公开(公告)号：US09887203B2

公开(公告)日：2018-02-06

申请号：US15222832

申请日：2016-07-28

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Zeev Wurman

IPC: H03K19/173 ,  H01L27/112 ,  H01L23/525

CPC classification number: H01L27/1128 ,  G06F17/505 ,  G06F17/5068 ,  H01L21/768 ,  H01L23/5252 ,  H01L27/11206 ,  H01L2224/16225 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/73204 ,  H01L2224/73265 ,  H01L2924/1305 ,  H03K19/17736 ,  H03K19/17748 ,  H03K19/1778 ,  H01L2924/00014 ,  H01L2924/00

Abstract: A 3D semiconductor device including: a first layer including a first monocrystalline layer, the first layer including first logic cells; a second layer including a monocrystalline semiconductor layer, the second layer overlying the first layer, the second layer including second transistors, where the logic cells include a Look-Up-Table logic cell, and where the second transistors are aligned to the first logic cells with less than 200 nm alignment error.

公开(公告)号：US09853089B2

公开(公告)日：2017-12-26

申请号：US15224929

申请日：2016-08-01

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Deepak C. Sekar ,  Brian Cronquist ,  Israel Beinglass ,  Zeev Wurman

IPC: H01L27/24 ,  G11C13/00 ,  G03F9/00 ,  H01L21/822 ,  H01L21/84 ,  H01L23/544 ,  H01L21/762 ,  H01L27/02 ,  H01L27/06 ,  H01L27/088 ,  H01L27/105 ,  H01L27/108 ,  H01L27/11 ,  H01L27/112 ,  H01L27/11551 ,  H01L27/11578 ,  H01L27/118 ,  H01L27/12 ,  H01L45/00 ,  H01L23/48

CPC classification number: H01L27/2436 ,  G03F9/7076 ,  G03F9/7084 ,  H01L21/76254 ,  H01L21/8221 ,  H01L21/84 ,  H01L23/481 ,  H01L23/544 ,  H01L27/0207 ,  H01L27/0688 ,  H01L27/088 ,  H01L27/092 ,  H01L27/105 ,  H01L27/10876 ,  H01L27/10894 ,  H01L27/10897 ,  H01L27/11 ,  H01L27/1108 ,  H01L27/112 ,  H01L27/11551 ,  H01L27/11578 ,  H01L27/11807 ,  H01L27/11898 ,  H01L27/1203 ,  H01L27/249 ,  H01L45/04 ,  H01L45/1226 ,  H01L45/146 ,  H01L2223/54426 ,  H01L2223/54453 ,  H01L2924/00011 ,  H01L2224/80001

Abstract: A semiconductor device, including: a first memory cell including a first transistor; a second memory cell including a second transistor, where the second transistor overlays the first transistor and the second transistor self-aligned to the first transistor; and a plurality of junctionless transistors, where at least one of the junctionless transistors controls access to at least one of the memory cells.

公开(公告)号：US09799761B2

公开(公告)日：2017-10-24

申请号：US15351389

申请日：2016-11-14

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Yuniarto Widjaja

IPC: H01L29/78 ,  G11C16/02 ,  H01L27/115 ,  G11C11/404 ,  G11C11/4097 ,  H01L27/108 ,  H01L27/11 ,  H01L27/11578 ,  H01L27/24 ,  G11C11/412 ,  G11C16/04

CPC classification number: H01L29/78 ,  G11C11/404 ,  G11C11/4097 ,  G11C11/412 ,  G11C16/02 ,  G11C16/0483 ,  G11C2213/71 ,  H01L27/10802 ,  H01L27/1104 ,  H01L27/115 ,  H01L27/11578 ,  H01L27/2436 ,  H01L29/7841

Abstract: A 3D IC based system, the system including: a first layer including first memory cells including first transistors, where the first transistors include first transistor channels; a second layer overlying the first layer, the second layer including second memory cells including second transistors, where the second transistors include second transistor channels, where the second layer includes vertically oriented doped regions, where the second layer includes at least one through second layer via having a diameter of less than 400 nm, and where at least one of the first transistor channels and at least one of the second transistor channels are directly coupled to at least one of the vertically oriented doped region.

