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    ORBITING INDEXABLE BELT POLISHING STATION FOR CHEMICAL MECHANICAL POLISHING
    1.
    发明申请
    ORBITING INDEXABLE BELT POLISHING STATION FOR CHEMICAL MECHANICAL POLISHING 失效
    用于化学机械抛光的可索引的皮带抛光站

    公开(公告)号：US20050009452A1

    公开(公告)日：2005-01-13

    申请号：US10711229

    申请日：2004-09-02

    申请人： Saket Chadda ,  Timothy Dyer ,  Clinton Fruitman

    发明人： Saket Chadda ,  Timothy Dyer ,  Clinton Fruitman

    IPC分类号： B24B21/04 ,  B24B37/10 ,  B24B1/00

    CPC分类号： B24B37/105 ,  B24B21/04

    摘要： An apparatus for planarizing a workpiece has a web with a face which is positioned adjacent the workpiece during planarization. At least one tension assembly is configured to maintain tension of the web. An orbiting assembly is configured to orbit the web relative to the workpiece. The apparatus for planarizing a workpiece may include first and second polishing surfaces where the first polishing surface has a substantially horizontal web with a face which is positioned adjacent the workpiece during the planarization process. The apparatus may also have a rotatable carousel and at least two workpiece carriers suspended from the carousel. Each of the carriers is configured to carry a workpiece and press the workpiece against one of the polishing surfaces while causing relative motion between the workpiece and the polishing surface. An apparatus for planarizing a workpiece which includes a plurality of polishing stations is also disclosed. At least one of the polishing stations has a web with a first face which is positioned adjacent the workpiece during planarization . The apparatus also includes an orbiting assembly configured to orbit the web relative to the workpiece.

    摘要翻译： 用于平坦化工件的装置具有在平坦化期间具有与工件相邻定位的面的腹板。 至少一个张力组件被配置成保持卷材的张力。 轨道组件被配置为相对于工件来绕轨道轨道。 用于平坦化工件的设备可以包括第一和第二抛光表面，其中第一抛光表面具有基本上水平的腹板，其中在平坦化过程期间邻近工件定位面。 该装置还可以具有可旋转的转盘和至少两个从转盘中悬挂的工件载体。 每个载体构造成承载工件并将工件压靠在抛光表面之一上，同时引起工件和抛光表面之间的相对运动。 还公开了一种用于平坦化包括多个抛光站的工件的设备。 抛光站中的至少一个具有在平坦化期间具有与工件相邻定位的第一面的腹板。 该装置还包括构造成相对于工件使幅材轨道运动的轨道组件。

    Line narrowing module
    6.
    发明申请
    Line narrowing module 有权

    公开(公告)号：US20060114957A1

    公开(公告)日：2006-06-01

    申请号：US11000684

    申请日：2004-11-30

    申请人： J. Martin Algots ,  Robert Bergstedt ,  Walter Gillespie ,  Vladimir Kulgeyko ,  William Partlo ,  German Rylov ,  Richard Sandstrom ,  Brian Strate ,  Timothy Dyer

    发明人： J. Martin Algots ,  Robert Bergstedt ,  Walter Gillespie ,  Vladimir Kulgeyko ,  William Partlo ,  German Rylov ,  Richard Sandstrom ,  Brian Strate ,  Timothy Dyer

    IPC分类号： H01S3/22

    CPC分类号： H01S3/1055 ,  G03F7/70025 ,  G03F7/70041 ,  H01S3/005 ,  H01S3/036 ,  H01S3/08 ,  H01S3/08004 ,  H01S3/08059 ,  H01S3/097 ,  H01S3/106 ,  H01S3/2251

    摘要： A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic; a second tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse by changing the position of the dispersive center wavelength selection optic relative to the nominal optical path of the line narrowing module; wherein the second tuning mechanism coarsely selects a value for the center wavelength and the first tuning mechanism more finely selects the value for the center wavelength. The apparatus and method may further comprise at least one beam expanding and redirecting prism in the optical path of the line narrowing module; the first tuning mechanism selecting an angle of incidence of the at least a first spatially defined portion of the laser light pulse beam by changing the position of the at least one beam expanding prism relative to the nominal optical path of the line narrowing module. The first and second tuning mechanisms may be controlled by a center wavelength controller during a burst based upon feedback from a center wavelength detector detecting the center wavelength of at least one other pulse in the burst of pulses and the controller providing the feedback based upon an algorithm employing the detected center wavelength for the at least one other pulse in the burst. The first tuning mechanism may comprise an electro-mechanical course positioning mechanism and a fine positioning mechanism comprising an actuatable material that changes position or shape when actuated.

