公开(公告)号：US20060037858A1

公开(公告)日：2006-02-23

申请号：US10528117

申请日：2003-05-23

申请人： Yoshinori Marumo ,  Miho Jomen ,  Takayuki Komiya ,  Hiroshi Sato ,  Gishi Chung

发明人： Yoshinori Marumo ,  Miho Jomen ,  Takayuki Komiya ,  Hiroshi Sato ,  Gishi Chung

IPC分类号： C25D17/06

CPC分类号： C23C18/1619 ,  C23C18/1669 ,  C23C18/1678

摘要： A plate is placed near a substrate held by a substrate holding section. A treating liquid is ejected from a treating liquid ejecting section, thereby plating the substrate electrolessly. The treating liquid flows through the gap between the substrate and the plate. Therefore a flow of the treating liquid occurs on the substrate. As a result, a fresh treating liquid can be supplied onto the substrate. Thus, a plating film can be formed very uniformly on the substrate even if the amount of treating liquid is small.

摘要翻译： 将板放置在由基板保持部保持的基板附近。 处理液从处理液喷射部喷出，由此无电解地镀覆基板。 处理液体流过基板和板之间的间隙。 因此，处理液的流动发生在基板上。 结果，可以将新鲜的处理液体供应到基底上。 因此，即使处理液的量少，也可以在基板上非常均匀地形成镀膜。

公开(公告)号：US20050164499A1

公开(公告)日：2005-07-28

申请号：US11082807

申请日：2005-03-18

申请人： Yoshinori Marumo ,  Hiroshi Sato ,  Miho Jomen

发明人： Yoshinori Marumo ,  Hiroshi Sato ,  Miho Jomen

IPC分类号： C23C18/16 ,  C23C18/18 ,  H01L21/00 ,  H01L21/288 ,  H01L21/768 ,  H01L21/44 ,  H01L21/4763

CPC分类号： H01L21/288 ,  C23C18/165 ,  H01L21/67028 ,  H01L21/67086 ,  H01L21/76877

摘要： In a method of electroless plating, catalytically active nuclei are formed on a diffusion inhibiting layer (such as a barrier layer), the catalytically active nuclei being catalytically active on a reducing agent contained in an electroless plating solution, and an electroless plating is then carried out by using the electroless plating solution. The method allows the formation of an electrolessly plated coating on a barrier layer through the acceleration of the reaction of a reducing agent contained in an electroless plating solution by catalytically active nucleus.

摘要翻译： 在化学镀方法中，在扩散抑制层（例如阻挡层）上形成催化活性核，催化活性核在化学镀溶液中包含的还原剂上具有催化活性的核，然后进行化学镀 通过使用化学镀溶液。 该方法允许通过催化活性核加速化学镀溶液中所含的还原剂的反应，在阻挡层上形成无电镀层。

公开(公告)号：US20060000704A1

公开(公告)日：2006-01-05

申请号：US10530678

申请日：2003-06-04

申请人： Hiroshi Sato ,  Gishi Chung

发明人： Hiroshi Sato ,  Gishi Chung

IPC分类号： C23C14/00

CPC分类号： C25D17/008 ,  C25D17/001

摘要： A solution treatment apparatus of the present invention includes a diaphragm position varying mechanism configured to partly vary the position of a diaphragm. According to the solution treatment apparatus of the present invention, partial positional change of the diaphragm is possible. Therefore, uniformity of solution treatment in a surface of a substrate can be effectively improved.

摘要翻译： 本发明的固溶处理装置包括：隔膜位置变化机构，被配置为部分地改变隔膜的位置。 根据本发明的固溶处理装置，隔膜的部分位置变化是可能的。 因此，能够有效地提高基板表面的固溶处理的均匀性。

公开(公告)号：US06848457B2

公开(公告)日：2005-02-01

申请号：US09849347

申请日：2001-05-07

申请人： Yoshinori Marumo ,  Yoshinori Kato ,  Hiroshi Sato ,  Kyungho Park

发明人： Yoshinori Marumo ,  Yoshinori Kato ,  Hiroshi Sato ,  Kyungho Park

IPC分类号： C25D21/18 ,  H01L21/00 ,  H01L21/288 ,  B08B3/04

CPC分类号： H01L21/67167 ,  C25D21/18 ,  H01L21/2885 ,  H01L21/67051 ,  H01L21/6715 ,  H01L21/67178 ,  H01L21/6723 ,  Y10S134/902

摘要： Providing liquid treatment equipment capable of largely reducing a frequency of discarding a treatment solution as a whole and capable of implementing smooth and high quality liquid treatment with less manufacturing burden. Equipment comprises a treatment solution bath capable of accommodating a treatment solution for implementing liquid treatment to a substrate to treat, a treatment solution circulating system circulating the accommodated treatment solution between the outside of the treatment solution bath, and a product removal unit removing a reaction product due to the liquid treatment contained in the circulated treatment solution. By circulating the accommodated treatment solution between the outside of the treatment solution bath, reaction products contained in the circulated treatment solution are removed by means of the product removal unit. Thereby, a chemical change substance and a decomposition product remaining in a treatment solution can be removed, resulting in preventing a treatment solution from deteriorating.

