Scanning particle microscope
    11.
    发明授权
    Scanning particle microscope 失效
    扫描粒子显微镜

    公开(公告)号:US4713543A

    公开(公告)日:1987-12-15

    申请号:US751020

    申请日:1985-07-02

    CPC分类号: H01J37/04 H01J37/28

    摘要: There is disclosed a scanning particle microscope in which the adverse influence of the Boersch effect is reduced. This is achieved by providing an elastrostatic retardation element in the particle optics unit to decelerate the particle from a first energy, at which the particles are generated, to a second energy which is less than half of the first energy.

    摘要翻译: 公开了一种扫描粒子显微镜,其中Boersch效应的不利影响降低。 这是通过在粒子光学单元中提供弹性静力学延迟元件来实现的,以使颗粒从产生颗粒的第一能量减速到小于第一能量的一半的第二能量。

    Achromatic mass separator
    13.
    发明授权
    Achromatic mass separator 有权
    消色差分离器

    公开(公告)号:US08049180B2

    公开(公告)日:2011-11-01

    申请号:US11925598

    申请日:2007-10-26

    IPC分类号: B01D59/44

    摘要: An ion beam device is described. The ion beam device includes an ion beam source for generating an ion beam, the ion beam being emitted along a first axis, an aperture unit adapted to shape the ion beam, and an achromatic deflection unit adapted to deflect ions of the ion beam having a predetermined mass by a deflecting angle. The achromatic deflection unit includes: an electric field generating component for generating an electric field, and a magnetic field generating component for generating a magnetic field substantially perpendicular to the electric field. The device further includes a mass separation aperture adapted for blocking ions with a mass different from the predetermined mass and for allowing ions having the predetermined mass to trespass the mass separator, and an objective lens having a second optical axis, wherein the second optical axis is inclined with regard to the first axis.

    摘要翻译: 描述了离子束装置。 离子束装置包括用于产生离子束的离子束源,沿着第一轴发射的离子束,适于使离子束成形的孔单元,以及适于使离子束的离子偏转的消色差偏转单元, 预定质量的偏转角。 无彩色偏转单元包括:用于产生电场的电场产生部件和用于产生基本上垂直于电场的磁场的磁场产生部件。 该装置还包括质量分离孔,其适于阻挡具有不同于预定质量的质量的离子,并允许具有预定质量的离子侵入质量分离器,以及具有第二光轴的物镜,其中第二光轴为 相对于第一轴倾斜。

    High Current Density Particle Beam System
    15.
    发明申请
    High Current Density Particle Beam System 有权
    高电流密度粒子束系统

    公开(公告)号:US20070284536A1

    公开(公告)日:2007-12-13

    申请号:US10593246

    申请日:2005-02-17

    申请人: Juergen Frosien

    发明人: Juergen Frosien

    摘要: The present invention relates to charged particle beam devices. The devices comprise an emitter for emitting charged particles; an aperture arrangement with at least two apertures for separating the emitted charged particles into at least two independent charged particle beams; and an objective lens for focusing the at least two independent charged particle beams, whereby the independent charged particle beams are focused onto the same location within the focal plane.

    摘要翻译: 本发明涉及带电粒子束装置。 这些装置包括用于发射带电粒子的发射器; 具有至少两个孔的孔布置,用于将发射的带电粒子分离成至少两个独立的带电粒子束; 以及用于聚焦至少两个独立带电粒子束的物镜,由此独立带电粒子束聚焦到焦平面内的相同位置上。

    Electrostatic deflection system with low aberrations and vertical beam incidence
    16.
    发明申请
    Electrostatic deflection system with low aberrations and vertical beam incidence 有权
    具有低像差和垂直光束入射的静电偏转系统

    公开(公告)号:US20070075262A1

    公开(公告)日:2007-04-05

    申请号:US11241880

    申请日:2005-09-30

    IPC分类号: H01J37/147

    摘要: Embodiments of the present invention may be utilized to improve electron beam deflection. One embodiment provides an electrostatic deflection system with electrodes that minimize aberrations and to achieve vertical incidence simultaneously. By using at least two stages of deflection for a deflection direction, the present invention allows the deflected electron beam to pass a back focal plane of an objective lens while deflection capacitors are not disposed across the back focal plane. As a result, deflection electrodes can have an angle of 120° to minimize aberrations and simultaneously achieve vertical incidence of the electron beam on a target to avoid distortions or changes in magnification with height variations of the target or focus variations.

    摘要翻译: 本发明的实施例可用于改善电子束偏转。 一个实施例提供一种静电偏转系统,其具有最小化像差并且同时实现垂直入射的电极。 通过对偏转方向使用至少两个偏转级,本发明允许偏转的电子束通过物镜的后焦平面,而偏转电容器不跨过后焦平面设置。 结果,偏转电极可以具有120°的角度以最小化像差并且同时实现电子束在靶上的垂直入射,以避免目标或焦点变化的高度变化引起的变形或放大变化。

    Method and system for discharging a sample
    17.
    发明授权
    Method and system for discharging a sample 有权
    放样样品的方法和系统

    公开(公告)号:US07170068B2

    公开(公告)日:2007-01-30

    申请号:US11129463

    申请日:2005-05-12

    摘要: A method for discharging a sample, the method includes: determining whether to discharge a negatively charged area of a sample or to discharge a positively charged area of the sample; and injecting gas, via an electrode and gas supply component, or setting a first electrode to a first voltage and set the electrode and gas supply component to a second voltage, in response to the determination. A system including: a first electrode adapted to be set to at least a first potential; an electrode and gas supply component, adapted to be set to at least a second potential and to selectively supply gas to a vicinity of the sample; wherein at least one out of the first electrode and the electrode and gas supply component are positioned close to the sample.

