公开(公告)号：US11158617B2

公开(公告)日：2021-10-26

申请号：US16444933

申请日：2019-06-18

Applicant: RENESAS ELECTRONICS CORPORATION

Inventor： Toshihiko Akiba ,  Kenji Sakata ,  Nobuhiro Kinoshita ,  Yosuke Katsura

IPC: H01L23/02 ,  H01L25/16 ,  H01L23/367 ,  H01L23/00 ,  H01L23/498 ,  H01L25/10

Abstract: Reliability of a semiconductor device is improved. The semiconductor device PKG1 includes a wiring substrate SUB1, a semiconductor chip CHP1 and a capacitor CDC mounted on the upper surface 2t of the wiring substrate SUB1, and a lid LD formed of a metallic plate covering the semiconductor chip CHP1 and the wiring substrate SUB1. The semiconductor chip CHP1 is bonded to the lid LD via a conductive adhesive layer, and the capacitor CDC, which is thicker than the thickness of the semiconductor chip CHP1, is disposed in the cut off portion 4d1 provided in the lid LD, and is exposed from the lid LD.

公开(公告)号：US10566255B2

公开(公告)日：2020-02-18

申请号：US16519150

申请日：2019-07-23

Applicant: Renesas Electronics Corporation

Inventor： Toshihiko Akiba ,  Bunji Yasumura ,  Masanao Sato ,  Hiromi Abe

IPC: H01L23/00 ,  H01L21/66 ,  G01R31/26 ,  H01L25/065

Abstract: Provided is a semiconductor device having a pad on a semiconductor chip, a first passivation film formed over the semiconductor chip and having an opening portion on the pad of a probe region and a coupling region, a second passivation film formed over the pad and the first passivation film and having an opening portion on the pad of the coupling region, and a rewiring layer formed over the coupling region and the second passivation film and electrically coupled to the pad. The pad of the probe region placed on the periphery side of the semiconductor chip relative to the coupling region has a probe mark and the rewiring layer extends from the coupling region to the center side of the semiconductor chip. The present invention provides a technology capable of achieving size reduction, particularly pitch narrowing, of a semiconductor device.

公开(公告)号：US20170229359A1

公开(公告)日：2017-08-10

申请号：US15494501

申请日：2017-04-22

Applicant: Renesas Electronics Corporation

Inventor： Toshihiko Akiba ,  Bunji Yasumura ,  Masanao Sato ,  Hiromi Abe

IPC: H01L21/66 ,  H01L23/00

CPC classification number: H01L22/32 ,  G01R31/26 ,  H01L22/14 ,  H01L22/20 ,  H01L22/30 ,  H01L24/03 ,  H01L24/05 ,  H01L24/06 ,  H01L24/11 ,  H01L24/12 ,  H01L24/13 ,  H01L24/45 ,  H01L24/48 ,  H01L24/49 ,  H01L24/73 ,  H01L25/0657 ,  H01L2224/02166 ,  H01L2224/02313 ,  H01L2224/02371 ,  H01L2224/02373 ,  H01L2224/02381 ,  H01L2224/0392 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/05012 ,  H01L2224/05073 ,  H01L2224/05082 ,  H01L2224/05187 ,  H01L2224/05552 ,  H01L2224/05553 ,  H01L2224/05554 ,  H01L2224/05555 ,  H01L2224/05558 ,  H01L2224/05624 ,  H01L2224/05644 ,  H01L2224/0603 ,  H01L2224/06133 ,  H01L2224/06135 ,  H01L2224/10 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/13099 ,  H01L2224/13144 ,  H01L2224/16225 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/45124 ,  H01L2224/45144 ,  H01L2224/48091 ,  H01L2224/4813 ,  H01L2224/48145 ,  H01L2224/48227 ,  H01L2224/48465 ,  H01L2224/4847 ,  H01L2224/48624 ,  H01L2224/48644 ,  H01L2224/48724 ,  H01L2224/4911 ,  H01L2224/49429 ,  H01L2224/49431 ,  H01L2224/73204 ,  H01L2224/73265 ,  H01L2224/85951 ,  H01L2225/0651 ,  H01L2225/06517 ,  H01L2924/01002 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01014 ,  H01L2924/01015 ,  H01L2924/01019 ,  H01L2924/01022 ,  H01L2924/01028 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/0105 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01083 ,  H01L2924/014 ,  H01L2924/05042 ,  H01L2924/10329 ,  H01L2924/12041 ,  H01L2924/1306 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/19041 ,  H01L2924/19043 ,  H01L2924/30105 ,  H01L2924/00014 ,  H01L2924/04941 ,  H01L2924/04953 ,  H01L2924/00 ,  H01L2224/48744 ,  H01L2924/00012

