公开(公告)号：US08779358B2

公开(公告)日：2014-07-15

申请号：US13449392

申请日：2012-04-18

Applicant: Dov Shachal

Inventor： Dov Shachal

IPC: G01N23/00

CPC classification number: H01J37/285 ,  H01J37/06 ,  H01J37/20 ,  H01J37/28 ,  H01J37/301 ,  H01J2237/006 ,  H01J2237/0458 ,  H01J2237/15 ,  H01J2237/164 ,  H01J2237/182 ,  H01J2237/2002 ,  H01J2237/2006 ,  H01J2237/2605 ,  H01J2237/28 ,  H01J2237/2801 ,  H01J2237/2806 ,  H01J2237/2807

Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.

Abstract translation: 接口，扫描电子显微镜和用于观察位于非真空环境中的物体的方法。 该方法包括：使在真空环境中产生的至少一个电子束通过孔阵列中的至少一个孔并通过至少一个密封所述至少一个孔的超薄膜; 其中所述至少一个电子束被引向所述物体; 其中所述至少一个超薄膜承受真空环境和非真空环境之间的压力差; 以及检测响应于所述至少一个电子束和所述物体之间的相互作用而产生的微粒。

公开(公告)号：US08766213B2

公开(公告)日：2014-07-01

申请号：US13607329

申请日：2012-09-07

Applicant: Marcus Straw ,  Mark Emerson

Inventor： Marcus Straw ,  Mark Emerson

IPC: H01J37/00

CPC classification number: H01J37/3045 ,  G21K5/00 ,  G21K5/08 ,  H01J37/226 ,  H01J37/228 ,  H01J37/3056 ,  H01J2237/1501 ,  H01J2237/28

Abstract: A method and apparatus for aligning a laser beam coincident with a charged particle beam. The invention described provides a method for aligning the laser beam through the center of an objective lens and ultimately targeting the eucentric point of a multi-beam system. The apparatus takes advantage of components of the laser beam alignment system being positioned within and outside of the vacuum chamber of the charged particle system.

Abstract translation: 用于对准与带电粒子束一致的激光束的方法和装置。 所描述的本发明提供了一种通过物镜的中心对准激光束并最终瞄准多光束系统的中心点的方法。 该装置利用激光束对准系统的部件位于带电粒子系统的真空室内和外部。

公开(公告)号：US08704195B2

公开(公告)日：2014-04-22

申请号：US13854187

申请日：2013-04-01

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Matthias Knappich

IPC: H01J37/20

CPC classification number: G21K5/10 ,  H01J37/20 ,  H01J2237/20214 ,  H01J2237/20221 ,  H01J2237/20285 ,  H01J2237/28 ,  H02P8/40

Abstract: A method is provided for setting a position of a carrier element, arranged in a particle beam device, that holds an object. The particle beam device has a beam generator for generating a particle beam and an objective for focusing the particle beam. The carrier element is movable using a first stepper motor. A movement of the carrier element is started by actuating the first stepper motor using a first motor current in the form of an alternating current. The first motor current is set to a first frequency and a first amplitude. The movement of the carrier element is decelerated by reducing the first frequency and by reducing the first amplitude of the first motor current. The first frequency is reduced to zero during a first period of time. The first amplitude is reduced to an amplitude of a first holding current during the first period of time.

Abstract translation: 提供了一种用于设置放置在粒子束装置中的承载元件的位置的方法，该载体元件保持物体。 粒子束装置具有用于产生粒子束的束发生器和用于聚焦粒子束的物镜。 载体元件可以使用第一步进电机来移动。 使用交流电形式的第一电动机电流来驱动第一步进电动机来启动载体元件的移动。 第一电动机电流被设定为第一频率和第一幅度。 通过降低第一频率并减小第一电动机电流的第一幅度，使载体元件的移动减速。 第一个频率在第一个时间段内减少到零。 第一幅度在第一时间段内降低到第一保持电流的幅度。

公开(公告)号：US08653459B2

公开(公告)日：2014-02-18

申请号：US13518236

申请日：2010-12-24

Applicant: Seiichiro Kanno ,  Hiroyuki Kitsunai ,  Masaru Matsushima

Inventor： Seiichiro Kanno ,  Hiroyuki Kitsunai ,  Masaru Matsushima

IPC: H01J37/20

CPC classification number: H01L21/6831 ,  H01J37/20 ,  H01J2237/2007 ,  H01J2237/28

Abstract: There is provided a technique that is capable of attracting a sample without making the voltage applied to an electrostatic chuck unnecessarily large. Attraction experiments with respect to the electrostatic chuck are performed using a testing sample whose degree of warp and pattern of warp are known, and a critical application voltage at which the attraction state changes from “bad” to “good” is found. When measuring an inspection target sample, the flatness of the inspection target sample is measured, and the degree of warp and pattern of warp of the inspection target sample are detected. Based on the degree of warp and pattern of warp of the inspection target sample and on the known critical application voltage, the application voltage for the electrostatic chuck is set.

