公开(公告)号：US07822092B2

公开(公告)日：2010-10-26

申请号：US11981014

申请日：2007-10-30

申请人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J. W. Brown ,  Igor V. Fomenkov ,  Robert A. Bergstedt

发明人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J. W. Brown ,  Igor V. Fomenkov ,  Robert A. Bergstedt

IPC分类号： H01S3/22

CPC分类号： H01S3/225 ,  G03F7/70583 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/03 ,  H01S3/034 ,  H01S3/08036 ,  H01S3/08059 ,  H01S3/10092 ,  H01S3/105 ,  H01S3/2251 ,  H01S3/2333

摘要： A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.

摘要翻译： 一种方法和装置可以包括线变窄的脉冲准分子或分子氟气放电激光系统，其可以包括种子激光振荡器，其产生包括可以包括第一气体放电准分子或分子氟激光室的脉冲的激光输出光束的输出; 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，其包括激光输出光束 脉冲，其可以包括环形功率放大级。

公开(公告)号：US07778302B2

公开(公告)日：2010-08-17

申请号：US11981290

申请日：2007-10-30

申请人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J. W. Brown ,  Igor V. Fomenkov ,  Robert A. Bergstedt

发明人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J. W. Brown ,  Igor V. Fomenkov ,  Robert A. Bergstedt

IPC分类号： H01S3/22

CPC分类号： H01S3/10092 ,  G03F7/70583 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/08 ,  H01S3/08059 ,  H01S3/0835 ,  H01S3/121 ,  H01S3/225 ,  H01S3/2333 ,  H01S3/235 ,  H01S3/2383

摘要： A method/apparatus may comprise a seed laser oscillator producing an output which may comprise: a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage receiving the output of the seed laser oscillator which may comprise: a ring power amplification stage; a coherence busting mechanism intermediate the seed laser oscillator and the ring power amplification stage which may comprise a beam splitter separating the seed laser output into a main beam and a beam entering an optical delay path which may have a delay length longer than the coherence length of a pulse in the seed laser output and may have a beam angular offset mechanism offsetting a delayed beam and the main beam.

摘要翻译： 一种方法/装置可以包括产生输出的种子激光振荡器，该输出可以包括：第一气体放电准分子或分子氟激光室; 第一振荡器腔内的线窄模块; 接收种子激光振荡器的输出的激光放大级，其可以包括：环形功率放大级; 种子激光振荡器和环形功率放大级之间的相干破坏机构，其可以包括将种子激光器输出分离成主波束的分束器和进入光学延迟路径的波束，该光束延迟路径可以具有比相干长度长的延迟长度 种子激光器中的脉冲输出并且可以具有抵消延迟的光束和主光束的光束角偏移机构。

公开(公告)号：US20090122825A1

公开(公告)日：2009-05-14

申请号：US11981290

申请日：2007-10-30

申请人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J.W. Brown ,  Igor V. Fomenkov ,  Robert A. Bergstedt

发明人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J.W. Brown ,  Igor V. Fomenkov ,  Robert A. Bergstedt

IPC分类号： H01S3/225

CPC分类号： H01S3/10092 ,  G03F7/70583 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/08 ,  H01S3/08059 ,  H01S3/0835 ,  H01S3/121 ,  H01S3/225 ,  H01S3/2333 ,  H01S3/235 ,  H01S3/2383

摘要： A method/apparatus may comprise a seed laser oscillator producing an output which may comprise: a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage receiving the output of the seed laser oscillator which may comprise: a ring power amplification stage; a coherence busting mechanism intermediate the seed laser oscillator and the ring power amplification stage which may comprise a beam splitter separating the seed laser output into a main beam and a beam entering an optical delay path which may have a delay length longer than the coherence length of a pulse in the seed laser output and may have a beam angular offset mechanism offsetting a delayed beam and the main beam.

摘要翻译： 一种方法/装置可以包括产生输出的种子激光振荡器，该输出可以包括：第一气体放电准分子或分子氟激光室; 第一振荡器腔内的线窄模块; 接收种子激光振荡器的输出的激光放大级，其可以包括：环形功率放大级; 种子激光振荡器和环形功率放大级之间的相干破坏机构，其可以包括将种子激光器输出分离成主波束的分束器和进入光学延迟路径的波束，该光束延迟路径可以具有比相干长度长的延迟长度 种子激光器中的脉冲输出并且可以具有抵消延迟的光束和主光束的光束角偏移机构。

公开(公告)号：US20080144671A1

公开(公告)日：2008-06-19

申请号：US11981014

申请日：2007-10-30

申请人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J.W. Brown ,  Igor V. Fomenkov ,  Robert A. Bergstedt

发明人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J.W. Brown ,  Igor V. Fomenkov ,  Robert A. Bergstedt

IPC分类号： H01S3/30

CPC分类号： H01S3/225 ,  G03F7/70583 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/03 ,  H01S3/034 ,  H01S3/08036 ,  H01S3/08059 ,  H01S3/10092 ,  H01S3/105 ,  H01S3/2251 ,  H01S3/2333

摘要： A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.

