公开(公告)号：US20240363569A1

公开(公告)日：2024-10-31

申请号：US18763481

申请日：2024-07-03

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Ting-Li Yang ,  Po-Hao Tsai ,  Ching-Wen Hsiao ,  Hong-Seng Shue ,  Ming-Da Cheng

IPC: H01L23/00 ,  H01L21/768 ,  H01L23/522 ,  H01L23/528

CPC classification number: H01L24/11 ,  H01L21/76816 ,  H01L23/5223 ,  H01L23/5226 ,  H01L23/5283 ,  H01L24/16 ,  H01L2224/11019 ,  H01L2224/13008 ,  H01L2924/19041

Abstract: A method of forming a semiconductor device includes: forming an interconnect structure over a substrate; forming a first passivation layer over the interconnect structure; forming a first conductive feature over the first passivation layer and electrically coupled to the interconnect structure; conformally forming a second passivation layer over the first conductive feature and the first passivation layer; forming a dielectric layer over the second passivation layer; and forming a first bump via and a first conductive bump over and electrically coupled to the first conductive feature, where the first bump via is between the first conductive bump and the first conductive feature, where the first bump via extends into the dielectric layer, through the second passivation layer, and contacts the first conductive feature, where the first conductive bump is over the dielectric layer and electrically coupled to the first bump via.

公开(公告)号：US20240321621A1

公开(公告)日：2024-09-26

申请号：US18733107

申请日：2024-06-04

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yu-Hsiang Hu ,  Chung-Shi Liu ,  Hung-Jui Kuo ,  Ming-Da Cheng

IPC: H01L21/683 ,  H01L21/288 ,  H01L21/48 ,  H01L21/56 ,  H01L23/31 ,  H01L23/498 ,  H01L23/538

CPC classification number: H01L21/6835 ,  H01L21/2885 ,  H01L21/486 ,  H01L21/6836 ,  H01L23/3128 ,  H01L23/5389 ,  H01L21/568 ,  H01L23/49816 ,  H01L2221/68345 ,  H01L2221/68359 ,  H01L2221/68381 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/19 ,  H01L2224/32225 ,  H01L2224/73267 ,  H01L2224/83005 ,  H01L2224/92244

Abstract: A method includes forming an adhesive layer over a carrier, forming a sacrificial layer over the adhesive layer, forming through-vias over the sacrificial layer, and placing a device die over the sacrificial layer. The Method further includes molding and planarizing the device die and the through-vias, de-bonding the carrier by removing the adhesive layer, and removing the sacrificial layer.

公开(公告)号：US12057423B2

公开(公告)日：2024-08-06

申请号：US17492126

申请日：2021-10-01

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Ting-Li Yang ,  Po-Hao Tsai ,  Ching-Wen Hsiao ,  Hong-Seng Shue ,  Ming-Da Cheng

IPC: H01L23/00 ,  H01L21/768 ,  H01L23/522 ,  H01L23/528

CPC classification number: H01L24/11 ,  H01L21/76816 ,  H01L23/5223 ,  H01L23/5226 ,  H01L23/5283 ,  H01L24/16 ,  H01L2224/11019 ,  H01L2224/13008 ,  H01L2924/19041

Abstract: A method of forming a semiconductor device includes: forming an interconnect structure over a substrate; forming a first passivation layer over the interconnect structure; forming a first conductive feature over the first passivation layer and electrically coupled to the interconnect structure; conformally forming a second passivation layer over the first conductive feature and the first passivation layer; forming a dielectric layer over the second passivation layer; and forming a first bump via and a first conductive bump over and electrically coupled to the first conductive feature, where the first bump via is between the first conductive bump and the first conductive feature, where the first bump via extends into the dielectric layer, through the second passivation layer, and contacts the first conductive feature, where the first conductive bump is over the dielectric layer and electrically coupled to the first bump via.

公开(公告)号：US12009322B2

公开(公告)日：2024-06-11

申请号：US17670481

申请日：2022-02-13

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Chih-Hsuan Tai ,  Ting-Ting Kuo ,  Yu-Chih Huang ,  Chih-Wei Lin ,  Hsiu-Jen Lin ,  Chih-Hua Chen ,  Ming-Da Cheng ,  Ching-Hua Hsieh ,  Hao-Yi Tsai ,  Chung-Shi Liu

