公开(公告)号：US06839372B2

公开(公告)日：2005-01-04

申请号：US10141201

申请日：2002-05-07

申请人： Xiaojiang Pan ,  Holger K. Glatzel ,  John T. Melchior ,  Raymond Cybulski

发明人： Xiaojiang Pan ,  Holger K. Glatzel ,  John T. Melchior ,  Raymond Cybulski

IPC分类号： G03F7/20 ,  H01S3/00 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/08 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/102 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/11 ,  H01S3/13 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/223 ,  H01S3/225 ,  H01S3/23

CPC分类号： G03F7/70025 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0401 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258

摘要： The present invention provides a gas discharge ultraviolet laser capable of producing a high quality pulsed ultraviolet laser beam at pulse rates greater than 2000 Hz at pulse energies at 5 mJ or greater and having an enclosed beam path at least a portion of which comprises an oxidation agent. In a preferred embodiment a portion of the beam path comprises a sealed chamber containing a gas comprising a small concentration of oxygen. In one preferred embodiment the sealed chamber is an etalon chamber and the contained gas is nitrogen with an oxygen concentration of between 1.6 and 2.4 percent. In another preferred embodiments a small concentration of oxygen is added to the purge gas of a special purge compartment containing optical components exposed to high intensity output laser beam.

摘要翻译： 本发明提供一种气体放电紫外线激光器，其能够以5mJ以上的脉冲能量产生高于2000Hz的脉冲率的高质量脉冲紫外激光束，并且具有封闭的光束路径，其至少一部分包含氧化剂 。 在优选实施例中，光束路径的一部分包括含有包含少量氧气的气体的密封室。 在一个优选实施例中，密封室是标准室，并且所含有的气体是氧浓度在1.6和2.4％之间的氮气。 在另一个优选的实施方案中，将小浓度的氧气加入到包含暴露于高强度输出激光束的光学部件的特殊净化室的净化气体中。

公开(公告)号：US06904073B2

公开(公告)日：2005-06-07

申请号：US10384967

申请日：2003-03-08

申请人： Thomas A. Yager ,  William N. Partio ,  Richard L. Sandstrom ,  Xiaojiang Pan ,  John T. Melchior ,  John Martin Algots ,  Matthew Ball ,  Alexander I. Ershov ,  Vladimir Fleurov ,  Walter D. Gillespie ,  Holger K. Glatzel ,  Leonard Lublin ,  Elizabeth Marsh ,  Richard G. Morton ,  Richard C. Ujazdowski ,  David J. Warkentin ,  R. Kyle Webb

发明人： Thomas A. Yager ,  William N. Partio ,  Richard L. Sandstrom ,  Xiaojiang Pan ,  John T. Melchior ,  John Martin Algots ,  Matthew Ball ,  Alexander I. Ershov ,  Vladimir Fleurov ,  Walter D. Gillespie ,  Holger K. Glatzel ,  Leonard Lublin ,  Elizabeth Marsh ,  Richard G. Morton ,  Richard C. Ujazdowski ,  David J. Warkentin ,  R. Kyle Webb

IPC分类号： G03F7/20 ,  H01S3/00 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/08 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/102 ,  H01S3/104 ,  H01S3/105 ,  H01S3/11 ,  H01S3/13 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/223 ,  H01S3/225 ,  H01S3/23

CPC分类号： H01S3/2333 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2366

摘要： The present invention provides long life optics for a modular, high repetition rate, ultraviolet gas discharge laser systems producing a high repetition rate high power output beam. The invention includes solutions to a surface damage problem discovered by Applicants on CaF2 optics located in high pulse intensity sections of the output beam of prototype laser systems. Embodiments include an enclosed and purged beam path with beam pointing control for beam delivery of billions of output laser pulses. Optical components and modules described herein are capable of controlling ultraviolet laser output pulses with wavelength less than 200 nm with average output pulse intensities greater than 1.75×106 Watts/cm2 and with peak intensity or greater 3.5×106 Watts/cm2 for many billions of pulses as compared to prior art components and modules which failed after only a few minutes in these pulse intensities. Techniques and components are disclosed for minimizing the potential for optical damage and for reducing the pulse energy density to less than 100×10−6 J/cm3. Important improvements described in this specification have been grouped into the following subject matter categories: (1) Solution to CaF2 surface damage discovered by Applicants, (2) description of a high power ArF MOPA laser system, (3) description of beam delivery units, (4) polarization considerations (5) a high speed water-cooled auto shutter energy detector module and (6) other improvements.

