公开(公告)号：US5013061A

公开(公告)日：1991-05-07

申请号：US303338

申请日：1989-01-26

申请人： Itaru Fujimura ,  Naoto Fukushima ,  Yukio Fukunaga ,  Yohsuke Akatsu

发明人： Itaru Fujimura ,  Naoto Fukushima ,  Yukio Fukunaga ,  Yohsuke Akatsu

IPC分类号： B60G17/04 ,  B60G17/00 ,  B60G17/0185 ,  B60G23/00

CPC分类号： B60G17/0185 ,  B60G2500/02 ,  B60G2500/30 ,  B60G2600/08

摘要： An an actively controlled suspension system includes a fail-safe system which is associated with a pressure control valve and detective of failure of a control circuit to perform fail-safe operation. The fail-safe system operates the pressure control valve in response to failure of the control circuit, to fix the valve position corresponding to a working fluid pressure in a working chamber defined in a suspension cylinder disposed between a vehicular body and a suspension member rotatably supporting a vehicular wheel, at a pressure value at or in the vicinity of a predetermined initial or neutral pressure.

摘要翻译： 一个主动控制的悬挂系统包括与压力控制阀相关联的故障安全系统和控制电路故障执行故障安全操作的检测。 故障安全系统响应于控制电路的故障操作压力控制阀，将对应于工作流体压力的阀位置固定在限定在设置在车体和悬架构件之间的悬架的工作室中，所述悬架圆筒可旋转地支撑 在预定的初始或中立压力或附近的压力值下的车辆轮。

公开(公告)号：US6022413A

公开(公告)日：2000-02-08

申请号：US664544

申请日：1996-06-17

申请人： Hiroyuki Shinozaki ,  Yukio Fukunaga ,  Takeshi Murakami ,  Kiwamu Tsukamoto

发明人： Hiroyuki Shinozaki ,  Yukio Fukunaga ,  Takeshi Murakami ,  Kiwamu Tsukamoto

IPC分类号： C23C16/458 ,  C23C16/46 ,  C30B25/10 ,  C30B25/12 ,  C23C14/00 ,  C23C16/00

CPC分类号： C30B25/10 ,  C23C16/4584 ,  C23C16/46 ,  C30B25/12

摘要： A thin-film vapor deposition apparatus has a reaction chamber for holding therein a substrate in an atmosphere isolated from an ambient atmosphere. For depositing a thin film on the substrate, the temperature of an inner wall of the reaction chamber is adjusted to control the temperature of the atmosphere in the reaction chamber, and the temperature of the substrate is also adjusted independently of the temperature of the atmosphere in the reaction chamber, while the substrate is being rotated at a high speed in the reaction chamber. Reactant gases required to deposit a thin film on the substrate are ejected from a reactant gas elector head toward the substrate in the reaction chamber. Remaining and excessive gases are discharged out of the reaction chamber.

摘要翻译： 薄膜蒸镀装置具有用于在与环境气氛隔离的气氛中保持基板的反应室。 为了在基板上沉积薄膜，调整反应室内壁的温度以控制反应室中的气氛的温度，并且基板的温度也独立于大气温度 反应室，同时基板在反应室中高速旋转。 在基板上沉积薄膜所需的反应物气体从反应气体选择器头向反应室内的基板喷出。 剩余的和过量的气体从反应室排出。

公开(公告)号：US5950925A

公开(公告)日：1999-09-14

申请号：US948579

申请日：1997-10-10

申请人： Yukio Fukunaga ,  Hiroyuki Shinozaki ,  Kiwamu Tsukamoto ,  Masao Saitoh

发明人： Yukio Fukunaga ,  Hiroyuki Shinozaki ,  Kiwamu Tsukamoto ,  Masao Saitoh

IPC分类号： C23C16/44 ,  C23C16/455 ,  C23C16/00

CPC分类号： C23C16/45574 ,  C23C16/45512 ,  C23C16/45565 ,  C23C16/4557 ,  C23C16/45572

摘要： A reactant gas ejector head enables a process gas mixture of a uniform concentration and composition to be delivered to the surface of a substrate in a stable and uniform thermodynamic state by preventing premature reactions to occur along the gas delivery route. The reactant gas ejector head comprises an ejection head body having a back plate and a nozzle plate for defining a gas mixing space therebetween. The nozzle plate has numerous gas ejection nozzles. A gas supply pipe is communicated with the ejection head body through a center region of the back plate so as to separately introduce at least two types of gaseous substances into the mixing space. Gas distribution passages are formed between the back plate and the nozzle plate in such a way as to guide the at least two types of gaseous substances from the gas supply pipe to be directed separately towards peripheral regions of the gas mixing space.

