摘要:
The present invention provides a package structure and a method for forming the same. The structure comprises a substrate with contact pads and through holes filled with conducting metals for performing heat dissipation and ground shielding A chip with bonding pads is attached on the contact pad by an adhesive with high thermal conductivity to achieve heat dissipation. A RDL is formed on the substrate and the chip to couple the bonding pad and the contact pad formed on the substrate. The structure of present invention can improve the thickness thereof, and the heat dissipation and ground shielding of the structure are enhanced. Furthermore, the structure can achieve package on package (PoP) structure.
摘要:
The present invention comprises a first substrate with a die formed on a die metal pad, a first and a second wiring circuits formed on the surfaces of the first substrate. A second substrate has a die opening window for receiving the die, a third wiring circuit is formed on top surface of the second substrate and a fourth wiring circuit on bottom surface of the second substrate. An adhesive material is filled into the gap between back side of the die and top surface of the first substrate and between the side wall of the die and the side wall of the die receiving through hole and the bottom side of the second substrate. During the formation, laser is introduced to cut the backside of the first substrate and an opening hole is formed in the first substrate to expose a part of the backside of the Au or Au/Ag metal layer of chip/die.
摘要:
The present invention provides a structure of multi-chips package comprising: a substrate with a die receiving cavity formed within an upper surface of the substrate and a first through holes structure, wherein terminal pads are formed under the first through holes structure. A first die is disposed within the die receiving cavity and a first dielectric layer is formed on the first die and the substrate. A first re-distribution conductive layer (RDL) is formed on the first dielectric layer. A second dielectric layer is formed over the first RDL. A third dielectric layer is formed under a second die. A second re-distribution conductive layer (RDL) is formed under the third dielectric layer. A fourth dielectric layer is formed under the second RDL. Conductive bumps are coupled to the first RDL and the second RDL. A surrounding material surrounds the second die. The second die is coupled to the first die through the first RDL, second RDL and the conductive bumps.
摘要:
The present invention discloses a structure of package comprising a substrate with at least one die receiving through holes, a conductive connecting through holes structure and a contact pads on both side of substrate. At least one die is disposed within the die receiving through holes. A first material is formed under the die and second material is formed filled in the gap between the die and sidewall of the die receiving though holes. Dielectric layers are formed on the surface of both side of the die and the substrate. Redistribution layers (RDL) are formed on the both sides and coupled to the contact pads. A protection bases are formed over the RDLs.
摘要:
The image sensor package with dual substrates comprises a first substrate with a die receiving opening and a plurality of first through hole penetrated through the first substrate; a second substrate with a die opening window and a plurality of second through hole penetrated through the second substrate, formed on the first substrate. A part of the second wiring pattern is coupled to a part of the third wiring pattern; an image die having conductive pads and sensing array received within the die receiving opening and the sensing array being exposed by the die opening window; and a through hole conductive material refilled into the plurality of second through hole, some of the plurality of second through hole coupling to the conductive pads of the image sensor.
摘要:
The semiconductor device package structure includes a first die with a through silicon via (TSV) open from back side of the first die to expose bonding pads; a build up layer coupled between the bonding pads to terminal metal pads by the through silicon via (TSV); a substrate with a second die embedded inside and top circuit wiring and bottom circuit wiring on top and bottom side of the substrate respectively; and a conductive through hole structure coupled between the terminal metal pads to the top circuit wiring and the bottom circuit wiring.