公开(公告)号：US4582661A

公开(公告)日：1986-04-15

申请号：US598333

申请日：1984-03-16

申请人： Hirotaka Ito ,  Akio Kusui

发明人： Hirotaka Ito ,  Akio Kusui

IPC分类号： H01R13/648 ,  C08K3/08 ,  C08K7/06 ,  C08L55/02 ,  H01B1/22 ,  H01B7/00 ,  H01B7/17 ,  H01B7/18 ,  H02G15/103 ,  H05K9/00 ,  C08K7/02 ,  C08L27/06

CPC分类号： H05K9/009 ,  C08K3/08 ,  C08K7/06 ,  C08L55/02 ,  H01B1/22 ,  H02G15/103 ,  Y10T428/24818

摘要： A shielding composition has an electromagnetic wave shielding property and also an injection molding property. The composition comprises at least one kind of embedding material selected from a group consisting of plasticized vinyl chloride and acrylonitrile-butadiene-styrene resin, and copper or copper alloy fiber having a diameter of 1-100 .mu.m and a length of 0.5-10 mm embedded in said embedding material. The amount of the fibers is 30-70% by weight of the total composition.

摘要翻译： PCT No.PCT / JP83 / 00238 Sec。 371日期1984年3月16日 102（e）日期1984年3月16日PCT提交1983年7月25日PCT公布。 出版物WO84 / 00555 日期：1984年2月16日。屏蔽组合物具有电磁波屏蔽性和注射成型性。 该组合物包含选自由塑化氯乙烯和丙烯腈 - 丁二烯 - 苯乙烯树脂组成的组中的至少一种包埋材料，以及直径为1-100μm，长度为0.5-10mm的铜或铜合金纤维 嵌入在所述嵌入材料中。 纤维的量为总组合物的30-70重量％。

公开(公告)号：US09976209B2

公开(公告)日：2018-05-22

申请号：US13982613

申请日：2012-02-09

申请人： Hirotaka Ito ,  Kenji Yamamoto

发明人： Hirotaka Ito ,  Kenji Yamamoto

IPC分类号： B21D39/00 ,  C23C14/02 ,  C04B41/00 ,  F16C33/24 ,  C23C16/02 ,  F16C33/04 ,  F16C33/06 ,  F16C33/16

CPC分类号： C23C14/022 ,  C04B41/00 ,  C23C16/0227 ,  F16C33/043 ,  F16C33/06 ,  F16C33/16 ,  F16C33/24 ,  F16C2202/02 ,  F16C2202/04 ,  F16C2240/40 ,  F16C2240/44 ,  Y10T428/12361 ,  Y10T428/12396 ,  Y10T428/24331 ,  Y10T428/24612

摘要： Provided is a sliding member having slidability and abrasion resistance both at satisfactory levels. This sliding member has a sliding surface including a base and a filling part. The base includes a first material and bears regularly arranged concavities. The filling part includes a second material and is arranged in the sliding surface to fill the concavities. The first material includes one selected from the group consisting of a metallic material, a ceramic material, and a carbonaceous material. The second material includes at least one selected from the group consisting of a metallic material, a ceramic material, and a carbonaceous material. The first and second materials differ from each other in at least one of frictional coefficient and hardness. The base and the filling part are substantially flush with each other in the sliding surface.

公开(公告)号：US08298723B2

公开(公告)日：2012-10-30

申请号：US12594825

申请日：2008-03-05

申请人： Shinichi Tanifuji ,  Hirotaka Ito ,  Toshiki Sato ,  Jun Suzuki ,  Yoshinori Ito ,  Jun Hisamoto

发明人： Shinichi Tanifuji ,  Hirotaka Ito ,  Toshiki Sato ,  Jun Suzuki ,  Yoshinori Ito ,  Jun Hisamoto