摘要翻译： 提供液体处理设备能够大大降低整体处理溶液的排放频率，能够以较少的制造负担实现平稳高质量的液体处理。 设备包括能够容纳用于对基板进行液体处理的处理溶液的处理溶液浴，以处理在处理溶液浴的外部之间循环所容纳的处理溶液的处理溶液循环系统和去除反应产物的产物去除单元 由于循环处理溶液中所含的液体处理。 通过将处理溶液的外部循环容纳的处理液，通过产品除去单元除去循环处理液中所含的反应产物。 因此，可以除去残留在处理溶液中的化学变化物质和分解产物，从而防止处理溶液劣化。

公开(公告)号：US20060121307A1

公开(公告)日：2006-06-08

申请号：US11250532

申请日：2005-10-17

申请人： Koumei Matsuzawa ,  Hiroshi Sato ,  Takayuki Komiya ,  Eiichi Kondoh ,  Kenji Matsumoto

发明人： Koumei Matsuzawa ,  Hiroshi Sato ,  Takayuki Komiya ,  Eiichi Kondoh ,  Kenji Matsumoto

IPC分类号： C23C16/00 ,  B32B15/00 ,  C23C14/32

CPC分类号： H01L21/288 ,  C23C18/04 ,  C23C18/08 ,  H01L21/76843 ,  H01L21/76846 ,  H01L21/76877 ,  Y10T428/12819 ,  Y10T428/12903

摘要： In a film deposition method which forms a Cu film on a Cu diffusion preventing film formed on a substrate, a contact film which is provided for adhering the Cu film to the Cu diffusion preventing film is formed on the Cu diffusion preventing film. A processing medium in which a precursor is dissolved in a medium of a supercritical state is supplied to the substrate so that the Cu film is formed on the contact film.

摘要翻译： 在形成在基板上的Cu扩散防止膜上形成Cu膜的成膜方法中，在Cu扩散防止膜上形成有将Cu膜附着在Cu扩散防止膜上的接触膜。 将前体溶解在超临界状态的介质中的处理介质供给到基板，使得在接触膜上形成Cu膜。

公开(公告)号：US20060084266A1

公开(公告)日：2006-04-20

申请号：US11252795

申请日：2005-10-19

申请人： Masaki Narushima ,  Koumei Matsuzawa ,  Hiroshi Sato ,  Takayuki Komiya ,  Eiichi Kondoh

发明人： Masaki Narushima ,  Koumei Matsuzawa ,  Hiroshi Sato ,  Takayuki Komiya ,  Eiichi Kondoh

IPC分类号： H01L21/44

CPC分类号： H01L21/76877 ,  C23C18/161 ,  C23C18/1678 ,  C23C18/168 ,  C23C18/1682 ,  C23C18/1685 ,  C23C18/40 ,  H01L21/28556 ,  H01L21/288

摘要： A film formation method of forming a film on a fine-pattern by supplying a processing medium that is in the supercritical state in which a precursor is dissolved on a target substrate is disclosed. The film formation method includes a first process of supplying the processing medium on the target substrate, the temperature of which is set at a first temperature that is lower than a film formation minimum temperature that is the lowest temperature at which film formation takes place, and a second process of forming the film on the target substrate by raising the temperature of the target substrate from the first temperature to a second temperature that is higher than the film formation minimum temperature.

摘要翻译： 公开了一种通过在目标基板上提供处于前体被溶解的超临界状态的处理介质，在微细图案上形成薄膜的成膜方法。 成膜方法包括：将目标基板上的处理介质供给到第一温度的第一工序，该第一工序的温度设定在低于成膜的最低温度的成膜最低温度的第一温度，以及 通过将目标基板的温度从第一温度升高到高于成膜最低温度的第二温度，在目标基板上形成膜的第二工序。

公开(公告)号：US20160331470A1

公开(公告)日：2016-11-17

申请号：US15111814

申请日：2015-01-09

申请人： Hiroshi Sato

发明人： Hiroshi Sato

IPC分类号： A61B34/20 ,  A61M1/00 ,  A61B90/11 ,  A61M5/158 ,  A61B17/3209 ,  A61B34/00

CPC分类号： A61B34/20 ,  A61B5/062 ,  A61B17/32093 ,  A61B34/30 ,  A61B34/35 ,  A61B34/73 ,  A61B90/11 ,  A61B2017/320052 ,  A61B2034/2051 ,  A61B2034/2059 ,  A61B2034/2065 ,  A61B2034/2072 ,  A61B2034/732 ,  A61B2090/061 ,  A61B2090/062 ,  A61B2090/374 ,  A61B2090/376 ,  A61B2090/3762 ,  A61B2090/378 ,  A61B2090/392 ,  A61B2090/3954 ,  A61B2090/3966 ,  A61B2218/002 ,  A61B2218/007 ,  A61M1/008 ,  A61M5/158 ,  A61M2005/1585 ,  G01B15/00

摘要： The embodiment of the present invention provides a position control system having a movement apparatus including an electromagnet capable of applying a magnetic field to a head and a movement control unit; and a position detection apparatus being capable of determining a position of a mark existing on the head or in a tip end side position of a pipe which is attached to the head with a tip end thereof open and through which a liquid can be injected or suctioned via an opening portion in the tip end, the position detection apparatus being capable of detecting a position of the head on the basis of the position of the mark, the movement control unit of the movement apparatus is capable of controlling an advancement direction of the head so that the pipe is inserted substantially linearly into a target position.