公开(公告)号：US20170221761A1

公开(公告)日：2017-08-03

申请号：US15488514

申请日：2017-04-16

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Deepak C. Sekar ,  Brian Cronquist ,  Zeev Wurman

IPC: H01L21/77 ,  H01L27/10 ,  H01L27/02 ,  H01L23/00 ,  H01L23/31 ,  H01L29/66 ,  H01L23/40

CPC classification number: H01L21/77 ,  B82Y10/00 ,  G11C16/0408 ,  G11C16/0483 ,  H01L21/6835 ,  H01L21/76254 ,  H01L21/84 ,  H01L23/3114 ,  H01L23/36 ,  H01L23/3677 ,  H01L23/4012 ,  H01L23/5286 ,  H01L24/01 ,  H01L24/13 ,  H01L24/16 ,  H01L24/32 ,  H01L24/48 ,  H01L27/0207 ,  H01L27/0688 ,  H01L27/0694 ,  H01L27/088 ,  H01L27/092 ,  H01L27/10 ,  H01L27/1052 ,  H01L27/10802 ,  H01L27/10894 ,  H01L27/10897 ,  H01L27/1104 ,  H01L27/1108 ,  H01L27/1116 ,  H01L27/11524 ,  H01L27/11526 ,  H01L27/11529 ,  H01L27/11551 ,  H01L27/1157 ,  H01L27/11573 ,  H01L27/11578 ,  H01L27/11807 ,  H01L27/1203 ,  H01L27/2436 ,  H01L27/249 ,  H01L28/00 ,  H01L29/1033 ,  H01L29/66257 ,  H01L29/6659 ,  H01L29/66795 ,  H01L29/66825 ,  H01L29/66833 ,  H01L29/7841 ,  H01L29/785 ,  H01L29/78696 ,  H01L29/7881 ,  H01L29/792 ,  H01L45/04 ,  H01L45/1226 ,  H01L45/146 ,  H01L2221/6835 ,  H01L2221/68381 ,  H01L2224/131 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/48227 ,  H01L2224/73204 ,  H01L2224/73265 ,  H01L2224/81001 ,  H01L2924/00014 ,  H01L2924/10253 ,  H01L2924/12032 ,  H01L2924/12042 ,  H01L2924/1305 ,  H01L2924/13062 ,  H01L2924/13091 ,  H01L2924/1461 ,  H01L2924/15311 ,  H01L2924/3011 ,  H01L2924/3025 ,  H01L2924/00012 ,  H01L2924/00015 ,  H01L2924/014 ,  H01L2924/3512 ,  H01L2924/00 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: A 3D integrated circuit device, including: a first transistor; a second transistor; and a third transistor, where the third transistor is overlaying the second transistor and the third transistor is controlled by a third control line, where the second transistor is overlaying the first transistor and the second transistor is controlled by a second control line, where the first transistor is part of a control circuit controlling the second control line and the third control line, and where the second transistor and the third transistor are self-aligned.

公开(公告)号：US09721927B1

公开(公告)日：2017-08-01

申请号：US15095187

申请日：2016-04-11

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach

IPC: H01L23/02 ,  H01L21/00 ,  H01L25/065 ,  H01L25/07 ,  H01L25/075

CPC classification number: H01L25/0756 ,  H01L22/14 ,  H01L23/544 ,  H01L25/074 ,  H01L27/0688 ,  H01L2223/5442 ,  H01L2223/54426

Abstract: A 3D semiconductor device, including: a first die including first transistors and first interconnect, overlaid by a second die including second transistors and second interconnect, where the first die has a first die area and the second die has a second die area, where the first die area is at least 10% larger than the second die area, and where the second die has a thickness of less than four microns.

公开(公告)号：US20170200715A1

公开(公告)日：2017-07-13

申请号：US15470866

申请日：2017-03-27

Applicant: Monolithic 3D Inc.

