公开(公告)号：US20160042913A1

公开(公告)日：2016-02-11

申请号：US14819402

申请日：2015-08-05

Applicant: Intevac, Inc.

Inventor： Babak Adibi ,  Vinay Prabhakar ,  Terry Bluck

IPC: H01J37/20 ,  H01J37/18 ,  H01J37/317

CPC classification number: H01J37/20 ,  H01J37/185 ,  H01J37/3045 ,  H01J37/3171 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/204 ,  H01J2237/31701 ,  H01J2237/31711

Abstract: System and method to align a substrate under a shadow mask. A substrate holder has alignment mechanism, such as rollers, that is made to abut against an alignment straight edge. The substrate is then aligned with respect to the straight edge and is chucked to the substrate holder. The substrate holder is then transported into a vacuum processing chamber, wherein it is made to abut against a mask straight edge to which the shadow mask is attached and aligned to. Since the substrate was aligned to an alignment straight edge, and since the mask is aligned to the mask straight edge that is precisely aligned to the alignment straight edge, the substrate is perfectly aligned to the mask.

Abstract translation: 将底物对准荫罩的系统和方法。 衬底保持器具有对准机构，例如辊，其抵靠对准直边缘。 然后将衬底相对于直边对准，并被夹持到衬底保持器。 然后将衬底保持器输送到真空处理室中，其中它与邻接荫罩直线边缘抵接，荫罩直线边缘与阴罩对准。 由于衬底与对准直边对准，并且由于掩模与精确地对准直线对准的掩模直边对准，所以基板与掩模完全对准。

公开(公告)号：US20150364292A1

公开(公告)日：2015-12-17

申请号：US14738508

申请日：2015-06-12

Applicant: CANON KABUSHIKI KAISHA

Inventor： Tomonori Ishikawa ,  Nobushige Korenaga

IPC: H01J37/20 ,  H01J37/317

CPC classification number: H01J37/20 ,  H01J37/3174 ,  H01J2237/2007

Abstract: A stage apparatus including: a magnet; a moving member configured to be supported so as to float by a magnetic force of the magnet and move in a first direction along a horizontal plane together with the magnet; and a fixed member having a magnetic material facing the magnet above the magnet in a movable area of the moving member, wherein side surfaces of the magnet in the first direction are covered by using a first magnetic field blocking surface of the moving member and a second magnetic field blocking surface of the fixed member.

Abstract translation: 一种舞台装置，包括：磁铁; 移动构件，被构造成被支撑以便通过磁体的磁力浮动，并与磁体一起沿水平面沿第一方向移动; 以及固定构件，其具有在所述移动构件的可移动区域中具有面对所述磁体的磁体的磁性材料，其中所述磁体在所述第一方向上的侧表面通过使用所述移动构件的第一磁场阻挡表面而被覆盖， 固定部件的磁场阻挡面。

公开(公告)号：US20150348745A1

公开(公告)日：2015-12-03

申请号：US14729547

申请日：2015-06-03

Applicant: PROTOCHIPS, INC.

Inventor： Daniel Stephen Gardiner ,  Franklin Stampley Walden, II ,  John Damiano, JR.

IPC: H01J37/20 ,  F16J15/06 ,  B01L9/00

CPC classification number: H01J37/261 ,  B01L9/52 ,  B01L2200/0636 ,  F16J15/022 ,  F16J15/062 ,  F16J15/064 ,  F16J15/104 ,  H01J37/20 ,  H01J2237/2003 ,  H01J2237/2006 ,  H01J2237/2007

Abstract: A flow directing gasket for improving the flow of a gas or liquid across electron beam transparent membranes in environmental cells within a sample holder of an electron microscope, and uses of the sample holders comprising said flow directing gaskets.

Abstract translation: 用于改善气体或液体在电子显微镜的样品保持器内的环境细胞中的电子束透明膜的流动的流动引导衬垫，以及包括所述流动引导衬垫的样品保持器的用途。

公开(公告)号：US20150303027A1

公开(公告)日：2015-10-22

申请号：US14624881

申请日：2015-02-18

Applicant: JEOL Ltd.

