Film carrier semiconductor device
    2.
    发明授权
    Film carrier semiconductor device 失效
    薄膜载体半导体器件

    公开(公告)号:US5726489A

    公开(公告)日:1998-03-10

    申请号:US531271

    申请日:1995-09-20

    摘要: A film carrier semiconductor device 10 comprises a semiconductor bare chip 20 and a carrier film 30. Chip electrodes 21 are provided on the bare chip 20. Each chip electrode 21 is electrically connected to the carrier film 30. Bump electrodes 37 are formed and arranged as an array on the carrier film 30 on the side of the other surface 31b of the film 30. Interconnection layers 32 are provided on the carrier film 30 to connect some of the chip electrodes 21b to the bump electrodes 37a and 37b. The semiconductor device 10 also comprises a noise blocking layer 60 provided on the carrier film 30 outside the chip mounting region. The noise blocking layer 60 is electrically connected to at least one of the chip electrodes 21a.

    摘要翻译: 膜载体半导体器件10包括半导体裸芯片20和载体膜30.芯片电极21设置在裸芯片20上。每个芯片电极21电连接到载体膜30.凸起电极37形成并布置为 在膜30的另一个表面31b侧的载体膜30上的阵列。在载体膜30上设置有互连层32,以将一些芯片电极21b连接到凸块电极37a和37b。 半导体器件10还包括设置在芯片安装区域外部的载体膜30上的噪声阻挡层60。 噪声阻挡层60电连接到芯片电极21a中的至少一个。

    Method for inspecting semiconductor chip bonding pads using infrared rays
    6.
    发明授权
    Method for inspecting semiconductor chip bonding pads using infrared rays 失效
    使用红外线检查半导体芯片接合焊盘的方法

    公开(公告)号:US06339337B1

    公开(公告)日:2002-01-15

    申请号:US09048045

    申请日:1998-03-26

    IPC分类号: G01R3102

    CPC分类号: G01R31/311

    摘要: An infrared ray test for a semiconductor chip is conducted by irradiating infrared ray onto a bottom surface of a semiconductor chip, receiving the infrared ray reflected from a bonding pad and displaying the image of the bonding pad on a monitor. The image obtained from the infrared ray has information whether the bonding pad itself or a portion of the silicon substrate underlying the bonding pad has a defect or whether or not there is a deviation of the bonding pad with respect to the bump.

    摘要翻译: 通过将红外线照射到半导体芯片的底面上,接收从接合焊盘反射的红外线并将接合焊盘的图像显示在监视器上,进行半导体芯片的红外线测试。 从红外线获得的图像具有关于焊盘本身或接合焊盘下方的硅衬底的一部分是否具有缺陷的焊盘的位置,或者接合焊盘相对于凸块是否存在偏差的信息。

    Carrier film with peripheral slits
    7.
    发明授权
    Carrier film with peripheral slits 失效
    带外围狭缝的载体膜

    公开(公告)号:US5757068A

    公开(公告)日:1998-05-26

    申请号:US533208

    申请日:1995-09-25

    摘要: There is provided a carrier film (130, 140) having a plurality of slits (135) formed by the periphery of a chip mounting region (138) on which a semiconductor chip 10 is to be mounted. The chip mounting region is rectangular and four slits are formed along the four sides of the chip mounting region. The slits may be formed by means of punching with a die or etching.

    摘要翻译: 提供了一种载体膜(130,140),其具有由芯片安装区域(138)的周围形成的多个狭缝(135),半导体芯片10将要安装在该芯片安装区域周围。 芯片安装区域是矩形的,并且沿着芯片安装区域的四个边缘形成四个狭缝。 狭缝可以通过用模具冲压或蚀刻来形成。

    Semiconductor device
    8.
    发明授权
    Semiconductor device 失效
    半导体器件

    公开(公告)号:US06794750B2

    公开(公告)日:2004-09-21

    申请号:US09222524

    申请日:1998-12-28

    申请人: Shuichi Matsuda

    发明人: Shuichi Matsuda

    IPC分类号: H01L2343

    摘要: A semiconductor device equipped with a TAB (tape automated bonding) tape. A desired pattern of wiring is formed on one surface of the TAB tape and a semiconductor chip having two or more chip electrodes is disposed on the other surface of the TAB tape. The wiring and the chip electrodes are electrically interconnected via bumps that are formed in through-holes of the wiring in conforming relationship with the chip electrodes. This prevents fault connection between the chip electrodes and the bumps.

    摘要翻译: 一种配有TAB(胶带自动贴合)胶带的半导体器件。 在TAB带的一个表面上形成所需的布线图案,并且在TAB带的另一个表面上设置具有两个或更多个芯片电极的半导体芯片。 布线和芯片电极通过与芯片电极成一致的关系形成在布线的通孔中的凸块电连接。 这防止了芯片电极和凸块之间的故障连接。

    Method of forming a photomask material
    9.
    发明授权
    Method of forming a photomask material 失效
    形成光掩模材料的方法

    公开(公告)号:US4792461A

    公开(公告)日:1988-12-20

    申请号:US64392

    申请日:1987-06-22

    摘要: A silicide film of oxidized transition metal 3 formed on a transparent substrate 1 has a low reflectance and in consequence, a high resolution can be obtained and dry etching thereof can be easily done. In addition, since said silicide film 3 has good adhesion to a transparent substrate 1, file patterns therein do not peel off at the time of rinsing the mask.

    摘要翻译: 形成在透明基板1上的氧化过渡金属3的硅化物膜具有低反射率,因此可以获得高分辨率,并且可以容易地进行干蚀刻。 此外,由于所述硅化物膜3对透明基板1具有良好的粘附性,因此在清洗掩模时,其中的文件图案不会剥落。