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    EUV collector debris management
    1.
    发明申请
    EUV collector debris management 失效
    EUV收集器碎片管理

    公开(公告)号：US20060091109A1

    公开(公告)日：2006-05-04

    申请号：US10979945

    申请日：2004-11-01

    申请人： William Partlo ,  Richard Sandstrom ,  Igor Fomenkov ,  Alexander Ershov ,  William Oldham ,  William Marx ,  Oscar Hemberg

    发明人： William Partlo ,  Richard Sandstrom ,  Igor Fomenkov ,  Alexander Ershov ,  William Oldham ,  William Marx ,  Oscar Hemberg

    IPC分类号： H01L21/306 ,  B08B6/00 ,  B44C1/22

    CPC分类号： B08B7/00

    摘要： A method and apparatus that may comprise an EUV light producing mechanism utilizing an EUV plasma source material comprising a material that will form an etching compound, which plasma source material produces EUV light in a band around a selected center wavelength comprising: an EUV plasma generation chamber; an EUV light collector contained within the chamber having a reflective surface containing at least one layer comprising a material that does not form an etching compound and/or forms a compound layer that does not significantly reduce the reflectivity of the reflective surface in the band; an etchant source gas contained within the chamber comprising an etchant source material with which the plasma source material forms an etching compound, which etching compound has a vapor pressure that will allow etching of the etching compound from the reflective surface. The etchant source material may comprises a halogen or halogen compound. The etchant source material may be selected based upon the etching being stimulated in the presence of photons of EUV light and/or DUV light and/or any excited energetic photons with sufficient energy to stimulate the etching of the plasma source material. The apparatus may further comprise an etching stimulation plasma generator providing an etching stimulation plasma in the working vicinity of the reflective surface; and the etchant source material may be selected based upon the etching being stimulated by an etching stimulation plasma. There may also be an ion accelerator accelerating ions toward the reflective surface. The ions may comprise etchant source material. The apparatus and method may comprise a part of an EUV production subsystem with an optical element to be etched of plasma source material.

    摘要翻译： 可以包括使用EUV等离子体源材料的EUV发光机构的方法和装置，所述EUV等离子体源材料包括将形成蚀刻化合物的材料，所述等离子体源材料在所选择的中心波长周围的带内产生EUV光，包括：EUV等离子体产生室 ; 包含在室内的EUV光收集器具有反射表面，该反射表面包含至少一层，该层包含不形成蚀刻化合物的材料和/或形成不显着降低该带中的反射表面的反射率的化合物层; 包含在腔室内的蚀刻剂源气体包括蚀刻剂源材料，等离子体源材料与蚀刻剂源材料形成蚀刻化合物，该蚀刻化合物具有允许从反射表面蚀刻蚀刻化合物的蒸气压。 蚀刻剂源材料可以包含卤素或卤素化合物。 蚀刻剂源材料可以基于在存在EUV光和/或DUV光的光子和/或具有足够能量以激发等离子体源材料的蚀刻的任何激发能量光子的情况下被激发的蚀刻来选择。 该装置还可以包括在反射表面的工作附近提供蚀刻刺激等离子体的蚀刻刺激等离子体发生器; 并且蚀刻剂源材料可以基于通过蚀刻刺激等离子体刺激的蚀刻来选择。 还可以存在离子加速剂将离子朝向反射表面加速。 离子可以包括蚀刻剂源材料。 该装置和方法可以包括具有待蚀刻的等离子体源材料的光学元件的EUV生产子系统的一部分。

    Method and apparatus for EUV plasma source target delivery
    2.
    发明申请
    Method and apparatus for EUV plasma source target delivery 有权
    用于EUV等离子体源目标传递的方法和装置

    公开(公告)号：US20060192154A1

    公开(公告)日：2006-08-31

    申请号：US11067124

    申请日：2005-02-25

    申请人： J. Algots ,  Igor Fomenkov ,  Alexander Ershov ,  William Partlo ,  Richard Sandstrom ,  Oscar Hemberg ,  Alexander Bykanov ,  Dennis Cobb

    发明人： J. Algots ,  Igor Fomenkov ,  Alexander Ershov ,  William Partlo ,  Richard Sandstrom ,  Oscar Hemberg ,  Alexander Bykanov ,  Dennis Cobb

    IPC分类号： H05G2/00

    CPC分类号： H05G2/003 ,  H05G2/005 ,  H05G2/006

    摘要： An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.

