Method of forming stacked wiring
    4.
    发明授权
    Method of forming stacked wiring 有权
    堆叠布线方法

    公开(公告)号:US09566790B2

    公开(公告)日:2017-02-14

    申请号:US14627393

    申请日:2015-02-20

    Abstract: A method of forming a stacked wiring includes forming a first adhesion layer on a substrate, forming a first wiring on the first adhesion layer, etching the first adhesion layer and the first wiring by the same first wet etching so that the first wiring is in a reverse trapezoid shape in which a first width of a top surface is larger than a second width of a bottom surface contacting the first adhesion layer as a cross-section in a direction intersecting with a first wiring extending direction, covering the top surface and a side surface of the first wiring with a second adhesion layer, forming a second wiring on the second adhesion layer, and etching the second adhesion layer and the second wiring by the same second wet etching so that the second adhesion layer and the second wiring remain on only the top surface of the first wiring.

    Abstract translation: 形成层叠布线的方法包括在基板上形成第一粘附层,在第一粘合层上形成第一布线,通过相同的第一湿蚀刻蚀刻第一粘合层和第一布线,使得第一布线处于 反向梯形,其中顶表面的第一宽度大于与第一粘合层接触的底面的第二宽度作为与第一布线延伸方向相交的方向的横截面,覆盖顶表面和侧面 所述第一布线的表面具有第二粘附层,在所述第二粘合层上形成第二布线,并且通过相同的第二湿蚀刻蚀刻所述第二粘合层和所述第二布线,使得所述第二粘合层和所述第二布线仅保留 第一个接线的顶面。

Patent Agency Ranking