Inventor： Deepak Sekar ,  Zvi Or-Bach ,  Brian Cronquist

IPC: H01L27/06 ,  H01L27/108 ,  H01L21/762

CPC classification number: H01L27/0688 ,  H01L21/76254 ,  H01L21/823475 ,  H01L23/3677 ,  H01L23/481 ,  H01L23/5225 ,  H01L23/585 ,  H01L25/0657 ,  H01L27/088 ,  H01L27/0886 ,  H01L27/092 ,  H01L27/0922 ,  H01L27/10802 ,  H01L27/10897 ,  H01L28/00 ,  H01L2225/06527 ,  H01L2225/06541 ,  H01L2225/06589 ,  H01L2924/0002 ,  H01L2924/00

Abstract: An Integrated Circuit device, including: first transistors and second transistors, where the first transistors and the second transistors each include a single crystal channel, where at least one of the second transistors overlays at least one of the first transistors with less than 1 micron distance apart, and where at least one of the second transistors is a dopant segregated schottky barrier transistor.

公开(公告)号：US09691760B2

公开(公告)日：2017-06-27

申请号：US15089394

申请日：2016-04-01

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Zeev Wurman

IPC: H03K19/096 ,  H01L27/06 ,  H03K19/177 ,  H03K3/037 ,  H01L23/522 ,  H01L23/525 ,  H01L23/367

CPC classification number: H01L27/0688 ,  H01L23/3677 ,  H01L23/5226 ,  H01L23/5252 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/73204 ,  H01L2224/73265 ,  H01L2924/00014 ,  H01L2924/00015 ,  H01L2924/0002 ,  H01L2924/15311 ,  H01L2924/181 ,  H03K3/0375 ,  H03K19/096 ,  H03K19/1774 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/45099

Abstract: A 3D device, including: a first layer including first transistors, the first transistors interconnected by a first layer of interconnection; a second layer including second transistors, the second transistors overlaying the first layer of interconnection, where the first layer includes a first clock distribution structure, where the second layer includes a second clock distribution structure, where the device includes a Phase Lock Loop (“PLL”) circuit, where the second clock distribution structure is connected to the Phase Lock Loop (“PLL”) circuit, and where the second transistors are aligned to the first transistors with less than 200 nm alignment error.

公开(公告)号：US20170053906A1

公开(公告)日：2017-02-23

申请号：US15243941

申请日：2016-08-22

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Jin-Woo Han

IPC: H01L27/06 ,  H01L29/161 ,  H01L27/115 ,  H01L27/108 ,  H01L27/24 ,  H01L23/528 ,  H01L27/102

CPC classification number: H01L27/11578 ,  H01L27/1027 ,  H01L27/10802 ,  H01L27/11548 ,  H01L27/11551 ,  H01L27/11575 ,  H01L29/749

Abstract: A device, including: a first structure including first memory cells, the first memory cells including first transistors; and a second structure including second memory cells, the second memory cells including second transistors, where the second transistors overlay the first transistors, and a plurality of memory cells control lines, where the first transistors are self-aligned to the second transistors, where a second transistor channel of the second transistors is aligned to a first transistor channel of the first transistors, the aligned is at an atomic level as would have been resulted from an epitaxial growth process.

Abstract translation: 一种装置，包括：包括第一存储单元的第一结构，所述第一存储单元包括第一晶体管; 以及包括第二存储器单元的第二结构，所述第二存储单元包括第二晶体管，其中第二晶体管覆盖第一晶体管，以及多个存储单元控制线，其中第一晶体管与第二晶体管自对准，其中 第二晶体管的第二晶体管沟道与第一晶体管的第一晶体管沟道对准，如同由外延生长工艺所产生的那样，对准的原子水平处于原子水平。

公开(公告)号：US09406670B1

公开(公告)日：2016-08-02

申请号：US14514386

申请日：2014-10-15

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Brian Cronquist ,  Israel Beinglass ,  Jan Lodewijk de Jong ,  Deepak C. Sekar ,  Zeev Wurman

