公开(公告)号：US5723940A

公开(公告)日：1998-03-03

申请号：US471296

申请日：1995-06-06

Applicant: Gerardus G.P. Van Gorkom ,  Petrus H.F. Trompenaars ,  Gerardus A.H.M. Vrijssen ,  Siebe T. De Zwart ,  Bernardus H.W. Hendriks ,  Nicolaas Lambert

Inventor： Gerardus G.P. Van Gorkom ,  Petrus H.F. Trompenaars ,  Gerardus A.H.M. Vrijssen ,  Siebe T. De Zwart ,  Bernardus H.W. Hendriks ,  Nicolaas Lambert

IPC: H01J31/12 ,  H01J29/82 ,  H01J29/87 ,  H01J31/15 ,  H04N5/70 ,  H01J29/70 ,  H01J1/62 ,  H01J3/10 ,  H01J63/04

CPC classification number: H01J31/124 ,  H04N5/70

Abstract: Flat-panel type picture display device having a luminescent screen and a large number of electron propagation ducts operating by means of electron wall interaction. Electrons are withdrawn from the ducts by means of an addressing system, whereafter these electrons are directed towards desired locations on the luminescent screen. An apertured spacer plate of electrically insulating material for passing electrons is arranged between the addressing system and the screen. To enable large voltage differences to be applied across the dimension of thickness of the spacer plate, the spacer plate is provided with a high-ohmic layer, or with a pattern of a low-ohmic material, or with an equalization layer at one side and with a low-ohmic layer at the other side, and at least the walls of the apertures are preferably coated with a material having a low secondary emission.

公开(公告)号：US5638388A

公开(公告)日：1997-06-10

申请号：US446195

申请日：1995-05-19

Applicant: William L. Nighan, Jr. ,  John Cole

Inventor： William L. Nighan, Jr. ,  John Cole

IPC: H01S3/094 ,  H01S3/081 ,  H01S3/0941 ,  H01S3/109 ,  H01S3/13 ,  H01S3/16 ,  H01J3/10

CPC classification number: H01S3/109 ,  H01S3/081 ,  H01S3/094053 ,  H01S3/09415 ,  H01S3/13 ,  H01S3/1611 ,  H01S3/1643 ,  H01S3/1653 ,  H01S3/1673

Abstract: A diode pumped, multiaxial mode, intracavity frequency doubled laser resonator has high amplitude stability, meaning that the percent root mean square noise (%RMS) of the doubled output beam power is low. A diode pump source supplies a pump beam to a laser crystal positioned in a resonator cavity and produces a multiaxial mode infrared beam that is incident on a doubling crystal, also positioned in the resonator. A frequency doubled output beam is produced that has an RMS of less than 3%, and in some cases less than 0.2%. The laser is highly efficient, provides high output power, and its output beam is of high spatial quality.

Abstract translation: 二极管泵浦，多轴模式，腔内倍频激光谐振器具有高振幅稳定性，意味着双倍输出光束功率的均方根噪声百分比（％RMS）低。 二极管泵浦源将泵浦光束提供给位于谐振器腔中的激光晶体，并产生入射在双晶晶体上并且位于谐振器中的多轴模式红外光束。 产生频率倍增的输出光束，其RMS小于3％，在某些情况下小于0.2％。 激光器高效，提供高输出功率，其输出光束具有高空间质量。

公开(公告)号：US4549091A

公开(公告)日：1985-10-22

申请号：US521054

申请日：1983-08-08

Applicant: Theodore S. Fahlen ,  Barton Mass

Inventor： Theodore S. Fahlen ,  Barton Mass

IPC: H01S3/097 ,  H03K3/55 ,  G11C13/02 ,  H01J3/10

CPC classification number: H03K3/55 ,  H01S3/097

Abstract: An electrical excitation circuit is disclosed for a gas laser. The electrical excitation circuit includes a charging circuit connected in series with a pulse forming network between a power source and the laser load. The charging circuit includes a capacitor charged by the power source and a thyratron for transferring voltage to the pulse forming network. Alternatively, the charging circuit includes a capacitor charged upon the firing of a silicon controlled rectifier through a saturable step-up transformer which saturates for transferring voltage to the pulse forming network. The pulse forming network includes a saturable inductor switch positioned with respect to a capacitor so that when the voltage on the capacitor reaches a predetermined level, saturation of the saturable inductor switch releases electrical energy stored in the capacitor to the laser load.

Abstract translation: 公开了一种用于气体激光器的电激励电路。 电激励电路包括与电源和激光负载之间的脉冲形成网络串联连接的充电电路。 充电电路包括由电源充电的电容器和用于将电压传送到脉冲形成网络的闸流管。 或者，充电电路包括在通过可饱和升压变压器烧制可控硅整流器时充电的电容器，其饱和以将电压传送到脉冲形成网络。 脉冲形成网络包括相对于电容器定位的可饱和电感器开关，使得当电容器上的电压达到预定水平时，饱和电感器开关的饱和度释放存储在电容器中的激光负载的电能。

公开(公告)号：US12080507B2

公开(公告)日：2024-09-03

申请号：US17763186

申请日：2020-09-04

Applicant: Photo electron Soul Inc.