Inventor： Noriyuki Kobayashi ,  Yoshiaki Takizawa

IPC: H01J37/20 ,  H01J37/317

CPC classification number: H01J37/20 ,  H01J37/3174 ,  H01J37/3175 ,  H01J2237/0044 ,  H01J2237/2007

Abstract: A charged-particle beam lithographic system (100) delineates a pattern on a substrate (2) by directing a charged-particle beam (L) at the substrate. The system (100) includes a substrate stage (10) on which the substrate (2) is disposed and a substrate cover (20). The cover (20) has a frame portion (22) that covers an outer peripheral portion of the substrate (2) as viewed within a plane. The frame portion (22) has a first part (22a) disposed on the stage (10) and a second part (22b) capable of being loaded and unloaded on and from the stage (10) by a transport portion (40). When the second part (22b) is loaded on the stage (10), it is electrically grounded.

Abstract translation: 带电粒子束光刻系统（100）通过将带电粒子束（L）引导到衬底上来描绘衬底（2）上的图案。 系统（100）包括其上设置有基板（2）的基板台（10）和基板盖（20）。 盖（20）具有在平面内观察时覆盖基板（2）的外周部的框架部（22）。 框架部分（22）具有设置在平台（10）上的第一部分（22a）和能够通过运输部分（40）装载和卸载在台架（10）上的第二部分（22b）。 当第二部分（22b）装载在平台（10）上时，它被电接地。

公开(公告)号：US09105442B2

公开(公告)日：2015-08-11

申请号：US14552477

申请日：2014-11-24

Applicant: Hitachi High-Technologies Corporation

Inventor： Yusuke Ominami ,  Sukehiro Ito ,  Tomohisa Ohtaki

IPC: H01J37/28 ,  H01J37/20 ,  H01J37/16 ,  G01N13/10 ,  H01J37/18 ,  H01J37/244

CPC classification number: H01J37/18 ,  H01J37/16 ,  H01J37/185 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/16 ,  H01J2237/164 ,  H01J2237/1825 ,  H01J2237/2007 ,  H01J2237/2608

Abstract: Provided is a charged particle beam apparatus or charged particle microscope capable of observing an observation target sample in an air atmosphere or a gas environment without making significant changes to the configuration of a conventional high vacuum charged particle microscope. In a charged particle beam apparatus configured such that a thin film (10) is used to separate a vacuum environment and an air atmosphere (or a gas environment), an attachment (121) capable of holding the thin film (10) and whose interior can be maintained at an air atmosphere or a gas environment is inserted into a vacuum chamber (7) of a high vacuum charged particle microscope. The attachment (121) is vacuum-sealed and fixed to a vacuum partition of the vacuum sample chamber. Image quality is further improved by replacing the atmosphere in the attachment with helium or a light-elemental gas that has a lower mass than atmospheric gases such as nitrogen or water vapor.

Abstract translation: 提供一种能够在空气气氛或气体环境中观察观察目标样品的带电粒子束装置或带电粒子显微镜，而不会对传统的高真空带电粒子显微镜的构造进行显着变化。 在构成为使用薄膜（10）分离真空环境和空气气氛（或气体环境）的带电粒子束装置中，能够保持薄膜（10）的附件（121），其内部 可以在空气气氛中保持，或者将气体环境插入到高真空带电粒子显微镜的真空室（7）中。 附件（121）被真空密封并固定到真空样品室的真空隔板。 通过用氦气或具有比大气气体如氮气或水蒸气更低的质量的轻质气体代替附件中的气氛来进一步改善图像质量。

公开(公告)号：US09077264B2

公开(公告)日：2015-07-07

申请号：US14118892

申请日：2012-05-18

Applicant: Tetsuji Ohsawa ,  Naoya Ishigaki

Inventor： Tetsuji Ohsawa ,  Naoya Ishigaki

IPC: H01L21/683 ,  H02N13/00 ,  H01J37/20 ,  H01J37/28

CPC classification number: H02N13/00 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/2007 ,  H01J2237/248 ,  H01L21/6831