Abstract: Provided is a semiconductor device having a pad on a semiconductor chip, a first passivation film formed over the semiconductor chip and having an opening portion on the pad of a probe region and a coupling region, a second passivation film formed over the pad and the first passivation film and having an opening portion on the pad of the coupling region, and a rewiring layer formed over the coupling region and the second passivation film and electrically coupled to the pad. The pad of the probe region placed on the periphery side of the semiconductor chip relative to the coupling region has a probe mark and the rewiring layer extends from the coupling region to the center side of the semiconductor chip. The present invention provides a technology capable of achieving size reduction, particularly pitch narrowing, of a semiconductor device.

公开(公告)号：US09646901B2

公开(公告)日：2017-05-09

申请号：US15219254

申请日：2016-07-25

Applicant: Renesas Electronics Corporation

Inventor： Toshihiko Akiba ,  Bunji Yasumura ,  Masanao Sato ,  Hiromi Abe

IPC: H01L23/58 ,  H01L21/66 ,  H01L23/00 ,  H01L25/065 ,  G01R31/26

CPC classification number: H01L22/32 ,  G01R31/26 ,  H01L22/14 ,  H01L22/20 ,  H01L22/30 ,  H01L24/03 ,  H01L24/05 ,  H01L24/06 ,  H01L24/11 ,  H01L24/12 ,  H01L24/13 ,  H01L24/45 ,  H01L24/48 ,  H01L24/49 ,  H01L24/73 ,  H01L25/0657 ,  H01L2224/02166 ,  H01L2224/02313 ,  H01L2224/02371 ,  H01L2224/02373 ,  H01L2224/02381 ,  H01L2224/0392 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/05012 ,  H01L2224/05073 ,  H01L2224/05082 ,  H01L2224/05187 ,  H01L2224/05552 ,  H01L2224/05553 ,  H01L2224/05554 ,  H01L2224/05555 ,  H01L2224/05558 ,  H01L2224/05624 ,  H01L2224/05644 ,  H01L2224/0603 ,  H01L2224/06133 ,  H01L2224/06135 ,  H01L2224/10 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/13099 ,  H01L2224/13144 ,  H01L2224/16225 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/45124 ,  H01L2224/45144 ,  H01L2224/48091 ,  H01L2224/4813 ,  H01L2224/48145 ,  H01L2224/48227 ,  H01L2224/48465 ,  H01L2224/4847 ,  H01L2224/48624 ,  H01L2224/48644 ,  H01L2224/48724 ,  H01L2224/4911 ,  H01L2224/49429 ,  H01L2224/49431 ,  H01L2224/73204 ,  H01L2224/73265 ,  H01L2224/85951 ,  H01L2225/0651 ,  H01L2225/06517 ,  H01L2924/01002 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01014 ,  H01L2924/01015 ,  H01L2924/01019 ,  H01L2924/01022 ,  H01L2924/01028 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/0105 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01083 ,  H01L2924/014 ,  H01L2924/05042 ,  H01L2924/10329 ,  H01L2924/12041 ,  H01L2924/1306 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/19041 ,  H01L2924/19043 ,  H01L2924/30105 ,  H01L2924/00014 ,  H01L2924/04941 ,  H01L2924/04953 ,  H01L2924/00 ,  H01L2224/48744 ,  H01L2924/00012

Abstract: Provided is a semiconductor device having a pad on a semiconductor chip, a first passivation film formed over the semiconductor chip and having an opening portion on the pad of a probe region and a coupling region, a second passivation film formed over the pad and the first passivation film and having an opening portion on the pad of the coupling region, and a rewiring layer formed over the coupling region and the second passivation film and electrically coupled to the pad. The pad of the probe region placed on the periphery side of the semiconductor chip relative to the coupling region has a probe mark and the rewiring layer extends from the coupling region to the center side of the semiconductor chip. The present invention provides a technology capable of achieving size reduction, particularly pitch narrowing, of a semiconductor device.

