公开(公告)号：US12300644B2

公开(公告)日：2025-05-13

申请号：US17841223

申请日：2022-06-15

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Wen-Hsiung Lu ,  Ming-Da Cheng ,  Chia-Li Lin ,  Yu-Chih Huang ,  Chen-Shien Chen

IPC: H01L23/48 ,  H01L21/66 ,  H01L23/00

Abstract: In an embodiment, a device includes: a dielectric layer over an active surface of a semiconductor substrate; a conductive via in the dielectric layer, the conductive via including a first copper layer having a non-uniform grain orientation; and a bonding pad over the conductive via and in the dielectric layer, the bonding pad including a second copper layer having a uniform grain orientation, a top surface of the bonding pad being coplanar with a top surface of the dielectric layer.

公开(公告)号：US20240387433A1

公开(公告)日：2024-11-21

申请号：US18782141

申请日：2024-07-24

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd

Inventor： Po-Hao Tsai ,  Ming-Da Cheng ,  Wen-Hsiung Lu ,  Hsu-Lun Liu ,  Kai-Di Wu ,  Su-Fei Lin

IPC: H01L23/00

Abstract: A method includes forming a seed layer over a first conductive feature of a wafer, forming a patterned plating mask on the seed layer, and plating a second conductive feature in an opening in the patterned plating mask. The plating includes performing a plurality of plating cycles, with each of the plurality of plating cycles including a first plating process performed using a first plating current density, and a second plating process performed using a second plating current density lower than the first plating current density. The patterned plating mask is then removed, and the seed layer is etched.

公开(公告)号：US11961762B2

公开(公告)日：2024-04-16

申请号：US17809960

申请日：2022-06-30

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Ming-Da Cheng ,  Tzy-Kuang Lee ,  Song-Bor Lee ,  Wen-Hsiung Lu ,  Po-Hao Tsai ,  Wen-Che Chang

IPC: H01L21/768 ,  H01L23/00

CPC classification number: H01L21/76885 ,  H01L21/76802 ,  H01L21/76852 ,  H01L21/76871 ,  H01L24/05 ,  H01L24/13 ,  H01L24/32 ,  H01L2224/0231 ,  H01L2224/02331 ,  H01L2224/0235 ,  H01L2224/0239 ,  H01L2224/0391 ,  H01L2224/0401 ,  H01L2224/05008 ,  H01L2224/05022

Abstract: A method includes forming a first conductive feature, depositing a passivation layer on a sidewall and a top surface of the first conductive feature, etching the passivation layer to reveal the first conductive feature, and recessing a first top surface of the passivation layer to form a step. The step comprises a second top surface of the passivation layer. The method further includes forming a planarization layer on the passivation layer, and forming a second conductive feature extending into the passivation layer to contact the first conductive feature.

公开(公告)号：US20220336276A1

公开(公告)日：2022-10-20

申请号：US17809960

申请日：2022-06-30

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Ming-Da Cheng ,  Tzy-Kuang Lee ,  Song-Bor Lee ,  Wen-Hsiung Lu ,  Po-Hao Tsai ,  Wen-Che Chang

IPC: H01L21/768 ,  H01L23/00

Abstract: A method includes forming a first conductive feature, depositing a passivation layer on a sidewall and a top surface of the first conductive feature, etching the passivation layer to reveal the first conductive feature, and recessing a first top surface of the passivation layer to form a step. The step comprises a second top surface of the passivation layer. The method further includes forming a planarization layer on the passivation layer, and forming a second conductive feature extending into the passivation layer to contact the first conductive feature.

公开(公告)号：US20210375675A1

公开(公告)日：2021-12-02

申请号：US17085731

申请日：2020-10-30

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Ming-Da Cheng ,  Tzy-Kuang Lee ,  Song-Bor Lee ,  Wen-Hsiung Lu ,  Po-Hao Tsai ,  Wen-Che Chang

IPC: H01L21/768 ,  H01L23/00

Abstract: A method includes forming a first conductive feature, depositing a passivation layer on a sidewall and a top surface of the first conductive feature, etching the passivation layer to reveal the first conductive feature, and recessing a first top surface of the passivation layer to form a step. The step comprises a second top surface of the passivation layer. The method further includes forming a planarization layer on the passivation layer, and forming a second conductive feature extending into the passivation layer to contact the first conductive feature.

公开(公告)号：US11152319B2

公开(公告)日：2021-10-19

申请号：US16871032

申请日：2020-05-10

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Wen-Hsiung Lu ,  Chen-Shien Chen ,  Chen-En Yen ,  Cheng-Jen Lin ,  Chin-Wei Kang ,  Kai-Jun Zhan

IPC: H01L23/52 ,  H01L23/00

Abstract: A micro-connection structure is provided. The micro-connection structure includes an under bump metallurgy (UBM) pad, a bump and an insulating ring. The UBM pad is electrically connected to at least one metallic contact of a substrate. The bump is disposed on the UBM pad and electrically connected with the UBM pad. The insulating ring surrounds the bump and the UBM pad. The bump is separate from the insulating ring with a distance and the bump is isolated by a gap between the insulating ring and the bump.

