Nanoscale masking and printing using patterned substrates
    17.
    发明申请
    Nanoscale masking and printing using patterned substrates 审中-公开
    使用图案化衬底的纳米级掩模和印刷

    公开(公告)号:US20080145627A1

    公开(公告)日:2008-06-19

    申请号:US11822215

    申请日:2007-07-03

    IPC分类号: B32B3/08 B05D5/00 B32B33/00

    摘要: Nanoscale masking using particles patterned on a substrate include assembling particles into a pattern on a first substrate; contacting the particles with a second substrate; adding blocking molecules while the particles are in contact, such that blocking molecules bind to portions of the second substrate not in contact with the particles; and separating the substrates, yielding a functionalized substrate having blocking molecules bound thereto. Nanoscale printing methods include assembling particles into a desired pattern on a first substrate; contacting a print material with the particles such that at least a portion of the print material binds to the particles on the first substrate; removing the first substrate having particles thereon from unbound print material; contacting the particles having print material bound thereto with a second substrate such that at least a portion of the print material binds to the second substrate; and separating the substrates, yielding a printed substrate.

    摘要翻译: 使用在基板上图案化的颗粒的纳米级掩模包括将颗粒组装成第一基板上的图案; 使颗粒与第二底物接触; 在颗粒接触的同时加入阻挡分子,使得阻挡分子与不与颗粒接触的第二基底的部分结合; 并分离底物,产生具有与其结合的阻断分子的官能化底物。 纳米级印刷方法包括在第一基底上将颗粒组装成所需图案; 使打印材料与颗粒接触,使得至少一部分印刷材料与第一基底上的颗粒结合; 从未结合的印刷材料中除去其上具有颗粒的第一基板; 使具有与其结合的印刷材料的颗粒与第二基板接触,使得至少一部分印刷材料结合到第二基板; 并分离衬底,产生印刷衬底。