THREE-DIMENSIONAL MICRO-STRUCTURE, ARRANGEMENT WITH AT LEAST TWO THREE-DIMENSIONAL MICRO-STRUCTURES, METHOD FOR PRODUCING THE MICRO-STRUCTURE AND USE OF THE MICRO-STRUCTURE
    9.
    发明申请
    THREE-DIMENSIONAL MICRO-STRUCTURE, ARRANGEMENT WITH AT LEAST TWO THREE-DIMENSIONAL MICRO-STRUCTURES, METHOD FOR PRODUCING THE MICRO-STRUCTURE AND USE OF THE MICRO-STRUCTURE 审中-公开
    至少有两个二维微结构,其制造方法微结构和使用微观结构的三维微结构安排

    公开(公告)号:WO2011039070A3

    公开(公告)日:2011-05-26

    申请号:PCT/EP2010063811

    申请日:2010-09-20

    Abstract: The invention relates to a three-dimensional micro-structure comprising a plurality of adjacent micro-columns which are arranged at a distance from each other and essentially parallel in relation to the respective longitudinal extension, said micro-columns being made of at least one micro-column material having respectively an aspect ratio in the region of 20 - 1000 and respectively a micro-column diameter in the region of 0,1 µm - 200 µm, and a micro-column intermediate chamber arranged between adjacent micro-columns having a micro-column distance selected from between the adjacent micro-columns in the region of 1 µm - 100 µm. The invention also relates to a method for producing the three-dimensional micro-structures according to the following steps: a) a template is provided with template material, said template having a three-dimensional structure with column-like template cavities essentially inverse for the micro-structure, b) the micro-column material is arranged in the column-like cavities such that the micro-columns are formed, and c) the template material is at least partially removed. A silicon wafer is preferably used as the template. In order to provide the template, the PAECE (Photo Assisted Electro-Chemical Etching) method is used. Said invention enables micro-structures with extremely large surfaces to be produced.

    Abstract translation: 本发明涉及一种包括多个并排的三维微结构,相对于它们各自的微柱纵向延伸实质上平行于彼此且相互间隔开的微柱与至少一个微柱的材料,各自具有的纵横比 具有20至1000,并且每个具有从0.1微米至200微米范围内的微柱的直径,并且被设置为一个的相邻微柱之间的相邻微柱的微柱间距之间 范围为1微米至100微米选用微型柱间距。 这里还提供了一种制造配备有以下工艺步骤的三维微结构的方法,包括:a)提供具有模板材料,其中基本上在微观结构的掩模具有与柱状模板空腔逆三维模板结构的模板, b)在柱状腔的微柱的材料的放置,从而使微柱形成,以及c)至少部分地去除所述模板材料。 作为模板,硅晶片,优选使用。 为了提供对paece模板(照片辅助电化学刻蚀)方法排序。 通过本发明,具有非常大的表面微结构被实现。

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