Abstract: To improve an apparatus reliability by applying a voltage suitable to a situation, a charged-particle-beam apparatus 1 of the present invention includes: a sample stage 25; an electrostatic chuck 30; and an electrostatic-chuck controlling unit 13, and generates an image of a sample 24 by irradiating the sample 24 held on the sample stage 25 by the electrostatic chuck 30 with an electron beam 16. The electrostatic-chuck controlling unit 13, when the electrostatic chuck 30 holds the sample 24, applies a preset initial voltage to a chuck electrode of the electrostatic chuck 30; determines whether or not the sample 24 is normally clamped to the electrostatic chuck 30; and increases the voltage applied to the chuck electrode until determining that the sample 24 is clamped normally to the electrostatic chuck 30 if determining that the sample 24 is not clamped normally to the electrostatic chuck 30.

Abstract translation: 为了通过施加适合于这种情况的电压来提高装置的可靠性，本发明的带电粒子束装置1包括：样品台25; 静电吸盘30; 和静电卡盘控制单元13，并且通过用电子束16通过静电卡盘30照射保持在样品台25上的样本24来产生样本24的图像。静电卡盘控制单元13当静电吸盘控制单元13 卡盘30保持样品24，将预设的初始电压施加到静电卡盘30的卡盘电极; 确定样品24是否正常夹在静电吸盘30上; 并且如果确定样品24没有正常地夹在静电卡盘30上，则增加施加到卡盘电极的电压，直到确定样品24正常地夹在静电卡盘30上。

公开(公告)号：US20150185461A1

公开(公告)日：2015-07-02

申请号：US14657733

申请日：2015-03-13

Applicant: Denssolutions B.V.

Inventor： Hendrik Willem Zandbergen

IPC: G02B21/26 ,  H01J37/20 ,  G21K5/08

CPC classification number: G02B21/26 ,  G21K5/08 ,  H01J37/20 ,  H01J2237/2007 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/206 ,  H01J2237/2065 ,  H01J2237/26 ,  Y10T29/49826

Abstract: A holder and multicontact device for use in microscopy, a method of loading the multicontact device, a container for the multicontact device, and a microscope comprising said holder and device. The invention is in the field of microscopy, specifically in the field of electron and focused ion beam microscopy. However, its application is extendable in principle to any field of microscopy.

Abstract translation: 用于显微镜的保持器和多触点装置，装载多触点装置的方法，用于多触点装置的容器以及包括所述保持器和装置的显微镜。 本发明在显微镜领域，特别是在电子和聚焦离子束显微镜领域。 然而，其应用原则上可扩展到任何显微镜领域。

公开(公告)号：US20150144804A1

公开(公告)日：2015-05-28

申请号：US14406415

申请日：2013-06-03

Applicant: Hitachi High-Technologies Corporation

Inventor： Tohru Ando ,  Kunji Shigeto ,  Shotaro Tamayama ,  Yusuke Narita

IPC: H01J37/20 ,  H01J37/26 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/20 ,  H01J37/22 ,  H01J37/261 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/20285 ,  H01J2237/22 ,  H01J2237/2801 ,  H01J2237/2809

Abstract: In many cases, the charged particle beam apparatus is used basically for observation at a magnification of 10,000 times or higher. It is thus difficult to recognize how the orientation of a sample seen with the naked eye corresponds to the origination of the sample appearing on an acquired image. This makes it difficult intuitively to grasp the tilt direction and other details of the sample. An object of this invention is to provide a charged particle beam apparatus allowing the orientation and the tilted state of the sample to be grasped intuitively. The apparatus includes: a charged particle beam source that emits a charged particle beam; a charged particle beam optical system that irradiates the sample with the charged particle beam; a platform on which the sample is placed; a stage capable of moving the platform at least in a tilt direction; a display unit that displays a tilted state of the platform by use of a simulated image of the platform; an operation input unit that allows a user to designate the position and direction of the sample for observation; and a control unit that controls the amount of movement of the stage based on a signal input from the operation input unit.

