APPARATUS AND METHOD FOR PLACING SOLDER BALLS
    221.
    发明申请
    APPARATUS AND METHOD FOR PLACING SOLDER BALLS 有权
    用于放置焊接棒的装置和方法

    公开(公告)号:US20130171816A1

    公开(公告)日:2013-07-04

    申请号:US13340275

    申请日:2011-12-29

    Applicant: Yonggang Jin

    Inventor: Yonggang Jin

    Abstract: A system and process for forming a ball grid array on a substrate includes defining a plurality of openings in a resist layer on the substrate, and forming a plurality of openings in the resist layer, each positioned over a contact pad of the substrate. Flux is then deposited in the openings, and solder balls are positioned in each opening with the flux. Solder bumps are formed by reflowing the solder balls in the respective openings. The resist layer is then removed, leaving an array of solder bumps on the substrate. The flux can be deposited by depositing a layer of flux, then removing the flux, except a portion that remains in each opening. Solder balls can be positioned by moving a ball feeder across the resist layer and dropping a solder ball each time an aperture in the ball feeder aligns with an opening in the resist layer.

    Abstract translation: 用于在衬底上形成球栅阵列的系统和方法包括在衬底上的抗蚀剂层中限定多个开口,并且在抗蚀剂层中形成多个开口,每个位于衬底的接触焊盘上方。 然后将焊剂沉积在开口中,并且焊剂球通过焊剂位于每个开口中。 通过在相应的开口中回流焊球来形成焊料凸点。 然后去除抗蚀剂层,留下衬底上的焊料凸块阵列。 可以通过沉积一层焊剂,然后除去焊剂,除了保留在每个开口中的部分之外,可以沉积焊剂。 焊球可以通过使球进料器横过抗蚀剂层移动而定位,并且每当球进料器中的孔与抗蚀剂层中的开口对准时,下降焊球。

    PLASMA TREATMENT ON SEMICONDUCTOR WAFERS
    229.
    发明申请
    PLASMA TREATMENT ON SEMICONDUCTOR WAFERS 有权
    半导体波长处理等离子体处理

    公开(公告)号:US20120168938A1

    公开(公告)日:2012-07-05

    申请号:US13327563

    申请日:2011-12-15

    Abstract: A semiconductor wafer has integrated circuits formed thereon and a top passivation layer applied. The passivation layer is patterned and selectively etched to expose contact pads on each semiconductor die. The wafer is exposed to ionized gas causing the upper surface of passivation layer to roughen and to slightly roughen the upper surface of the contact pads. The wafer is cut to form a plurality of semiconductor dies each with a roughened passivation layer. The plurality of semiconductor dies are placed on an adhesive layer and a reconstituted wafer formed. Redistribution layers are formed to complete the semiconductor package having electrical contacts for establishing electrical connections external to the semiconductor package, after which the wafer is singulated to separate the dice.

    Abstract translation: 半导体晶片具有形成在其上的集成电路和施加的顶部钝化层。 钝化层被图案化并选择性地蚀刻以暴露每个半导体管芯上的接触焊盘。 将晶片暴露于电离气体中,导致钝化层的上表面变粗糙,并使接触垫的上表面略微变糙。 切割晶片以形成多个具有粗糙化钝化层的半导体管芯。 多个半导体管芯被放置在粘合剂层上并形成重构的晶片。 形成再分布层,以完成具有用于建立半导体封装外部的电连接的电触头的半导体封装,然后将晶片单分割以分离晶片。

    IMAGE SENSOR CIRCUIT, SYSTEM, AND METHOD
    230.
    发明申请
    IMAGE SENSOR CIRCUIT, SYSTEM, AND METHOD 有权
    图像传感器电路,系统和方法

    公开(公告)号:US20120168888A1

    公开(公告)日:2012-07-05

    申请号:US13029665

    申请日:2011-02-17

    Abstract: A process of forming optical sensors includes sealing an imaging portion of each of a plurality of optical sensors on a sensor wafer with a transparent material. The operation of sealing leaves a bonding portion of each of the optical sensors exposed. The process further includes cutting the wafer into a plurality of image sensor dies after sealing the optical sensors such that each image sensor die includes one of the optical sensors sealed with a corresponding portion of the transparent material.

    Abstract translation: 形成光学传感器的过程包括用透明材料密封传感器晶片上的多个光学传感器中的每一个的成像部分。 密封的操作使每个光学传感器的接合部分暴露出来。 该方法还包括在密封光学传感器之后将晶片切割成多个图像传感器管芯,使得每个图像传感器管芯包括用透明材料的相应部分密封的一个光学传感器。

Patent Agency Ranking