摘要:
An organic thin film consisting essentially of an organic compound is formed on a substrate surface by vacuum vapor deposition by exposing the organic compound as a vapor source to a laser beam having an energy level corresponding to that of the chemical bond of the organic compound, thereby sputtering the organic compound onto a substrate surface in vacuum and forming the organic thin film thereon. When a light or radiation-sensitive organic compound is used as the vapor source, a light or radiation-sensitive resist film is formed. The thin film thus formed retains the original chemical structure of the vapor source, and has a good flatness. Resolvability of resist film is improved owing to the absence of pin holes and particulate matters. A resist film having a higher sensitivity and a better contrast is formed by heating the substrate during the vapor deposition.
摘要:
A thin film of a-Si, SiO.sub.2 or Si.sub.3 N.sub.4 can be formed on a substrate using a starting material gas containing at least a polysilane of the formula Si.sub.n H.sub.2n+2 (n=2, 3 or 4) by a chemical vapor deposition method with irradiation with light with high film forming rate at lower temperatures.
摘要翻译:可以通过化学气相沉积法使用至少含有式SinH2n + 2(n = 2,3或4)的聚硅烷的原料气体在基板上形成a-Si,SiO 2或Si 3 N 4的薄膜 具有在较低温度下具有高成膜速率的光。
摘要:
A photosensitive resin composition comprising (a) 10 to 90 parts by weight of at least one polymerizable monomer of the formula: ##STR1## (R is defined in the specification), (b) 90 to 10 parts by weight of at least one compound selected from the group consisting of epoxy-acrylate resins, 1,2-polybutadiene resins, polyester resins and organopolysiloxanes, all having one or more acryloyloxy or methacryloyloxy groups in their molecular end or ends, and (c) 0.05 to 5 parts by weight of a photosensitizer based on 100 parts by weight of the sum of the components (a) and (b) shows slight shrinkage and the resulting coating film is good in adhesive properties and mechanical strength.
摘要:
A microwave plasma enhanced CVD method and apparatus wherein a microwave is applied, after expanded, over a greater area than the area in which a desired thin film is to be formed. With this arrangement, uniform microwave application is assured to produce uniform plasma over a wide area. This enables realization of a large size liquid crystal display.
摘要:
A working machine having a blade is disclosed, the blade comprising a body blade and an extension blade, the body blade having a body-side mounting portion having a body-side mounting hole and the extension blade having an extension-side mounting portion having an extension-side mounting hole, the body-side mounting hole and the extension-side mounting hole being formed vertically through the body-side mounting portion and the extension-side mounting portion, respectively. Further provided are mounting members adapted to be inserted into the mounting holes to connect the body blade and the extension blade with each other, and positioning members and a cutout portion for aligning the positions of the body-side mounting hole and the extension-side mounting hole vertically with each other and inhibiting the body-side mounting portion and the extension-side mounting portion from pivoting around the mounting members.
摘要:
A method of manufacturing an LCD device which includes a gate line having an effective display area which includes an aluminum alloy layer and an aluminum oxide layer. The gate line also includes a gate terminal portion which is made up of the same aluminum alloy layer with a molybdenum alloy layer formed thereon. To form this structure, an insulating substrate of the LCD device, with the laminated structure of the aluminum alloy layer and the molybdenum layer, is immersed in an electrolytic solution. During the immersion, the molybdenum layer is etched off the aluminum alloy in the effective displaying area, while the etching is prevented in the gate terminal area by a protective layer. Following this, the aluminum oxide layer is formed over the aluminum alloy in the effected display area while the device is still immersed in the electrolytic solution.
摘要:
A thin film transistor structure for use in driving liquid crystal display elements has a semiconductor active layer, a control electrode layer underlying the active layer with an insulating layer interposed therebetween and first and second main electrode layers formed on or above the active layer in a spaced relation with each other to define a channel in the active layer in cooperation with the control electrode layer between the main electrode layers. The active layer has a first peripheral edge portion generally perpendicular to the direction of the channel and a second peripheral edge portion generally not perpendicular to the direction of the channel. The first and/or second main electrode layer extends over the first and/or second peripheral edge portion of the active layer such that at least a part of the first peripheral edge portion and/or at least part of the second peripheral edge portion of the active layer has its side face directly covered with the main electrode layer.
摘要:
A resist is peeled without leaving a residue after peeling, by bringing a resist-peeling liquid comprising a primary aliphatic amine of 2-6 carbon atoms into contact with the surface of an etched novolak positive photoresist, and removing the resist-peeling liquid containing the thus peeled resist from the surface of the etched resist. The used resist-peeling liquid can easily be recovered and regenerated.
摘要:
A metal thin film is deposited on predetermined portions of an underlayer of a substrate by a chemical deposition method with good selectivity, good reproducibility and high deposition rate by preventing hydrogen atoms from the adhesion to portions of the substrate not to be deposited with a metal using a special means for heating only the substrate or a special gas flow controlling means.
摘要:
An electrode material for semi-conductor device such as solar cells comprises Ag powders, at least one metal of zirconium, hafnium, vanadium, niobium, and tantalum, an organic binder, and an organic solvent, and, if necessary, glass, Pd powders and Pt powders.The electrodes are prepared from the electrode material by printing, drying and firing at a low temperature and have a low contact resistance without any junction breakage or increase in leak current.