公开(公告)号：US2579109A

公开(公告)日：1951-12-18

申请号：US13778850

申请日：1950-01-10

Applicant: GEN ELECTRIC

Inventor： DAVIES LEONARD J ,  BEESON ERIC J G

IPC: H01J1/00

CPC classification number: H01J1/00 ,  H01J2893/0051

公开(公告)号：US2494895A

公开(公告)日：1950-01-17

申请号：US68521046

申请日：1946-07-20

Applicant: HARTFORD NAT BANK & TRUST CO

Inventor： WILHELM MULDER JOHANNES GIJSBE

IPC: H01J1/00

CPC classification number: H01J1/00 ,  H01J2893/0049

公开(公告)号：US09082593B2

公开(公告)日：2015-07-14

申请号：US13435689

申请日：2012-03-30

Applicant: Daisuke Hayashi ,  Toshifumi Ishida ,  Norihiko Amikura

Inventor： Daisuke Hayashi ,  Toshifumi Ishida ,  Norihiko Amikura

IPC: C23C16/455 ,  C23C16/50 ,  C23C16/503 ,  C23C16/505 ,  C23C16/509 ,  C23F1/00 ,  H01J37/32 ,  H01J1/02 ,  C23F1/12 ,  H01J1/00

CPC classification number: H01J37/32449 ,  C23C16/455 ,  C23C16/45563 ,  C23C16/45565 ,  C23C16/45576 ,  C23C16/50 ,  C23C16/503 ,  C23C16/505 ,  C23C16/509 ,  C23F1/12 ,  H01J1/00 ,  H01J1/02 ,  H01J37/32532

Abstract: An electrode having a gas discharge function, where the degree of freedom related to a maximum gas flow rate is abundant, an electrode cover member may be thinned, and a change of a gas behavior according to time is difficult to be generated in a processing chamber during gas introduction. The electrode includes: a base material having a plurality of gas holes; and an electrode cover member having a plurality of gas holes respectively corresponding to the plurality of gas holes of the base material in a one-to-one manner, fixed to the base material, and disposed facing a processing space in which the object is plasma-processed, wherein a gas hole diameter of the electrode cover member is larger than a gas hole diameter of the base material.

Abstract translation: 具有气体放电功能的电极，其中与最大气体流量相关的自由度丰富，电极盖构件可能变薄，并且在处理室中难以产生根据时间的气体性能的变化 在气体引入期间。 电极包括：具有多个气孔的基材; 以及电极盖构件，其具有分别对应于所述基材的所述多个气孔的多个气孔，所述多个气孔以一对一的方式固定到所述基材上，并且面对所述物体为等离子体的处理空间 其特征在于，所述电极盖部件的气孔直径大于所述基材的气孔直径。

公开(公告)号：US09028721B2

公开(公告)日：2015-05-12

申请号：US13388887

申请日：2010-07-29

Applicant: Tokuyuki Nakayama ,  Yoshiyuki Abe

Inventor： Tokuyuki Nakayama ,  Yoshiyuki Abe

IPC: H01B1/08 ,  C23C14/34 ,  C04B35/01 ,  C04B35/645 ,  C23C14/08

CPC classification number: H01J37/3429 ,  C04B35/01 ,  C04B35/645 ,  C04B2235/3229 ,  C04B2235/3232 ,  C04B2235/3244 ,  C04B2235/3256 ,  C04B2235/3258 ,  C04B2235/3284 ,  C04B2235/3286 ,  C04B2235/3293 ,  C04B2235/5436 ,  C04B2235/5445 ,  C04B2235/5472 ,  C04B2235/6562 ,  C04B2235/6565 ,  C04B2235/6567 ,  C04B2235/6581 ,  C04B2235/6585 ,  C04B2235/6586 ,  C04B2235/668 ,  C04B2235/77 ,  C04B2235/786 ,  C04B2235/95 ,  C04B2235/963 ,  C23C14/08 ,  C23C14/3414 ,  H01B1/08 ,  H01J1/00 ,  H01L31/022466 ,  H01L33/42

Abstract: A target for sputtering which enables to attain high rate film-formation of a transparent conductive film suitable for a blue LED or a solar cell. A oxide sintered body includes an indium oxide and a cerium oxide, and one or more oxide of titanium, zirconium, hafnium, molybdenum and tungsten. The cerium content is 0.3 to 9% by atom, as an atomicity ratio of Ce/(In+Ce+M), the M element content is equal to or lower than 1% by atom, as an atomicity ratio of M/(In+Ce+M), and the total content of cerium and the M element is equal to or lower than 9% by atom, as an atomicity ratio of (Ce+M)/(In+Ce+M). The oxide sintered body has an In2O3 phase of a bixbyite structure has a CeO2 phase of a fluorite-type structure finely dispersed as crystal grains having an average particle diameter of equal to or smaller than 3 μm.

