公开(公告)号：US09208983B2

公开(公告)日：2015-12-08

申请号：US14011575

申请日：2013-08-27

Applicant: SEN Corporation

Inventor： Masateru Sato

IPC: H01J37/08 ,  H01J1/20 ,  H01J5/10 ,  H01J27/08

CPC classification number: H01J5/10 ,  H01J27/08 ,  H01J37/08 ,  H01J2237/082 ,  H01J2237/31701

Abstract: An ion generation method uses a direct current discharge ion source provided with an arc chamber formed of a high melting point material, and includes: generating ions by causing molecules of a source gas to collide with thermoelectrons in the arc chamber and producing plasma discharge; and causing radicals generated in generating ions to react with a liner provided to cover an inner wall of the arc chamber at least partially. The liner is formed of a material more reactive to radicals generated as the source gas is dissociated than the material of the arc chamber.

Abstract translation: 离子产生方法使用设置有由高熔点材料形成的电弧室的直流放电离子源，并且包括：通过使源气体的分子与电弧室中的热电子碰撞并产生等离子体放电而产生离子; 并且使产生离子产生的自由基与至少部分地覆盖电弧室的内壁的衬垫反应。 衬垫由与源电极气体相比所产生的自由基反应的材料形成为比电弧室的材料更为反应。

公开(公告)号：US20150340194A1

公开(公告)日：2015-11-26

申请号：US14721808

申请日：2015-05-26

Applicant: SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.

Inventor： Masateru Sato

IPC: H01J37/06 ,  H01J37/08

CPC classification number: H01J37/06 ,  H01J27/08 ,  H01J37/08 ,  H01J2237/082

Abstract: An ion generator includes an arc chamber, a cathode that extends outward from the inside of the arc chamber in an axial direction and that emits a thermal electron into the arc chamber, a thermal reflector with a cylindrical shape provided around the cathode in a radial direction and extending in the axial direction, and a narrow structure configured to narrow a width in the radial direction of a gap between the cathode and the thermal reflector at a given position in the axial direction.

Abstract translation: 离子发生器包括电弧室，阴极，其沿着轴向从电弧室的内部向外延伸并且向电弧室发射热电子;沿半径方向设置在阴极周围的具有圆筒形的热反射器 并且在轴向方向上延伸，窄结构构造成在轴向的给定位置处使阴极和热反射器之间的间隙的径向宽度变窄。

公开(公告)号：US09196452B2

公开(公告)日：2015-11-24

申请号：US13790783

申请日：2013-03-08

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Yi-Jiun Lee ,  Cheng-Hung Hu ,  Yh-Hsiu Hsiao ,  Kan Hwa Chang ,  Ming-Te Chen

IPC: H01J37/08 ,  H01L21/265 ,  H01J37/317

CPC classification number: H01J37/08 ,  H01J37/3171 ,  H01L21/26506

Abstract: Methods and apparatus for a carbon ion source head. An ionization chamber is configured to receive a process gas containing carbon and a noble carrier gas; a cathode is disposed in the ionization chamber and configured to emit electrons in thermionic emission; a graphite coating is provided on at least a portion of the cathode; and an outlet on the ionization chamber is configured to output carbon ions. A method for ion implantation of carbon is disclosed. Additional alternative embodiments are disclosed.

Abstract translation: 碳离子源头的方法和装置。 电离室构造成​​接收含有碳和贵重载气的工艺气体; 阴极设置在电离室中并且被配置为以热电子发射发射电子; 在阴极的至少一部分上提供石墨涂层; 并且电离室上的出口构造成输出碳离子。 公开了一种离子注入碳的方法。 公开了另外的替代实施例。

公开(公告)号：US09171725B2

公开(公告)日：2015-10-27

申请号：US14331092

申请日：2014-07-14

Applicant: Entegris, Inc.

Inventor： James J. Mayer ,  Richard S. Ray ,  Robert Kaim ,  Joseph D. Sweeney

IPC: H01L21/265 ,  H01L21/302 ,  H01J37/08 ,  H01J37/317

CPC classification number: H01L21/2658 ,  C09K3/00 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/304 ,  H01L21/26506 ,  H01L21/302

Abstract: Isotopically enriched silicon precursor compositions are disclosed, as useful in ion implantation to enhance performance of the ion implantation system, in relation to corresponding ion implantation lacking such isotopic enrichment of the silicon precursor composition. The silicon dopant composition includes at least one silicon compound that is isotopically enriched above natural abundance in at least one of 28Si, 29Si, and 30Si, and may include a supplemental gas including at least one of a co-species gas and a diluent gas. Dopant gas supply apparatus for providing such silicon dopant compositions to an ion implanter are described, as well as ion implantation systems including such dopant gas supply apparatus.