IPC分类号： H01M8/04

CPC分类号： C23C14/22 ,  C22C5/02 ,  C22C5/04 ,  C22C14/00 ,  C22C16/00 ,  C22C27/02 ,  C23C14/16 ,  C23C14/165 ,  C23C14/345 ,  H01M8/0206 ,  H01M8/0208 ,  H01M8/021 ,  H01M8/0228 ,  Y02P70/56

摘要： A metal separator 1 for a fuel cell according to the invention is a metal separator for a fuel cell manufactured by using a metal substrate 2 with a flat surface, or with concave gas flow paths formed on at least a part of the surface. The metal separator 1 includes an acid-resistant metal film 3 formed over the surface of the metal substrate 2, and containing one or more kinds of non-noble metals selected from the group comprised of Zr, Nb, and Ta, and a conductive alloy film 4 formed over the acid-resistant metal film 3, and containing one or more kinds of noble metals selected from the group comprised of Au and Pt, and one or more kinds of non-noble metals selected from the group comprised of Zr, Nb, and Ta. A method for manufacturing the metal separator for a fuel cell according to the invention includes a step S1 of depositing an acid-resistant metal film, and a step S2 of depositing a conductive alloy film. With this structure, the invention provides the metal separator for a fuel cell with an excellent acid resistance and a low contact resistance, and a manufacturing method thereof.

摘要翻译： 根据本发明的用于燃料电池的金属隔板1是通过使用具有平坦表面的金属基板2或者形成在表面的至少一部分上的凹入气体流路而制造的用于燃料电池的金属隔板。 金属隔板1包括在金属基板2的表面上形成的耐酸金属膜3，并且含有选自Zr，Nb，Ta中的一种以上的非贵金属和导电性合金 在耐酸金属膜3上形成的含有选自Au和Pt的一种或多种贵金属的一种或多种选自Zr，Nb ，和Ta。 根据本发明的燃料电池用金属隔板的制造方法包括沉积耐酸金属膜的工序S1和沉积导电性合金膜的工序S2。 利用该结构，本发明提供了具有优异的耐酸性和低接触电阻的燃料电池用金属隔板及其制造方法。

公开(公告)号：US08231990B2

公开(公告)日：2012-07-31

申请号：US12517607

申请日：2007-12-12

申请人： Toshiki Sato ,  Jun Suzuki ,  Yoshinori Ito ,  Hirotaka Ito ,  Shinichi Tanifuji

发明人： Toshiki Sato ,  Jun Suzuki ,  Yoshinori Ito ,  Hirotaka Ito ,  Shinichi Tanifuji

IPC分类号： H01M8/02 ,  H01M2/16 ,  C23C14/34 ,  C22F1/00

CPC分类号： H01M8/0206 ,  C22C5/02 ,  C22C5/04 ,  C22C14/00 ,  C22C16/00 ,  C22C27/00 ,  C22C27/02 ,  C22F1/05 ,  C22F1/18 ,  C23C14/16 ,  C23C14/165 ,  C23C14/5806 ,  C23C14/5846 ,  C23C14/5853 ,  H01M8/0208 ,  H01M8/021 ,  H01M8/0228 ,  H01M8/0263 ,  H01M2008/1095 ,  Y02P70/56

摘要： The present invention concerns an alloy film for a metal separator for a fuel cell characterized by containing at least one noble metal element selected from Au and Pt and at least one non-noble metal element selected from the group consisting of Ti, Zr, Nb, Hf, and Ta, at a content ratio of noble metal element/non-noble metal element of 35/65 to 95/5, and having a film thickness of 2 nm or more. The present invention also relates to a manufacturing method of an alloy film for the metal separator for the fuel cell and a target material for sputtering, as well as the metal separator and the fuel sell. The alloy film for the metal separator for the fuel cell according to the invention is excellent in the corrosion resistance, has low contact resistance, can maintain the low contact resistance for a long time even in a corrosive environment, and is excellent further in the productivity.