IPC: H01L27/02 ,  H01L27/06 ,  H01L27/088 ,  H01L23/522 ,  H01L23/532 ,  H01L23/367 ,  H01L23/528

CPC classification number: H01L27/0688 ,  G03F9/7076 ,  G03F9/7084 ,  H01L21/268 ,  H01L21/76254 ,  H01L21/76898 ,  H01L21/8221 ,  H01L21/823871 ,  H01L21/84 ,  H01L23/367 ,  H01L23/481 ,  H01L23/5226 ,  H01L23/528 ,  H01L23/53214 ,  H01L23/53228 ,  H01L23/544 ,  H01L24/73 ,  H01L27/0207 ,  H01L27/088 ,  H01L27/092 ,  H01L27/105 ,  H01L27/10876 ,  H01L27/10894 ,  H01L27/10897 ,  H01L27/11 ,  H01L27/1108 ,  H01L27/112 ,  H01L27/11551 ,  H01L27/11578 ,  H01L27/11807 ,  H01L27/11898 ,  H01L27/1203 ,  H01L29/42392 ,  H01L29/458 ,  H01L29/66272 ,  H01L29/66545 ,  H01L29/66621 ,  H01L29/66848 ,  H01L29/66901 ,  H01L29/732 ,  H01L29/78639 ,  H01L29/78642 ,  H01L29/78645 ,  H01L29/808 ,  H01L29/812 ,  H01L2223/5442 ,  H01L2223/54426 ,  H01L2223/54453 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/45124 ,  H01L2224/45147 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/73204 ,  H01L2224/73253 ,  H01L2224/73265 ,  H01L2924/00011 ,  H01L2924/10253 ,  H01L2924/12032 ,  H01L2924/1301 ,  H01L2924/1305 ,  H01L2924/13062 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/3011 ,  H01L2924/3025 ,  H01L2924/00014 ,  H01L2924/00 ,  H01L2224/80001 ,  H01L2924/00012 ,  H01L2924/01015

Abstract: A semiconductor device, including: a first layer including first transistors, the first transistors are interconnected by at least one metal layer including copper or aluminum; a second layer including second transistors, the first layer is overlaid by the second layer, where the second layer includes a plurality of through layer vias having a diameter of less than 200 nm, where the second transistors include a source contact, the source contact including a silicide, and where the silicide has a sheet resistance of less than 15 ohm/sq.

Abstract translation: 一种半导体器件，包括：包括第一晶体管的第一层，所述第一晶体管通过包括铜或铝的至少一个金属层互连; 第二层包括第二晶体管，第一层由第二层覆盖，其中第二层包括直径小于200nm的多个通孔通孔，其中第二晶体管包括源极接触，源极接触包括 硅化物，其中硅化物的薄层电阻小于15欧姆/平方。

公开(公告)号：US20160218046A1

公开(公告)日：2016-07-28

申请号：US15089394

申请日：2016-04-01

Applicant: Monolithic 3D Inc.

Inventor： Zvi Or-Bach ,  Zeev Wurman

IPC: H01L23/34 ,  H01L23/522 ,  H01L27/06 ,  H03K3/037

CPC classification number: H01L27/0688 ,  H01L23/3677 ,  H01L23/5226 ,  H01L23/5252 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/73204 ,  H01L2224/73265 ,  H01L2924/00014 ,  H01L2924/00015 ,  H01L2924/0002 ,  H01L2924/15311 ,  H01L2924/181 ,  H03K3/0375 ,  H03K19/096 ,  H03K19/1774 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/45099

Abstract: A 3D device, including: a first layer including first transistors, the first transistors interconnected by a first layer of interconnection; a second layer including second transistors, the second transistors overlaying the first layer of interconnection, where the first layer includes a first clock distribution structure, where the second layer includes a second clock distribution structure, where the device includes a Phase Lock Loop (“PLL”) circuit, where the second clock distribution structure is connected to the Phase Lock Loop (“PLL”) circuit, and where the second transistors are aligned to the first transistors with less than 200 nm alignment error.

Abstract translation: 一种3D设备，包括：第一层，包括第一晶体管，所述第一晶体管通过第一互连层相互连接; 包括第二晶体管的第二层，所述第二晶体管覆盖所述第一互连层，其中所述第一层包括第一时钟分配结构，其中所述第二层包括第二时钟分配结构，其中所述器件包括锁相环（“PLL” “）电路，其中第二时钟分配结构连接到锁相环（”PLL“）电路，并且其中第二晶体管与具有小于200nm对准误差的第一晶体管对准。