摘要:
A wiring board has an insulating layer, a plurality of wiring layers formed in such a way as to be insulated from each other by the insulating layer, and a plurality of vias formed in the insulating layer to connect the wiring layers. Of the wiring layers, a surface wiring layer formed in one surface of the insulating layer include a first metal film exposed from the one surface and a second metal film embedded in the insulating layer and stacked on the first metal film. Edges of the first metal film project from edges of the second metal film in the direction in which the second metal film spreads. By designing the shape of the wiring layers embedded in the insulating layer in this manner, it is possible to obtain a highly reliable wiring board that can be effectively prevented from side etching in the manufacturing process and can adapt to miniaturization and highly dense packaging of wires.
摘要:
An object of the present invention is to provide a functional device-embedded substrate that can be thinned and suppress occurrence of warpage. The present invention provides a functional device-embedded substrate including at least a functional device including an electrode terminal, and a covering insulating layer covering at least an electrode terminal surface and a side surface of the functional device, the functional device-embedded substrate including a first pillar structure around the functional device inside the covering insulating layer, the first pillar structure including a material having a thermal expansion coefficient between thermal expansion coefficients of the functional device and the covering insulating layer, wherein the first pillar structure is arranged at a position where a shortest distance from a side surface of the functional device to a side surface of the first pillar structure is smaller than a thickness of the functional device.
摘要:
A wiring substrate in which a semiconductor element is built includes a semiconductor element; a peripheral insulating layer covering at least an outer circumferential side surface of this semiconductor element; and an upper surface-side wiring line provided on the upper surface side of the wiring substrate. The semiconductor element includes an internal terminal electrically connected to the upper surface-side wiring line on the upper surface side of the semiconductor element. This internal terminal includes a first conductive part exposed out of an insulating surface layer of the semiconductor element; an adhesion layer on this first conductive part; and a second conductive part on this adhesion layer. The adhesion layer covers an exposed surface of the first conductive part, and is formed on a portion of the insulating surface layer around the exposed surface of the first conductive part, and the adhesion layer extends around the outer side of an outer edge of this second conductive part so as to surround the second conductive part.
摘要:
A semiconductor element-embedded substrate includes a semiconductor element; a chip component; a peripheral insulating layer covering at least the outer circumferential side surfaces thereof; an upper surface-side wiring line provided on the upper surface side of the substrate; and a lower surface-side wiring line provided on the lower surface side of the substrate. The built-in semiconductor element includes a terminal on the upper surface side thereof, and this terminal is electrically connected to the upper surface-side wiring line. The built-in chip component includes an upper surface-side terminal electrically connected to the upper surface-side wiring line; a lower surface-side terminal electrically connected to the lower surface-side wiring line;and a through-chip via penetrating through the chip component to connect the upper surface-side terminal and the lower surface-side terminal.
摘要:
A semiconductor device includes a plural number of interconnects and a plural number of vias are stacked. A semiconductor element is enclosed in an insulation layer. At least one of the vias provided in insulation layers and/or at least one of interconnects provided in the interconnect layers are of cross-sectional shapes different from those of the vias formed in another one of the insulation layers and/or interconnects provided in another one of the interconnect layers.
摘要:
A novel NiMnZn-based ferrite which can reduce magnetic loss (core loss) at a high frequency of about 2 MHz or higher and achieve higher saturated magnetic flux density while forming high sintered density is provided. The NiMnZn-based ferrite contains a main component comprising 54.0 to 57.5 mol % of iron oxide in terms of Fe2O3, 2.0 to 7.0 mol % of zinc oxide in terms of ZnO, 0.5 to 4.7 mol % of nickel oxide in terms of NiO, and a remainder of manganese oxide (in terms of MnO); and an accessory component comprising 100 to 1000 ppm by weight of Si in terms of SiO2, 800 to 3000 ppm by weight of Ca in terms of CaCO3, and 520 to 1000 ppm by weight of Nb in terms of Nb2O5 with respect to the main component; while having an average ferrite crystal particle size of 2.1 to 8.5 μm.
摘要:
A novel NiMnZn-based ferrite which can reduce magnetic loss (core loss) at a high frequency of about 2 MHz or higher and achieve higher saturated magnetic flux density while forming high sintered density is provided. The NiMnZn-based ferrite contains a main component comprising 54.0 to 57.5 mol % of iron oxide in terms of Fe2O3, 2.0 to 7.0 mol % of zinc oxide in terms of ZnO, 0.5 to 4.7 mol % of nickel oxide in terms of NiO, and a remainder of manganese oxide (in terms of MnO); and an accessory component comprising 100 to 1000 ppm by weight of Si in terms of SiO2, 800 to 3000 ppm by weight of Ca in terms of CaCO3, and 520 to 1000 ppm by weight of Nb in terms of Nb2O5 with respect to the main component; while having an average ferrite crystal particle size of 2.1 to 8.5 μm.
摘要:
A wiring board has an insulating layer, a plurality of wiring layers formed in such a way as to be insulated from each other by the insulating layer, and a plurality of vias formed in the insulating layer to connect the wiring layers. Of the wiring layers, a surface wiring layer formed in one surface of the insulating layer include a first metal film exposed from the one surface and a second metal film embedded in the insulating layer and stacked on the first metal film. Edges of the first metal film project from edges of the second metal film in the direction in which the second metal film spreads. By designing the shape of the wiring layers embedded in the insulating layer in this manner, it is possible to obtain a highly reliable wiring board that can be effectively prevented from side etching in the manufacturing process and can adapt to miniaturization and highly dense packaging of wires.
摘要:
A transparent board is positioned on a support board provided with a positioning mark, and a release material is provided. A semiconductor element is then positioned so that the electrode element faces upward, and the support board is then removed. An insulating resin is then formed on the release material so as to cover the semiconductor element; and a via, a wiring layer, an insulation layer, an external terminal, and a solder resist are then formed. The transparent board is then peeled from the semiconductor device through the use of the release material. A chip can thereby be mounted with high precision, there is no need to provide a positioning mark during mounting of the chip on the substrate in the manufacturing process, and the substrate can easily be removed. As a result, a semiconductor device having high density and a thin profile can be manufactured at low cost.
摘要:
A sphygmomanometer includes a body 10 and a cuff 20 which is integrally attached to the body 10 and wrapped around the wrist. The body 10 is attached to the cuff 20 such that the body is located on the thumb side of the arm L when the sphygmomanometer is fitted on the wrist. Consequently, a precise blood pressure measurement and precise blood pressure fluctuation can be obtained without restriction on the location where the blood pressure measurement is conducted.