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    INSPECTION SYSTEM, IMAGE PROCESSING DEVICE AND INSPECTION METHOD
    84.
    发明申请
    INSPECTION SYSTEM, IMAGE PROCESSING DEVICE AND INSPECTION METHOD 审中-公开

    公开(公告)号：US20190244783A1

    公开(公告)日：2019-08-08

    申请号：US16261784

    申请日：2019-01-30

    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

    Inventor： Takeyoshi OHASHI ,  Masami IKOTA

    IPC: H01J37/22 ,  H01J37/28 ,  G06T7/00

    CPC classification number: H01J37/222 ,  G06T7/0004 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/28 ,  H01J2237/24564 ,  H01J2237/2801

    Abstract: An inspection system is provided that includes a microscope that scans a sample with a beam that is an incident electron beam, and an image processing device that controls the microscope. The image processing device performs: an acquisition process of acquiring a plurality of images relating to brightness based on an amount of a signal electron detected from the sample a result of controlling the microscope according to a s and irradiating the sample with the beam, the plurality of image acquisition condition being multiple combinations of different irradiation amounts of the beam per unit length; a first generation process of generating a plurality of actually measured profiles that show a relationship between an irradiation position of the beam in the sample and the brightness of the sample, based on the plurality of images acquired in the acquisition process; and an output process of outputting an electrical contact characteristic of the sample based on the plurality of actually measured profiles generated in the first generation process.

    Stage Device and Charged Particle Beam Device Using the Same
    89.
    发明申请
    Stage Device and Charged Particle Beam Device Using the Same 有权
    舞台装置和使用它的带电粒子束装置

    公开(公告)号：US20160365219A1

    公开(公告)日：2016-12-15

    申请号：US15120919

    申请日：2015-01-07

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Akira NISHIOKA ,  Masaki MIZUOCHI ,  Shuichi NAKAGAWA ,  Nobuyuki MAKI

    IPC: H01J37/20 ,  H01L21/687 ,  H01L21/67

    CPC classification number: H01J37/20 ,  H01J2237/2002 ,  H01J2237/20221 ,  H01J2237/20271 ,  H01J2237/20278 ,  H01J2237/2801 ,  H01J2237/2817 ,  H01L21/67253 ,  H01L21/68 ,  H01L21/68785 ,  H02K9/22 ,  H02K16/00 ,  H02K41/02

    Abstract: To provide a stage device and a charged particle beam device using the same capable of effectively suppressing thermal deformation of a stage generated by temperature increase caused by heat generated by a linear motor. The stage device including a table, a linear motor driving the table in a prescribed direction, in which the table and a moving part of the linear motor are connected by components, a slide unit is attached to the component, movement of which is constrained by a rail fixed to a base, and at the same time, the slide unit is positioned vertically below a place where the component is joined to the table, thereby suppressing thermal deformation of the table.

    Abstract translation: 提供一种能够有效地抑制由线性电动机产生的热量引起的温度上升所产生的台的热变形的阶段装置和带电粒子束装置。 台架装置包括工作台，在规定方向上驱动工作台的线性电动机，其中工作台和直线电动机的运动部件通过部件连接，滑动单元安装在部件上，其运动受到 固定在基座上的轨道，同时滑动单元垂直定位在组件接合到工作台的位置的下方，从而抑制工作台的热变形。

    Charged particle radiation device and specimen preparation method using said device
    90.
    发明授权
    Charged particle radiation device and specimen preparation method using said device 有权
    带电粒子辐射装置和使用所述装置的样品制备方法

    公开(公告)号：US09449786B2

    公开(公告)日：2016-09-20

    申请号：US14786446

    申请日：2014-04-11

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Miki Tsuchiya ,  Yasuhira Nagakubo ,  Satoshi Tomimatsu

    IPC: H01J37/20 ,  H01J37/305 ,  G01N1/42 ,  H01J37/302 ,  H01J37/304 ,  B25J7/00 ,  H01J37/28 ,  H01J37/30 ,  G01N1/28

    CPC classification number: H01J37/20 ,  B25J7/00 ,  G01N1/42 ,  G01N2001/2873 ,  H01J37/28 ,  H01J37/30 ,  H01J37/302 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/002 ,  H01J2237/2001 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/208 ,  H01J2237/2801 ,  H01J2237/30461 ,  H01J2237/31745 ,  H01J2237/31749

    Abstract: The present invention enables a sample to be observed in a clean state directly after preparation of a final observation surface when preparing a sample for observing a material that is sensitive to heat. The present invention is a method of preparing a sample using a charged particle beam device including a microprobe having a cooling mechanism, a first sample holder having a mechanism for retaining a sample in a cooled state, and a stage into which the microprobe and the first sample holder can be introduced, the method including cutting a bulk-shaped sample piece from the sample on the first sample holder retained in a cooled state; adhering the sample piece to a distal end of the microprobe that is cooled to a fixed temperature and transferring the sample piece to a second sample holder for thin film observation retained in a cooled state, which is different from the first sample holder, within a vacuum chamber of the charged particle beam device; separating the sample piece that has been transferred to the second sample holder from the microprobe and thin film processing the sample piece to a thickness that is less than the thickness during cutting; and observing the sample piece after the thin film processing.

    Abstract translation: 本发明使得在制备用于观察对热敏感的材料的样品时，在制备最终观察表面之后，可以直接在清洁状态下观察样品。 本发明是一种使用带电粒子束装置制备样品的方法，所述带电粒子束装置包括具有冷却机构的微探针，具有用于将样品保持在冷却状态的机构的第一样品保持器和所述微探针和第一 可以引入样品保持器，该方法包括从保持在冷却状态的第一样品保持器上的样品切割块状样品; 将样品块粘附到被冷却到固定温度的微探针的远端，并将样品片转移到第二样品保持器以进行薄膜观察，在与真空中的第一样品保持器不同的冷却状态下保持 带电粒子束装置的腔室; 将从所述微探针转移到所述第二样品保持器的样品片和将所述样品片处理的薄膜分离成小于切割时的厚度的厚度; 并在薄膜处理后观察样品。

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