Abstract translation: 提供了能够吸引样品而不使施加到静电卡盘的电压不必要地大的技术。 对于静电卡盘的吸引实验，使用已知翘曲度和翘曲状态的测试样品，以及吸引状态从“不良”变为“良好”的临界施加电压进行。 在测定检查对象样品时，测定检查对象样品的平坦度，检测检查对象样品的翘曲程度和翘曲图案。 基于检测对象样品的翘曲和翘曲的程度以及已知的关键施加电压，设定静电卡盘的施加电压。

公开(公告)号：US20140008534A1

公开(公告)日：2014-01-09

申请号：US13935853

申请日：2013-07-05

Applicant: Hitachi High-Technologies Corporation

Inventor： Wen LI ,  Hisafumi IMURA ,  Hajime KAWANO ,  Hiroyuki TAKAHASHI

IPC: H01J37/26

CPC classification number: H01J37/265 ,  H01J37/045 ,  H01J2237/0432 ,  H01J2237/2485 ,  H01J2237/28

Abstract: Technique capable of achieving shortening of settling time, which is caused by ringing, etc. of a blanking control signal is provided. A measuring/inspecting apparatus is configured to have a main blanking unit and a correction blanking control unit as a high-speed switching control unit of an electron beam. During the period of switching of a main blanking control signal from ON to OFF, a correction blanking control signal is applied in real time in synchronization with the switching. The ringing, etc. caused by the main blanking are corrected so as to be cancelled out by that, the settling time is shortened as a result.

Abstract translation: 提供了能够实现由消隐控制信号的振铃等引起的建立时间缩短的技术。 测量/检查装置被配置为具有作为电子束的高速切换控制单元的主消隐单元和校正消隐控制单元。 在将主消隐控制信号从ON切换到OFF的时段期间，与切换同步地实时地施加校正消隐控制信号。 由主消隐引起的振铃等被校正，从而被抵消，因此结算时间缩短。

公开(公告)号：US08623230B2

公开(公告)日：2014-01-07

申请号：US12744586

申请日：2008-12-18

Applicant: Nicole Auth ,  Petra Spies ,  Tristan Bret ,  Rainer Becker ,  Thorsten Hofmann ,  Klaus Edinger

Inventor： Nicole Auth ,  Petra Spies ,  Tristan Bret ,  Rainer Becker ,  Thorsten Hofmann ,  Klaus Edinger

IPC: H01L21/302

CPC classification number: C23F4/00 ,  H01J37/3056 ,  H01J2237/28 ,  H01J2237/3174 ,  H01L21/76894 ,  H01L22/22 ,  H01L2924/0002 ,  H01L2924/00

Abstract: The present method relates to processes for the removal of a material from a sample by a gas chemical reaction activated by a charged particle beam. The method is a multiple step process wherein in a first step a gas is supplied which, when a chemical reaction between the gas and the material is activated, forms a non-volatile material component such as a metal salt or a metaloxide. In a second consecutive step the reaction product of the first chemical reaction is removed from the sample.

Abstract translation: 本方法涉及通过由带电粒子束激活的气体化学反应从样品中去除材料的方法。 该方法是多步骤方法，其中在第一步骤中，供应气体，当气体和材料之间的化学反应活化时，形成非挥发性物质组分如金属盐或金属氧化物。 在第二个连续步骤中，从样品中除去第一化学反应的反应产物。

公开(公告)号：US20130320209A1

公开(公告)日：2013-12-05

申请号：US13873725

申请日：2013-04-30

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Hiroyasu SHICHI ,  Satoshi TOMIMATSU ,  Noriyuki KANEOKA ,  Kaoru UMEMURA ,  Koji ISHIGURO

IPC: H01J37/26

CPC classification number: H01J37/261 ,  H01J37/20 ,  H01J37/3045 ,  H01J2237/08 ,  H01J2237/20207 ,  H01J2237/24528 ,  H01J2237/28 ,  H01J2237/31713 ,  H01J2237/3174 ,  H01J2237/31749

Abstract: An ion beam processing apparatus includes an ion beam irradiation optical system that irradiates a rectangular ion beam to a sample on a first sample stage, an electron beam irradiation optical system that irradiates an electron beam to the sample, and a second sample stage to hold a test piece, extracted from the sample. The ion beam can be tilted by rotating the second sample stage about a tilting axis. A controller controls the width of skew of an intensity profile representing an edge of the rectangular ion beam in a direction perpendicular to a first direction in which the tilting axis of the second sample stage is projected on the second sample stage surface so that the width will be smaller than the width of skew of an intensity profile representing another edge of the ion beam in a direction parallel to the first direction.