摘要翻译： 本发明的实施例提供了一种位置控制系统，其具有包括能够向磁头施加磁场的电磁体和移动控制单元的移动装置; 以及位置检测装置，其能够确定存在于头部的标记的位置或附接到头部的管的前端侧位置，其顶端开口，并且可以通过该顶端喷射或吸引液体 通过前端的开口部，位置检测装置能够根据标记的位置检测头部的位置，移动装置的移动控制单元能够控制头部的前进方向 使得管道基本线性地插入目标位置。

公开(公告)号：US09244342B2

公开(公告)日：2016-01-26

申请号：US12963009

申请日：2010-12-08

申请人： Hiroshi Sato

发明人： Hiroshi Sato

IPC分类号： B29C59/02 ,  G03F7/00 ,  B82Y10/00 ,  B82Y40/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： An imprint apparatus comprises a scope which observes a mark formed in each shot of a substrate and a mark formed on a mold and a controller. The controller performs observation by the scope, detects an amount of displacement of the shot with respect to the mold based on the observation result, and, if the detected displacement amount falls outside an allowable range, executes at least one of remeasuring a baseline amount and reexecuting a global alignment process.

摘要翻译： 压印装置包括观察在基板的每个镜头中形成的标记的范围和形成在模具上的标记和控制器。 控制器通过该范围进行观察，基于观察结果检测射出相对于模具的位移量，并且如果检测到的位移量超出允许范围，则执行重新测量基线量和 重新执行全局对齐过程。

公开(公告)号：US09239946B2

公开(公告)日：2016-01-19

申请号：US13546355

申请日：2012-07-11

申请人： Kan Torii ,  Masakazu Matsugu ,  Katsuhiko Mori ,  Hiroshi Sato ,  Yusuke Mitarai

发明人： Kan Torii ,  Masakazu Matsugu ,  Katsuhiko Mori ,  Hiroshi Sato ,  Yusuke Mitarai

IPC分类号： G06K9/00 ,  H04N5/232

CPC分类号： G06K9/00234 ,  G06K2209/011 ,  H04N5/23219

摘要： In an image within which a face pattern is detected, when a ratio of a skin color pixel is equal to or smaller than a first threshold value in a first region and a ratio of a skin color pixel is equal to or greater than a second threshold value in a second r region, the vicinity of the first region is determined to be a face candidate position at which the face pattern can exist. Face detection is carried out on the face candidate position. The second region is arranged in a predetermined position relative to the first region.

摘要翻译： 在其中检测到面部图案的图像中，当皮肤颜色像素的比例在第一区域中等于或小于第一阈值并且皮肤颜色像素的比率等于或大于第二阈值时 在第二r区域中，第一区域附近被确定为可以存在脸部图案的面部候选位置。 脸部检测在脸部候选位置进行。 第二区域相对于第一区域布置在预定位置。

公开(公告)号：US08953175B2

公开(公告)日：2015-02-10

申请号：US12966237

申请日：2010-12-13

申请人： Hiroshi Sato

发明人： Hiroshi Sato

IPC分类号： G01B11/14 ,  G01B11/02 ,  G03F9/00 ,  G03F7/00

CPC分类号： G01B11/14 ,  B29C59/002 ,  B29C59/026 ,  B29K2101/00 ,  B29L2009/005 ,  B82Y10/00 ,  B82Y40/00 ,  G01B11/02 ,  G03F7/0002 ,  G03F9/7038 ,  G03F9/7042 ,  G03F9/7049 ,  G03F9/7088

摘要： A detector for detecting a position of a mark comprises: an image sensing device; an optical system which projects the mark onto an image sensing surface of the image sensing device; a pattern located in a position between the image sensing surface and an optical element located closest to a plane on which the mark is to be located, among optical elements forming the optical system, the position being optically conjugated with the plane; and a processor which calculates a position of the mark with respect to one of a position of the pattern and a position already known from the position of the pattern, based on a moire pattern formed on the image sensing surface by the mark and the pattern.

摘要翻译： 用于检测标记位置的检测器包括：图像感测装置; 光学系统，其将标记投射到图像感测装置的图像感测表面上; 在形成光学系统的光学元件中位于图像感测表面和位于最靠近标记所在的平面的光学元件之间的位置的图案，该位置与该平面光学共轭; 以及处理器，其基于通过标记和图案形成在图像感测表面上的莫尔图案，计算相对于图案的位置和从图案的位置已知的位置之一的标记的位置。