公开(公告)号：US09437341B2

公开(公告)日：2016-09-06

申请号：US13800979

申请日：2013-03-13

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Shengwu Chang

IPC: G21K5/00 ,  H01J27/02 ,  H01J37/08 ,  H01J37/302 ,  H01J37/317

CPC classification number: G21K5/00 ,  H01J27/028 ,  H01J37/08 ,  H01J37/302 ,  H01J37/3171

Abstract: An apparatus to generate negative hydrogen ions includes an ion source operative to generate positive hydrogen ions, a first component to adjust positive molecular hydrogen ion species in the ion source, a second component to adjust extraction voltage for extraction of the positive molecular hydrogen ions from the ion source, and a charge exchange cell comprising charge exchange species to convert the extracted positive molecular hydrogen ions to negative hydrogen ions. The adjusted extraction voltage is effective to generate an ion energy to maximize negative ion current yield in the charge exchange cell based upon a product of extraction efficiency of the positive molecular hydrogen ions and a peak in charge exchange efficiency for converting a species of the positive molecular hydrogen ions to negative hydrogen ions through charge exchange between the extracted hydrogen ions and charge exchange species.

Abstract translation: 产生负氢离子的装置包括可产生正氢离子的离子源，用于调节离子源中的正分子氢离子种类的第一组分，用于调节提取电压以提取正离子氢离子的第二组分 离子源和包含电荷交换物质的电荷交换单元，以将所提取的正分子氢离子转化为负的氢离子。 基于正分子氢离子的提取效率和电荷交换效率的峰值，用于转换正分子的种类，调整的提取电压有效产生离子能量以最大化电荷交换电池中的负离子电流产量 氢离子与负离子之间的氢离子通过电荷交换提取氢离子和电荷交换物质。

公开(公告)号：US20160240350A1

公开(公告)日：2016-08-18

申请号：US15136524

申请日：2016-04-22

Applicant: Glenn Lane Family Limited Liability Limited Partnership

Inventor： Glenn E. LANE

IPC: H01J37/317

CPC classification number: H01J37/3007 ,  C23C14/48 ,  C23C14/54 ,  H01J37/08 ,  H01J37/09 ,  H01J37/3171 ,  H01J49/062 ,  H01J49/26 ,  H01J2237/0213 ,  H01J2237/04 ,  H01J2237/0455 ,  H01J2237/152 ,  H01J2237/31701 ,  H01L21/265

Abstract: Embodiments of the invention relate to a mass resolving aperture that may be used in an ion implantation system that selectively exclude ion species based on charge to mass ratio (and/or mass to charge ratio) that are not desired for implantation, in an ion beam assembly. Embodiments of the invention relate to a mass resolving aperture that is segmented, adjustable, and/or presents a curved surface to the oncoming ion species that will strike the aperture. Embodiments of the invention also relate to the filtering of a flow of charged particles through a closed plasma channel (CPC) superconductor, or boson energy transmission system.

Abstract translation: 本发明的实施例涉及可用于离子注入系统中的质量分辨孔径，该离子注入系统基于离子束中不需要的注入质量比（和/或质荷比）来选择性地排除离子种类 部件。 本发明的实施例涉及一种质量分辨孔径，该质量分辨孔径被分段，可调节和/或呈现出将撞击孔的迎面而来的离子物质的曲面。 本发明的实施例还涉及通过封闭的等离子体通道（CPC）超导体或玻色子能量传输系统对带电粒子的流过滤。

公开(公告)号：US20160233048A1

公开(公告)日：2016-08-11

申请号：US14615602

申请日：2015-02-06

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Shengwu Chang ,  Kristen S. Rounds ,  William Leavitt ,  Michael St. Peter

IPC: H01J37/08 ,  H01J37/10 ,  H01J37/317

CPC classification number: H01J37/08 ,  H01J37/3171 ,  H01J2237/024 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/04924

Abstract: An apparatus to control an ion beam for treating a substrate. The apparatus may include a fixed electrode configured to conduct the ion beam through a fixed electrode aperture and to apply a fixed electrode potential to the ion beam, a ground electrode assembly disposed downstream of the fixed electrode. The ground electrode assembly may include a base and a ground electrode disposed adjacent the fixed electrode and configured to conduct the ion beam through a ground electrode aperture, the ground electrode being reversibly movable along a first axis with respect to the fixed electrode between a first position and a second position, wherein a beam current of the ion beam at the substrate varies when the ground electrode moves between the first position and second position.

