Methods of manufacturing photomask blank and photomask
    1.
    发明授权
    Methods of manufacturing photomask blank and photomask 有权
    制造光掩模坯料和光掩模的方法

    公开(公告)号:US07195846B2

    公开(公告)日:2007-03-27

    申请号:US10724734

    申请日:2003-12-02

    IPC分类号: G03F1/00 G03C5/00

    摘要: A photomask blank having a film of at least one layer formed on a substrate is manufactured by forming a film on a substrate and irradiating the film with light from a flash lamp. A photomask is manufactured from the thus manufactured photomask blank by forming a patterned resist on the film on the blank by photolithography, etching away those portions of the film which are not covered with the resist, and removing the resist. The photomask blank and photomask have minimized warpage and improved chemical resistance.

    摘要翻译: 通过在基板上形成膜并用来自闪光灯的光照射薄膜来制造具有形成在基板上的至少一层的膜的光掩模坯料。 通过光刻法在坯料上的膜上形成图案化的抗蚀剂,蚀刻掉未被抗蚀剂覆盖的膜的那些部分,并除去抗蚀剂,由这样制造的光掩模坯料制造光掩模。 光掩模坯料和光掩模具有最小的翘曲和改善的耐化学性。