Abstract translation: 公开了同位素富集的硅前体组合物，用于离子注入以提高离子注入系统的性能，与相对于缺乏硅前体组合物的同位素富集的离子注入相关。 所述硅掺杂剂组合物包括在28Si，29Si和30Si中的至少一种中同位素富集的至少一种硅化合物，并且可以包括包括共同种类气体和稀释气体中的至少一种的补充气体。 描述了用于将离子注入机提供这种硅掺杂剂组合物的掺杂气体供应装置，以及包括这种掺杂剂气体供应装置的离子注入系统。

公开(公告)号：US09168392B1

公开(公告)日：2015-10-27

申请号：US14275481

申请日：2014-05-12

Applicant: Vladimir Balakin

Inventor： Vladimir Balakin

IPC: A61N5/10

CPC classification number: A61N5/1049 ,  A61N5/1067 ,  A61N5/1081 ,  A61N2005/1061 ,  A61N2005/1087 ,  G21K1/093 ,  G21K5/04 ,  H01J35/045 ,  H01J37/08 ,  H01J37/1475 ,  H05H13/04 ,  H05H2007/002 ,  H05H2007/048

Abstract: An imaging system apparatus and method of use thereof is described in combination with a co-movable charged particle beamline apparatus element, such as one or more elements held and dynamically positioned by a gantry, where the method and apparatus are optionally elements of a positively charged particle cancer therapy system. In one embodiment, an X-ray imaging element is rigidly and semi-permanently attached to and co-moved with a proton directing element. For example, as the gantry relocates one or more elements of a proton beamline arc, the X-ray beam is mechanically forced to co-relocate with the proton directing element and/or the final proton beam path.

Abstract translation: 一种成像系统装置及其使用方法与可移动的带电粒子束线装置元件（诸如由台架保持和动态定位的一个或多个元件）结合在一起进行描述，其中该方法和装置可选地是带正电荷的元件 颗粒癌治疗系统。 在一个实施例中，X射线成像元件刚性地和半永久地附接到质子引导元件并与之一体移动。 例如，当台架重新定位质子束线弧的一个或多个元件时，X射线束被机械地强制与质子引导元件和/或最终质子束路径共同重定位。

公开(公告)号：US09165773B2

公开(公告)日：2015-10-20

申请号：US14287840

申请日：2014-05-27

Applicant: Ashwini K. Sinha ,  Lloyd A. Brown

Inventor： Ashwini K. Sinha ,  Lloyd A. Brown

IPC: H01L21/265 ,  H01L21/67 ,  H01J37/08 ,  H01J37/317

CPC classification number: H01L21/265 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/006 ,  H01L21/67017 ,  Y10T137/86348 ,  Y10T137/88054

Abstract: A novel method and system for using aluminum dopant compositions is provided. A composition of the aluminum dopant compositions is selected with sufficient vapor pressure and minimal carbon content, thereby enabling ease of delivery to an ion implant process and substantial reduction of carbon deposition during Al ion implantation. The source material is preferably stored and delivered from a sub-atmospheric storage and delivery device to enhance safety and reliability during the Al ion implantation process.

Abstract translation: 提供了一种使用铝掺杂剂组合物的新方法和系统。 选择铝掺杂剂组合物的组合物具有足够的蒸汽压力和最小的碳含量，从而使得能够容易地输送到离子注入工艺，并且在Al离子注入期间显着降低碳沉积。 源材料优选地从次大气压储存和输送装置储存和递送，以在Al离子注入工艺期间提高安全性和可靠性。

公开(公告)号：US09136086B2

公开(公告)日：2015-09-15

申请号：US13132762

申请日：2009-12-08

Applicant: John E. Madocks

Inventor： John E. Madocks

IPC: C23C14/00 ,  H01J37/08 ,  H01J27/14 ,  H01J37/305 ,  H01J37/317 ,  H01J37/32 ,  H01J37/34

CPC classification number: H01J37/08 ,  H01J27/143 ,  H01J37/3053 ,  H01J37/317 ,  H01J37/32862 ,  H01J37/3405 ,  H01J2237/081

Abstract: A process for modifying a surface of a substrate is provided that includes supplying electrons to an electrically isolated anode electrode of a closed drift ion source. The anode electrode has an anode electrode charge bias that is positive while other components of the closed drift ion source are electrically grounded or support an electrical float voltage. The electrons encounter a closed drift magnetic field that induces ion formation. Anode contamination is prevented by switching the electrode charge bias to negative in the presence of a gas, a plasma is generated proximal to the anode electrode to clean deposited contaminants from the anode electrode. The electrode charge bias is then returned to positive in the presence of a repeat electron source to induce repeat ion formation to again modify the surface of the substrate. An apparatus for modification of a surface of a substrate by this process is provided.