摘要翻译： 本发明提供了用于产生高重复率高功率输出光束的模块化高重复率紫外线气体放电激光器系统的长寿命光学器件。 本发明包括由申请人发现的位于原型激光系统的输出光束的高脉冲强度部分中的CaF 2光学器件的表面损伤问题的解决方案。 实施例包括用于束传送数十亿个输出激光脉冲的光束指向控制的封闭和清除的光束路径。 本文所述的光学部件和模块能够控制波长小于200nm的紫外激光输出脉冲，平均输出脉冲强度大于1.75×6 /瓦/ cm 2，并且与 与在这些脉冲强度中仅仅几分钟之后失效的现有技术部件和模块相比，数十亿个脉冲的峰值强度或更大的3.5×10 6 / cm 2 / SUP。 公开了用于最小化光学损伤的可能性和将脉冲能量密度降低到小于100×10 -6 / cm 3的技术和部件。 本说明书中描述的重要改进已分为以下主题类别：（1）由申请人发现的CaF 2 2表面损伤的解决方案，（2）高功率ArF MOPA激光系统的描述（ 3）光束传输单元的描述，（4）偏振考虑（5）高速水冷自动快门能量检测器模块和（6）其他改进。

公开(公告)号：US06894785B2

公开(公告)日：2005-05-17

申请号：US10676907

申请日：2003-09-30

申请人： Rajasekhar M. Rao ,  John T. Melchior ,  Holger K. Glatzel

发明人： Rajasekhar M. Rao ,  John T. Melchior ,  Holger K. Glatzel

IPC分类号： H01S3/23 ,  G01B9/02

CPC分类号： H01S3/2366 ,  H01S3/03 ,  H01S3/2333

摘要： A spectral analysis module, including a wavemeter, for a high repetition rate gas discharge laser having a laser output beam comprising a pulsed output of greater than or equal to 15 mJ per pulse, sub-nanometer bandwidth tuning range pulses having a femptometer bandwidth precision and tens of femptometers bandwidth accuracy range, for measuring bandwidth on a pulse to pulse basis at pulse repetition rates of 4000 Hz and above, is disclosed which may comprise a primary beam-splitter in the path of the laser output laser of the gas discharge laser operative to pass the vast majority of the output beam and to reflect a first small portion of the output beam, the primary beam splitter oriented at an angle to sufficiently reduce the fluence on the primary beam-splitter, and creating overlapping fresnel reflections in the first small portion of the laser output beam; a secondary beam splitter made from a material having a damage threshold sufficiently high to tolerate the fluence created by the overlapping portion of the fresnel reflections in the first small portion of the output laser beam, the secondary beam splitter reflecting the vast majority of the first small portion of the output laser beam and passing a second small portion of the output laser beam; a telescoping optic in the path of the second small portion of the output beam operative to demagnify the second small portion of the output beam onto a first stage diffuser receiving the demagnified second small portion of the output laser beam, the demagnification selected to keep the fluence in the overlapping fresnel reflections in the second small portion of the output laser beam below the damage threshold of the first stage diffuser. The telescoping optic may demagnify a long axis of the second small portion of the output laser beam more than a short axis of the second small portion of the output laser beam, redistributing the fluence of the second small portion of the laser output beam across the first stage diffuser to keep any portion of the first stage diffuser from exceeding the damage threshold for the material from which the first stage diffuser is made. The vast majority of the first small portion of the laser output beam may be reflected into a power detection module. A second stage diffuser may creating a narrow cone of a focused second small portion of the laser output beam before the beam enters an interferometer.