公开(公告)号：US07217940B2

公开(公告)日：2007-05-15

申请号：US10798740

申请日：2004-03-10

申请人： William N. Partlo ,  John Martin Algots ,  Gerry M. Blumenstock ,  Norbert Bowering ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  Xiaojiang Pan

发明人： William N. Partlo ,  John Martin Algots ,  Gerry M. Blumenstock ,  Norbert Bowering ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  Xiaojiang Pan

IPC分类号： H01J35/20

CPC分类号： H05G2/001 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062

摘要： A method and apparatus for debris removal from a reflecting surface of an EUV collector in an EUV light source is disclosed which may comprise the reflecting surface comprises a first material and the debris comprises a second material and/or compounds of the second material, the system and method may comprise a controlled sputtering ion source which may comprise a gas comprising the atoms of the sputtering ion material; and a stimulating mechanism exciting the atoms of the sputtering ion material into an ionized state, the ionized state being selected to have a distribution around a selected energy peak that has a high probability of sputtering the second material and a very low probability of sputtering the first material. The stimulating mechanism may comprise an RF or microwave induction mechanism.

摘要翻译： 公开了一种用于从EUV光源中的EUV收集器的反射表面去除碎屑的方法和装置，其可以包括反射表面，其包括第一材料，并且所述碎屑包括第二材料和/或第二材料的化合物，所述系统 并且方法可以包括受控的溅射离子源，其可以包括包含溅射离子材料的原子的气体; 以及将溅射离子材料的原子激发成离子化状态的刺激机构，所选择的离子化状态具有围绕选择的能量峰的分布，其具有溅射第二材料的可能性很高，并且溅射的可能性非常低 材料。 刺激机构可以包括RF或微波感应机构。

公开(公告)号：US07164144B2

公开(公告)日：2007-01-16

申请号：US10900839

申请日：2004-07-27

申请人： William N. Partlo ,  Norbert Bowering ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  David W. Myers ,  Ian Roger Oliver ,  John Viatella ,  Robert N. Jacques

发明人： William N. Partlo ,  Norbert Bowering ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  David W. Myers ,  Ian Roger Oliver ,  John Viatella ,  Robert N. Jacques

IPC分类号： H01J35/20

CPC分类号： G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

摘要： A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprises a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, and a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site.

摘要翻译： 激光产生的等离子体（“LPP”）极紫外（“EUV”）光源控制系统包括适于传送移动等离子体引发目标的目标传送系统和具有定义所需等离子体起始位置的焦点的EUV光收集光学元件，靶 跟踪和反馈系统，包括：至少一个成像装置，其提供目标流轨迹的图像作为输出;以及流轨道误差检测器，其检测目标流轨迹在大致垂直于目标的至少一个轴上的位置的误差 来自与期望的等离子体起始位点相交的所需流道的流轨道。

公开(公告)号：US06801560B2

公开(公告)日：2004-10-05

申请号：US10056619

申请日：2002-01-23

申请人： David S. Knowles ,  Daniel J. W. Brown ,  Richard L. Sandstrom ,  German E. Rylov ,  Eckehard D. Onkels ,  Herve A. Besaucele ,  David W. Myers ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Richard C. Ujazdowski ,  Richard M. Ness ,  Scott T. Smith ,  William G. Hulburd

发明人： David S. Knowles ,  Daniel J. W. Brown ,  Richard L. Sandstrom ,  German E. Rylov ,  Eckehard D. Onkels ,  Herve A. Besaucele ,  David W. Myers ,  Alexander I. Ershov ,  William N. Partlo ,  Igor V. Fomenkov ,  Richard C. Ujazdowski ,  Richard M. Ness ,  Scott T. Smith ,  William G. Hulburd

IPC分类号： H01S322

CPC分类号： H01S3/2366 ,  G01J9/00 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333

摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in a F2 laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line selection package for selecting the strongest F2 spectral line.

