公开(公告)号：US20140170335A1

公开(公告)日：2014-06-19

申请号：US13716829

申请日：2012-12-17

申请人： INTERMOLECULAR, INC.

发明人： ShouQian Shao ,  Chi-I Lang ,  Jingang Su

IPC分类号： C23C16/52

CPC分类号： C23C16/45544 ,  C23C16/04 ,  C23C16/042 ,  C23C16/45536 ,  C23C16/45565 ,  C23C16/4584 ,  C23C16/4586 ,  C23C16/50 ,  C23C16/52

摘要： Apparatus and methods for depositing materials on a plurality of site-isolated regions on a substrate are provided. The deposition uses PECVD or PEALD. The apparatus include an inner chamber with an aperture and barrier that can be used to isolate the regions during the deposition and prevent the remaining portions of the substrate from being exposed to the deposition process. The process parameters for the deposition process are varied among the site-isolate regions in a combinatorial manner.

摘要翻译： 提供了用于在衬底上的多个位置隔离区域上沉积材料的设备和方法。 沉积使用PECVD或PEALD。 该装置包括具有开口和屏障的内室，其可以用于在沉积期间隔离区域，并且防止基板的剩余部分暴露于沉积工艺。 用于沉积过程的工艺参数以组合方式在位点隔离区域之间变化。

公开(公告)号：US20140166616A1

公开(公告)日：2014-06-19

申请号：US13717478

申请日：2012-12-17

申请人： INTERMOLECULAR, INC.

发明人： Sunil Shanker ,  Tony P. Chiang ,  Chi-I Lang ,  Sandip Niyogi

IPC分类号： C23C16/50 ,  B44C1/22

CPC分类号： C23C16/50 ,  C23C16/452 ,  C23C16/45565 ,  C23C16/45574 ,  C23C16/4584

摘要： Methods and apparatus for processing using a remote plasma source are disclosed. The apparatus includes an outer chamber, a remote plasma source, and a showerhead. Inert gas ports within the showerhead assembly can be used to alter the concentration and energy of reactive radical or reactive neutral species generated by the remote plasma source in different regions of the showerhead. This allows the showerhead to be used to apply a surface treatment to different regions of the surface of a substrate. Varying parameters such as the remote plasma parameters, the inert gas flows, pressure, and the like allow different regions of the substrate to be treated in a combinatorial manner.

摘要翻译： 公开了使用远程等离子体源的处理方法和装置。 该装置包括外室，远程等离子体源和喷头。 喷头组件内的惰性气体端口可用于改变由喷头的不同区域中的远程等离子体源产生的反应性基团或反应中性物质的浓度和能量。 这允许使用喷头来对表面的不同区域进行表面处理。 诸如远程等离子体参数，惰性气体流量，压力等的不同参数允许以组合的方式处理衬底的不同区域。

公开(公告)号：US20140144512A1

公开(公告)日：2014-05-29

申请号：US13687906

申请日：2012-11-28

申请人： INTERMOLECULAR, INC.

发明人： Satbir Kahlon ,  Aaron T. Francis ,  Chi-I Lang ,  Gregory P. Lim ,  Jeffrey Chih-Hou Lowe ,  Robert Anthony Sculac

IPC分类号： B65D83/00

CPC分类号： H01L21/00 ,  H01L21/67017 ,  H01L21/6715 ,  Y10T137/0318 ,  Y10T137/0424 ,  Y10T137/86493 ,  Y10T137/87249 ,  Y10T137/87281

摘要： Provided are methods and systems for dispensing different chemicals used for high productivity combinatorial processing. A dispense panel may include multiple inlet lines for supplying different chemicals. Each inlet line is connected to its own three-way valve that either allows the supplied chemical to flow from the inlet line towards a dispense valve connected to a dispense manifold (during dispensing of the supplied chemical) or allows another chemical to flow from the dispense valve to a waste manifold (during priming of the dispense manifold with this other chemical). Specifically, during priming a chemical supplied from its inlet line and is passed through a corresponding three-way valve and is directed to its dispense valve and then into the dispense manifold. Other dispense valves and three-way valves of the dispense panel allow this chemical to flow out of the dispense manifold, thereby priming remaining parts of the panel.