Abstract translation: 控制用于处理基板的离子束的装置。 该装置可以包括固定电极，其被配置为使离子束通过固定电极孔并且将固定电极电位施加到离子束，设置在固定电极下游的接地电极组件。 接地电极组件可以包括基部和邻近固定电极设置的接地电极，并且被配置为使离子束通过接地电极孔，接地电极可相对于固定电极的第一轴线在第一位置 以及第二位置，其中当所述接地电极在所述第一位置和所述第二位置之间移动时，所述衬底处的离子束的束电流变化。

公开(公告)号：US09396902B2

公开(公告)日：2016-07-19

申请号：US13477253

申请日：2012-05-22

Applicant: Costel Biloiu ,  Craig R. Chaney ,  Neil J. Bassom ,  Benjamin Colombeau ,  Dennis P. Rodier

Inventor： Costel Biloiu ,  Craig R. Chaney ,  Neil J. Bassom ,  Benjamin Colombeau ,  Dennis P. Rodier

IPC: H01J7/24 ,  H01J27/20 ,  H01J37/02 ,  H01J37/08

CPC classification number: H01J27/20 ,  H01J7/24 ,  H01J37/02 ,  H01J37/08

Abstract: In one embodiment, a method for generating an ion beam having gallium ions includes providing at least a portion of a gallium compound target in a plasma chamber, the gallium compound target comprising gallium and at least one additional element. The method also includes initiating a plasma in the plasma chamber using at least one gaseous species and providing a source of gaseous etchant species to react with the gallium compound target to form a volatile gallium species.

Abstract translation: 在一个实施方案中，用于产生具有镓离子的离子束的方法包括在等离子体室中提供镓化合物靶的至少一部分，所述镓化合物靶包含镓和至少一个附加元素。 该方法还包括使用至少一种气态物质在等离子体室中引发等离子体，并提供气态蚀刻剂物质源以与镓化合物靶反应以形成挥发性镓物质。

公开(公告)号：US20160175804A1

公开(公告)日：2016-06-23

申请号：US14576549

申请日：2014-12-19

Applicant: Axcelis Technologies, Inc.

Inventor： William Davis Lee ,  William DiVergilio ,  Daniel R. Tieger

IPC: B01J19/12 ,  H01J37/08 ,  C01B35/02 ,  H01J37/317

CPC classification number: C01B35/026 ,  B01J19/121 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/2001

Abstract: Systems and methods for the production of laser induced high mass molecular borane is disclosed for an ion implantation system. The system comprises a laser, a diborane gas source, a heated interaction chamber for generating a high mass molecular borane, a transport system for transferring the high mass molecular borane, and an ion source chamber for generating an ion beam in an ion beam path for implantation of a workpiece. The transport system comprises at least a first and a second flow control component at least a first heated chamber, wherein the first heated chamber is disposed between the first and second flow control components, and wherein the first heated chamber is configured to condense the high mass molecular borane. The laser comprises a CO2 laser configured to irradiate the diborane source gas at a wavelength of about 10.6 μm at a R-16 (973 cm−1) line of excitation.