公开(公告)号：US07109503B1

公开(公告)日：2006-09-19

申请号：US11067099

申请日：2005-02-25

申请人： Norbert R. Bowering ,  Bjorn A. M. Hansson ,  Alexander N. Bykanov ,  Oleh Khodykin ,  Alexander I. Ershov ,  William N. Partlo

发明人： Norbert R. Bowering ,  Bjorn A. M. Hansson ,  Alexander N. Bykanov ,  Oleh Khodykin ,  Alexander I. Ershov ,  William N. Partlo

IPC分类号： G01J1/00

CPC分类号： G03F7/70925 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  G21K2201/06 ,  H05G2/001

摘要： Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.

摘要翻译： 公开了用于保护EUV光源等离子体生产室光学元件表面免受等离子体形成产生的碎片的系统和方法。 在本发明的实施例的一个方面，公开了一种屏蔽件，其包括位于光学元件和等离子体形成部位之间的至少一个中空管。 管被定向以捕获碎片，同时允许光以相对较小的掠入射角度的反射通过管的内腔。 在本发明的一个实施例的另一方面，公开了一种屏蔽件，其被加热到足以去除沉积在屏蔽上的一种或多种碎屑材料的温度。 在本发明的一个实施例的另一方面，公开了一种系统，其将屏蔽件从光源等离子体室移动到清洁室，其中屏蔽件被清洁。

公开(公告)号：US20130306110A1

公开(公告)日：2013-11-21

申请号：US13473529

申请日：2012-05-16

申请人： Silvia De Dea ,  Michael Varga ,  Alexander I. Ershov ,  Robert L. Morse

发明人： Silvia De Dea ,  Michael Varga ,  Alexander I. Ershov ,  Robert L. Morse

IPC分类号： B08B3/00

CPC分类号： B08B11/02 ,  B08B3/02 ,  B23K26/0643 ,  B23K26/16 ,  G02B27/0006 ,  G03F7/70925

摘要： A collector mirror of an extreme ultraviolet light source is cleaned by removing the collector mirror from a chamber of the extreme ultraviolet light source; mounting the collector mirror to a carrier; inserting the carrier with the collector mirror into a cleaning tank; applying a cleaning agent to a reflective surface of the collector mirror by spraying the cleaning agent through a plurality of nozzles directed toward the collector mirror reflective surface until the collector mirror reflective surface is clean; rinsing the applied cleaning agent from the collector mirror reflective surface; and drying the collector mirror reflective surface.

摘要翻译： 通过从极紫外光源的室中除去集光镜来清洁极紫外光源的集光镜; 将集电镜安装到载体上; 将带有收集镜的载体插入清洗槽中; 通过喷射清洁剂通过指向集光镜反射表面的多个喷嘴将清洁剂施加到收集反射镜的反射表面，直到收集器反射表面清洁; 从收集器反射表面冲洗所施加的清洁剂; 并干燥收集器反射镜。

公开(公告)号：US09073098B2

公开(公告)日：2015-07-07

申请号：US13473529

申请日：2012-05-16

申请人： Silvia De Dea ,  Michael Varga ,  Alexander I. Ershov ,  Robert L. Morse

发明人： Silvia De Dea ,  Michael Varga ,  Alexander I. Ershov ,  Robert L. Morse

IPC分类号： B08B3/02 ,  B08B3/04 ,  B08B3/08 ,  B08B11/02 ,  G03F7/20 ,  G02B27/00 ,  B23K26/06 ,  B23K26/16

CPC分类号： B08B11/02 ,  B08B3/02 ,  B23K26/0643 ,  B23K26/16 ,  G02B27/0006 ,  G03F7/70925

摘要： A collector mirror of an extreme ultraviolet light source is cleaned by removing the collector mirror from a chamber of the extreme ultraviolet light source; mounting the collector mirror to a carrier; inserting the carrier with the collector mirror into a cleaning tank; applying a cleaning agent to a reflective surface of the collector mirror by spraying the cleaning agent through a plurality of nozzles directed toward the collector mirror reflective surface until the collector mirror reflective surface is clean; rinsing the applied cleaning agent from the collector mirror reflective surface; and drying the collector mirror reflective surface.

摘要翻译： 通过从极紫外光源的室中除去集光镜来清洁极紫外光源的集光镜; 将集电镜安装到载体上; 将带有收集镜的载体插入清洗槽中; 通过喷射清洁剂通过指向集光镜反射表面的多个喷嘴将清洁剂施加到收集反射镜的反射表面，直到收集器反射表面清洁; 从收集器反射表面冲洗所施加的清洁剂; 并干燥收集器反射镜。