摘要翻译： 提供了用于分配用于高生产率组合处理的不同化学品的方法和系统。 分配面板可以包括用于供应不同化学品的多个入口管线。 每个入口管路连接到其自己的三通阀，其允许供应的化学品从入口管线流向连接到分配歧管的分配阀（在分配供应的化学品期间）或允许另一种化学品从分配流出 阀门到废液歧管（在使用这种其他化学品的分配歧管启动期间）。 具体来说，在从其入口管线引入化学物质并通过相应的三通阀时，被引导到其分配阀然后进入分配歧管。 分配面板的其他分配阀和三通阀允许该化学品流出分配歧管，从而引发面板的剩余部分。

公开(公告)号：US20130338305A1

公开(公告)日：2013-12-19

申请号：US13971613

申请日：2013-08-20

申请人： Intermolecular, Inc.

发明人： Anh Duong ,  Tony Chiang ,  Zachary M. Fresco ,  Nitin Kumar ,  Chi-I Lang ,  Jinhong Tong ,  Anna Tsizelmon

IPC分类号： C09D129/04

CPC分类号： H01L23/5329 ,  C09D129/04 ,  H01L21/02063 ,  H01L21/02074 ,  H01L21/3105 ,  H01L21/31058 ,  H01L21/76814 ,  H01L21/7682 ,  H01L21/76826 ,  H01L21/76829 ,  H01L2221/1063 ,  H01L2924/0002 ,  H01L2924/00

摘要： Methods of modifying a patterned semiconductor substrate are presented including: providing a patterned semiconductor substrate surface including a dielectric region and a conductive region; and applying an amphiphilic surface modifier to the dielectric region to modify the dielectric region. In some embodiments, modifying the dielectric region includes modifying a wetting angle of the dielectric region. In some embodiments, modifying the wetting angle includes making a surface of the dielectric region hydrophilic. In some embodiments, methods further include applying an aqueous solution to the patterned semiconductor substrate surface. In some embodiments, the conductive region is selectively enhanced by the aqueous solution. In some embodiments, methods further include providing the dielectric region formed of a low-k dielectric material. In some embodiments, applying the amphiphilic surface modifier modifies an interaction of the low-k dielectric region with a subsequent process.

公开(公告)号：US20130217238A1

公开(公告)日：2013-08-22

申请号：US13829290

申请日：2013-03-14

申请人： Intermolecular, Inc.

发明人： Thomas R. Boussie ,  Tony P. Chiang ,  Anh Duong ,  Zachary Fresco ,  Nitin Kumar ,  Chi-I Lang ,  Sandra G. Malhotra ,  Jinhong Tong

IPC分类号： H01L21/02

CPC分类号： H01L21/02112 ,  H01L21/02123 ,  H01L21/3105 ,  H01L21/321 ,  H01L21/76834 ,  H01L21/7685

摘要： Methods for substrate processing are described. The methods include forming a material layer on a substrate. The methods include selecting constituents of a molecular masking layer (MML) to remove an effect of variations in the material layer as a result of substrate processing. The methods include normalizing the surface characteristics of the material layer by selectively depositing the MML on the material layer.

摘要翻译： 描述基板处理方法。 所述方法包括在基底上形成材料层。 所述方法包括选择分子屏蔽层（MML）的成分以消除作为衬底处理的结果的材料层中的变化的影响。 所述方法包括通过在材料层上选择性地沉积MML来使材料层的表面特性归一化。

公开(公告)号：US20130214808A1

公开(公告)日：2013-08-22

申请号：US13849749

申请日：2013-03-25

申请人： Intermolecular, Inc.