Abstract translation: 能够实现适合于蓝色LED或太阳能电池的透明导电膜的高速成膜的溅射靶。 氧化物烧结体包括氧化铟和氧化铈，以及一种或多种钛，锆，铪，钼和钨的氧化物。 铈含量为原子数为0.3〜9原子数，以Ce /（In + Ce + M）的原子数比计，M元素含量为1原子％以下，原子比为M /（In + Ce + M），并且铈和M元素的总含量等于或低于9原子％，作为（Ce + M）/（In + Ce + M）的原子数比。 氧化物烧结体具有二氧化硅结构的In 2 O 3相，其具有以平均粒径为3μm以下的晶粒细分散的萤石型结构的CeO 2相。

公开(公告)号：US20100055347A1

公开(公告)日：2010-03-04

申请号：US12547648

申请日：2009-08-26

Applicant: HITOSHI KATO ,  Yasushi Takeuchi ,  Shigehiro Ushikubo ,  Hiroyuki Kikuchi

Inventor： HITOSHI KATO ,  Yasushi Takeuchi ,  Shigehiro Ushikubo ,  Hiroyuki Kikuchi

IPC: C23C16/50 ,  H05H1/24 ,  C23C16/00

CPC classification number: H01J37/32559 ,  C23C16/452 ,  C23C16/45517 ,  C23C16/45536 ,  C23C16/45551 ,  C23C16/45563 ,  C23C16/45565 ,  C23C16/45578 ,  C23C16/4584 ,  C23C16/50 ,  C23C16/505 ,  C23C16/509 ,  C23C16/5093 ,  H01J1/00 ,  H01J37/3244 ,  H01J37/32449

Abstract: An activated gas injector includes a flow passage defining member partitioned into a gas activation passage and a gas introduction passage by a partition wall; a gas introduction port through which a process gas is introduced into the gas introduction passage; a pair of electrodes to be supplied with electrical power to activate the process gas, wherein the electrodes extend along the partition wall in the gas activation passage; through-holes formed in the partition wall and arranged along a longitudinal direction of the electrodes, wherein the through-holes allow the process gas to flow from the gas introduction passage to the gas activation passage; and gas ejection holes provided in the gas activation passage along the longitudinal direction of the electrodes, wherein the gas ejection holes allow the process gas activated in the gas activation passage to be ejected therefrom.

Abstract translation: 活性气体喷射器包括分隔成气体激活通道的流动通道限定部件和通过分隔壁的气体引入通道; 气体导入口，通过该气体导入口将工艺气体引入到气体导入通路内; 一对电极被供电以激活处理气体，其中电极沿着气体激活通道中的分隔壁延伸; 所述通孔形成在所述分隔壁上并且沿着所述电极的纵向方向布置，其中所述通孔允许所述工艺气体从所述气体引入通道流到所述气体激活通道; 以及沿着电极的纵向方向设置在气体致动通道中的气体喷射孔，其中气体喷射孔允许从气体激活通道中激活的处理气体从其喷射。

公开(公告)号：US5218262A

公开(公告)日：1993-06-08

申请号：US863640

申请日：1992-04-06

Applicant: Masami Taguchi ,  Charles A. Brantingham

Inventor： Masami Taguchi ,  Charles A. Brantingham

IPC: G01B7/34 ,  G01N27/00 ,  G01Q60/10 ,  G01Q60/16 ,  G01Q70/02 ,  G12B17/02 ,  H01J1/00 ,  H01J37/02 ,  H01J37/28

CPC classification number: G01Q60/16 ,  B82Y35/00 ,  G01Q70/02 ,  H01J1/00 ,  H01J37/02 ,  H01J37/067 ,  H01J2237/032

Abstract: In an electrode assembly, an electrode holder has a forward end thereof affixed coaxially to an electrode tip. An attachment member is affixed to the holder rearwardly of the electrode. A retaining assembly includes an outer cup component, an inner cup component and a magnet therein. An electrical lead is connected to the inner cup component. The electrode assembly fits coaxially into the retaining assembly with the attachment member adjacent to and retained by the magnet. The electrode holder is seated in electrical contact with the inner cup component. The holder, cup components and attachment member are magnetically permeable, and separated in each assembly by insulators, so as to effect an outer magnetic shielding loop and an inner magnetic shielding loop.

公开(公告)号：US3558923A

公开(公告)日：1971-01-26

申请号：US3558923D

申请日：1967-09-12

Applicant: BELL TELEPHONE LABOR INC

Inventor： UENOHARA MICHIYUKI

IPC: H01J1/00 ,  H03K3/02 ,  H04J3/00 ,  H04Q1/36 ,  H03K5/01

CPC classification number: H03K3/02 ,  H01J1/00 ,  H04J3/00 ,  H04Q1/36

Abstract: A two-valley semiconductor device, biased below the threshold voltage for triggering or sustaining oscillations, is triggered by input pulses to release an output that is an amplified or regenerated form of the input. In another embodiment an analogue signal input is encoded into a pulse position modulation train.

公开(公告)号：US3446917A

公开(公告)日：1969-05-27

申请号：US3446917D

申请日：1965-06-07

Applicant: BELL TELEPHONE LABOR INC

Inventor： INOSE HIROSHI ,  SAITO TADAO

IPC: H01J1/00 ,  H04J3/00 ,  H04Q11/04 ,  H04J5/00

CPC classification number: H01J1/00 ,  H04J3/00 ,  H04Q11/04

公开(公告)号：US2468037A

公开(公告)日：1949-04-26

申请号：US73471247

申请日：1947-03-14

Applicant: CLARK DUDLEY B

Inventor： CLARK DUDLEY B

IPC: H01J1/00 ,  H01J13/50

CPC classification number: H01J1/00 ,  H01J13/50 ,  H01J2893/005 ,  H01J2893/0088

公开(公告)号：US2309642A

公开(公告)日：1943-02-02

申请号：US37000740

申请日：1940-12-13

Applicant: RAYTHEON PRODUCTION CORP

Inventor： ROBERT GRAY

IPC: H01J1/00

CPC classification number: H01J1/00 ,  H01J2893/0051