Semiconductor device and method of manufacturing the same
    6.
    发明授权
    Semiconductor device and method of manufacturing the same 失效
    半导体装置及其制造方法

    公开(公告)号:US5530289A

    公开(公告)日:1996-06-25

    申请号:US286165

    申请日:1994-08-05

    摘要: A semiconductor device includes a rectangular wiring substrate and a plurality of semiconductor elements having connecting electrodes such as projecting electrodes connected to the wiring substrate. Even though the wiring substrate is deformed, the semiconductor elements and connecting electrodes are prevented from being broken, thereby maintaining the reliability of the semiconductor device for a long period of time. A buffer region constituted by grooves is formed in that middle part of the undersurface of the rectangular wiring substrate which is located between both the long sides of the wiring substrate and between both the short sides thereof. The semiconductor elements are formed outside the buffer region. The connecting electrodes of the semiconductor elements are connected to a wiring pattern on the surface of the wiring substrate, with the result that the semiconductor elements are mounted on the wiring substrate. The deformation of the buffer region absorbs a deformation of that part of the wiring substrate which is located near the semiconductor elements mounted on the wiring substrate thereby to protect the semiconductor elements.

    摘要翻译: 半导体器件包括矩形布线基板和多个具有诸如连接到布线基板的突出电极的连接电极的半导体元件。 即使布线基板变形,也可以防止半导体元件和连接电极的断裂,从而保持半导体器件的长时间的可靠性。 在矩形布线基板的下表面的位于布线基板的两个长边之间的两个短边之间的中间部分处形成有由凹槽构成的缓冲区域。 半导体元件形成在缓冲区的外部。 半导体元件的连接电极与布线基板的表面上的布线图形连接,结果半导体元件安装在布线基板上。 缓冲区域的变形吸收位于布线基板上的半导体元件附近的布线基板的那部分的变形,从而保护半导体元件。