Inventor： Hokuto Iijima

IPC: H01J3/02 ,  H01J1/34 ,  H01J1/52 ,  H01J3/10 ,  H01J37/073

CPC classification number: H01J3/021 ,  H01J1/34 ,  H01J1/52 ,  H01J3/10 ,  H01J37/073 ,  H01J2237/06333

Abstract: An object is to provide an electron gun that makes it possible to verify whether or not an electron beam emitted form a photocathode is misaligned from a designed emission center axis. The object can be achieved by an electron gun including: a light source; a photocathode; and an anode. The electron gun includes an intermediate electrode arranged between the photocathode and the anode, an electron beam shielding member configured to block a part of an electron beam, a measurement unit configured to measure an intensity of an electron beam blocked by the electron beam shielding member, and an electron beam emission direction deflector arranged between the anode and the electron beam shielding member and configured to change a position where an electron beam that passed through the anode reaches the electron beam shielding member. The intermediate electrode has an electron beam passage hole and a drift space.

公开(公告)号：US10950407B2

公开(公告)日：2021-03-16

申请号：US16897828

申请日：2020-06-10

Applicant: New Japan Radio Co., Ltd.

Inventor： Toru Kimura ,  Misao Iseki ,  Hideyuki Obata

IPC: H01J13/02 ,  H01J3/02 ,  H01J3/10

Abstract: An electron gun comprising a cathode having an electron emitting surface and whose planar shape is circular; a heater; an anode being arranged to oppose the cathode; and a heat resistant member. The anode applies a positive potential relative to the cathode to extract electrons in a predetermined direction. The cathode has, in a central portion thereof, a through hole along a central axis of the cathode. The heat resistant member has a first portion to close the through hole and a second portion being positioned between the cathode and the heater.

公开(公告)号：US10020160B2

公开(公告)日：2018-07-10

申请号：US15417887

申请日：2017-01-27

Applicant: Hitachi High-Technologies Corporation

Inventor： Koichi Kuroda ,  Hajime Kawano ,  Makoto Suzuki ,  Yuzuru Mizuhara

IPC: G01N23/00 ,  H01J37/00 ,  H01J3/10 ,  H01J37/147 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/147 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2806 ,  H01J2237/2815

Abstract: An object of the present invention is to provide a charged particle beam device which can realize improved contrast of an elongated pattern in a specific direction, such as a groove-like pattern. In order to achieve the above-described object, the present invention proposes a charged particle beam device including a detector for detecting a charged particle obtained based on a charged particle beam discharged to a sample. The charged particle beam device includes a charged particle passage restricting member that has at least one of an arcuate groove and a groove having a longitudinal direction in a plurality of directions, and a deflector that deflects the charged particle discharged toward the groove from the sample. The charged particle discharged from the sample is deflected to a designated position of the groove.

公开(公告)号：US08586942B2

公开(公告)日：2013-11-19

申请号：US13639998

申请日：2012-01-20

Applicant: Taizo Honda ,  Hisashi Harada ,  Yuehu Pu ,  Masahiro Ikeda ,  Kazushi Hanakawa ,  Toshihiro Otani ,  Tadashi Katayose ,  Yukiko Yamada

Inventor： Taizo Honda ,  Hisashi Harada ,  Yuehu Pu ,  Masahiro Ikeda ,  Kazushi Hanakawa ,  Toshihiro Otani ,  Tadashi Katayose ,  Yukiko Yamada

IPC: H01J3/10

CPC classification number: A61N5/1048 ,  A61N5/1043 ,  A61N5/1071 ,  A61N2005/1074 ,  A61N2005/1087 ,  G01T1/29 ,  G21K5/00 ,  G21K5/02

Abstract: A charged particle beam position monitor is provided with a plurality of position monitors and a beam data processing device that performs calculation processing of the state of a charged particle beam, based on a plurality of signals outputted from the position monitors. The beam data processing device includes a plurality of channel data conversion units that perform AD conversion processing of the plurality of signals outputted from the position monitors; a position size processing unit, for each of the position monitors, that calculates the beam position of the beam, based on voltage information obtained through the AD conversion processing; and an integrated control unit that controls the plurality of channel data conversion units in such a way that while the beam is irradiated onto an irradiation subject, AD conversion processing of the signals is performed at different timings for the respective position monitors.