Abstract translation: 在许多情况下，带电粒子束装置基本上用于10,000倍或更高倍率的观察。 因此难以识别用肉眼看到的样本的取向如何对应于出现在所获取的图像上的样本的始发。 这使得难以直观地掌握样品的倾斜方向和其他细节。 本发明的目的在于提供一种能够直观地掌握样品的取向和倾斜状态的带电粒子束装置。 该装置包括：发射带电粒子束的带电粒子束源; 带电粒子束光学系统，其向带电粒子束照射样品; 放置样品的平台; 能够至少沿倾斜方向移动平台的台阶; 显示单元，其通过使用所述平台的模拟图像来显示所述平台的倾斜状态; 操作输入单元，其允许用户指定用于观察的样本的位置和方向; 以及控制单元，其基于从操作输入单元输入的信号来控制平台的移动量。

公开(公告)号：US09029765B2

公开(公告)日：2015-05-12

申请号：US13892772

申请日：2013-05-13

Applicant: Carl Zeiss Microscopy, LLC

Inventor： Richard Comunale ,  Alexander Groholski ,  John A. Notte, IV ,  Randall G. Percival ,  Billy W. Ward

IPC: H01J37/304 ,  H01J37/20 ,  H01J37/26 ,  H01J37/28 ,  H01J37/305

CPC classification number: H01J37/304 ,  H01J37/20 ,  H01J37/265 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/0216 ,  H01J2237/0805 ,  H01J2237/0807 ,  H01J2237/2007 ,  H01J2237/204 ,  H01J2237/2482

Abstract: Ion sources, systems and methods are disclosed. In some embodiments, the ion sources, systems and methods can exhibit relatively little undesired vibration and/or can sufficiently dampen undesired vibration. This can enhance performance (e.g., increase reliability, stability and the like). In certain embodiments, the ion sources, systems and methods can enhance the ability to make tips having desired physical attributes (e.g., the number of atoms on the apex of the tip). This can enhance performance (e.g., increase reliability, stability and the like).

Abstract translation: 公开了离子源，系统和方法。 在一些实施例中，离子源，系统和方法可以表现出相对较少的不期望的振动和/或可以充分地抑制不需要的振动。 这可以提高性能（例如，增加可靠性，稳定性等）。 在某些实施方案中，离子源，系统和方法可以增强制备具有期望物理属性的尖端的能力（例如尖端顶点上的原子数）。 这可以提高性能（例如，增加可靠性，稳定性等）。

公开(公告)号：US20150097123A1

公开(公告)日：2015-04-09

申请号：US14376901

申请日：2013-01-28

Applicant: Hitachi High-Technologies Corporation

Inventor： Yasushi Ebizuka ,  Seiichiro Kanno ,  Makoto Nishihara ,  Masashi Fujita

IPC: H01J37/22 ,  H01J37/28 ,  H01J37/20 ,  H02N13/00

CPC classification number: H01J37/226 ,  H01J37/026 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/0047 ,  H01J2237/06 ,  H01J2237/2007 ,  H01J2237/2801 ,  H02N13/00

Abstract: An object of the present invention is to provide a charged particle beam apparatus that effectively removes electrical charges from an electrostatic chuck.In order to achieve the above object, the charged particle beam apparatus of the present invention includes a sample chamber that maintains a space containing an electrostatic chuck mechanism (5) in a vacuum state; and in which the charged particle beam apparatus includes an ultraviolet light source (6) to irradiate ultraviolet light within the sample chamber, and a irradiation target member irradiated by the ultraviolet light; and the irradiation target member is placed perpendicular to the adsorption surface of the electrostatic chuck.

Abstract translation: 本发明的目的是提供一种有效地从静电卡盘去除电荷的带电粒子束装置。 为了实现上述目的，本发明的带电粒子束装置包括在真空状态下保持包含静电卡盘机构（5）的空间的样本室; 并且其中带电粒子束装置包括用于照射样品室内的紫外光的紫外光源和照射由紫外光照射的照射目标构件; 并且照射目标构件垂直于静电吸盘的吸附表面放置。