APPARATUS WITH SELF-ALIGNED CONNECTION AND RELATED METHODS

    公开(公告)号:US20240194529A1

    公开(公告)日:2024-06-13

    申请号:US18507019

    申请日:2023-11-10

    摘要: Semiconductor devices including self-aligned vertical connectors are disclosed herein. The self-aligned vertical connectors may have upper and lower portions that are concentric or have fixed relative positions across the connectors. The concentric or fixed relative positions may be aligned with a corresponding circuit or a bit line based on forming a conformal depression by depositing a controlled amount of conformal layer that fills wells adjacent to the bit line at a target location of the vertical connector. The vertical connector can be formed using the conformal depression, which may be self-aligned relative to the bit line as a result of filling the wells with the controlled amount of the conformal layer.

    SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
    16.
    发明公开

    公开(公告)号:US20240138159A1

    公开(公告)日:2024-04-25

    申请号:US18487248

    申请日:2023-10-15

    申请人: ROHM CO., LTD.

    发明人: Takeharu IMAI

    IPC分类号: H10B99/00 H10B69/00

    CPC分类号: H10B99/14 H10B69/00

    摘要: A semiconductor integrated circuit device includes: a terminal; an internal resistor that is any one of a pull-up resistor configured so that a first end of the pull-up resistor is connected to the terminal and a first constant voltage is applied to a second end of the pull-up resistor, or a pull-down resistor configured so that a first end of the pull-down resistor is connected to the terminal and a ground voltage is applied to a second end of the pull-down resistor; and an AD converter configured so that a voltage of the terminal is converted into digital data having a number of bits of 2 or more.

    Three-dimensional semiconductor memory device

    公开(公告)号:US11839091B2

    公开(公告)日:2023-12-05

    申请号:US17011156

    申请日:2020-09-03

    IPC分类号: H10B43/20 H10B69/00

    CPC分类号: H10B69/00 H10B43/20

    摘要: A three-dimensional semiconductor memory device including a substrate including a cell array region and a first connection region arranged in a first direction; and a first block structure on the substrate, the first block structure including a lower stack including a plurality of lower electrodes vertically stacked on the substrate; and intermediate stacks exposing the lower stack, the intermediate stacks including a plurality of intermediate electrodes vertically stacked on the lower stack, wherein, on the cell array region, the first block structure has a first width in a second direction crossing the first direction, and wherein, on the first connection region, the first block structure has a second width, which is larger than the first width, in the second direction.