IPC: H01L21/683 ,  H01L23/00 ,  H01L23/31

CPC classification number: H01L24/02 ,  H01L21/6835 ,  H01L21/6836 ,  H01L23/3114 ,  H01L23/3135 ,  H01L24/19 ,  H01L24/96 ,  H01L24/97 ,  H01L23/3128 ,  H01L2221/68327 ,  H01L2221/6834 ,  H01L2221/68359 ,  H01L2221/68372 ,  H01L2224/02311 ,  H01L2224/02319 ,  H01L2224/02331 ,  H01L2224/02371 ,  H01L2224/02379 ,  H01L2224/02381 ,  H01L2224/12105

Abstract: A package structure includes a semiconductor device, a molding compound, a first dielectric layer, and a through-via. The molding compound is in contact with a sidewall of the semiconductor device. The first dielectric layer is over the molding compound and the semiconductor device. The through-via is in the molding compound and the first dielectric layer. The through-via is a continuous element and in contact with the first dielectric layer.

公开(公告)号：US12009256B2

公开(公告)日：2024-06-11

申请号：US18338095

申请日：2023-06-20

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Ming-Da Cheng ,  Wen-Hsiung Lu ,  Chin Wei Kang ,  Yung-Han Chuang ,  Lung-Kai Mao ,  Yung-Sheng Lin

IPC: H01L21/768 ,  H01L23/00

CPC classification number: H01L21/76885 ,  H01L21/76802 ,  H01L21/76852 ,  H01L21/76871 ,  H01L24/05 ,  H01L24/13 ,  H01L24/32 ,  H01L2224/0231 ,  H01L2224/02331 ,  H01L2224/0235 ,  H01L2224/0239 ,  H01L2224/0391 ,  H01L2224/0401 ,  H01L2224/05008 ,  H01L2224/05022

Abstract: A method includes forming a metal seed layer over a first conductive feature of a wafer, forming a patterned photo resist on the metal seed layer, forming a second conductive feature in an opening in the patterned photo resist, and heating the wafer to generate a gap between the second conductive feature and the patterned photo resist. A protection layer is plated on the second conductive feature. The method further includes removing the patterned photo resist, and etching the metal seed layer.

公开(公告)号：US11961791B2

公开(公告)日：2024-04-16

申请号：US17663970

申请日：2022-05-18

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Ching-Wen Hsiao ,  Ming-Da Cheng ,  Chih-Wei Lin ,  Chen-Shien Chen ,  Chih-Hua Chen ,  Chen-Cheng Kuo

IPC: H01L23/48 ,  H01L21/683 ,  H01L23/31 ,  H01L23/498 ,  H01L25/10 ,  H01L23/00

CPC classification number: H01L23/49816 ,  H01L21/6835 ,  H01L23/3128 ,  H01L23/49822 ,  H01L25/105 ,  H01L24/16 ,  H01L2221/68318 ,  H01L2221/68345 ,  H01L2221/68381 ,  H01L2224/131 ,  H01L2224/16225 ,  H01L2225/1023 ,  H01L2225/1058 ,  H01L2924/12042 ,  H01L2924/15311 ,  H01L2924/15331 ,  H01L2924/18161 ,  H01L2224/131 ,  H01L2924/014 ,  H01L2924/12042 ,  H01L2924/00

Abstract: A device includes a redistribution line, and a polymer region molded over the redistribution line. The polymer region includes a first flat top surface. A conductive region is disposed in the polymer region and electrically coupled to the redistribution line. The conductive region includes a second flat top surface not higher than the first flat top surface.

公开(公告)号：US11955423B2

公开(公告)日：2024-04-09

申请号：US17213650

申请日：2021-03-26

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Ting-Li Yang ,  Po-Hao Tsai ,  Ming-Da Cheng ,  Yung-Han Chuang ,  Hsueh-Sheng Wang

IPC: H01L21/768 ,  H01L21/48 ,  H01L23/00 ,  H01L23/31 ,  H01L23/367 ,  H01L23/495 ,  H01L23/522 ,  H01L23/528 ,  H01L23/532 ,  H01L25/065

CPC classification number: H01L23/5226 ,  H01L21/486 ,  H01L23/528 ,  H01L24/11 ,  H01L24/14

Abstract: Methods for forming dummy under-bump metallurgy structures and semiconductor devices formed by the same are disclosed. In an embodiment, a semiconductor device includes a first redistribution line and a second redistribution line over a semiconductor substrate; a first passivation layer over the first redistribution line and the second redistribution line; a second passivation layer over the first passivation layer; a first under-bump metallurgy (UBM) structure over the first redistribution line, the first UBM structure extending through the first passivation layer and the second passivation layer and being electrically coupled to the first redistribution line; and a second UBM structure over the second redistribution line, the second UBM structure extending through the second passivation layer, the second UBM structure being electrically isolated from the second redistribution line by the first passivation layer.

