Integrated circuit packaging system with interconnects and method of manufacture thereof
    6.
    发明授权
    Integrated circuit packaging system with interconnects and method of manufacture thereof 有权
    具有互连的集成电路封装系统及其制造方法

    公开(公告)号:US08709932B2

    公开(公告)日:2014-04-29

    申请号:US12966071

    申请日:2010-12-13

    IPC分类号: H01L21/44 H01L21/00 H01L23/02

    摘要: A method of manufacture of an integrated circuit packaging system includes: providing a carrier having a contact pad; forming a first resist layer, having a first resist opening, over the carrier and the contact pad, the first resist opening partially exposing the first contact pad; forming a second resist layer, having a second resist opening over the first resist opening, the second resist opening partially exposing the first resist layer; mounting an integrated circuit over the carrier; and forming an internal interconnect between the integrated circuit and the carrier, the internal interconnect filling the second resist opening with no space between the second resist layer in the second resist opening.

    摘要翻译: 一种集成电路封装系统的制造方法,包括:提供具有接触焊盘的载体; 在所述载体和所述接触焊盘上形成具有第一抗蚀剂开口的第一抗蚀剂层,所述第一抗蚀剂开口部分地暴露所述第一接触焊盘; 形成第二抗蚀剂层,在所述第一抗蚀剂开口上具有第二抗蚀剂开口,所述第二抗蚀剂开口部分地暴露所述第一抗蚀剂层; 在载体上安装集成电路; 以及在所述集成电路和所述载体之间形成内部互连,所述内部互连件在所述第二抗蚀剂开口中的所述第二抗蚀剂层之间没有空间填充所述第二抗蚀剂开口。

    INTEGRATED CIRCUIT PACKAGING SYSTEM WITH INTERCONNECTS AND METHOD OF MANUFACTURE THEREOF
    7.
    发明申请
    INTEGRATED CIRCUIT PACKAGING SYSTEM WITH INTERCONNECTS AND METHOD OF MANUFACTURE THEREOF 有权
    具有互连的集成电路包装系统及其制造方法

    公开(公告)号:US20120146230A1

    公开(公告)日:2012-06-14

    申请号:US12966071

    申请日:2010-12-13

    IPC分类号: H01L23/498 H01L21/50

    摘要: A method of manufacture of an integrated circuit packaging system includes: providing a carrier having a contact pad; forming a first resist layer, having a first resist opening, over the carrier and the contact pad, the first resist opening partially exposing the first contact pad; forming a second resist layer, having a second resist opening over the first resist opening, the second resist opening partially exposing the first resist layer; mounting an integrated circuit over the carrier; and forming an internal interconnect between the integrated circuit and the carrier, the internal interconnect filling the second resist opening with no space between the second resist layer in the second resist opening.

    摘要翻译: 一种集成电路封装系统的制造方法,包括:提供具有接触焊盘的载体; 在所述载体和所述接触焊盘上形成具有第一抗蚀剂开口的第一抗蚀剂层,所述第一抗蚀剂开口部分地暴露所述第一接触焊盘; 形成第二抗蚀剂层,在所述第一抗蚀剂开口上具有第二抗蚀剂开口,所述第二抗蚀剂开口部分地暴露所述第一抗蚀剂层; 在载体上安装集成电路; 以及在所述集成电路和所述载体之间形成内部互连,所述内部互连件在所述第二抗蚀剂开口中的所述第二抗蚀剂层之间没有空间填充所述第二抗蚀剂开口。