公开(公告)号：US07292343B2

公开(公告)日：2007-11-06

申请号：US11075973

申请日：2005-03-08

申请人： Rajasekhar M. Rao ,  John T. Melchior ,  Holger K. Glatzel

发明人： Rajasekhar M. Rao ,  John T. Melchior ,  Holger K. Glatzel

IPC分类号： G01B9/02 ,  G01J3/45 ,  H01S3/13

CPC分类号： G01J1/4257 ,  G01J1/429 ,  G01J3/02 ,  G01J3/0205 ,  G01J3/0208 ,  G01J3/024 ,  G01J3/027 ,  G01J3/26 ,  G01J9/02 ,  G01J9/0246 ,  G03F7/70025 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0401 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

摘要： A wavemeter and method for measuring bandwidth for a high repetition rate gas discharge laser having an output laser bean comprising a pulsed output of greater than or equal to 15 mJ per pulse, sub-nanometer bandwidth tuning range pulses having a femptometer bandwidth precision and tens of femptometers bandwidth accuracy range, for measuring bandwidth on a pulse to pulse basis at pulse repetition rates of 4000 Hz and above, is disclosed which may comprise a focusing lens having a focal length; an optical interferometer creating an interference fringe pattern; an optical detection means positioned at the focal length from the focusing lens; and a bandwidth calculator calculating bandwidth from the position of interference fringes in the interference fringe pattern incident on the optical detection means, defining a DID and a DOD, the respective distances between a pair of first fringe borders and between a pair of second fringe borders in the interference pattern on an axis of the interference pattern, and according to the formula Δλ=λ0[DOD2−DID2]/[8f2−D02], where λ0 is an assumed constant wavelength and D0=(DOD−DID)/2, and f is the focal length. The optical detector may be a photodiode array. The wavemeter may have an optical interferometer having a slit function; the slit function and the focal length being selected to deliver to the optical detector the two innermost fringes of the optical interference ring pattern. The optical detector may comprise an array of pixels each having a height and width and the array having a total width; and an aperture at the optical input to the optical interferometer may selectively input to the optical interferometer a portion of a beam of light sufficient for the output of the etalon to illuminate the optical detector over the height of each respective pixel height and the total width. The optical interferometer may comprise an etalon having a slit function of 3 pm or less and a finesses of 25 or greater; and the focal length may be 1.5 meters. A second stage diffuser may be placed between the first stage diffuser and the etalon delivering a narrow cone of light to the etalon, and an aperture between the second stage diffuser and the etalon may deliver to the etalon a thin strip of the narrow cone of light.

公开(公告)号：US06912052B2

公开(公告)日：2005-06-28

申请号：US10676175

申请日：2003-09-30

申请人： Rajasekhar M Rao ,  John T. Melchior ,  Holger K. Glatzel

发明人： Rajasekhar M Rao ,  John T. Melchior ,  Holger K. Glatzel

IPC分类号： G01B9/02 ,  G01J1/42 ,  G01J9/02 ,  G03F7/20 ,  H01S3/00 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/08 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/102 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/11 ,  H01S3/13 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/223 ,  H01S3/225 ,  H01S3/23

CPC分类号： G01J1/4257 ,  G01J1/429 ,  G01J3/02 ,  G01J3/0205 ,  G01J3/0208 ,  G01J3/024 ,  G01J3/027 ,  G01J3/26 ,  G01J9/02 ,  G01J9/0246 ,  G03F7/70025 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0401 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

摘要： A wavemeter and method for measuring bandwidth for a high repetition rate gas discharge laser having an output laser bean comprising a pulsed output of greater than or equal to 15 mJ per pulse, sub-nanometer bandwidth tuning range pulses having a femptometer bandwidth precision and tens of femptometers bandwidth accuracy range, for measuring bandwidth on a pulse to pulse basis at pulse repetition rates of 4000Hz and above, is disclosed which may comprise a focusing lens having a focal length; an optical interferometer creating an interference fringe pattern; an optical detection means positioned at the focal length from the focusing lens; and a bandwidth calculator calculating bandwidth from the position of interference fringes in the interference fringe pattern incident on the optical detection means, defining a DID and a DOOD, the respective distances between a pair of first fringe borders and between a pair of second fringe borders in the interference pattern on an axis of the interference pattern, and according to the formula Δλ=λ0 [DOD2−DID2]/[8f2−D02], where λ0 is an assumed constant wavelength and D0=(DOD−DID)/2, and f is the focal length. The optical detector may be a photodiode array. The wavemember may have an optical interferometer having a slit function; the slit function and the focal length being selected to deliver to the optical detector the two innermost fringes of the optical interference ring pattern. The optical detector may comprise an array of pixels each having a height and width and the array having a total width; and an aperture at the optical input to the optical interferometer may selectively input to the optical interferometer a portion of a beam of light sufficient for the output of the etalon to illuminate the optical detector over the height of each respective pixel height and the total width. The optical interferometer may comprise an etalon having a slit function of 3 pm or less and a finesses of 25 or greater; and the focal length may be 1.5 meters. A second stage diffuser may be placed between the first stage diffuser and the etalon delivering a narrow cone of light to the etalon, and an aperture between the second stage diffuser and the etalon may deliver to the etalon a thin strip of the narrow cone of light.

