Metallization structures for semiconductor device interconnects
    75.
    发明申请
    Metallization structures for semiconductor device interconnects 审中-公开
    半导体器件互连的金属化结构

    公开(公告)号:US20050181595A1

    公开(公告)日:2005-08-18

    申请号:US11100282

    申请日:2005-04-06

    申请人: Salman Akram

    发明人: Salman Akram

    IPC分类号: H01L21/768 H01L21/4763

    摘要: The present invention provides a metallization structure for semiconductor device interconnects such as a conductive line, including a substrate with a substantially planar upper surface, foundation metal layer disposed on a portion of the substrate upper surface, primary conducting metal layer overlying the foundation metal layer, and metal spacer on the sidewalls of the primary conducting metal layer and the foundation metal layer. The present invention also provides a metallization structure including a substrate with a foundation metal layer disposed thereon, a dielectric layer with an aperture therethrough being disposed on the substrate, where the bottom of the aperture exposes the foundation metal layer of the substrate, and a metal spacer on the sidewall of the aperture and a line or plug of a primary conducting metal fill the remaining portion of the aperture. The present invention also includes methods for making the metallization structures.

    摘要翻译: 本发明提供了一种用于半导体器件互连的金属化结构,诸如导线,包括具有基本平坦的上表面的基板,设置在基板上表面的一部分上的基底金属层,覆盖在基础金属层上的初级导电金属层, 和金属间隔物在主导电金属层和基底金属层的侧壁上。 本发明还提供了一种金属化结构,其包括其上设置有基底金属层的基底,具有穿过其中的孔的介电层设置在基底上,孔的底部露出基底的基底金属层,金属 孔的侧壁上的间隔物和初级导电金属的线或插塞填充孔的剩余部分。 本发明还包括用于制造金属化结构的方法。

    Protective structures for bond wires
    76.
    发明申请
    Protective structures for bond wires 审中-公开
    接合线的保护结构

    公开(公告)号:US20050173790A1

    公开(公告)日:2005-08-11

    申请号:US11070600

    申请日:2005-03-02

    申请人: Salman Akram

    发明人: Salman Akram

    IPC分类号: G01R1/04 H01L21/68 H01L23/52

    摘要: Protective structures for bond wires or other intermediate conductive elements of a semiconductor device assembly cover the intermediate conductive elements without covering a substantial portion of a semiconductor device from which the intermediate conductive elements extend. In addition to coating at least portions of one or more intermediate conductive elements, the protective structure may include a fence which is configured to receive a semiconductor device. Such a fence may be formed integrally with the remainder of the protective structure or a separately formed member. The protective structures may be formed from a photopolymer material which has been at least partially cured, for example, by stereolithography processes. Accordingly, the protective structures may include a single layer or a plurality of superimposed, contiguous, mutually adhered layers.

    摘要翻译: 用于半导体器件组件的接合线或其它中间导电元件的保护结构覆盖中间导电元件而不覆盖中间导电元件从其延伸的半导体器件的主要部分。 除了涂覆一个或多个中间导电元件的至少一部分之外,保护结构可以包括被配置为接收半导体器件的栅栏。 这样的围栏可以与保护结构的其余部分或单独形成的部件一体形成。 保护结构可以由至少部分固化的光聚合物材料形成,例如通过立体光刻工艺。 因此,保护​​结构可以包括单层或多个叠加的,邻接的相互粘附的层。

    Apparatus for continuous processing of semiconductor wafers
    80.
    发明授权
    Apparatus for continuous processing of semiconductor wafers 失效
    用于连续处理半导体晶片的装置

    公开(公告)号:US06899797B2

    公开(公告)日:2005-05-31

    申请号:US10365381

    申请日:2003-02-11

    IPC分类号: C25D7/12 C25D17/00 C25F7/00

    CPC分类号: C25F7/00 C25D17/001

    摘要: An electrochemical reaction assembly of inducing electrochemical reactions, such as for deposition of materials on semiconductor substrates. The assembly achieves a highly uniform thickness and composition of deposition material or uniform etching or polishing on the semiconductor substrates by retaining the semiconductor substrates on a moving cathode immersed in an appropriate reaction solution wherein a wire mesh anode rotates about the moving cathode during electrochemical reaction.

    摘要翻译: 引起电化学反应的电化学反应组件,例如用于在半导体衬底上沉积材料。 通过将半导体衬底保持在浸入合适的反应溶液中的移动阴极上,在电化学反应期间,丝网阳极围绕移动的阴极旋转,该组件实现了沉积材料的高度均匀的厚度和组成,或半导体衬底上的均匀蚀刻或抛光。