    Gas discharge laser chamber improvements
    9.
    发明申请
    Gas discharge laser chamber improvements 有权

    公开(公告)号：US20050226301A1

    公开(公告)日：2005-10-13

    申请号：US10815387

    申请日：2004-03-31

    申请人： William Partlo ,  Yoshiho Amada ,  James Carmichael ,  Timothy Dyer ,  Walter Gillespie ,  Bryan Moosman ,  Richard Morton ,  Curtis Rettig ,  Brian Strate ,  Thomas Steiger ,  Fedor Trintchouk ,  Richard Ujazdowski

    发明人： William Partlo ,  Yoshiho Amada ,  James Carmichael ,  Timothy Dyer ,  Walter Gillespie ,  Bryan Moosman ,  Richard Morton ,  Curtis Rettig ,  Brian Strate ,  Thomas Steiger ,  Fedor Trintchouk ,  Richard Ujazdowski

    IPC分类号： H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/041 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/22 ,  H01S3/225

    CPC分类号： H01S3/036 ,  H01S3/0384 ,  H01S3/041 ,  H01S3/0971 ,  H01S3/225

    摘要： A method and apparatus if disclosed which may comprise a high power high repetition rate gas discharge laser UV light source which may comprise: a gas discharge chamber comprising an interior wall comprising a vertical wall and an adjacent bottom wall; a gas circulation fan creating a gas flow path adjacent the interior vertical wall and the adjacent bottom wall; an in-chamber dust trap positioned a region of low gas flow, which may be along an interior wall and may comprise at least one meshed screen, e.g., a plurality of meshed screens, which may comprise at least two different gauge meshed screens. The dust trap may extend along the bottom interior wall of the chamber and/or a vertical portion of the interior wall. The dust trap may comprise a first meshed screen having a first gauge; a second meshed screen having a second gauge smaller than the first gauge; and the second meshed screen intermediate the first meshed screen and the interior wall. The chamber may comprise a plurality of dust collecting recesses in at least one of the vertical interior wall and the bottom wall of the chamber which may be selected from a group comprising a one-part recess and a multi-part recess, which may comprise two sections angled with respect to each other. The dust trap may comprise a pressure trap positioned between a portion of a main insulator and an interior wall of the chamber. The chamber may comprise a gas circulating fan comprising a cross-flow fan with a fan cutoff that may comprise a vortex control pocket. The chamber may comprise a preionization mechanism comprising a preionization tub containing a ground rod within an elongated opening in the preionization tube that may comprise a compliant member, an automatic preionization shut-off mechanism, a preionization onset control mechanism and/or a focusing element. The chamber may comprise an elongated baffle plate that may comprise a plurality of pyramidal structures including varying numbers of generally pyramidal elements and oriented in groups of varying numbers of generally pyramidal elements and oriented along and transverse to the longitudinal axis. Acoustic resonances within the chamber may also be reduced by introducing an artificial jitter into the timing of the laser discharges varying the inter-pulse period randomly or in a repeating pattern from pulse to pulse within a burst.

    Halogen gas discharge laser electrodes
    10.
    发明申请
    Halogen gas discharge laser electrodes 有权

    公开(公告)号：US20050047471A1

    公开(公告)日：2005-03-03

    申请号：US10877737

    申请日：2004-06-25

    申请人： Thomas Steiger ,  Richard Ujazdowski ,  Timothy Dyer ,  Thomas Duffey ,  Walter Gillespie ,  Bryan Moosman ,  Richard Morton ,  Brian Strate

    发明人： Thomas Steiger ,  Richard Ujazdowski ,  Timothy Dyer ,  Thomas Duffey ,  Walter Gillespie ,  Bryan Moosman ,  Richard Morton ,  Brian Strate

    IPC分类号： H01S20060101 ,  H01S3/038 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/22 ,  H01S3/225

    CPC分类号： H01S3/225 ,  H01S3/0381 ,  H01S3/0385 ,  H01S3/0388 ,  H01S3/0971 ,  H01S3/09713

    摘要： A method and apparatus for operating a gas discharge laser is disclosed which may comprise a laser chamber containing a laser gas, the laser gas comprising a halogen, two elongated electrode elements defining a cathode and an anode, each of the cathode and anode having an elongated discharge receiving region having a discharge receiving region width defining a width of an electric discharge between the electrode elements in the laser gas, the discharge receiving region defining two longitudinal edges, and the anode comprising: a first elongated anode portion comprising a first anode material defining a first anode material erosion rate, located entirely within the discharge receiving region of the anode, a pair of second elongated anode portions comprising a second anode material defining a second anode material erosion rate, respectively located on each side of the first anode portion and at least partially within the discharge receiving region; an elongated electrode center base portion integral with the first elongated anode portion; and wherein each of the respective pair of second elongated anode portions is mechanically bonded to the center base portion. The electrode element may comprise a cathode. The first and second materials may be different materials such as different brass alloys with different erosion rates in the halogen gas. The first elongated cathode portion may comprising a first cathode material, located entirely within the discharge receiving region comprising a first portion of an ellipse intersecting elongated side walls, with a bottom wall opposite the portion of the ellipse; and a pair of second elongated cathode side portions comprising a second cathode material with the intersection of each respective second cathode portion and the portion of the ellipse forming the discharge receiving region of the first cathode portion, forming respective ellipsoidal extensions of the first portion. The members may be mechanically bonded to the center base portion. Some may be diffusion bonded to the center base portion and/or each other. The electrode assembly may have a hooded discharge receiving region extension at respective ends of the electrode and the electrode portion may be formed with or bonded to the center base portion and may have slanted side walls.