Abstract translation: 公开了用于离子注入系统的用于生产激光诱导的高质量分子量硼烷的系统和方法。 该系统包括激光器，乙硼烷气体源，用于产生高质量分子量硼烷的加热相互作用室，用于转移高质量分子量硼烷的输送系统和用于在离子束路径中产生离子束的离子源室， 植入工件。 输送系统至少包括第一和第二流量控制部件至少第一加热室，其中第一加热室设置在第一和第二流量控制部件之间，并且其中第一加热室被配置为冷凝高质量 分子硼烷。 激光器包括配置成在R-16（973cm-1）激发线处照射约10.6μm波长的乙硼烷源气体的CO 2激光器。

公开(公告)号：US09372161B2

公开(公告)日：2016-06-21

申请号：US14600338

申请日：2015-01-20

Applicant: ULVAC-PHI, Inc.

Inventor： Daisuke Sakai ,  Mauo Sogou ,  Kenzo Hiraoka

IPC: G01N23/02 ,  H01J49/26 ,  H01J37/08 ,  H01J37/252 ,  H01J27/26 ,  H01J49/04 ,  H01J49/16 ,  G01N23/225

CPC classification number: G01N23/02 ,  G01N23/2258 ,  H01J27/26 ,  H01J37/08 ,  H01J37/252 ,  H01J49/0468 ,  H01J49/165 ,  H01J2237/0812 ,  H01J2237/2527 ,  H01J2237/3174

Abstract: Provided are an ion source, an ion gun, and an analysis instrument, which are capable of performing sputtering without damage to a surface of a sample and improving detection sensitivity in mass spectroscopy. In the ion source, an emission opening to which ionization liquid is supplied is disposed in an electric field formed in vacuum environment by an extracting electrode so that super large droplet cluster ions are generated from the emission opening. When the sample is irradiated with a super large droplet cluster ion beam, the sample surface is subjected to sputtering without damage, so as to remove contamination substances or to expose a new surface of the sample. In mass spectroscopy, detection sensitivity is improved.

Abstract translation: 提供离子源，离子枪和分析仪器，其能够进行溅射而不损害样品的表面并提高质谱中的检测灵敏度。 在离子源中，在真空环境中由提取电极形成的电场中配置有供给电离液体的发射开口，从而从发射开口产生超大的液滴簇离子。 当用超大液滴簇离子束照射样品时，样品表面经受溅射而不损坏，以便去除污染物质或露出样品的新表面。 在质谱中，检测灵敏度得到改善。

公开(公告)号：US09362097B2

公开(公告)日：2016-06-07

申请号：US14975374

申请日：2015-12-18

Applicant: Massachusetts Institute of Technology

Inventor： Paulo C. Lozano ,  Steven Mark Arestie

IPC: H01J27/26 ,  H01J49/04 ,  B01L3/00

CPC classification number: H01J37/08 ,  B01L3/502715 ,  C25F3/14 ,  H01J1/05 ,  H01J9/02 ,  H01J49/0445 ,  H01J2237/0802 ,  H01J2237/317

Abstract: An ionic liquid ion source can include a microfabricated body including a base and a tip. The body can be formed of a porous material compatible with at least one of an ionic liquid or room-temperature molten salt. The body can have a pore size gradient that decreases from the base of the body to the tip of the body, such that the at least one of an ionic liquid or room-temperature molten salt is capable of being transported through capillarity from the base to the tip.

Abstract translation: 离子液体离子源可以包括包含基底和尖端的微加工体。 身体可以由与离子液体或室温熔融盐中的至少一种相容的多孔材料形成。 身体可以具有从身体的基部到身体的尖端减小的孔径梯度，使得离子液体或室温熔融盐中的至少一种能够通过毛细管线从基底转移到 小费。

公开(公告)号：US09343259B2

公开(公告)日：2016-05-17

申请号：US14815265

申请日：2015-07-31

Applicant: TEL Epion Inc.