发明人： Yun Wang ,  Tony P. Chiang ,  Chi-I Lang

IPC分类号： G01R31/26

CPC分类号： G01R31/26 ,  G01N21/55 ,  G01R31/2607 ,  H02S50/10

摘要： Measuring current-voltage (I-V) characteristics of a solar cell using a lamp that emits light, a substrate that includes a plurality of solar cells, a positive electrode attached to the solar cells, and a negative electrode peripherally deposited around each of the solar cells and connected to a common ground, an articulation platform coupled to the substrate, a multi-probe switching matrix or a Z-stage device, a programmable switch box coupled to the multi-probe switching matrix or Z-stage device and selectively articulating the probes by raising the probes until in contact with at least one of the positive electrode and the negative electrode and lowering the probes until contact is lost with at least one of the positive electrode and the negative electrode, a source meter coupled to the programmable switch box and measuring the I-V characteristics of the substrate.

摘要翻译： 使用发光灯的太阳能电池测量电流 - 电压（IV）特性，包括多个太阳能电池的基板，附着到太阳能电池的正电极和周围沉积在每个太阳能电池周围的负电极 并且连接到公共接地，耦合到衬底的关节式平台，多探针开关矩阵或Z级装置，耦合到多探针开关矩阵或Z级装置的可编程开关盒，并且选择性地将探针 通过将探针升高直到与正电极和负电极中的至少一个接触并且降低探针，直到与正电极和负电极中的至少一个接触而丢失，源计量器耦合到可编程开关盒和 测量衬底的IV特性。

公开(公告)号：US09245744B2

公开(公告)日：2016-01-26

申请号：US14253712

申请日：2014-04-15

申请人： Intermolecular, Inc.

发明人： Sunil Shanker ,  Tony P. Chiang ,  Chi-I Lang

IPC分类号： C23C16/50 ,  C23C16/509 ,  H01L21/02 ,  C23C16/44 ,  C23C16/455 ,  H01J37/32 ,  C23C16/02 ,  C23C16/458 ,  H01L21/67 ,  H01L21/3065

CPC分类号： H01L21/02274 ,  C23C16/0227 ,  C23C16/44 ,  C23C16/45523 ,  C23C16/45525 ,  C23C16/45536 ,  C23C16/45548 ,  C23C16/45565 ,  C23C16/45574 ,  C23C16/4586 ,  C23C16/509 ,  C23C16/5096 ,  H01J37/32091 ,  H01J37/3244 ,  H01J37/32532 ,  H01J37/32541 ,  H01J37/32568 ,  H01J37/32715 ,  H01J37/32779 ,  H01L21/3065 ,  H01L21/67069

摘要： According to various embodiments of the disclosure, an apparatus and method for enhanced deposition and etch techniques is described, including a pedestal, the pedestal having at least two electrodes embedded in the pedestal, a showerhead above the pedestal, a plasma gas source connected to the showerhead, wherein the showerhead is configured to deliver plasma gas to a processing region between the showerhead and the substrate and a power source operably connected to the showerhead and the at least two electrodes with plasma being substantially contained in an area which corresponds with one electrode of the at least two electrodes.

摘要翻译： 根据本公开的各种实施例，描述了一种用于增强沉积和蚀刻技术的装置和方法，包括基座，具有至少两个嵌入基座的电极的基座，基座上方的喷头，连接到基座的等离子体气体源 淋浴头，其中所述喷头被构造成将等离子体气体输送到所述喷头和所述基板之间的处理区域，以及电源，其可操作地连接到所述喷头和所述至少两个电极，其中等离子体基本上包含在对应于 所述至少两个电极。

公开(公告)号：US09176181B2

公开(公告)日：2015-11-03

申请号：US13971325

申请日：2013-08-20

申请人： Intermolecular, Inc.

发明人： Yun Wang ,  Tony P. Chiang ,  Chi-I Lang

IPC分类号： G01R31/26 ,  G01N21/55 ,  H02S50/10

CPC分类号： G01R31/26 ,  G01N21/55 ,  G01R31/2607 ,  H02S50/10

摘要： Measuring current-voltage (I-V) characteristics of a solar cell using a lamp that emits light, a substrate that includes a plurality of solar cells, a positive electrode attached to the solar cells, and a negative electrode peripherally deposited around each of the solar cells and connected to a common ground, an articulation platform coupled to the substrate, a multi-probe switching matrix or a Z-stage device, a programmable switch box coupled to the multi-probe switching matrix or Z-stage device and selectively articulating the probes by raising the probes until in contact with at least one of the positive electrode and the negative electrode and lowering the probes until contact is lost with at least one of the positive electrode and the negative electrode, a source meter coupled to the programmable switch box and measuring the I-V characteristics of the substrate.