公开(公告)号：US08912540B2

公开(公告)日：2014-12-16

申请号：US13802704

申请日：2013-03-13

Applicant: Renesas Electronics Corporation

Inventor： Toshihiko Akiba ,  Bunji Yasumura ,  Masanao Sato ,  Hiromi Abe

IPC: H01L21/66 ,  H01L23/00 ,  H01L25/065

CPC classification number: H01L22/32 ,  G01R31/26 ,  H01L22/14 ,  H01L22/20 ,  H01L22/30 ,  H01L24/03 ,  H01L24/05 ,  H01L24/06 ,  H01L24/11 ,  H01L24/12 ,  H01L24/13 ,  H01L24/45 ,  H01L24/48 ,  H01L24/49 ,  H01L24/73 ,  H01L25/0657 ,  H01L2224/02166 ,  H01L2224/02313 ,  H01L2224/02371 ,  H01L2224/02373 ,  H01L2224/02381 ,  H01L2224/0392 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/05012 ,  H01L2224/05073 ,  H01L2224/05082 ,  H01L2224/05187 ,  H01L2224/05552 ,  H01L2224/05553 ,  H01L2224/05554 ,  H01L2224/05555 ,  H01L2224/05558 ,  H01L2224/05624 ,  H01L2224/05644 ,  H01L2224/0603 ,  H01L2224/06133 ,  H01L2224/06135 ,  H01L2224/10 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/13099 ,  H01L2224/13144 ,  H01L2224/16225 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/45124 ,  H01L2224/45144 ,  H01L2224/48091 ,  H01L2224/4813 ,  H01L2224/48145 ,  H01L2224/48227 ,  H01L2224/48465 ,  H01L2224/4847 ,  H01L2224/48624 ,  H01L2224/48644 ,  H01L2224/48724 ,  H01L2224/4911 ,  H01L2224/49429 ,  H01L2224/49431 ,  H01L2224/73204 ,  H01L2224/73265 ,  H01L2224/85951 ,  H01L2225/0651 ,  H01L2225/06517 ,  H01L2924/01002 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01014 ,  H01L2924/01015 ,  H01L2924/01019 ,  H01L2924/01022 ,  H01L2924/01028 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/0105 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01083 ,  H01L2924/014 ,  H01L2924/05042 ,  H01L2924/10329 ,  H01L2924/12041 ,  H01L2924/1306 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/19041 ,  H01L2924/19043 ,  H01L2924/30105 ,  H01L2924/00014 ,  H01L2924/04941 ,  H01L2924/04953 ,  H01L2924/00 ,  H01L2224/48744 ,  H01L2924/00012

Abstract: Provided is a semiconductor device having a pad on a semiconductor chip, a first passivation film formed over the semiconductor chip and having an opening portion on the pad of a probe region and a coupling region, a second passivation film formed over the pad and the first passivation film and having an opening portion on the pad of the coupling region, and a rewiring layer formed over the coupling region and the second passivation film and electrically coupled to the pad. The pad of the probe region placed on the periphery side of the semiconductor chip relative to the coupling region has a probe mark and the rewiring layer extends from the coupling region to the center side of the semiconductor chip. The present invention provides a technology capable of achieving size reduction, particularly pitch narrowing, of a semiconductor device.

Abstract translation: 提供了一种在半导体芯片上具有焊盘的半导体器件，形成在半导体芯片上并且在探针区域的焊盘上的开口部分和耦合区域的第一钝化膜，形成在焊盘上的第二钝化膜和第一钝化膜 钝化膜并且在耦合区域的焊盘上具有开口部分，以及重新布线层，形成在耦合区域和第二钝化膜上并电耦合到焊盘。 相对于耦合区域放置在半导体芯片的周边侧的探针区域的焊盘具有探针标记，并且重新布线层从半导体芯片的耦合区域延伸到中心侧。 本发明提供能够实现半导体器件的尺寸减小，特别是间距变窄的技术。

