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209 条记录 (耗时 0.092 秒)

    EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
    51.
    发明授权
    EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods 有权
    具有子系统的EUV光源，用于在EUV非输出期间维持LPP驱动激光输出

    公开(公告)号：US08653437B2

    公开(公告)日：2014-02-18

    申请号：US13157233

    申请日：2011-06-09

    申请人： William N. Partlo ,  Richard L. Sandstrom ,  Daniel J. W. Brown ,  Igor V. Fomenkov

    发明人： William N. Partlo ,  Richard L. Sandstrom ,  Daniel J. W. Brown ,  Igor V. Fomenkov

    IPC分类号： H05G2/00

    CPC分类号： G21K5/00 ,  G03F7/70033 ,  H01S3/117 ,  H01S3/2232 ,  H01S3/2308 ,  H05G2/008

    摘要： A device is disclosed herein which may comprise a droplet generator producing droplets of target material; a sensor providing an intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the intercept time signal; a laser source responsive to a trigger signal to produce a laser pulse; and a system controlling said delay circuit to provide a trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light pulse which is not focused on a droplet.

    摘要翻译： 本文公开的装置可包括产生目标材料的液滴的液滴发生器; 当液滴到达预选位置时提供拦截时间信号的传感器; 与所述传感器耦合的延迟电路，所述延迟电路产生从截取时间信号延迟的触发信号; 响应于触发信号产生激光脉冲的激光源; 以及控制所述延迟电路的系统，以提供从截取时间延迟第一延迟时间的触发信号，以产生聚焦在液滴上的光脉冲和从截取时间延迟第二延迟时间的触发信号，以产生 不聚焦在液滴上的光脉冲。

    High repetition rate laser produced plasma EUV light source
    52.
    发明申请
    High repetition rate laser produced plasma EUV light source 有权

    公开(公告)号：US20080197297A1

    公开(公告)日：2008-08-21

    申请号：US11471434

    申请日：2006-06-20

    申请人： Robert P. Akins ,  Richard L. Sandstrom ,  William N. Partlo ,  Igor V. Fomenkov ,  Thomas D. Steiger ,  John Martin Algots ,  Norbert Bowering ,  Robert N. Jacques ,  Frederick Palenschat ,  Jun Song

    发明人： Robert P. Akins ,  Richard L. Sandstrom ,  William N. Partlo ,  Igor V. Fomenkov ,  Thomas D. Steiger ,  John Martin Algots ,  Norbert Bowering ,  Robert N. Jacques ,  Frederick Palenschat ,  Jun Song

    IPC分类号： G01J3/10

    CPC分类号： B82Y10/00 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/008

    摘要： An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.

    High repetition rate laser produced plasma EUV light source
    53.
    发明授权
    High repetition rate laser produced plasma EUV light source 有权

    公开(公告)号：US07087914B2

    公开(公告)日：2006-08-08

    申请号：US10803526

    申请日：2004-03-17

    申请人： Robert P. Akins ,  Richard L. Sandstrom ,  William N. Partlo ,  Igor V. Fomenkov ,  John Martin Algots ,  Robert N. Jacques ,  Frederick Palenschat ,  Jun Song

    发明人： Robert P. Akins ,  Richard L. Sandstrom ,  William N. Partlo ,  Igor V. Fomenkov ,  John Martin Algots ,  Robert N. Jacques ,  Frederick Palenschat ,  Jun Song

    IPC分类号： H01J35/20

    CPC分类号： B82Y10/00 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/008

    摘要： An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.

    Relax gas discharge laser lithography light source
    54.
    发明授权
    Relax gas discharge laser lithography light source 有权
    放气放电激光光刻光源

    公开(公告)号：US07088758B2

    公开(公告)日：2006-08-08

    申请号：US10956784

    申请日：2004-10-01

    申请人： Richard L. Sandstrom ,  William N. Partlo ,  Daniel J. W. Brown ,  Thomas A. Yager ,  Alexander I. Ershov ,  Robert J. Rafac ,  German E. Rylov

    发明人： Richard L. Sandstrom ,  William N. Partlo ,  Daniel J. W. Brown ,  Thomas A. Yager ,  Alexander I. Ershov ,  Robert J. Rafac ,  German E. Rylov

    IPC分类号： H01S3/22

    CPC分类号： G01J1/429 ,  B23K26/0622 ,  B23K2101/40 ,  G01J9/02 ,  G02B26/002 ,  G02B26/0875 ,  G03F7/70041 ,  G03F7/70575 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/1055 ,  H01S3/225