    摘要翻译: 一种用于放电样品的方法,所述方法包括:确定是否放电样品的带负电区域或放电样品的带正电区域; 以及通过电极和气体供应部件注入气体,或者将第一电极设置为第一电压,并且响应于该确定将电极和气体供应部件设置为第二电压。 一种系统,包括:适于被设置为至少第一电位的第一电极; 电极和气体供应部件,其适于被设置为至少第二电位并且选择性地向所述样品的附近供应气体; 其中所述第一电极和所述电极和气体供应部件中的至少一个定位成靠近所述样品。

    Spectrometer objective for electron beam mensuration techniques
    18.
    发明授权
    Spectrometer objective for electron beam mensuration techniques 失效
    电子束测量技术的光谱仪物镜

    公开(公告)号:US4808821A

    公开(公告)日:1989-02-28

    申请号:US874498

    申请日:1986-06-16

    摘要: A spectrometer objective is composed of a short focal length, asymmetrical objective lens comprising an integrated electrostatic opposing field spectrometer and a single-stage deflection system arranged within the magnetic lens. Since the deflection of primary electrons occurs within the spectrometer objective, the space for a two-state deflection system employed in conventional systems between a condenser lens and an objective lens can be eliminated. The extremely-short structural length of the electron beam measuring apparatus which is thereby obtainable, in turn, has a beneficial effect on the influence of the lateral Boersch effect on probe diameter, this influence increasing with the length of the electron-optical beam path.

    摘要翻译: 光谱仪物镜由包括集成静电相对场光谱仪的短焦距不对称物镜和布置在磁透镜内的单级偏转系统组成。 由于一次电子的偏转发生在光谱仪物镜内,因此可以消除在聚光透镜和物镜之间的常规系统中采用的两状态偏转系统的空间。 由此可以获得电子束测量装置的极短的结构长度,对横向Boersch效应对探针直径的影响具有有益的影响,这种影响随着电子束光路的长度而增加。

    Scanning particle microscope with diminished boersch effect
    19.
    发明授权
    Scanning particle microscope with diminished boersch effect 失效
    扫描粒子显微镜具有降低的波纹效应

    公开(公告)号:US4675524A

    公开(公告)日:1987-06-23

    申请号:US831730

    申请日:1986-02-21

    CPC分类号: H01J37/28 H01J37/153

    摘要: A beam generator in a scanning particle microscope reduces energetic Boersch effect on the probe diameter to improve resolution by enabling beam particles to traverse a first beam crossover point with low energy and subsequently reaccelerating the beam particles to high energies while traversing the microscope's electro-optical column for subsequent deceleration shortly before reaching a specimen. An extraction electrode is provided between a Wehnelt electrode and an anode at a positive potential relative to a cathode, wherein the positive potential of the extraction electrode is substantially less than a positive potential at the anode.

    摘要翻译: 扫描粒子显微镜中的光束发生器通过使光束粒子能够以低能量穿过第一光束交叉点并随后在横过显微镜的电光柱的同时将光束粒子重新加速到高能量,从而降低对探针直径的能量Boersch效应,以提高分辨率 以便在到达试样前不久随后减速。 在Wehnelt电极和阳极之间以相对于阴极的正电位提供引出电极,其中提取电极的正电位基本上小于阳极处的正电位。

    Method and device for the rapid deflection of a particle beam
    20.
    发明授权
    Method and device for the rapid deflection of a particle beam 失效
    用于粒子束快速偏转的方法和装置

    公开(公告)号:US4335309A

    公开(公告)日:1982-06-15

    申请号:US172085

    申请日:1980-07-24

    CPC分类号: H01J37/1474

    摘要: In an exemplary system, a two stage deflection system responds to a first control signal of low frequency such that extra-axial chromatic errors due to electrostatic and magnetic deflection are made equal and opposite. The magnetic and electrostatic deflection systems may be arranged in either order along the beam path just so the low frequency electrostatic deflection is one-half the magnetic deflection and is in an opposite direction at the target. A second higher frequency control signal controls only the electrostatic deflection system. Preferably the deflection velocities at the target produced by the two control signals are equal, with the higher frequency being an integral multiple of the lower frequency and with the control signals being poled to provide opposite deflections. When the two deflection velocities are superimposed, the resultant is then a step type deflection as a function of time.

    摘要翻译: 在示例性系统中,两级偏转系统响应于低频的第一控制信号,使得由于静电和磁偏转引起的异轴色差误差相等而相反。 磁性和静电偏转系统可以沿着光束路径以任何顺序布置,因此低频静电偏转是磁偏转的一半,并且在目标处是相反的方向。 第二高频控制信号仅控制静电偏转系统。 优选地,由两个控制信号产生的目标处的偏转速度相等,其中较高的频率是较低频率的整数倍,并且控制信号极化以提供相反的偏转。 当两个偏转速度叠加时,所得到的是随时间变化的阶梯型偏转。