公开(公告)号：US20140361299A1

公开(公告)日：2014-12-11

申请号：US14465975

申请日：2014-08-22

Applicant: Renesas Electronics Corporation

Inventor： Toshihiko Akiba ,  Bunji Yasumura ,  Masanao Sato ,  Hiromi Abe

IPC: H01L21/66 ,  G01R31/26

CPC classification number: H01L22/32 ,  G01R31/26 ,  H01L22/14 ,  H01L22/20 ,  H01L22/30 ,  H01L24/03 ,  H01L24/05 ,  H01L24/06 ,  H01L24/11 ,  H01L24/12 ,  H01L24/13 ,  H01L24/45 ,  H01L24/48 ,  H01L24/49 ,  H01L24/73 ,  H01L25/0657 ,  H01L2224/02166 ,  H01L2224/02313 ,  H01L2224/02371 ,  H01L2224/02373 ,  H01L2224/02381 ,  H01L2224/0392 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/05012 ,  H01L2224/05073 ,  H01L2224/05082 ,  H01L2224/05187 ,  H01L2224/05552 ,  H01L2224/05553 ,  H01L2224/05554 ,  H01L2224/05555 ,  H01L2224/05558 ,  H01L2224/05624 ,  H01L2224/05644 ,  H01L2224/0603 ,  H01L2224/06133 ,  H01L2224/06135 ,  H01L2224/10 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/13099 ,  H01L2224/13144 ,  H01L2224/16225 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/45124 ,  H01L2224/45144 ,  H01L2224/48091 ,  H01L2224/4813 ,  H01L2224/48145 ,  H01L2224/48227 ,  H01L2224/48465 ,  H01L2224/4847 ,  H01L2224/48624 ,  H01L2224/48644 ,  H01L2224/48724 ,  H01L2224/4911 ,  H01L2224/49429 ,  H01L2224/49431 ,  H01L2224/73204 ,  H01L2224/73265 ,  H01L2224/85951 ,  H01L2225/0651 ,  H01L2225/06517 ,  H01L2924/01002 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01014 ,  H01L2924/01015 ,  H01L2924/01019 ,  H01L2924/01022 ,  H01L2924/01028 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/0105 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01083 ,  H01L2924/014 ,  H01L2924/05042 ,  H01L2924/10329 ,  H01L2924/12041 ,  H01L2924/1306 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/19041 ,  H01L2924/19043 ,  H01L2924/30105 ,  H01L2924/00014 ,  H01L2924/04941 ,  H01L2924/04953 ,  H01L2924/00 ,  H01L2224/48744 ,  H01L2924/00012

Abstract: Provided is a semiconductor device having a pad on a semiconductor chip, a first passivation film formed over the semiconductor chip and having an opening portion on the pad of a probe region and a coupling region, a second passivation film formed over the pad and the first passivation film and having an opening portion on the pad of the coupling region, and a rewiring layer formed over the coupling region and the second passivation film and electrically coupled to the pad. The pad of the probe region placed on the periphery side of the semiconductor chip relative to the coupling region has a probe mark and the rewiring layer extends from the coupling region to the center side of the semiconductor chip. The present invention provides a technology capable of achieving size reduction, particularly pitch narrowing, of a semiconductor device.

Abstract translation: 提供了一种在半导体芯片上具有焊盘的半导体器件，形成在半导体芯片上并且在探针区域的焊盘上的开口部分和耦合区域的第一钝化膜，形成在焊盘上的第二钝化膜和第一钝化膜 钝化膜并且在耦合区域的焊盘上具有开口部分，以及重新布线层，形成在耦合区域和第二钝化膜上并电耦合到焊盘。 相对于耦合区域放置在半导体芯片的周边侧的探针区域的焊盘具有探针标记，并且重新布线层从半导体芯片的耦合区域延伸到中心侧。 本发明提供能够实现半导体器件的尺寸减小，特别是间距变窄的技术。