摘要翻译： 本发明涉及一种用于燃料电池用金属隔板的合金膜，其特征在于，含有至少一种选自Au和Pt的贵金属元素和至少一种选自Ti，Zr，Nb， Hf和Ta，贵金属元素/非贵金属元素的含量比为35/65〜95/5，膜厚为2nm以上。 本发明还涉及用于燃料电池用金属隔板的合金膜和溅射用靶材以及金属隔板和燃料的制造方法。 本发明的燃料电池用金属隔板用合金膜耐腐蚀性优异，接触电阻低，即使在腐蚀性环境下也能长时间保持低接触电阻，生产率进一步提高 。

公开(公告)号：US20110147753A1

公开(公告)日：2011-06-23

申请号：US13056444

申请日：2009-08-14

申请人： Takashi Onishi ,  Aya Miki ,  Hiroshi Goto ,  Masao Mizuno ,  Hirotaka Ito ,  Katsufumi Tomihisa

发明人： Takashi Onishi ,  Aya Miki ,  Hiroshi Goto ,  Masao Mizuno ,  Hirotaka Ito ,  Katsufumi Tomihisa

IPC分类号： H01L29/04 ,  B32B17/06

CPC分类号： H01L23/53233 ,  C22C9/00 ,  C22C9/01 ,  H01L27/124 ,  H01L2924/0002 ,  Y10T428/265 ,  H01L2924/00

摘要： Disclosed is a Cu alloy film for a display device that has high adhesion to a glass substrate while maintaining a low electric resistance characteristic of Cu-based materials. The Cu alloy film is wiring in direct contact with a glass substrate on a board and contains 0.1 to 10.0 atomic % in total of one or more elements selected from the group consisting of Ti, Al, and Mg. Also disclosed is a display device comprising a thin-film transistor that comprises the Cu alloy film. In a preferred embodiment of the display device, the thin-film transistor has a bottom gate-type structure, and a gate electrode and scanning lines in the thin-film transistor comprise the Cu alloy film and are in direct contact with the glass substrate.

摘要翻译： 公开了一种用于显示装置的Cu合金膜，其在保持Cu基材料的低电阻特性的同时对玻璃基板具有高粘附性。 Cu合金膜是与板上的玻璃基板直接接触的布线，并且含有0.1〜10.0原子％的一种以上选自Ti，Al，Mg的元素。 还公开了包括包含Cu合金膜的薄膜晶体管的显示装置。 在显示装置的优选实施例中，薄膜晶体管具有底栅型结构，并且薄膜晶体管中的栅电极和扫描线包括Cu合金膜并与玻璃基板直接接触。

公开(公告)号：US20110121459A1

公开(公告)日：2011-05-26

申请号：US13003181

申请日：2009-07-10

申请人： Takashi Onishi ,  Masao Mizuno ,  Hirotaka Ito ,  Kazuyuki Kohama ,  Kazuhiro Ito ,  Susumu Tsukimoto ,  Masanori Murakami

发明人： Takashi Onishi ,  Masao Mizuno ,  Hirotaka Ito ,  Kazuyuki Kohama ,  Kazuhiro Ito ,  Susumu Tsukimoto ,  Masanori Murakami

IPC分类号： H01L23/535

CPC分类号： H01L21/76843 ,  H01L21/2855 ,  H01L21/76867 ,  H01L23/53238 ,  H01L23/5329 ,  H01L2924/0002 ,  H01L2924/00

摘要： Provided is a semiconductor interconnection wherein a barrier layer different from a TiO2 layer is formed on an interface between an insulating film and a Cu interconnection without increasing electrical resistivity of the Cu interconnection. In the semiconductor interconnection, a Cu interconnection containing Ti is embedded in a trench arranged on an insulating film on the semiconductor substrate, and a TiC layer is formed between the insulating film and the Cu interconnection. The insulating film is preferably composed of SiCO or SiCN. The thickness of the TiC layer is preferably 3-30 nm.

