Abstract:
A method of manufacturing a semiconductor device includes forming an integrated circuit region on a semiconductor wafer. A first metal layer pattern is formed over the integrated circuit region. A via hole is formed to extend through the first metal layer pattern and the integrated circuit region. A final metal layer pattern is formed over the first metal layer pattern and within the via hole. A plug is formed within the via hole. Thereafter, a passivation layer is formed to overlie the final metal layer pattern.
Abstract:
A variable phase shifter is provided. In the variable phase shifter, a fixed substrate, which is a dielectric substrate, is fixedly mounted in a housing and has at least one arc-shaped microstrip line on one surface thereof. A rotation substrate, which is a dielectric substrate, is rotatably mounted in the housing, in contact with the other surface of the fixed substrate and has a slot line on the contact surface thereof. Microstrip-slot line coupling takes place between the microstrip line and the slot line even during rotation. Both ends of the microstrip line are connected to an output port of the variable phase shifter and the slot line is electrically connected to an input port of the variable phase shifter, for receiving an input signal.
Abstract:
A wafer level chip scale package may have a gap provided between a solder bump and a bump land. The gap may be filled with a gas. A method of manufacturing a wafer level chip scale package may involve forming a redistribution line having a first opening, forming a seed metal layer having a second opening including an undercut portion, and forming the gap using the first and the second openings.
Abstract:
A reinforced solder bump connector structure is formed between a contact pad arranged on a semiconductor chip and a ball pad arranged on a mounting substrate. The semiconductor chip includes at least one reinforcing protrusion extending upwardly from a surface of an intermediate layer. The mounting substrate includes at least one reinforcing protrusion extending upwardly from a ball pad, the protrusions from both the chip and the substrate being embedded within the solder bump connector. In some configurations, the reinforcing protrusion from the contact pad and the ball pad are sized and arranged to have overlapping under portions. These overlapping portions may assume a wide variety of configurations that allow the protrusions to overlap without contacting each other including pin arrays and combinations of surrounding and surrounded elements. In each configuration, the reinforcing protrusions will tend to suppress crack formation and/or crack propagation thereby improving reliability.
Abstract:
The present invention relates to a segregation reducing agent consisting of curdlan and alkaline materials and a hydraulic composition containing the segragation reducing agent, particularly, the present invention relates to the segregation reducing agent prepared by alkalifying a curdlan-producing fermentation broth per se or a curdlan powder with an alkaline material, and also relates to hydraulic compositions, concrete and mortar, comprising the segregation educing agent. This segregation reducing agent can provide a great segregation reduction effect for hydraulic compositions even at its small amount as well as guarantee the strength, filling ability and fluidity.
Abstract:
Disclosed are a catalyst for removing NOx from flue gas and its preparation. The catalyst comprises vanadium pentoxide, and barium oxide or calcium oxide as active components on a titanium dioxide support and is prepared by uniformly dispersing the metal oxides on the surface of the titanium dioxide support. This support is prepared by sufficiently drying and calcining a metatitanate (TiO(OH)2)-predominating slurry which is obtained from the course of the production of titanium dioxide for pigment from ilmenite. The catalyst exbihits excellent NOx removal activity as well as high durability against SO2, so that it can remove NOx for relatively longer period of time without being deteriorated by the poisoning induced by SO2 and significantly contribute to the prevention of plugging and corrosion of the downstream of a SCR reactor system.
Abstract:
An apparatus for generating an independent coherent beam array from a single light source, in which individual coherent beams are selectively activated. The independent coherent beam array generating apparatus, which ensures high-efficient independent coherent beams from a single light source, are implemented by using a phase grating and a spacial light modulator. The number of multiple beams to be used as a light source for high-density recording and reading can be adjusted by varying the design of the phase grating. Regardless of the number of light sources required in various applications, once the beam array generating apparatus is adopted to the applications, the desired function of the applications can be implemented at low cost.
Abstract:
The present invention relates to a novel benzoxazine benzimidazole derivative of formula (1) as an antagonist against a vanilloid receptor-1, a pharmaceutical composition comprising the same as an active ingredient, and a use thereof. The benzoxazine benzimidazole derivative of the present invention may be useful for preventing or treating a disease associated with antagonistic activity of vanilloid receptor-1: wherein, R1, R2, R3, R3′, Q1, Q2, Q3 and Q4 have same meanings as defined in the specification.
Abstract:
A semiconductor device and a method for fabricating the same, wherein a portion of a substrate comprising a pad is removed to form a via hole. An insulating layer is formed on the substrate. A portion of the insulating layer is removed to form a plurality of openings exposing portions of the pad. A through electrode is formed to fill the via hole and to be electrically connected to the pad through one of the plurality of openings. A portion of the pad is exposed by another opening among the plurality of openings.
Abstract:
A semiconductor chip comprises a substrate including a front surface and a rear surface, the substrate having a first via hole formed in the front surface and a second via hole formed in the rear surface, a first conductive plug formed on the substrate, the first conductive plug including a first portion formed in the first via hole and a second portion protruding from the front surface of the substrate, and a second conductive plug formed on the first conductive plug, the second conductive plug having a smaller cross-sectional area than the first conductive plug.