    摘要： An apparatus and method are disclosed for operating a narrow band short pulse duration gas discharge laser output light pulse beam producing system, producing a beam comprising laser output light pulses at a selected pulse repetition rate, which may comprise: a dispersive center wavelength selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a tuning mechanism operative to select at least one angle of incidence of a first spatially defined portion of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic; and, the tuning mechanism comprising a variably refractive optical element defining a plurality of refractive angular displacements of the first spatially defined portion of the laser light pulse beam passing through the variably refractive optical element at one of a plurality of positions of incidence of the laser light pulse beam on the variably refractive optical element. The variably refractive optical element may comprise: a first generally flat face defining a surface of incidence for the laser light pulse beam; and, a second multifaceted or curved face defining a plurality of generally flat surfaces of exit or a continuously varying surface of exit for the laser light beam. Other aspects of pulse parameter metrology and pulse modulation control, including in response to signals from the utilization tool are disclosed, e.g., relating to proper dose control with differing center wavelength spectra.

    摘要翻译： 公开了一种用于操作窄带短脉冲持续时间气体放电激光输出光脉冲束产生系统的装置和方法，产生包括选定脉冲重复频率的激光输出光脉冲的光束，其可以包括：色散中心波长选择光学选择 用于每个脉冲的至少一个中心波长至少部分地由分散波长选择光学器件上包含相应脉冲的激光束的入射角确定; 调谐机构，用于在色散中心波长选择光学器件上选择包含相应脉冲的激光束脉冲光束的第一空间限定部分的至少一个入射角; 并且所述调谐机构包括可变折射光学元件，所述可变折射光学元件限定所述激光束的所述第一空间限定部分的多个折射角位移通过所述可变折射光学元件在所述激光的入射的多个位置中的一个位置 脉冲光束在可变折射光学元件上。 可变折射光学元件可以包括：限定用于激光束脉冲束的入射面的第一大致平坦的面; 以及限定用于激光束的出口的多个大致平坦的表面或出口的连续变化的表面的第二多面或弯曲面。 脉冲参数测量和脉冲调制控制的其它方面包括响应来自利用工具的信号，例如涉及具有不同中心波长光谱的适当剂量控制。

    Electric discharge laser with acoustic chirp correction
    58.
    发明授权
    Electric discharge laser with acoustic chirp correction 有权
    具有声啁啾校正的放电激光器

    公开(公告)号：US06317447B1

    公开(公告)日：2001-11-13

    申请号：US09490835

    申请日：2000-01-25

    申请人： William N. Partlo ,  Igor V. Fomenkov ,  Jean-Marc Hueber ,  Zsolt Bor ,  Eckehard D. Onkels ,  Michael C. Cates ,  Richard C. Ujazdowski ,  Vladimir B. Fleurov ,  Dmitri V. Gaidarenko

    发明人： William N. Partlo ,  Igor V. Fomenkov ,  Jean-Marc Hueber ,  Zsolt Bor ,  Eckehard D. Onkels ,  Michael C. Cates ,  Richard C. Ujazdowski ,  Vladimir B. Fleurov ,  Dmitri V. Gaidarenko

    IPC分类号： H01S322

    CPC分类号： G03F7/70025 ,  G03F7/70575 ,  G03F7/708 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0381 ,  H01S3/0382

    摘要： Methods and structural changes in gas discharge lasers for minimizing wavelength chirp at high pulse rates. Applicants have identified the major cause of wavelength chirp in high pulse rate gas discharge lithography lasers as pressure waves from a discharge reflecting back to the discharge region coincident with a subsequent discharge. The timing of the arrival of the pressure wave is determined by the temperature of the laser gas through which the wave is traveling. During burst mode operation, the laser gas temperature in prior art lasers changes by several degrees over periods of a few milliseconds. These changing temperatures change the location of the coincident pressure waves from pulse to pulse within the discharge region causing a variation in the pressure of the laser gas which in turn affects the index of refraction of the discharge region causing the laser beam exiting the rear of the laser to slightly change direction. This change in beam direction causes the grating in the LNP to reflect back to the discharge region light at a slightly different wavelength causing the wavelength chirp. Solution to the problem is to include in the laser chamber structural elements to moderate or disperse the pressure waves and to maintain the laser gas temperature as close as feasible to constant values.

