基。

公开(公告)号：US07312449B2

公开(公告)日：2007-12-25

申请号：US11034873

申请日：2005-01-14

申请人： Mamoru Nakasuji ,  Takao Kato ,  Tohru Satake ,  Kenji Watanabe ,  Takeshi Murakami ,  Nobuharu Noji

发明人： Mamoru Nakasuji ,  Takao Kato ,  Tohru Satake ,  Kenji Watanabe ,  Takeshi Murakami ,  Nobuharu Noji

IPC分类号： G01N23/00

CPC分类号： H01J37/28 ,  G01N23/04 ,  H01J2237/2817

摘要： An electron beam system wherein a shot noise of an electron beam can be reduced and a beam current can be made higher, and further a shaped beam is formed by a two-stage lenses so as to allow for an operation with high stability. In this electron beam system, an electron beam emitted from an electron gun is irradiated onto a sample and secondary electrons emanated from the sample are detected. The electron gun is a thermionic emission type and designed to operate in a space charge limited condition. A shaping aperture and a NA aperture are arranged in front locations of the electron gun. An image of the shaping aperture formed by an electron beam emitted from the thermionic emission electron gun is focused onto a surface of the sample through the two-stage lenses.

摘要翻译： 一种电子束系统，其中可以减少电子束的喷射噪声并且可以使束流更高，并且还可以通过两级透镜形成成形梁，以允许具有高稳定性的操作。 在该电子束系统中，从电子枪发射的电子束照射到样品上，并检测从样品发出的二次电子。 电子枪是一种热离子发射型，设计用于在空间电荷限制条件下工作。 成形孔径和NA孔径布置在电子枪的前部位置。 由从热电子发射电子枪发射的电子束形成的成形孔的图像通过两级透镜聚焦到样品的表面上。