公开(公告)号：US20130193438A1

公开(公告)日：2013-08-01

申请号：US13802704

申请日：2013-03-13

Applicant: RENESAS ELECTRONICS CORPORATION

Inventor： Toshihiko Akiba ,  Bunji Yusumura ,  Masanao Sato ,  Hiromi Abe

IPC: H01L21/66

CPC classification number: H01L22/32 ,  G01R31/26 ,  H01L22/14 ,  H01L22/20 ,  H01L22/30 ,  H01L24/03 ,  H01L24/05 ,  H01L24/06 ,  H01L24/11 ,  H01L24/12 ,  H01L24/13 ,  H01L24/45 ,  H01L24/48 ,  H01L24/49 ,  H01L24/73 ,  H01L25/0657 ,  H01L2224/02166 ,  H01L2224/02313 ,  H01L2224/02371 ,  H01L2224/02373 ,  H01L2224/02381 ,  H01L2224/0392 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/05012 ,  H01L2224/05073 ,  H01L2224/05082 ,  H01L2224/05187 ,  H01L2224/05552 ,  H01L2224/05553 ,  H01L2224/05554 ,  H01L2224/05555 ,  H01L2224/05558 ,  H01L2224/05624 ,  H01L2224/05644 ,  H01L2224/0603 ,  H01L2224/06133 ,  H01L2224/06135 ,  H01L2224/10 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/13099 ,  H01L2224/13144 ,  H01L2224/16225 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/45124 ,  H01L2224/45144 ,  H01L2224/48091 ,  H01L2224/4813 ,  H01L2224/48145 ,  H01L2224/48227 ,  H01L2224/48465 ,  H01L2224/4847 ,  H01L2224/48624 ,  H01L2224/48644 ,  H01L2224/48724 ,  H01L2224/4911 ,  H01L2224/49429 ,  H01L2224/49431 ,  H01L2224/73204 ,  H01L2224/73265 ,  H01L2224/85951 ,  H01L2225/0651 ,  H01L2225/06517 ,  H01L2924/01002 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01014 ,  H01L2924/01015 ,  H01L2924/01019 ,  H01L2924/01022 ,  H01L2924/01028 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/0105 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01083 ,  H01L2924/014 ,  H01L2924/05042 ,  H01L2924/10329 ,  H01L2924/12041 ,  H01L2924/1306 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/19041 ,  H01L2924/19043 ,  H01L2924/30105 ,  H01L2924/00014 ,  H01L2924/04941 ,  H01L2924/04953 ,  H01L2924/00 ,  H01L2224/48744 ,  H01L2924/00012

Abstract: Provided is a semiconductor device having a pad on a semiconductor chip, a first passivation film formed over the semiconductor chip and having an opening portion on the pad of a probe region and a coupling region, a second passivation film formed over the pad and the first passivation film and having an opening portion on the pad of the coupling region, and a rewiring layer formed over the coupling region and the second passivation film and electrically coupled to the pad. The pad of the probe region placed on the periphery side of the semiconductor chip relative to the coupling region has a probe mark and the rewiring layer extends from the coupling region to the center side of the semiconductor chip. The present invention provides a technology capable of achieving size reduction, particularly pitch narrowing, of a semiconductor device.

Abstract translation: 提供了一种在半导体芯片上具有焊盘的半导体器件，形成在半导体芯片上并且在探针区域的焊盘上的开口部分和耦合区域的第一钝化膜，形成在焊盘上的第二钝化膜和第一钝化膜 钝化膜并且在耦合区域的焊盘上具有开口部分，以及重新布线层，形成在耦合区域和第二钝化膜上并电耦合到焊盘。 相对于耦合区域放置在半导体芯片的周边侧的探针区域的焊盘具有探针标记，并且重新布线层从半导体芯片的耦合区域延伸到中心侧。 本发明提供能够实现半导体器件的尺寸减小，特别是间距变窄的技术。

公开(公告)号：US12148680B2

公开(公告)日：2024-11-19

申请号：US17517908

申请日：2021-11-03

Applicant: RENESAS ELECTRONICS CORPORATION

Inventor： Toshihiko Akiba ,  Yusuke Tanuma

IPC: H01L23/367 ,  H01L23/00 ,  H01L23/04 ,  H01L23/10

Abstract: A semiconductor device includes: a wiring substrate; a semiconductor chip mounted on the wiring substrate; a heat release sheet arranged on the semiconductor chip to cover the entire semiconductor chip and having a larger area than an area of the semiconductor chip; and a cover member which covers the semiconductor chip and the heat release sheet and to which the heat release sheet is fixed. The cover member has a first portion facing the semiconductor chip, a flange portion arranged in a periphery of the first portion and bonded and fixed onto the wiring substrate, and a second portion arranged between the first portion and the flange portion. In a plan view of the cover member viewed from the heat release sheet, the heat release sheet is bonded/fixed to the cover member through a bonding member partially arranged between the heat release sheet and the cover member.

