Display device
    1.
    发明授权

    公开(公告)号:US10319298B2

    公开(公告)日:2019-06-11

    申请号:US15815774

    申请日:2017-11-17

    Abstract: In a display element such as an organic EL element, deterioration progresses due to light emission, and emission luminance is lowered even if the same voltage is applied to the display element. Therefore, use over time causes variations in luminance of each pixel, thereby a so-called “image burn-in” phenomenon occurs. Given this factor, the invention provides a display device which can reduce the difference in deterioration of a display element in each pixel and suppress variations in light emission of a display element in a pixel. It is prevented that only a specific pixel has a long accumulated lighting time. For that purpose, a gray scale of a display pattern is changed to prevent the difference in deterioration of display element in pixels from increasing. Alternatively, a specific display pattern is prevented from being fixedly displayed in a specific region. Further alternatively, a pixel lagging behind in deterioration is deteriorated so that the accumulated lighting time of pixels is equal to each other.

    Semiconductor device
    4.
    发明授权

    公开(公告)号:US09391209B2

    公开(公告)日:2016-07-12

    申请号:US14024962

    申请日:2013-09-12

    CPC classification number: H01L29/7869 H01L29/41733 H01L29/78606

    Abstract: An object is to provide a semiconductor device including an oxide semiconductor in which miniaturization is achieved while favorable characteristics are maintained. The semiconductor includes an oxide semiconductor layer, a source electrode and a drain electrode in contact with the oxide semiconductor layer, a gate electrode overlapping with the oxide semiconductor layer, a gate insulating layer provided between the oxide semiconductor layer and the gate electrode, and an insulating layer provided in contact with the oxide semiconductor layer. A side surface of the oxide semiconductor layer is in contact with the source electrode or the drain electrode. An upper surface of the oxide semiconductor layer overlaps with the source electrode or the drain electrode with the insulating layer interposed between the oxide semiconductor layer and the source electrode or the drain electrode.

    Display device and manufacturing method thereof
    7.
    发明授权
    Display device and manufacturing method thereof 有权
    显示装置及其制造方法

    公开(公告)号:US09112043B2

    公开(公告)日:2015-08-18

    申请号:US14151183

    申请日:2014-01-09

    Inventor: Yasuyuki Arai

    Abstract: A display device includes a first wiring functioning as a gate electrode formed over a substrate, a gate insulating film formed over the first wiring, a second wiring and an electrode layer provided over the gate insulating film, and a high-resistance oxide semiconductor layer formed between the second wiring and the electrode layer are included. In the structure, the second wiring is formed using a stack of a low-resistance oxide semiconductor layer and a conductive layer over the low-resistance oxide semiconductor layer, and the electrode layer is formed using a stack of the low-resistance oxide semiconductor layer and the conductive layer which is stacked so that a region functioning as a pixel electrode of the low-resistance oxide semiconductor layer is exposed.

    Abstract translation: 显示装置包括用作形成在基板上的栅电极的第一布线,形成在第一布线上的栅极绝缘膜,设置在栅极绝缘膜上的第二布线和电极层,以及形成的高电阻氧化物半导体层 包括在第二布线和电极层之间。 在该结构中,第二布线使用低电阻氧化物半导体层上的低电阻氧化物半导体层和导电层的堆叠形成,并且使用低电阻氧化物半导体层的堆叠形成电极层 并且层叠的导电层露出作为低电阻氧化物半导体层的像素电极的区域。

    Photoelectric conversion device and manufacturing method thereof
    8.
    发明授权
    Photoelectric conversion device and manufacturing method thereof 有权
    光电转换装置及其制造方法

    公开(公告)号:US09099579B2

    公开(公告)日:2015-08-04

    申请号:US14331664

    申请日:2014-07-15

    Abstract: A photoelectric conversion device with a novel anti-reflection structure. In the photoelectric conversion device, a front surface of a semiconductor substrate which serves as a light-receiving surface is covered with a group of whiskers (a group of nanowires) so that surface reflection is reduced. In other words, a semiconductor layer which has a front surface where crystals grow so that whiskers are formed is provided on the light-receiving surface side of the semiconductor substrate. The semiconductor layer has a given uneven structure, and thus has effects of reducing reflection on the front surface of the semiconductor substrate and increasing conversion efficiency.

    Abstract translation: 具有抗反射结构的光电转换装置。 在光电转换装置中,作为光接收面的半导体基板的前表面被一组晶须(一组纳米线)覆盖,从而表面反射减小。 换句话说,在半导体基板的受光面侧设置半导体层,该半导体层具有晶体长大的前表面,使晶须形成。 半导体层具有给定的不均匀结构,因此具有减少半导体衬底的前表面上的反射并提高转换效率的效果。

    Photoelectric Conversion Device and Manufacturing Method Thereof
    10.
    发明申请
    Photoelectric Conversion Device and Manufacturing Method Thereof 审中-公开
    光电转换装置及其制造方法

    公开(公告)号:US20140326307A1

    公开(公告)日:2014-11-06

    申请号:US14331664

    申请日:2014-07-15

    Abstract: A photoelectric conversion device with a novel anti-reflection structure. In the photoelectric conversion device, a front surface of a semiconductor substrate which serves as a light-receiving surface is covered with a group of whiskers (a group of nanowires) so that surface reflection is reduced. In other words, a semiconductor layer which has a front surface where crystals grow so that whiskers are formed is provided on the light-receiving surface side of the semiconductor substrate. The semiconductor layer has a given uneven structure, and thus has effects of reducing reflection on the front surface of the semiconductor substrate and increasing conversion efficiency.

    Abstract translation: 具有抗反射结构的光电转换装置。 在光电转换装置中,作为光接收面的半导体基板的前表面被一组晶须(一组纳米线)覆盖,从而表面反射减小。 换句话说,在半导体基板的受光面侧设置半导体层,该半导体层具有晶体长大的前表面,使晶须形成。 半导体层具有给定的不均匀结构,因此具有减少半导体衬底的前表面上的反射并提高转换效率的效果。

Patent Agency Ranking