摘要翻译： 提供了一种半导体互连，其中在绝缘膜和Cu互连之间的界面上形成不同于TiO 2层的阻挡层，而不增加Cu互连的电阻率。 在半导体互连中，包含Ti的Cu互连嵌入设置在半导体衬底上的绝缘膜上的沟槽中，并且在绝缘膜和Cu互连之间形成TiC层。 绝缘膜优选由SiCO或SiCN构成。 TiC层的厚度优选为3-30nm。

公开(公告)号：US20050220990A1

公开(公告)日：2005-10-06

申请号：US11049724

申请日：2005-02-04

申请人： Tsutomu Aoyama ,  Shunji Ishio ,  Hirotaka Ito

发明人： Tsutomu Aoyama ,  Shunji Ishio ,  Hirotaka Ito

IPC分类号： G11B5/64 ,  B05D5/12 ,  C23C14/00 ,  C23C14/48 ,  G11B5/65 ,  G11B5/851 ,  G11B5/855 ,  H01F10/08 ,  H01F10/14 ,  H01F10/16 ,  H01F41/14 ,  H01F41/34

CPC分类号： H01F41/34 ,  C23C14/3492 ,  C23C14/48 ,  G11B5/855 ,  H01F10/123 ,  H01F10/3236

摘要： An Ag ion 6 is locally implanted into a thin film 4 containing, as main components, at least one of Fe and Co and at least one of Pd and Pt and a heat treatment is then carried out, and a portion 7 into which the Ag ion 6 is implanted becomes a portion 9 having a large coercive force and a portion 8 into which the Ag ion 6 is not locally implanted becomes a portion 10 having a small coercive force.

摘要翻译： 将Ag离子6局部注入含有作为主要成分的Fe和Co中的至少一种以及Pd和Pt中的至少一种并进行热处理的薄膜4，然后进行热处理的部分7，Ag 离子6被注入成为矫顽力大的部分9和不局部注入Ag离子6的部分8成为矫顽力小的部分10。

公开(公告)号：US5617941A

公开(公告)日：1997-04-08

申请号：US360575

申请日：1994-12-21

申请人： Shigeo Takahashi ,  Yoshitaka Soga ,  Tatsuo Ohhashi ,  Hirotaka Ito

发明人： Shigeo Takahashi ,  Yoshitaka Soga ,  Tatsuo Ohhashi ,  Hirotaka Ito

IPC分类号： B21K1/30 ,  F16D13/52 ,  F16D25/0638 ,  F16D55/36 ,  F16D67/02 ,  F16D67/04 ,  F16H63/30 ,  F16D13/60

CPC分类号： F16D55/36 ,  B21K1/30 ,  F16D13/52 ,  F16D25/0638 ,  F16D67/02 ,  F16D67/04 ,  F16H63/3026

摘要： A pressure-receiving plate for a friction device includes an annular portion and pawls formed integrally on the inner or outer periphery of the annular portion. The annular portion has one side provided with a friction surface which contacts a friction disk engaged with one of a driving member and a driven member, and another side provided with reduced-thickness portions formed by applying crushing work that takes hardness and surface roughness of the friction surface into consideration. The pawls are engaged with the other of the driving member and driven member.

摘要翻译： 用于摩擦装置的受压板包括环形部分和整体形成在环形部分的内周或外周上的棘爪。 环状部具有设置有摩擦面的摩擦面，该摩擦面接触与驱动构件和从动构件中的一个摩擦盘相接合的摩擦面，另一侧设置有通过施加破碎作用形成的厚度减小部分，所述破碎作业具有硬度和表面粗糙度 考虑摩擦面。 棘爪与驱动构件和被驱动构件中的另一个接合。

公开(公告)号：US09121548B2

公开(公告)日：2015-09-01

申请号：US14110782

申请日：2012-04-12

申请人： Hiroyuki Mori ,  Munehisa Matsui ,  Keiji Hayashi ,  Yoshio Fuwa ,  Takatoshi Shinyoshi ,  Satoshi Jinno ,  Kenji Shimoda ,  Satoshi Hirota ,  Koichiro Akari ,  Hirotaka Ito