Inventor： Matthew C. Gwinn ,  Avrum Freytsis ,  Robert K. Becker

IPC: H01J37/08 ,  H01J37/305

CPC classification number: H01J37/08 ,  H01J37/305 ,  H01J2237/006 ,  H01J2237/0206 ,  H01J2237/061 ,  H01J2237/0812 ,  H01J2237/0822 ,  H01J2237/3151

Abstract: A nozzle assembly used for performing gas cluster ion beam (GCIB) etch processing of various materials is described. In particular, the nozzle assembly includes two or more conical nozzles that are aligned such that they are both used to generate the same GCIB. The first conical nozzle may include the throat that initially forms the GCIB and the second nozzle may form a larger conical cavity that may be appended to the first conical nozzle. A transition region may be disposed between the two conical nozzles that may substantially cylindrical and slightly larger than the largest diameter of the first conical nozzle.

Abstract translation: 描述了用于进行各种材料的气体簇离子束（GCIB）蚀刻处理的喷嘴组件。 特别地，喷嘴组件包括两个或更多个锥形喷嘴，其被对准，使得它们都用于产生相同的GCIB。 第一锥形喷嘴可以包括最初形成GCIB的喉部，并且第二喷嘴可以形成可以附着到第一锥形喷嘴的更大的锥形空腔。 过渡区域可以设置在两个锥形喷嘴之间，其可以基本上圆柱形并稍微大于第一锥形喷嘴的最大直径。

公开(公告)号：US20160111243A1

公开(公告)日：2016-04-21

申请号：US14969306

申请日：2015-12-15

Applicant: Carl Zeiss Microscopy, LLC

Inventor： John A. Notte, IV ,  Weijie Huang ,  FHM-Faridur Rahman ,  Shawn McVey

IPC: H01J37/08 ,  H01J37/18

CPC classification number: H01J37/18 ,  G21K5/04 ,  H01J27/26 ,  H01J37/08 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/032 ,  H01J2237/0653 ,  H01J2237/0807 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/20221 ,  H01J2237/20235

Abstract: The disclosure relates to a method of operating a gas field ion beam system in which the gas field ion beam system comprises an external housing, an internal housing, arranged within the external housing, an electrically conductive tip arranged within the internal housing, a gas supply for supplying one or more gases to the internal housing, the gas supply having a tube terminating within the internal housing, and an extractor electrode having a hole to permit ions generated in the neighborhood of the tip to pass through the hole into the external housing. The method comprises the step of regularly heating the external housing, the internal housing, the electrically conductive tip, the tube and the extractor electrode to a temperature of above 100° C.

公开(公告)号：US20160111241A1

公开(公告)日：2016-04-21

申请号：US14949468

申请日：2015-11-23

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Alexandre Likhanskii ,  Svetlana B. Radovanov ,  Bon-Woong Koo

IPC: H01J27/02 ,  H01J27/16

CPC classification number: H01J27/024 ,  H01J27/16 ,  H01J37/08 ,  H01J2237/0815 ,  H05H2001/4652 ,  H05H2001/466

Abstract: A plasma chamber having improved controllability of the ion density of the extracted ribbon ion beam is disclosed. A plurality of pairs of RF biased electrodes is disposed on opposite sides of the extraction aperture in a plasma chamber. In some embodiments, one of each pair of RF biased electrodes is biased at the extraction voltage, while the other of each pair is coupled to a RF bias power supply, which provides a RF voltage having a DC component and an AC component. In another embodiment, both of the electrodes in each pair are coupled to a RF biased power supply. A blocker may be disposed in the plasma chamber near the extraction aperture. In some embodiments, RF biased electrodes are disposed on the blocker.

Abstract translation: 公开了具有提取的带状离子束的离子密度的可控性的等离子体室。 多个RF偏置电极对设置在等离子体室中的提取孔的相对侧上。 在一些实施例中，每对RF偏置电极中的一个被偏置在提取电压，而每对中的另一个耦合到RF偏置电源，RF偏压电源提供具有DC分量和AC分量的RF电压。 在另一个实施例中，每对中的两个电极耦合到RF偏置电源。 阻挡剂可以设置在提取孔附近的等离子体室中。 在一些实施例中，RF偏置电极设置在阻挡器上。