Insulation of phase-change memory cells

    公开(公告)号:US12213392B2

    公开(公告)日:2025-01-28

    申请号:US17362670

    申请日:2021-06-29

    Inventor: Philippe Boivin

    Abstract: Memory devices and methods of manufacturing such devices are provided herein. In at least one embodiment, a memory device includes a plurality of phase-change memory cells. An electrically-insulating layer covers lateral walls of each of the phase-change memory cells, and a thermally-insulating material is disposed on the electrically-insulating layer and covers the lateral walls of the phase-change memory cells.

    Read only memory
    617.
    发明授权

    公开(公告)号:US12063775B2

    公开(公告)日:2024-08-13

    申请号:US18484906

    申请日:2023-10-11

    CPC classification number: H10B20/367 G11C16/0466 H01L23/57

    Abstract: The present description concerns a ROM including at least one first rewritable memory cell. In an embodiment, a method of manufacturing a read-only memory (ROM) comprising a plurality of memory cells is proposed. Each of the plurality of memory cells includes a rewritable first transistor and a rewritable second transistor. An insulated gate of the rewritable first transistor is connected to an insulated gate of the rewritable second transistor. The method includes successively depositing, on a semiconductor structure, a first insulating layer and a first gate layer, wherein the first insulating layer is arranged between the semiconductor structure and the first gate layer, wherein the rewritable second transistor further includes a well-formed between an associated first insulating layer and the semiconductor structure, and wherein the rewritable first insulating layer is in direct contact with the semiconductor structure; and successively depositing a second insulating layer and a second gate layer.

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