Method and device including transistor component having a field electrode
    1.
    发明授权
    Method and device including transistor component having a field electrode 有权
    包括具有场电极的晶体管部件的方法和装置

    公开(公告)号:US08072028B2

    公开(公告)日:2011-12-06

    申请号:US12605933

    申请日:2009-10-26

    IPC分类号: H01L29/76

    摘要: A transistor component and method of forming a transistor component. One embodiment provides a semiconductor arrangement including a semiconductor body having a at least one first trench, a first field electrode arranged in the lower trench section of the at least one first trench and being insulated from the semiconductor body by a field electrode dielectric. A dielectric layer is formed on the first field electrode in the at least one first trench, including depositing a dielectric material on a first side of the semiconductor body and on the field plate at a higher deposition rate than on sidewalls of the at least one first trench.

    摘要翻译: 晶体管元件及形成晶体管元件的方法。 一个实施例提供一种半导体装置,其包括半导体本体,该半导体本体具有至少一个第一沟槽,第一场电极,布置在至少一个第一沟槽的下沟槽部分中,并且通过场电极电介质与半导体本体绝缘。 在所述至少一个第一沟槽中的所述第一场电极上形成电介质层,包括在所述半导体主体的第一侧和所述场板上以比所述至少一个第一沟槽的侧壁更高的沉积速率沉积介电材料 沟。

    METHOD AND DEVICE INCLUDING TRANSISTOR COMPONENT HAVING A FIELD ELECTRODE
    3.
    发明申请
    METHOD AND DEVICE INCLUDING TRANSISTOR COMPONENT HAVING A FIELD ELECTRODE 有权
    包括具有场电极的晶体管成分的方法和装置

    公开(公告)号:US20120040505A1

    公开(公告)日:2012-02-16

    申请号:US13281829

    申请日:2011-10-26

    IPC分类号: H01L21/336 H01L21/28

    摘要: A transistor component and method of forming a transistor component. One embodiment provides a semiconductor arrangement including a semiconductor body having a at least one first trench, a first field electrode arranged in the lower trench section of the at least one first trench and being insulated from the semiconductor body by a field electrode dielectric. A dielectric layer is formed on the first field electrode in the at least one first trench, including depositing a dielectric material on a first side of the semiconductor body and on the field plate at a higher deposition rate than on sidewalls of the at least one first trench.

    摘要翻译: 晶体管元件及形成晶体管元件的方法。 一个实施例提供一种半导体装置,其包括半导体本体,该半导体本体具有至少一个第一沟槽,第一场电极,布置在至少一个第一沟槽的下沟槽部分中,并且通过场电极电介质与半导体本体绝缘。 在所述至少一个第一沟槽中的所述第一场电极上形成电介质层,包括在所述半导体主体的第一侧和所述场板上以比所述至少一个第一沟槽的侧壁更高的沉积速率沉积介电材料 沟。

    METHOD AND DEVICE INCLUDING TRANSISTOR COMPONENT HAVING A FIELD ELECTRODE
    4.
    发明申请
    METHOD AND DEVICE INCLUDING TRANSISTOR COMPONENT HAVING A FIELD ELECTRODE 有权
    包括具有场电极的晶体管成分的方法和装置

    公开(公告)号:US20110095360A1

    公开(公告)日:2011-04-28

    申请号:US12605933

    申请日:2009-10-26

    摘要: A transistor component and method of forming a transistor component. One embodiment provides a semiconductor arrangement including a semiconductor body having a at least one first trench, a first field electrode arranged in the lower trench section of the at least one first trench and being insulated from the semiconductor body by a field electrode dielectric. A dielectric layer is formed on the first field electrode in the at least one first trench, including depositing a dielectric material on a first side of the semiconductor body and on the field plate at a higher deposition rate than on sidewalls of the at least one first trench.

    摘要翻译: 晶体管元件及形成晶体管元件的方法。 一个实施例提供一种半导体装置,其包括半导体本体,该半导体本体具有至少一个第一沟槽,第一场电极,布置在至少一个第一沟槽的下沟槽部分中,并且通过场电极电介质与半导体本体绝缘。 在所述至少一个第一沟槽中的所述第一场电极上形成电介质层,包括在所述半导体主体的第一侧和所述场板上以比所述至少一个第一沟槽的侧壁更高的沉积速率沉积介电材料 沟。