发明人： Hiroyuki Mori ,  Munehisa Matsui ,  Keiji Hayashi ,  Yoshio Fuwa ,  Takatoshi Shinyoshi ,  Satoshi Jinno ,  Kenji Shimoda ,  Satoshi Hirota ,  Koichiro Akari ,  Hirotaka Ito

IPC分类号： C23C14/32 ,  F16N1/00 ,  F02F3/10 ,  C23C14/06 ,  C10M135/32 ,  C23C14/34 ,  C23C14/35 ,  C23C14/50 ,  C23C28/04 ,  C23C28/00

CPC分类号： F16N1/00 ,  C10M135/32 ,  C23C14/0635 ,  C23C14/3492 ,  C23C14/352 ,  C23C14/505 ,  C23C28/042 ,  C23C28/044 ,  C23C28/42 ,  F02F3/10 ,  Y10T428/265 ,  Y10T428/31678

摘要： A sliding member includes: a substrate which has a sliding surface sliding under the presence of lubricating oil; and a film which is fixed to at least a part of the sliding surface. The film contains carbon (C), titanium (Ti), and boron (B), is obtained by repeatedly and alternately layering a first layer containing amorphous carbon as a principal component and a second layer containing C and Ti as principal components, and has hardness of 18 GPa or more.

摘要翻译： 滑动构件包括：在润滑油的存在下滑动表面滑动的基板; 以及固定在滑动面的至少一部分上的膜。 通过重复交替层叠含有无定形碳作为主要成分的第一层和含有C和Ti作为主要成分的第二层而获得含有碳（C），钛（Ti）和硼（B）的膜，并且具有 硬度18GPa以上。

公开(公告)号：US08574715B2

公开(公告)日：2013-11-05

申请号：US12720135

申请日：2010-03-09

申请人： Hirotaka Ito ,  Kenji Yamamoto

发明人： Hirotaka Ito ,  Kenji Yamamoto

IPC分类号： B32B9/00

CPC分类号： C23C14/0605 ,  C23C14/024 ,  C23C14/027 ,  F16C33/043 ,  F16C2202/04 ,  F16C2206/00 ,  F16C2206/04 ,  F16C2206/40 ,  F16C2240/06 ,  F16C2240/12 ,  F16C2240/60 ,  Y10T74/20654 ,  Y10T428/24975 ,  Y10T428/24983 ,  Y10T428/265 ,  Y10T428/30

摘要： A laminated film is provided which exhibits excellent durability even when formed over a surface of a member (in particular, sliding member) to be used under a high pressure of contacted surface of 2.0 GPa or more. The laminated film includes an intermediate layer which contains one or more compounds selected from the group consisting of a carbide, a boride, and a boron carbide compound of a metal element, and which has a hardness measured by a nanoindentation method (hereinafter referred to as a “nanoindentation hardness”) of not less than 20 GPa nor more than 35 GPa and a thickness of not less than 5 μm nor more than 10 μm, and a diamond-like carbon film which is formed over the intermediate layer, and which has a nanoindentation hardness of not less than 25 GPa nor more than 35 GPa and a thickness of not less than 0.3 μm nor more than 1.0 μm.

摘要翻译： 即使在2.0GPa以上的接触表面的高压下使用的部件（特别是滑动部件）的表面上形成层叠膜也能显示优异的耐久性。 层压膜包括中间层，其含有一种或多种选自金属元素的碳化物，硼化物和碳化硼化合物的化合物，并且其具有通过纳米压痕法测量的硬度（以下称为 不小于20GPa，不大于35GPa，厚度不小于5μm或不大于10μm的“纳米压痕硬度”，以及形成在中间层上的类金刚石碳膜，并且具有 纳米压痕硬度不小于25GPa，不大于35GPa，厚度不小于0.3μm，不大于1.0μm。