    摘要翻译： 气体放电激光器的方法和结构变化，以最大限度地减少高脉冲波长啁啾。 申请人已经确定了在高脉冲气体放电光刻激光器中的波长啁啾的主要原因，因为从反射回到放电区域的放电的压力波与随后的放电一致。 压力波的到达时间由波浪行进的激光气体的温度决定。 在突发模式操作期间，现有技术的激光器中的激光气体温度在几毫秒的时间内改变了几度。 这些变化的温度改变了放电区域内重合压力波从脉冲到脉冲的位置，导致激光气体的压力变化，这反过来影响放电区域的折射率，导致激光束离开 激光稍微改变方向。 光束方向的这种变化导致LNP中的光栅以稍微不同的波长反射回到放电区域，导致波长啁啾。 解决问题的方法是在激光室结构元件中包括中压或分散压力波，并将激光气体温度保持在尽可能接近的恒定值。

    Drive laser for EUV light source
    59.
    发明申请
    Drive laser for EUV light source 有权
    驱动激光用于EUV光源

    公开(公告)号：US20070291350A1

    公开(公告)日：2007-12-20

    申请号：US11452558

    申请日：2006-06-14

    申请人： Alexander I. Ershov ,  Alexander N. Bykanov ,  Jerzy R. Hoffman ,  Igor V. Fomenkov ,  William N. Partlo

    发明人： Alexander I. Ershov ,  Alexander N. Bykanov ,  Jerzy R. Hoffman ,  Igor V. Fomenkov ,  William N. Partlo

    IPC分类号： H01S3/00

    CPC分类号： H01S3/2316 ,  H01S3/0057 ,  H01S3/11 ,  H01S3/2232 ,  H01S3/225 ,  H05G1/54 ,  H05G2/008

    摘要： A laser light source is disclosed having a laser oscillator producing an output beam; a first amplifier amplifying the output beam to produce a first amplified beam, and a second amplifier amplifying the first amplified beam to produce a second amplified beam. For the source, the first amplifier may have a gain medium characterized by a saturation energy (Es, 1) and a small signal gain (go, 1); and the second amplifier may have a gain medium characterized by a saturation energy (Es, 2) and a small signal gain (go, 2), with (go, 1)>(go, 2) and (Es, 2)>(Es, 1). In another aspect, a laser oscillator of a laser light source may be a cavity dumped laser oscillator, e.g. a mode-locked laser oscillator, q-switched laser oscillator and may further comprising a temporal pulse stretcher.

    摘要翻译： 公开了具有产生输出光束的激光振荡器的激光源; 放大所述输出光束以产生第一放大光束的第一放大器，以及放大所述第一放大光束以产生第二放大光束的第二放大器。 对于源极，第一放大器可以具有以饱和能量（E S，S 1）和小信号增益（g 1，...）为特征的增益介质; 并且第二放大器可以具有特征在于饱和能量（E SUB，2 N）和小信号增益（g 0，o 2）的增益介质，其中（g < （o，SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB >）。 在另一方面，激光光源的激光振荡器可以是空腔倾覆的激光振荡器，例如。 模式锁定激光振荡器，q切换激光振荡器，并且还可以包括时间脉冲展开器。

    Collector for EUV light source
    60.
    发明授权
    Collector for EUV light source 失效
    EUV光源收集器

    公开(公告)号：US07288777B2

    公开(公告)日：2007-10-30

    申请号：US11603471

    申请日：2006-11-21

    申请人： William N. Partlo ,  Alexander I. Ershov ,  Igor V. Fomenkov

    发明人： William N. Partlo ,  Alexander I. Ershov ,  Igor V. Fomenkov

    IPC分类号： H01J35/20

    CPC分类号： H05G2/001 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062

    摘要： An apparatus/method is disclosed that may comprise an EUV light source which may comprise a collector which may comprise an elliptical collector mirror having a first focus at a plasma initiation point and a second focus at an intermediate focus of the EUV light source; a debris shield intermediate the plasma initiation point and the elliptical collector mirror comprising a plurality of radially extending channels extending from the first focus and aligned to the second focus and in symmetry about an axis of rotation passing through the first focus and aligned to a longitudinal axis of the elliptical collector mirror. The plurality of channels may be formed between a plurality of generally planer foils extending radially from the first focus and aligned to the second focus and in symmetry about an axis of rotation passing through the first focus and aligned to a longitudinal axis of the collector mirror.

    摘要翻译： 公开了一种可以包括EUV光源的装置/方法，该EUV光源可以包括收集器，该收集器可以包括在EUV光源的中间焦点处具有等离子体起始点的第一焦点和第二焦点的椭圆形收集器反射镜; 位于等离子体起始点之间的碎片屏蔽和椭圆形收集器镜，其包括从第一焦点延伸并对准到第二焦点并围绕穿过第一焦点的旋转轴对称的多个径向延伸的通道，并且对准纵向轴线 的椭圆收集镜。 多个通道可以形成在从第一焦点径向延伸并与第二焦点对准的多个大致平面的箔片之间并且围绕穿过第一焦点的旋转轴线对称并且与收集器反射镜的纵向轴线对准。