Abstract translation: 提供了一种用于修改衬底表面的方法，其包括向闭合漂移离子源的电隔离的阳极提供电子。 阳极电极具有正极的阳极电极偏压，而闭合漂移离子源的其它部件电接地或支持电浮动电压。 电子遇到诱发离子形成的闭合漂移磁场。 通过在存在气体的情况下将电极充电偏压切换为负来防止阳极污染，在阳极电极附近产生等离子体以清除来自阳极电极的沉积的污染物。 然后在存在重复电子源的情况下将电极充电偏压返回到正值，以引起重复的离子形成，以再次改变衬底的表面。 提供了一种通过该方法修改基板的表面的装置。

公开(公告)号：US20150228438A1

公开(公告)日：2015-08-13

申请号：US14484914

申请日：2014-09-12

Applicant: Alpha Source LLC

Inventor： Glenn B. ROSENTHAL

IPC: H01J27/18 ,  H05H1/02 ,  H01J37/08

CPC classification number: H01J27/18 ,  G21G1/10 ,  H01J37/08 ,  H05H1/02 ,  H05H1/14

Abstract: An isotope generation apparatus is disclosed including: an ion beam source of any of the types described herein; an extractor for extracting the ion beam from the confinement region, where the beam includes a portion of multiply ionized ions in a selected final ionization state; a target including a target material; and an accelerator for accelerating the ion beam and directing the ion beam to the target. The ion beam directed to the target transmutes at least a portion of the target material to a radio-isotope in response to a nuclear reaction between ions in the selected final ion state and atoms of the target material.

Abstract translation: 公开了一种同位素产生装置，包括：本文所述的任何类型的离子束源; 提取器，用于从限制区域提取离子束，其中所述束包括处于选定的最终电离状态的多部分离子化离子的一部分; 包括目标材料的目标; 以及用于加速离子束并将离子束引导到靶的加速器。 响应于所选择的最终离子状态的离子与目标材料的原子之间的核反应，被引导到靶的离子束将目标材料的至少一部分转移到放射性同位素。

公开(公告)号：US09097625B2

公开(公告)日：2015-08-04

申请号：US13864362

申请日：2013-04-17

Applicant: Omniprobe, Inc.

Inventor： Rocky Kruger ,  Aaron Smith ,  Cheryl Hartfield

IPC: C23C16/00 ,  G01N1/28 ,  C23C16/448 ,  C23C16/48 ,  C23C16/52 ,  C23C16/56 ,  H01J37/02

CPC classification number: H01J37/08 ,  C23C16/448 ,  C23C16/48 ,  C23C16/52 ,  C23C16/56 ,  G01N1/28 ,  H01J37/02 ,  H01J2237/006 ,  H01J2237/317 ,  Y10T137/0329 ,  Y10T137/0352

Abstract: A gas injection system for an energetic-beam instrument having a vacuum chamber. The system has a cartridge containing a chemical serving as a source for an output gas to be delivered into the vacuum chamber. The cartridge has a reservoir containing the chemical, which rises to a fill line having a level defined by an amount of the chemical present in the reservoir at a given time. An outlet from the reservoir is coupled to an output passage through an outlet valve and configured so that when the system is tilted the outlet remains above the level of the fill line. Embodiments include isolation valves allowing the cartridge to be disconnected without destroying system vacuum.

Abstract translation: 一种用于具有真空室的能量束仪器的气体注入系统。 该系统具有一个包含化学物质的药筒，作为输出气体的来源，被输送到真空室中。 药筒具有容纳化学物质的储存器，其在给定时间上升到具有由储存器中存在的化学物质量限定的水平的填充管线。 储存器的出口通过出口阀联接到输出通道，并且构造成使得当系统倾斜时，出口保持在填充线的水平面上方。 实施例包括隔离阀，允许筒被断开而不破坏系统真空。

公开(公告)号：US20150170865A1

公开(公告)日：2015-06-18

申请号：US14336814

申请日：2014-07-21

Applicant: Massachusetts Institute of Technology

Inventor： Paulo C. Lozano ,  Steven Mark Arestie

IPC: H01J9/02

CPC classification number: H01J37/08 ,  B01L3/502715 ,  C25F3/14 ,  H01J1/05 ,  H01J9/02 ,  H01J49/0445 ,  H01J2237/0802 ,  H01J2237/317

Abstract: An ionic liquid ion source can include a microfabricated body including a base and a tip. The body can be formed of a porous material compatible with at least one of an ionic liquid or room-temperature molten salt. The body can have a pore size gradient that decreases from the base of the body to the tip of the body, such that the at least one of an ionic liquid or room-temperature molten salt is capable of being transported through capillarity from the base to the tip.

Abstract translation: 离子液体离子源可以包括包含基底和尖端的微加工体。 身体可以由与离子液体或室温熔融盐中的至少一种相容的多孔材料形成。 身体可以具有从身体的基部到身体的尖端减小的孔径梯度，使得离子液体或室温熔融盐中的至少一种能够通过毛细管线从基底转移到 小费。