Abstract translation: 一种离子束处理装置，包括：离子束照射光学系统，其将矩形离子束照射到第一样品台上的样品，向样品照射电子束的电子束照射光学系统;以及第二样品台， 试样，从样品中提取。 离子束可以通过使第二样品台围绕倾斜轴旋转来倾斜。 控制器控制表示矩形离子束在与第二样品台的倾斜轴投射到第二样品台表面上的第一方向垂直的方向上的强度分布的偏斜宽度，使得宽度将 小于在平行于第一方向的方向上表示离子束的另一边缘的强度分布的偏斜宽度。

公开(公告)号：US20130307960A1

公开(公告)日：2013-11-21

申请号：US13745100

申请日：2013-01-18

Applicant: FEI Company

Inventor： Alan Bahm ,  N. William Parker ,  Mark W. Utlaut

IPC: H04N5/232

CPC classification number: H04N5/23216 ,  G02B21/365 ,  H01J37/265 ,  H01J2237/22 ,  H01J2237/28 ,  H04N1/62

Abstract: An apparatus to permit a viewer of a digital microscopy original image to manipulate the display and/or the microscope to obtain an enhanced view of a region of interest within the original image. In one preferred embodiment a spotlight mode matches the gray shade scale for a spotlight region-of-interest to the pixel intensity variation present in the spotlight region. The gray shade scale used for the spotlight mode may then be generalized to the original image. In a preferred embodiment, spotlight mode provides an easy mechanism for permitting a user to command a re-imaging of a selected spotlight region from a displayed image. Such re-imaging may permit the use of imaging parameter selections that better fit the spotlight region.

Abstract translation: 一种允许数字显微镜原始图像的观看者操纵显示器和/或显微镜以获得原始图像内的感兴趣区域的增强视图的装置。 在一个优选实施例中，聚光灯模式将焦点区域的灰度级别与聚光灯区域中存在的像素强度变化匹配。 然后可以将用于聚光灯模式的灰度级别广义化为原始图像。 在优选实施例中，聚光灯模式提供了一种容易的机构，用于允许用户从显示的图像命令对所选聚光灯区域的重新成像。 这种重新成像可以允许使用更适合聚光灯区域的成像参数选择。

公开(公告)号：US08558190B2

公开(公告)日：2013-10-15

申请号：US13247319

申请日：2011-09-28

Applicant: Dirk Preikszas

Inventor： Dirk Preikszas

IPC: H01J37/153

CPC classification number: H01J37/153 ,  H01J2237/1534 ,  H01J2237/28

Abstract: A charged particle beam system includes a charged particle beam source to generate a charged particle beam; an objective lens to focus the charged particle beam in an object plane; a first condenser lens disposed in a beam path of the charged particle beam between the charged particle beam source and the objective lens; a deflector disposed in the beam path between the first condenser lens and the objective lens and configured to change an angle of incidence of the charged particle beam in an object plane; and an aberration corrector disposed in the beam path between the deflector and the objective lens and configured to compensate aberrations introduced by the objective lens. The aberration corrector is also configured to not compensate aberrations introduced by the first condenser lens.

Abstract translation: 带电粒子束系统包括带电粒子束源以产生带电粒子束; 用于将带电粒子束聚焦在物平面中的物镜; 第一聚光透镜，设置在带电粒子束源和物镜之间的带电粒子束的光束路径中; 偏转器，设置在所述第一聚光透镜和所述物镜之间的所述光束路径中并且被配置为改变所述带电粒子束在物平面中的入射角; 以及像差校正器，设置在偏转器和物镜之间的光束路径中并且被配置为补偿由物镜引入的像差。 像差校正器还被配置为不补偿由第一聚光透镜引入的像差。

公开(公告)号：US20130228685A1

公开(公告)日：2013-09-05

申请号：US13863064

申请日：2013-04-15

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Kenji OBARA ,  Takehiro HIRAI

IPC: G01N23/225

CPC classification number: G01N23/2251 ,  H01J37/222 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/24592 ,  H01J2237/28 ,  H01J2237/2809 ,  H01J2237/2817

Abstract: An object of the present invention is to provide a suitable method of observing a wafer edge by using an electron microscope. The electron microscope includes a column which can take an image in being tilted, and thus allows a wafer edge to be observed from an oblique direction.