公开(公告)号：US20190057913A1

公开(公告)日：2019-02-21

申请号：US16167492

申请日：2018-10-22

Applicant: Renesas Electronics Corporation

Inventor： Toshihiko Akiba ,  Bunji Yasumura ,  Masanao Sato ,  Hiromi Abe

IPC: H01L21/66 ,  H01L25/065 ,  H01L23/00 ,  G01R31/26

Abstract: Provided is a semiconductor device having a pad on a semiconductor chip, a first passivation film formed over the semiconductor chip and having an opening portion on the pad of a probe region and a coupling region, a second passivation film formed over the pad and the first passivation film and having an opening portion on the pad of the coupling region, and a rewiring layer formed over the coupling region and the second passivation film and electrically coupled to the pad. The pad of the probe region placed on the periphery side of the semiconductor chip relative to the coupling region has a probe mark and the rewiring layer extends from the coupling region to the center side of the semiconductor chip. The present invention provides a technology capable of achieving size reduction, particularly pitch narrowing, of a semiconductor device.

公开(公告)号：US09911673B2

公开(公告)日：2018-03-06

申请号：US15494501

申请日：2017-04-22

Applicant: Renesas Electronics Corporation

Inventor： Toshihiko Akiba ,  Bunji Yasumura ,  Masanao Sato ,  Hiromi Abe

IPC: H01L23/58 ,  H01L21/66 ,  H01L23/00

CPC classification number: H01L22/32 ,  G01R31/26 ,  H01L22/14 ,  H01L22/20 ,  H01L22/30 ,  H01L24/03 ,  H01L24/05 ,  H01L24/06 ,  H01L24/11 ,  H01L24/12 ,  H01L24/13 ,  H01L24/45 ,  H01L24/48 ,  H01L24/49 ,  H01L24/73 ,  H01L25/0657 ,  H01L2224/02166 ,  H01L2224/02313 ,  H01L2224/02371 ,  H01L2224/02373 ,  H01L2224/02381 ,  H01L2224/0392 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/05012 ,  H01L2224/05073 ,  H01L2224/05082 ,  H01L2224/05187 ,  H01L2224/05552 ,  H01L2224/05553 ,  H01L2224/05554 ,  H01L2224/05555 ,  H01L2224/05558 ,  H01L2224/05624 ,  H01L2224/05644 ,  H01L2224/0603 ,  H01L2224/06133 ,  H01L2224/06135 ,  H01L2224/10 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/13099 ,  H01L2224/13144 ,  H01L2224/16225 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/45124 ,  H01L2224/45144 ,  H01L2224/48091 ,  H01L2224/4813 ,  H01L2224/48145 ,  H01L2224/48227 ,  H01L2224/48465 ,  H01L2224/4847 ,  H01L2224/48624 ,  H01L2224/48644 ,  H01L2224/48724 ,  H01L2224/4911 ,  H01L2224/49429 ,  H01L2224/49431 ,  H01L2224/73204 ,  H01L2224/73265 ,  H01L2224/85951 ,  H01L2225/0651 ,  H01L2225/06517 ,  H01L2924/01002 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01014 ,  H01L2924/01015 ,  H01L2924/01019 ,  H01L2924/01022 ,  H01L2924/01028 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/0105 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01083 ,  H01L2924/014 ,  H01L2924/05042 ,  H01L2924/10329 ,  H01L2924/12041 ,  H01L2924/1306 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/19041 ,  H01L2924/19043 ,  H01L2924/30105 ,  H01L2924/00014 ,  H01L2924/04941 ,  H01L2924/04953 ,  H01L2924/00 ,  H01L2224/48744 ,  H01L2924/00012

Abstract: Provided is a semiconductor device having a pad on a semiconductor chip, a first passivation film formed over the semiconductor chip and having an opening portion on the pad of a probe region and a coupling region, a second passivation film formed over the pad and the first passivation film and having an opening portion on the pad of the coupling region, and a rewiring layer formed over the coupling region and the second passivation film and electrically coupled to the pad. The pad of the probe region placed on the periphery side of the semiconductor chip relative to the coupling region has a probe mark and the rewiring layer extends from the coupling region to the center side of the semiconductor chip. The present invention provides a technology capable of achieving size reduction, particularly pitch narrowing, of a semiconductor device.