    摘要翻译： 公开了一种EUV等离子体形成靶递送系统和方法，其可以包括：目标液滴形成机构，其包括磁阻或电子限制材料，终止于输出孔的液体等离子体源材料通道; 将电荷施加到液滴形成喷射流或沿着选定路径离开通道的各个液滴的充电机构; 在输出孔之间的液滴偏转器和等离子体引发位置周期性地偏转来自所选择的路径的液滴;液体靶材料输送机构，包括具有输入开口和输出孔的液体靶材料输送通道; 产生在液体目标材料内的干扰力的电动干扰力产生机构，具有输出孔的液体目标传送液滴形成机构; 和/或围绕输出孔周边的润湿屏障。

    Laser output beam wavefront splitter for bandwidth spectrum control
    3.
    发明申请
    Laser output beam wavefront splitter for bandwidth spectrum control 有权

    公开(公告)号：US20050286598A1

    公开(公告)日：2005-12-29

    申请号：US10875662

    申请日：2004-06-23

    申请人： Richard Sandstrom ,  Daniel Brown ,  Alexander Ershov ,  Igor Fomenkov ,  William Partlo

    发明人： Richard Sandstrom ,  Daniel Brown ,  Alexander Ershov ,  Igor Fomenkov ,  William Partlo

    IPC分类号： G03F7/20 ,  H01S3/08 ,  H01S3/097 ,  H01S3/10 ,  H01S3/1055 ,  H01S3/13 ,  H01S3/22

    CPC分类号： H01S3/0812 ,  G03F7/70025 ,  G03F7/70575 ,  H01S3/08059 ,  H01S3/097 ,  H01S3/1055 ,  H01S3/1305

    摘要： An apparatus and method for providing bandwidth control in a narrow band short pulse duration gas discharge laser output light pulse beam producing system, producing a beam comprising laser output light pulses at a selected pulse repetition rate, is disclosed which may comprise a dispersive bandwidth selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a tuning mechanism operative to select at least one angle of incidence of the a laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic; the tuning mechanism comprising a plurality of incidence angle selection elements each defining an angle of incidence for a different spatially separated but not temporally separated portion of the laser light pulse to return from the dispersive center wavelength selection optic a laser light pulse comprising a plurality of spatially separated but not temporally separated portions, each portion having one of at least two different selected center wavelengths. The tuning mechanism may comprise a temporal angle of incidence selection element defining an angle of incidence for different temporally separated portions of the pulse to return from the dispersive bandwidth selection optic a laser beam comprising a plurality of temporally separated portions of each pulse, each temporally separated portion of each pulse having one of at least two different selected center wavelengths. The tuning mechanism may comprise a plurality of spatial incidence angle selection elements each defining an angle of incidence for a spatially separated but not temporally separated portion of the laser light pulse, and a plurality of temporal angle of incidence selection elements each defining at least a first angle of incidence for at least a first temporally separated portion of each spatially separated but not temporally separated portion of the pulse and a second angle of incidence for a second temporally separated but not spatially separated portion of each spatially separated portion of the pulse.

    Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source
    6.
    发明申请
    Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source 有权
    用于减少等离子体产生的碎片对EUV光源的内部部件的影响的系统和方法

    公开(公告)号：US20050269529A1

    公开(公告)日：2005-12-08

    申请号：US11174442

    申请日：2005-06-29

    申请人： Alexander Ershov ,  William Marx ,  Norbert Bowering ,  Bjorn Hansson ,  Oleh Khodykin ,  Igor Fomenkov ,  William Partlo

    发明人： Alexander Ershov ,  William Marx ,  Norbert Bowering ,  Bjorn Hansson ,  Oleh Khodykin ,  Igor Fomenkov ,  William Partlo

    IPC分类号： G03F7/20 ,  G01J1/00

    CPC分类号： B82Y10/00 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/7085 ,  G03F7/70916 ,  G21K1/06 ,  G21K2201/06 ,  H05G2/001

    摘要： Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV metrology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove deposited debris from the mirror. In another aspect, a device is disclosed for removing plasma generated debris from an EUV light source collector mirror having a different debris deposition rate at different zones on the collector mirror. In a particular aspect, an EUV collector mirror system may comprise a source of hydrogen to combine with Li debris to create LiH on a collector surface; and a sputtering system to sputter LiH from the collector surface. In another aspect, an apparatus for etching debris from a surface of a EUV light source collector mirror with a controlled plasma etch rate is disclosed.

    摘要翻译： 公开了用于减少等离子体产生的碎片对EUV光源的内部部件的影响的系统和方法。 在一个方面，提供了一种EUV计量监测器，其可以具有加热器以将内部多层过滤镜加热到足以从反射镜去除沉积的碎屑的温度。 在另一方面，公开了一种用于从收集器反射镜上的不同区域处具有不同碎屑沉积速率的EUV光源收集镜去除等离子体产生的碎屑的装置。 在特定方面，EUV收集器镜系统可以包括氢源以与Li碎片结合以在收集器表面上产生LiH; 以及从收集器表面溅射LiH的溅射系统。 在另一方面，公开了一种用于从具有受控等离子体蚀刻速率的EUV光源收集镜的表面蚀刻碎片的装置。

