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37 条记录 (耗时 0.034 秒)

    ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
    13.
    发明公开
    ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE 审中-公开

    公开(公告)号：US20230259029A1

    公开(公告)日：2023-08-17

    申请号：US18191597

    申请日：2023-03-28

    申请人： FUJIFILM Corporation

    发明人： Yuta OKUAKI ,  Akihiro KANEKO ,  Masafumi KOJIMA ,  Akiyoshi GOTO ,  Keita KATO

    IPC分类号： G03F7/039

    CPC分类号： G03F7/0397

    摘要： An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition having an excellent resolution. In addition, another object of the present invention is to provide a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition.
    The actinic ray-sensitive or radiation-sensitive resin composition of the embodiment of the present invention includes:



    a resin of which polarity increases through decomposition by the action of an acid; and
    a compound that generates an acid upon irradiation with actinic rays or radiation,
    in which the resin includes a resin including a repeating unit X1 having two or more groups of which polarity increases through decomposition by the action of an acid and a repeating unit X2 having a phenolic hydroxyl group.

    PATTERN FORMATION METHOD, ELECTRONIC-DEVICE PRODUCTION METHOD, AND PROCESSING AGENT
    17.
    发明申请
    PATTERN FORMATION METHOD, ELECTRONIC-DEVICE PRODUCTION METHOD, AND PROCESSING AGENT 审中-公开
    图案形成方法，电子设备生产方法和加工代理

    公开(公告)号：US20160195814A1

    公开(公告)日：2016-07-07

    申请号：US15069300

    申请日：2016-03-14

    申请人： FUJIFILM Corporation

    发明人： Yuichiro ENOMOTO ,  Ryosuke UEBA ,  Michihiro SHIRAKAWA ,  Hajime FURUTANI ,  Akiyoshi GOTO ,  Masafumi KOJIMA

    IPC分类号： G03F7/40 ,  G03F7/32 ,  G03F7/20

    CPC分类号： G03F7/405 ,  G03F7/20 ,  G03F7/322 ,  G03F7/325 ,  G03F7/40 ,  H01L21/0273

    摘要： There is provided a pattern formation method comprising: a step (1) of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition which contains a resin of which, due to a polarity being increased by an action of an acid, solubility decreases with respect to a developer which includes an organic solvent; a step (2) of exposing the film to an actinic ray or radiation; a step (3) of forming a target process pattern by developing the film using a developer which includes an organic solvent; and a step (4) of obtaining a processed pattern by applying a processing agent which includes a compound (x) which has at least one of a primary amino group and a secondary amino group with respect to the target process pattern.

    摘要翻译： 提供了一种图案形成方法，包括：使用光化射线敏感或辐射敏感性树脂组合物形成膜的步骤（1），其包含由于通过酸的作用而极性增加的树脂， 相对于包含有机溶剂的显影剂，溶解度降低; 将膜暴露于光化射线或辐射的步骤（2）; 通过使用包含有机溶剂的显影剂显影该膜来形成目标工艺图案的步骤（3）; 以及通过应用包括相对于目标工艺图案具有伯氨基和仲氨基中的至少一个的化合物（x）的处理剂来获得加工图案的步骤（4）。