公开(公告)号：US06330261B1

公开(公告)日：2001-12-11

申请号：US09271041

申请日：1999-03-17

申请人： Toshihiko Ishihara ,  Thomas P. Duffey ,  John T. Melchior ,  Herve A. Besaucele ,  Richard G. Morton ,  Richard M. Ness ,  Peter C. Newman ,  William N. Partlo ,  Daniel A. Rothweil ,  Richard L. Sandstrom

发明人： Toshihiko Ishihara ,  Thomas P. Duffey ,  John T. Melchior ,  Herve A. Besaucele ,  Richard G. Morton ,  Richard M. Ness ,  Peter C. Newman ,  William N. Partlo ,  Daniel A. Rothweil ,  Richard L. Sandstrom

IPC分类号： H01S300

CPC分类号： G03F7/70025 ,  C23C14/0694 ,  C23C14/16 ,  C23C14/225 ,  C23C14/24 ,  G01J9/00 ,  G02B1/105 ,  G02B5/1852 ,  G03F7/70041 ,  G03F7/70358 ,  G03F7/70558 ,  G03F7/70575 ,  H01S3/03 ,  H01S3/036 ,  H01S3/08009 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/09713 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/1392 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H03K3/57 ,  H03K17/80

摘要： The present invention provides a reliable modular production quality excimer laser capable of producing 10 mJ laser pulses in the range of 1000 Hz to 2000 Hz with a full width half, maximum bandwidth of about 0.6 pm or less. Replaceable modules include a laser chamber, a pulse power system comprised of three modules; an optical resonator comprised of a line narrowing module and an output coupler module; a wavemeter module, an electrical control module, a cooling water module and a gas control module. Important improvements have been provided in the pulse power unit to produce faster rise time and improved pulse energy control. These improvements include an increased capacity high voltage power supply with a voltage bleed-down circuit for precise voltage trimming, an improved commutation module that generates a high voltage pulse from the capacitors charged by the high voltage power supply and amplifies the pulse voltage 23 times with a very fast voltage transformer having a secondary winding consisting of a single four-segment stainless steel rod. A novel design for the compression head saturable inductor greatly reduces the quantity of transformer oil required and virtually eliminates the possibility of oil leakage which in the past has posed a hazard.

摘要翻译： 本发明提供了一种可靠的模块化生产质量准分子激光器，其能够产生1000Hz至2000Hz范围内的10mJ激光脉冲，全宽度为一半，最大带宽为约0.6μm或更小。 可更换模块包括激光室，由三个模块组成的脉冲电源系统; 光学谐振器，包括线窄模块和输出耦合器模块; 波形计模块，电气控制模块，冷却水模块和气体控制模块。在脉冲功率单元中已经提供了重要的改进，以产生更快的上升时间和改进的脉冲能量控制。 这些改进包括增加容量的高压电源，具有用于精确调整电压的电压降低电路，改进的换向模块，其从由高压电源充电的电容器产生高电压脉冲，并用脉冲电压放大23次 具有由单个四段不锈钢棒组成的次级绕组的非常快速的电压互感器。 用于压缩头可饱和电感器的新颖设计大大减少了所需的变压器油的数量，并且几乎消除了过去漏油的可能性。