    Collector for EUV light source
    7.
    发明申请
    Collector for EUV light source 有权
    EUV光源收集器

    公开(公告)号：US20060131515A1

    公开(公告)日：2006-06-22

    申请号：US10798740

    申请日：2004-03-10

    申请人： William Partlo ,  John Algots ,  Gerry Blumenstock ,  Norbert Bowering ,  Alexander Ershov ,  Igor Fomenkov ,  Xiaojiang Pan

    发明人： William Partlo ,  John Algots ,  Gerry Blumenstock ,  Norbert Bowering ,  Alexander Ershov ,  Igor Fomenkov ,  Xiaojiang Pan

    IPC分类号： G01J1/00

    CPC分类号： H05G2/001 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062

    摘要： A method and apparatus for debris removal from a reflecting surface of an EUV collector in an EUV light source is disclosed which may comprise the reflecting surface comprises a first material and the debris comprises a second material and/or compounds of the second material, the system and method may comprise a controlled sputtering ion source which may comprise a gas comprising the atoms of the sputtering ion material; and a stimulating mechanism exciting the atoms of the sputtering ion material into an ionized state, the ionized state being selected to have a distribution around a selected energy peak that has a high probability of sputtering the second material and a very low probability of sputtering the first material. The stimulating mechanism may comprise an RF or microwave induction mechanism.

    摘要翻译： 公开了一种用于从EUV光源中的EUV收集器的反射表面去除碎屑的方法和装置，其可以包括反射表面，其包括第一材料，并且所述碎屑包括第二材料和/或第二材料的化合物，所述系统 并且方法可以包括受控的溅射离子源，其可以包括包含溅射离子材料的原子的气体; 以及将溅射离子材料的原子激发成离子化状态的刺激机构，所选择的离子化状态具有围绕选择的能量峰的分布，其具有溅射第二材料的可能性很高，并且溅射的可能性非常低 材料。 刺激机构可以包括RF或微波感应机构。

    EUV LIGHT SOURCE COLLECTOR EROSION MITIGATION
    8.
    发明申请
    EUV LIGHT SOURCE COLLECTOR EROSION MITIGATION 有权
    EUV光源收集器腐蚀减轻

    公开(公告)号：US20060289808A1

    公开(公告)日：2006-12-28

    申请号：US11238828

    申请日：2005-09-28

    申请人： William Partlo ,  Alexander Ershov ,  Igor Fomenkov

    发明人： William Partlo ,  Alexander Ershov ,  Igor Fomenkov

    IPC分类号： H01J61/62

    CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G01J1/429 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70983 ,  G21K1/062 ,  G21K2201/067 ,  H05G2/003

    摘要： An EUV light source collector erosion mitigation system and method is disclosed which may comprise a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interaction with materials created in an EUV light-creating plasma; a replacement material generator positioned to deliver replacement material comprising the capping material to the collector outer surface at a rate sufficient to replace the capping material removed due to the removing interaction. The replacement material generator may comprise a plurality of replacement material generators positioned to respectively deliver replacement material to a selected portion of the collector outer surface, which may comprise a sputtering mechanism sputtering replacement capping material onto the collector outer surface.

    摘要翻译： 公开了一种EUV光源收集器侵蚀缓解系统和方法，其可以包括收集器，其包括多层反射镜收集器，该多层反射镜收集器包括由封装材料构成的收集器外表面，该封盖材料由于与EUV发光等离子体中产生的材料的去除相互作用而被去除 ; 替代材料发生器定位成将包含封盖材料的替换材料以足以代替由于去除相互作用而去除的封盖材料的速率传送到收集器外表面。 替代材料发生器可以包括多个替换材料发生器，其被定位成分别将替代材料递送到集电器外表面的选定部分，其可以包括溅射机构将溅射替换封盖材料涂覆到集电器外表面上。

    LPP EUV light source
    9.
    发明申请
    LPP EUV light source 失效
    LPP EUV光源

    公开(公告)号：US20050205811A1

    公开(公告)日：2005-09-22

    申请号：US10979919

    申请日：2004-11-01

    申请人： William Partlo ,  Daniel Brown ,  Igor Fomenkov ,  Norbert Bowering ,  Curtis Rettig ,  Joseph MacFarlane ,  Alexander Ershov ,  Bjorn Hansson

    发明人： William Partlo ,  Daniel Brown ,  Igor Fomenkov ,  Norbert Bowering ,  Curtis Rettig ,  Joseph MacFarlane ,  Alexander Ershov ,  Bjorn Hansson

