Abstract:
Described herein are gate-all-around (GAA) transistors with extended drains, where the drain region extends through a well region below the GAA transistor. A high voltage can be applied to the drain, and the extended drain region provides a voltage drop. The transistor length (and, specifically length of the extended drain) can be varied based on the input voltage to the device, e.g., providing a longer drain for higher input voltages. The extended drain transistors can be implemented in devices that include CFETs, either by implementing the extended drain transistor across both CFET layers, or by providing a sub-fin pedestal with the well regions in the lower layer.
Abstract:
An apparatus is described. The apparatus includes a cross-point non volatile memory cell array comprised of a first plurality of access lines and a second orthogonal plurality of access lines. Each of the first plurality of access lines are coupled to a first address decoder through a respective pass transistor. The pass transistor is coupled to control circuitry to bias the pass transistor into one of at least two states that include a first active state determined from a second address decoder and a second active state determined from the second address decoder.
Abstract:
Embodiments of the present disclosure describe electrode configurations to increase electro-thermal isolation of phase-change memory elements and associated techniques. In an embodiment, an apparatus includes a plurality of phase-change memory (PCM) elements, wherein individual PCM elements of the plurality of PCM elements include a phase-change material layer, a first electrode layer disposed on the phase-change material layer and in direct contact with the phase-change material layer, and a second electrode layer disposed on the first electrode layer and in direct contact with the first electrode layer. Other embodiments may be described and/or claimed.
Abstract:
One embodiment provides a memory controller. The memory controller includes a memory controller circuitry and a set pulse determination circuitry. The memory controller circuitry is to identify an address of a target memory cell to be set. The set pulse determination circuitry is to select a positive polarity set pulse if the target memory cell is included in a positive polarity deck or to select a negative polarity set pulse if the target memory cell is included in a negative polarity deck. Each set pulse includes a respective nucleation portion and a respective growth portion. Each portion has a respective current amplitude and a respective time duration.
Abstract:
Technology for a memory device is described. The memory device can include an array of memory cells and a memory controller. The memory controller can receive a request to program a memory cell within the array of memory cells. The memory controller can select a current magnitude and a duration of the current magnitude for a programming set pulse based on a polarity of access for the memory cell, a number of prior write cycles for the memory cell, and electrical distances between the memory cell and wordline/bitline decoders within the array of memory cells. The memory controller can initiate, in response to the request, the programming set pulse to program the memory cell within the array of memory cells. The selected current magnitude and the selected duration of the current magnitude can be applied during the programming set pulse.
Abstract:
Phase change material can be set with a multistage set process. Set control logic can heat a phase change semiconductor material (PM) to a first temperature for a first period of time. The first temperature is configured to promote nucleation of a crystalline state of the PM. The control logic can increase the temperature to a second temperature for a second period of time. The second temperature is configured to promote crystal growth within the PM. The nucleation and growth of the crystal set the PM to the crystalline state. The multistage ramping up of the temperature can improve the efficiency of the set process relative to traditional approaches.
Abstract:
Phase change material can be set with a multistage set process. Set control logic can heat a phase change semiconductor material (PM) to a first temperature for a first period of time. The first temperature is configured to promote nucleation of a crystalline state of the PM. The control logic can increase the temperature to a second temperature for a second period of time. The second temperature is configured to promote crystal growth within the PM. The nucleation and growth of the crystal set the PM to the crystalline state. The multistage ramping up of the temperature can improve the efficiency of the set process relative to traditional approaches.
Abstract:
Multi-level cell (MLC) cross-point memory cells can store more than 1 bit per cell. In one example, MLC write operations for cross-point memory can be achieved by independently changing the state of the switch element and the memory element. The memory cell can be programmed to multiple states, such as a high threshold voltage state (where both the memory element and switch element exhibit a high threshold voltage or resistance), a low threshold voltage state (where both the memory element and select element exhibit a low threshold voltage or resistance), and one or more intermediate resistance states. In one example, additional resistance states can be programmed by setting the switch element and memory element to opposite states (e.g., one of the switch element and memory element is in a high resistance state and the other is in a low resistance state) or by placing both the switch element and memory element in different intermediate states.
Abstract:
Embodiments of the present disclosure describe electrode configurations to increase electro-thermal isolation of phase-change memory elements and associated techniques. In an embodiment, an apparatus includes a plurality of phase-change memory (PCM) elements, wherein individual PCM elements of the plurality of PCM elements include a phase-change material layer, a first electrode layer disposed on the phase-change material layer and in direct contact with the phase-change material layer, and a second electrode layer disposed on the first electrode layer and in direct contact with the first electrode layer. Other embodiments may be described and/or claimed.
Abstract:
Phase change material can be set with a multistage set process. Set control logic can heat a phase change semiconductor material (PM) to a first temperature for a first period of time. The first temperature is configured to promote nucleation of a crystalline state of the PM. The control logic can increase the temperature to a second temperature for a second period of time. The second temperature is configured to promote crystal growth within the PM. The nucleation and growth of the crystal set the PM to the crystalline state. The multistage ramping up of the temperature can improve the efficiency of the set process relative to traditional approaches.