公开(公告)号：US6018537A

公开(公告)日：2000-01-25

申请号：US273446

申请日：1999-03-19

申请人： Thomas Hofmann ,  Jean-Marc Hueber ,  Palash P. Das ,  Toshihiko Ishihara ,  Thomas P. Duffey ,  John T. Melchior ,  Herve A. Besaucele ,  Richard G. Morton ,  Richard M. Ness ,  Peter C. Newman ,  William N. Partlo ,  Daniel A. Rothweil ,  Richard L. Sandstrom

发明人： Thomas Hofmann ,  Jean-Marc Hueber ,  Palash P. Das ,  Toshihiko Ishihara ,  Thomas P. Duffey ,  John T. Melchior ,  Herve A. Besaucele ,  Richard G. Morton ,  Richard M. Ness ,  Peter C. Newman ,  William N. Partlo ,  Daniel A. Rothweil ,  Richard L. Sandstrom

IPC分类号： G01J9/00 ,  G03F7/20 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/08 ,  H01S3/0971 ,  H01S3/134 ,  H01S3/223 ,  H01S3/225 ,  H01S3/10

CPC分类号： G03F7/70025 ,  G01J9/00 ,  G03F7/70041 ,  G03F7/70358 ,  G03F7/70558 ,  G03F7/70575 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/0971 ,  H01S3/134 ,  H01S3/223 ,  H01S3/225 ,  H01S3/08009 ,  H01S3/09713 ,  H01S3/2251 ,  H01S3/2256

摘要： The present invention provides a reliable modular production quality excimer laser capable of producing 10 mJ laser pulses in the range of 1000 Hz to 2000 Hz or greater. Replaceable modules include a laser chamber; a pulse power system comprised of three modules; an optical resonator comprised of a line narrowing module and an output coupler module; a wavemeter module, an electrical control module, a cooling water module and a gas control module. Important improvements have been provided in the pulse power unit to produce faster rise time and improved pulse energy control. These improvements include an increased capacity high voltage power supply with a voltage bleed-down circuit for precise voltage trimming, an improved commutation module that generates a high voltage pulse from the capacitors charged by the high voltage power supply and amplifies the pulse voltage 23 times with a very fast voltage transformer having a secondary winding consisting of a single four-segment stainless steel rod. A novel design for the compression head saturable inductor greatly reduces the quantity of transformer oil required and virtually eliminates the possibility of oil leakage which in the past has posed a hazard.

摘要翻译： 本发明提供了可产生1000Hz至2000Hz或更大范围内的10mJ激光脉冲的可靠的模块化生产质量准分子激光器。 可更换模块包括激光室; 由三个模块组成的脉冲电源系统; 光学谐振器，包括线窄模块和输出耦合器模块; 波形计模块，电气控制模块，冷却水模块和气体控制模块。 在脉冲功率单元中已经提供了重要的改进，以产生更快的上升时间和改进的脉冲能量控制。 这些改进包括增加容量的高压电源，具有用于精确电压调整的电压降低电路，改进的换向模块，其从由高压电源充电的电容器产生高电压脉冲，并用脉冲电压放大23次 具有由单个四段不锈钢棒组成的次级绕组的非常快速的电压互感器。 用于压缩头可饱和电感器的新颖设计大大减少了所需的变压器油的数量，并且几乎消除了过去漏油的可能性。

公开(公告)号：USRE41457E1

公开(公告)日：2010-07-27

申请号：US11091005

申请日：2005-03-25

申请人： Peter C. Newman ,  John T. Melchior ,  Richard L. Sandstrom

发明人： Peter C. Newman ,  John T. Melchior ,  Richard L. Sandstrom

IPC分类号： H01S3/13 ,  H01S3/08

CPC分类号： G03F7/70358 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70558 ,  G03F7/70575 ,  H01S3/0014 ,  H01S3/02 ,  H01S3/03 ,  H01S3/0811 ,  H01S3/0971 ,  H01S3/225

摘要： An optical configuration to illuminate an etalon in a laser wavemeter with a minimum level of light intensity. The system includes optical components to direct a portion of the laser output beam representing the entire cross section of the beam, through an etalon positioned in an etalon housing and onto a photodetector. A first lens condenses the size of the beam sample, and a second lens re-collimates the beam which then passes into the etalon housing, ensuring that all of the spatial components of the beam are adequately sampled. A diffractive diffusing element is incorporated into the optical path. In a preferred embodiment, the diffractive diffusing element is placed within the etalon housing between said plano-concave lens and the etalon. In another preferred embodiment, the diffusing element is located up stream but outside the housing in the optical path.

