Forming vias using sacrificial material
    6.
    发明申请
    Forming vias using sacrificial material 失效
    使用牺牲材料形成通孔

    公开(公告)号:US20090004841A1

    公开(公告)日:2009-01-01

    申请号:US11824212

    申请日:2007-06-29

    IPC分类号: H01L21/44

    摘要: In one embodiment, the present invention includes a method for forming a sacrificial material layer, patterning it to obtain a first patterned sacrificial material layer, embedding the first patterned sacrificial material layer into a dielectric material, treating the first patterned sacrificial material layer to remove it to thus provide a patterned dielectric layer having a plurality of openings in which vias may be formed. Other embodiments are described and claimed.

    摘要翻译: 在一个实施例中,本发明包括一种形成牺牲材料层的方法,将其图形化以获得第一图案化牺牲材料层,将第一图案化牺牲材料层嵌入电介质材料中,处理第一图案化牺牲材料层以去除它 从而提供具有多个开口的图案化电介质层,其中可以形成通孔。 描述和要求保护其他实施例。