公开(公告)号：US11901319B2

公开(公告)日：2024-02-13

申请号：US17233967

申请日：2021-04-19

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Hui-Min Huang ,  Chih-Wei Lin ,  Tsai-Tsung Tsai ,  Ming-Da Cheng ,  Chung-Shi Liu ,  Chen-Hua Yu

IPC: H01L23/538 ,  H01L23/31 ,  H01L21/56 ,  H01L21/48 ,  H01L23/498 ,  H01L23/48 ,  H01L23/00

CPC classification number: H01L24/05 ,  H01L21/481 ,  H01L21/486 ,  H01L21/56 ,  H01L21/561 ,  H01L23/3114 ,  H01L23/3135 ,  H01L23/481 ,  H01L23/49811 ,  H01L23/49833 ,  H01L23/49838 ,  H01L23/49861 ,  H01L23/49866 ,  H01L23/5389 ,  H01L24/07 ,  H01L24/13 ,  H01L24/19 ,  H01L24/96 ,  H01L21/568 ,  H01L23/49827 ,  H01L2224/0239 ,  H01L2224/02372 ,  H01L2224/0401 ,  H01L2224/05083 ,  H01L2224/05144 ,  H01L2224/05147 ,  H01L2224/05155 ,  H01L2224/05166 ,  H01L2224/05171 ,  H01L2224/05184 ,  H01L2224/12105 ,  H01L2224/13111 ,  H01L2224/13139 ,  H01L2224/13147 ,  H01L2224/2919 ,  H01L2224/2929 ,  H01L2224/29386 ,  H01L2224/83191 ,  H01L2224/94 ,  H01L2924/01029 ,  H01L2924/18162 ,  H01L2224/94 ,  H01L2224/03 ,  H01L2224/94 ,  H01L2224/27

Abstract: A first protective layer is formed on a first die and a second die, and openings are formed within the first protective layer. The first die and the second die are encapsulated such that the encapsulant is thicker than the first die and the second die, and vias are formed within the openings. A redistribution layer can also be formed to extend over the encapsulant, and the first die may be separated from the second die.

公开(公告)号：US11894241B2

公开(公告)日：2024-02-06

申请号：US17220339

申请日：2021-04-01

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Mirng-Ji Lii ,  Chen-Shien Chen ,  Lung-Kai Mao ,  Ming-Da Cheng ,  Wen-Hsiung Lu

IPC: H01L21/48 ,  H01L23/498 ,  H01L23/522 ,  H01L23/538 ,  H01L23/00

CPC classification number: H01L21/4857 ,  H01L21/486 ,  H01L21/4853 ,  H01L23/49816 ,  H01L23/49822 ,  H01L23/49838 ,  H01L23/5226 ,  H01L23/5383 ,  H01L24/80 ,  H01L2224/80345 ,  H01L2224/80355

Abstract: A method includes forming a first package component, which formation process includes forming a first plurality of openings in a first dielectric layer, depositing a first metallic material into the first plurality of openings, performing a planarization process on the first metallic material and the first dielectric layer to form a plurality of metal pads in the first dielectric layer, and selectively depositing a second metallic material on the plurality of metal pads to form a plurality of bond pads. The first plurality of bond pads comprise the plurality of metal pads and corresponding parts of the second metallic material. The first package component is bonded to a second package component.

公开(公告)号：US20240021499A1

公开(公告)日：2024-01-18

申请号：US18362559

申请日：2023-07-31

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd

Inventor： Hsu-Lun Liu ,  Wen-Hsiung Lu ,  Ming-Da Cheng ,  Chen-En Yen ,  Cheng-Lung Yang ,  Kuanchih Huang

IPC: H01L23/48 ,  H01L23/60 ,  H01L21/768

CPC classification number: H01L23/481 ,  H01L23/60 ,  H01L21/76877 ,  H01L21/76898

Abstract: Some devices included a substrate; and a through via, including a plurality of scallops adjacent the through via in a first region and a plurality of scallops adjacent the through via in a second region, the of scallops having a first depth, the scallops having a greater depth. Some devices include an opening extending into a substrate, including a first region and a second region. Sidewalls of the opening include a stack of first concave portions extending a first distance into the first substrate, and a stack of second concave portions extending a second distance, greater than and parallel to the first distance, into the first substrate. A conductor partially fills the first concave portions and at least partially fills the respective second concave portions.