WIRING BOARD AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20200343133A1

    公开(公告)日:2020-10-29

    申请号:US16808847

    申请日:2020-03-04

    申请人: FUJITSU LIMITED

    发明人: Masaru Morita

    IPC分类号: H01L21/768 H05K3/10 H05K3/38

    摘要: A wiring board includes a wiring layer; a diffusion suppressing layer that. covers the wiring layer and suppresses diffusion of a metal component of the wiring layer; a base metal layer that covers the diffusion suppressing layer; and a passivation layer that covers the base metal layer.

    SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

    公开(公告)号:US20220189895A1

    公开(公告)日:2022-06-16

    申请号:US17401364

    申请日:2021-08-13

    申请人: FUJITSU LIMITED

    发明人: Masaru Morita

    IPC分类号: H01L23/00

    摘要: A semiconductor device includes a semiconductor substrate configured to include a first electrode layer, and a first barrier layer provided on the first electrode layer and bonded to a metal layer, and a circuit substrate configured to include a second electrode layer, and a second barrier layer provided on the second electrode layer and bonded to the metal layer, wherein the semiconductor substrate including a semiconductor element, and the circuit substrate are bonded via the metal layer containing Sn, a linear expansion coefficient of the first barrier layer is larger than that of the circuit substrate, and a linear expansion coefficient of the second barrier layer is smaller than that of the circuit substrate.