Abstract translation: 带电粒子束位置监视器具有多个位置监视器和根据从位置监视器输出的多个信号执行带电粒子束的状态的计算处理的波束数据处理装置。 所述波束数据处理装置包括对从所述位置监视器输出的所述多个信号进行AD转换处理的多个信道数据变换部; 基于通过AD转换处理获得的电压信息，对位置监视器中的每一个计算光束位置的位置尺寸处理单元; 以及集成控制单元，其以这样的方式控制多个通道数据转换单元，即当将光束照射到照射对象时，对于各个位置监视器，在不同的定时执行信号的AD转换处理。

公开(公告)号：US06853653B2

公开(公告)日：2005-02-08

申请号：US10036925

申请日：2001-12-21

Applicant: Ronald L. Spangler ,  Jacob P. Lipcon ,  John A. Rule ,  Robert N. Jacques ,  Armen Kroyan ,  Ivan Lalovic ,  Igor V. Fomenkov ,  John M. Algots

Inventor： Ronald L. Spangler ,  Jacob P. Lipcon ,  John A. Rule ,  Robert N. Jacques ,  Armen Kroyan ,  Ivan Lalovic ,  Igor V. Fomenkov ,  John M. Algots

IPC: B41C20060101 ,  B41C1/00 ,  G03F7/20 ,  H01L21/027 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/08 ,  H01S3/081 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/10 ,  H01S3/102 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/11 ,  H01S3/13 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/223 ,  H01S3/225 ,  H01J3/10

CPC classification number: G03F7/70575 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70933 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0812 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/13 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258

Abstract: An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.

公开(公告)号：US5768302A

公开(公告)日：1998-06-16

申请号：US859620

申请日：1997-05-20

Applicant: Richard W. Wallace ,  Walter R. Bosenberg ,  Jason I. Alexander

Inventor： Richard W. Wallace ,  Walter R. Bosenberg ,  Jason I. Alexander

IPC: G02F1/35 ,  G02F1/39 ,  H01S3/08 ,  H01J3/10

CPC classification number: G02F1/3532 ,  G02F1/39 ,  G02F2001/3548 ,  H01S3/08086

Abstract: A laser system in which an intense laser beam of a predefined pumping wavelength traverses a non-linear material, such as crystalline lithium niobate, that has been impressed with one or more quasi phase matching (QPM) gratings is disclosed. Quasi phase matching compensates for the dispersion or birefringence in a non-linear material by modulating the non-linearity with the proper period such that the different wavelengths involved in the non-linear process stay in phase over a long interaction length. The first QPM grating promotes the parametric generation of a resonant signal whose wavelength is determined by the grating period. According to the invention, either a second QPM grating impressed in the same medium or a different order of the first QPM grating promotes the non-linear interaction between the resonant signal and another optical signal traversing the non-linear material. The multi-step process allows efficient generation of high power radiation in wavelength regions, such as the blue, or red, not easily accessible otherwise.

Abstract translation: 公开了一种激光系统，其中预定的泵浦波长的激光束穿过已经被一个或多个准相位匹配（QPM）光栅照射的非线性材料，例如晶体铌酸锂。 准相位匹配通过以适当的周期调制非线性来补偿非线性材料中的色散或双折射，使得非线性过程中涉及的不同波长在长的相互作用长度上保持同相。 第一个QPM光栅促进了波长由光栅周期决定的谐振信号的参数产生。 根据本发明，施加在相同介质中的第二QPM光栅或者第一QPM光栅的不同顺序促进了谐振信号和穿过非线性材料的另一光信号之间的非线性相互作用。 多步骤过程允许在波长区域（例如蓝色或红色）中有效地产生高功率辐射，否则不容易获得。

公开(公告)号：US4956578A

公开(公告)日：1990-09-11

申请号：US224912

申请日：1988-07-27

Applicant: Akira Shimizu ,  Hidetoshi Suzuki ,  Masahiko Okunuki ,  Haruhito Ono ,  Ichiro Nomura ,  Yoshikazu Banno ,  Toshihiko Takeda ,  Tetsuya Kaneko

Inventor： Akira Shimizu ,  Hidetoshi Suzuki ,  Masahiko Okunuki ,  Haruhito Ono ,  Ichiro Nomura ,  Yoshikazu Banno ,  Toshihiko Takeda ,  Tetsuya Kaneko

IPC: H01J3/10 ,  H01J1/316 ,  H01J3/18 ,  H01J3/30

CPC classification number: H01J1/316 ,  H01J2201/3165

Abstract: A surface conduction electron-emitting device includes a high-potential electrode provided on a substrate surface, an electron-emitting region provided in contact with the periphery of an exposed part of the high-potential electrode, and a low-potential electrode in contact with the periphery of the electron-emitting region. The low-potential electrode may project upward in the thickness direction of the substrate to a higher level than the high-potential electrode. A device for applying a voltage may further provided between the high-potential electrode and low-potential electrode. The low-potential electrode may be divided into plural numbers and potential may be applied to each of the low-potential electrodes independently.