    IPC分类号： G01J1/00 ,  G03F7/20 ,  H01J65/04 ,  H05G2/00

    CPC分类号： B82Y10/00 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/008

    摘要： An apparatus and method is described for effectively and efficiently providing plasma irradiation laser light pulses in an LPP EUV light source which may comprise a laser initial target irradiation pulse generating mechanism irradiating a plasma initiation target with an initial target irradiation pulse to form an EUV generating plasma having an emission region emitting in-band EUV light; a laser plasma irradiation pulse generating mechanism irradiating the plasma with a plasma irradiation pulse after the initial target irradiation pulse so as to compress emission material in the plasma toward the emission region of the plasma. The plasma irradiation pulse may comprise a laser pulse having a wavelength that is sufficiently longer than a wavelength of the initial target irradiation pulse to have an associated lower critical density resulting in absorption occurring within the plasma in a region of the plasma defined by the wavelength of the plasma irradiation pulse sufficiently separated from an initial target irradiation site to achieve compression of the emission material, and the may compress the emission region. The laser plasma irradiation pulse may produce an aerial mass density in the ablating cloud of the plasma sufficient to confine the favorably emitting plasma for increased conversion efficiency. The deposition region for the plasma irradiation pulse may be is removed enough from the initial target surface so as to insure compression of the favorably emitting plasma. A high conversion efficiency laser produced plasma extreme ultraviolet (“EUV”) light source may comprise a laser initial target irradiation pulse generating mechanism irradiating a plasma initiation target with a target irradiation pulse to form an EUV generating plasma emitting in-band EUV light; a plasma tamper substantially surrounding the plasma to constrain the expansion of the plasma.

    摘要翻译： 描述了一种用于在LPP EUV光源中有效且有效地提供等离子体照射激光脉冲的装置和方法，其可以包括用初始目标照射脉冲照射等离子体引发目标的激光初始靶照射脉冲发生机构以形成产生EUV的等离子体 具有发射带内EUV光的发射区域; 激光等离子体照射脉冲发生机构在初始目标照射脉冲之后用等离子体照射脉冲照射等离子体，以将等离子体中的发射材料压缩到等离子体的发射区域。 等离子体照射脉冲可以包括具有足够长于初始靶照射脉冲的波长的波长的激光脉冲，以具有相关联的较低的临界密度，从而在由等离子体的波长定义的等离子体的区域内的等离子体内发生吸收 等离子体照射脉冲从初始目标照射位置充分分离，以实现发射材料的压缩，并且可以压缩发射区域。 激光等离子体照射脉冲可以在等离子体的消融云中产生足够的空气质量密度以限制有利的发射等离子体以提高转换效率。 可以从初始目标表面去除等离子体照射脉冲的沉积区域，以确保有利地发射等离子体的压缩。 高转换效率的激光产生的等离子体极紫外（“EUV”）光源可以包括激光初始靶照射脉冲发生机构，用目标照射脉冲照射等离子体引发目标，以形成产生EUV的发射等离子体的带内EUV光; 等离子体篡改基本上围绕等离子体以约束等离子体的膨胀。

    EUV light source
    10.
    发明申请
    EUV light source 有权
    EUV光源

    公开(公告)号：US20070158596A1

    公开(公告)日：2007-07-12

    申请号：US11647007

    申请日：2006-12-27

    申请人： I. Oliver ,  William Partlo ,  Igor Fomenkov ,  Alexander Ershov ,  Norbert Bowering ,  John Viatella ,  Dave Myers

    发明人： I. Oliver ,  William Partlo ,  Igor Fomenkov ,  Alexander Ershov ,  Norbert Bowering ,  John Viatella ,  Dave Myers

    IPC分类号： G01J3/10

    CPC分类号： G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

    摘要： An apparatus and method is described which may comprise a plasma produced extreme ultraviolet (“EUV”) light source multilayer collector which may comprise a plasma formation chamber; a shell within the plasma formation chamber in the form of a collector shape having a focus; the shell having a sufficient size and thermal mass to carry operating heat away from the multilayer reflector and to radiate the heat from the surface of the shell on a side of the shell opposite from the focus. The material of the shell may comprise a material selected from a group which may comprise silicon carbide, silicon, Zerodur or ULE glass, aluminum, beryllium, molybdenum, copper and nickel. The apparatus and method may comprise at least one radiative heater directed at the shell to maintain the steady state temperature of the shell within a selected range of operating temperatures.

    摘要翻译： 描述了可以包括可以包括等离子体形成室的等离子体产生的极紫外（“EUV”）光源多层收集器的装置和方法; 等离子体形成室内的壳体，具有焦点的收集器形状; 壳体具有足够的尺寸和热质量以将工作热量从多层反射器散开，并且在壳体的与焦点相对的一侧上从壳体的表面辐射热量。 壳的材料可以包括选自可以包括碳化硅，硅，Zerodur或ULE玻璃，铝，铍，钼，铜和镍的组的材料。 装置和方法可以包括指向壳体的至少一个辐射加热器，以将壳体的稳态温度维持在所选择的工作温度范围内。