摘要翻译： 以最小光强度照射激光波长计中的标准具的光学配置。 该系统包括光学部件，用于通过位于标准室外壳中的标准具和光电检测器来引导代表光束整个横截面的激光输出光束的一部分。 第一透镜会凝缩束样品的尺寸，并且第二透镜将光束重新准直，然后光束进入标准室壳体，确保光束的所有空间分量被充分地采样。 衍射漫射元件被结合到光路中。 在优选实施例中，衍射漫射元件放置在所述平凹透镜和标准具之间的标准室壳体内。 在另一优选实施例中，漫射元件位于光路中的上游之外，而在壳体外部。

公开(公告)号：US06539046B2

公开(公告)日：2003-03-25

申请号：US09473852

申请日：1999-12-27

申请人： Peter C. Newman ,  John T. Melchior ,  Richard L. Sandstrom

发明人： Peter C. Newman ,  John T. Melchior ,  Richard L. Sandstrom

IPC分类号： H01S308

CPC分类号： G01J1/4257 ,  G01J3/02 ,  G01J3/0205 ,  G01J3/0208 ,  G01J3/0291 ,  G01J3/26 ,  G01J9/00 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70358 ,  G03F7/70483 ,  G03F7/70558 ,  G03F7/70575 ,  H01S3/0014 ,  H01S3/02 ,  H01S3/03 ,  H01S3/0811 ,  H01S3/0971 ,  H01S3/225

摘要： An optical configuration to illuminate an etalon in a laser wavemeter with a minimum level of light intensity. The system includes optical components to direct a portion of the laser output beam representing the entire cross section of the beam, through an etalon positioned in an etalon housing and onto a photodetector. A first lens condenses the size of the beam sample, and a second lens re-collimates the beam which then passes into the etalon housing, ensuring that all of the spatial components of the beam are adequately sampled. A diffractive diffusing element is incorporated into the optical path. In a preferred embodiment, the diffractive diffusing element is placed within the etalon housing between said plano-concave lens and the etalon. In another preferred embodiment, the diffusing element is located up stream but outside the housing in the optical path.

摘要翻译： 以最小光强度照射激光波长计中的标准具的光学配置。 该系统包括光学部件，用于通过位于标准室外壳中的标准具和光电检测器来引导代表光束整个横截面的激光输出光束的一部分。 第一透镜会凝缩束样品的尺寸，并且第二透镜将光束重新准直，然后光束进入标准室壳体，确保光束的所有空间分量被充分地采样。 衍射漫射元件被结合到光路中。 在优选实施例中，衍射漫射元件放置在所述平凹透镜和标准具之间的标准室壳体内。 在另一优选实施例中，漫射元件位于光路中的上游之外，而在壳体外部。

公开(公告)号：US20080013589A1

公开(公告)日：2008-01-17

申请号：US11488879

申请日：2006-07-17

申请人： John T. Melchior ,  Richard C. Ujazdowski ,  James K. Howey

发明人： John T. Melchior ,  Richard C. Ujazdowski ,  James K. Howey

IPC分类号： H01S3/08

CPC分类号： H01S3/034 ,  H01S3/0346 ,  H01S3/225

摘要： A window assembly for a pressurized laser discharge chamber is disclosed and may include a housing that is formed with a recess. The assembly may also include an optic having a first side that is exposed to chamber pressure and an opposed second side, and a compliant member that may be positioned in the recess to space the second side of the optic from the housing under normal chamber operating pressures. For the assembly, the compliant member may be compressible to allow the optic to mechanically abut the assembly housing during a chamber overpressure.

摘要翻译： 公开了一种用于加压激光放电室的窗组件，并且可以包括形成有凹部的壳体。 组件还可以包括具有暴露于腔室压力的第一侧面和相对的第二侧面的光学元件，以及柔性构件，其可以定位在凹部中，以在正常室操作压力下将光学元件的第二侧与壳体间隔开 。 对于组件，柔性构件可以是可压缩的，以允许光学器件在腔室超压期间机械地邻接组件壳体。