公开(公告)号：US11101233B1

公开(公告)日：2021-08-24

申请号：US16868909

申请日：2020-05-07

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chen-En Yen ,  Chin-Wei Kang ,  Kai-Jun Zhan ,  Wen-Hsiung Lu ,  Cheng-Jen Lin ,  Ming-Da Cheng ,  Mirng-Ji Lii

IPC: H01L21/48 ,  H01L23/552 ,  H01L23/00

Abstract: A method for forming a semiconductor device is provided. The method includes providing a substrate. The method includes forming a mask layer over a surface of the substrate. The mask layer has an opening over a portion of the surface. The method includes depositing a conductive layer over the surface and the mask layer. The method includes removing the mask layer and the conductive layer over the mask layer. The conductive layer remaining after the removal of the mask layer and the conductive layer over the mask layer forms a conductive pad. The method includes bonding a device to the conductive pad through a solder layer. The conductive pad is embedded in the solder layer.

公开(公告)号：US20190259719A1

公开(公告)日：2019-08-22

申请号：US16403631

申请日：2019-05-06

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Wen-Hsiung Lu ,  Chen-Shien Chen ,  Chen-En Yen ,  Cheng-Jen Lin ,  Chin-Wei Kang ,  Kai-Jun Zhan

IPC: H01L23/00

Abstract: A micro-connection structure is provided. The micro-connection structure includes an under bump metallurgy (UBM) pad, a bump and an insulating ring. The UBM pad is electrically connected to at least one metallic contact of a substrate. The bump is disposed on the UBM pad and electrically connected with the UBM pad. The insulating ring surrounds the bump and the UBM pad. The bump is separate from the insulating ring with a distance and the bump is isolated by a gap between the insulating ring and the bump.

公开(公告)号：US20180012860A1

公开(公告)日：2018-01-11

申请号：US15712680

申请日：2017-09-22

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Hung-Jen Lin ,  Tsung-Ding Wang ,  Chien-Hsiun Lee ,  Wen-Hsiung Lu ,  Ming-Da Cheng ,  Chung-Shi Liu

IPC: H01L23/00 ,  H01L21/768 ,  H01L23/31 ,  H01L21/56 ,  H01L23/525

CPC classification number: H01L24/81 ,  H01L21/563 ,  H01L21/565 ,  H01L21/566 ,  H01L21/768 ,  H01L23/3114 ,  H01L23/3171 ,  H01L23/525 ,  H01L24/02 ,  H01L24/03 ,  H01L24/05 ,  H01L24/11 ,  H01L24/13 ,  H01L24/16 ,  H01L24/27 ,  H01L24/29 ,  H01L24/83 ,  H01L24/92 ,  H01L24/94 ,  H01L2224/02311 ,  H01L2224/0239 ,  H01L2224/024 ,  H01L2224/0347 ,  H01L2224/03612 ,  H01L2224/03614 ,  H01L2224/0362 ,  H01L2224/0401 ,  H01L2224/05008 ,  H01L2224/05073 ,  H01L2224/05124 ,  H01L2224/05147 ,  H01L2224/05166 ,  H01L2224/05187 ,  H01L2224/05582 ,  H01L2224/05611 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/05666 ,  H01L2224/05681 ,  H01L2224/11334 ,  H01L2224/1146 ,  H01L2224/11849 ,  H01L2224/13022 ,  H01L2224/131 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/21 ,  H01L2224/27318 ,  H01L2224/27334 ,  H01L2224/27416 ,  H01L2224/2919 ,  H01L2224/73204 ,  H01L2224/81024 ,  H01L2224/81191 ,  H01L2224/81203 ,  H01L2224/81801 ,  H01L2224/81815 ,  H01L2224/83192 ,  H01L2224/83855 ,  H01L2224/92125 ,  H01L2224/94 ,  H01L2924/00014 ,  H01L2924/01013 ,  H01L2924/01047 ,  H01L2924/12042 ,  H01L2924/181 ,  H01L2924/2076 ,  H01L2224/81 ,  H01L2924/01029 ,  H01L2924/04941 ,  H01L2924/04953 ,  H01L2924/014 ,  H01L2224/11 ,  H01L2924/00

Abstract: In some embodiments, the present disclosure relates to a package assembly having a bump on a first substrate. A molding compound is on the first substrate and contacts sidewalls of the bump. A no-flow underfill layer is on a conductive region of a second substrate. The no-flow underfill layer and the conductive region contact the bump. A mask layer is arranged on the second substrate and laterally surrounds the no-flow underfill layer. The no-flow underfill layer contacts the substrate between the conductive region and the mask layer.

公开(公告)号：US12300580B2

公开(公告)日：2025-05-13

申请号：US18732879

申请日：2024-06-04

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Hsu-Lun Liu ,  Wen-Hsiung Lu ,  Ming-Da Cheng ,  Chen-En Yen ,  Cheng-Lung Yang ,  Kuanchih Huang

IPC: H01L23/48 ,  H01L21/768 ,  H01L23/60

Abstract: Some devices included a substrate; and a through via, including a plurality of scallops adjacent the through via in a first region and a plurality of scallops adjacent the through via in a second region, the plurality of scallops having a first depth, the scallops having a greater depth. Some devices include an opening extending into a substrate, including a first region and a second region. Sidewalls of the opening include a stack of first concave portions extending a first distance into the first substrate, and a stack of second concave portions extending a second distance, greater than and parallel to the first distance, into the first substrate. A conductor partially fills the first concave portions and at least partially fills the respective second concave portions.