摘要翻译： 使用发光灯的太阳能电池测量电流 - 电压（IV）特性，包括多个太阳能电池的基板，附着到太阳能电池的正电极和周围沉积在每个太阳能电池周围的负电极 并且连接到公共接地，耦合到衬底的关节式平台，多探针开关矩阵或Z级装置，耦合到多探针开关矩阵或Z级装置的可编程开关盒，并且选择性地将探针 通过将探针升高直到与正电极和负电极中的至少一个接触并且降低探针，直到与正电极和负电极中的至少一个接触而丢失，源计量器耦合到可编程开关盒和 测量衬底的IV特性。

公开(公告)号：US08980709B2

公开(公告)日：2015-03-17

申请号：US14028281

申请日：2013-09-16

申请人： Intermolecular, Inc.

发明人： Tony P. Chiang ,  Chi-I Lang ,  Prashant B. Phatak

IPC分类号： H01L21/336 ,  H01L45/00 ,  H01L27/24

CPC分类号： H01L45/1608 ,  H01L27/2409 ,  H01L27/2463 ,  H01L45/10 ,  H01L45/1233 ,  H01L45/1253 ,  H01L45/14 ,  H01L45/148 ,  H01L45/149 ,  H01L45/1616 ,  H01L45/1641

摘要： A resistive-switching memory element is described. The memory element includes a first electrode, a porous layer over the first electrode including a point defect embedded in a plurality of pores of the porous layer, and a second electrode over the porous layer, wherein the nonvolatile memory element is configured to switch between a high resistive state and a low resistive state.

公开(公告)号：US20150001555A1

公开(公告)日：2015-01-01

申请号：US14488712

申请日：2014-09-17

申请人： Intermolecular, Inc.

发明人： Anh Duong ,  Tony Chiang ,  Zachary M. Fresco ,  Nitin Kumar ,  Chi-I Lang ,  Jinhong Tong ,  Anna Tsizelmon

IPC分类号： H01L23/532

CPC分类号： H01L23/5329 ,  C09D129/04 ,  H01L21/02063 ,  H01L21/02074 ,  H01L21/3105 ,  H01L21/31058 ,  H01L21/76814 ,  H01L21/7682 ,  H01L21/76826 ,  H01L21/76829 ,  H01L2221/1063 ,  H01L2924/0002 ,  H01L2924/00

摘要： Methods of modifying a patterned semiconductor substrate are presented including: providing a patterned semiconductor substrate surface including a dielectric region and a conductive region; and applying an amphiphilic surface modifier to the dielectric region to modify the dielectric region. In some embodiments, modifying the dielectric region includes modifying a wetting angle of the dielectric region. In some embodiments, modifying the wetting angle includes making a surface of the dielectric region hydrophilic. In some embodiments, methods further include applying an aqueous solution to the patterned semiconductor substrate surface. In some embodiments, the conductive region is selectively enhanced by the aqueous solution. In some embodiments, methods further include providing the dielectric region formed of a low-k dielectric material. In some embodiments, applying the amphiphilic surface modifier modifies an interaction of the low-k dielectric region with a subsequent process.

摘要翻译： 提出了修改图案化半导体衬底的方法，包括：提供包括电介质区域和导电区域的图案化半导体衬底表面; 以及将两亲表面改性剂施加到所述电介质区域以改变所述电介质区域。 在一些实施例中，修改电介质区域包括改变电介质区域的润湿角度。 在一些实施例中，改变润湿角度包括使介电区域的表面成为亲水性。 在一些实施方案中，方法还包括将水溶液施加到图案化的半导体衬底表面。 在一些实施例中，导电区域被水溶液选择性地增强。 在一些实施例中，方法还包括提供由低k电介质材料形成的电介质区域。 在一些实施方案中，施加两亲表面改性剂修饰低k电介质区域与随后工艺的相互作用。