摘要翻译： 反应物气体喷射头能够使均匀浓度和组成的工艺气体混合物通过防止沿气体输送路线发生过早反应而以稳定和均匀的热力学状态输送到基底表面。 反应物气体喷射头包括具有背板和用于限定其间的气体混合空间的喷嘴板的喷射头本体。 喷嘴板具有许多气体喷射喷嘴。 气体供给管通过背板的中心区域与喷射头本体连通，以将至少两种类型的气态物质分别引入混合空间。 在背板和喷嘴板之间形成气体分配通道，以将来自气体供给管的至少两种类型的气体物质引导到气体混合空间的周边区域。

公开(公告)号：US5950646A

公开(公告)日：1999-09-14

申请号：US3947

申请日：1998-01-08

申请人： Kuniaki Horie ,  Hidenao Suzuki ,  Tsutomu Nakada ,  Takeshi Murakami ,  Yukio Fukunaga ,  Masahito Abe ,  Hiroyuki Shinozaki ,  Kiwamu Tsukamoto ,  Mitsunao Shibasaki ,  Yuji Araki ,  Hiroyuki Ueyama

发明人： Kuniaki Horie ,  Hidenao Suzuki ,  Tsutomu Nakada ,  Takeshi Murakami ,  Yukio Fukunaga ,  Masahito Abe ,  Hiroyuki Shinozaki ,  Kiwamu Tsukamoto ,  Mitsunao Shibasaki ,  Yuji Araki ,  Hiroyuki Ueyama

IPC分类号： B08B9/00 ,  C23C16/44 ,  C23C16/448 ,  B08B3/10

CPC分类号： C23C16/448 ,  B08B9/00 ,  C23C16/4407 ,  Y10S134/902

摘要： A vapor feed supply system including a vaporizer device and a method of cleaning a vapor flow region employing such a vaporizer device enables thorough cleaning of the system, without having to degrade the overall system vacuum in the process of cleaning the vaporizer device. The method includes defining a cleaning fluid passage having a predetermined withstand pressure by isolating a cleaning region of the vapor flow region, and flowing a cleaning fluid into the cleaning fluid passage under a pressure so as to enable the cleaning fluid to remain in a liquid state at a cleaning temperature of the cleaning region.

摘要翻译： 包括蒸发器装置和使用这种蒸发器装置的蒸汽流动区域的清洁方法的蒸汽供给系统能够彻底清洁系统，而不必在清洁蒸发器装置的过程中降低整个系统的真空度。 该方法包括通过隔离蒸汽流动区域的清洁区域来限定具有预定耐受压力的清洁流体通道，并且在压力下将清洁流体流入清洁流体通道以使清洁流体保持在液体状态 在清洁区域的清洁温度下。

公开(公告)号：US4666013A

公开(公告)日：1987-05-19

申请号：US695478

申请日：1985-01-28

申请人： Yasuji Shibahata ,  Yukio Fukunaga ,  Kenji Nakamura ,  Yasumasa Tsubota ,  Namio Irie ,  Junsuke Kuroki

发明人： Yasuji Shibahata ,  Yukio Fukunaga ,  Kenji Nakamura ,  Yasumasa Tsubota ,  Namio Irie ,  Junsuke Kuroki

IPC分类号： B62D6/02 ,  B62D6/04 ,  B62D7/14 ,  B62D7/15 ,  B62D5/00

CPC分类号： B62D7/159 ,  B62D7/146 ,  B60G2202/32 ,  B60G2202/322 ,  B60G2206/1116

摘要： A wheeled vehicle is equipped with a feedforward steering control system which steers the vehicle through front or rear road wheels in accordance with a driver's steering input such as an angular displacement of a steering wheel, and a negative feedback system which senses a turning behavior of the vehicle such as a yaw rate or a lateral acceleration, and steers the vehicle through the front or rear wheels in such a negative direction as to reduce the turning behavior. The feedforward system may control the angular direction of the front or rear wheels in accordance with a linear combination of the steering input and the time derivative of the steering input, or may control the angular directions of both of the front and rear wheels in accordance with different transfer functions between the steering input and the front and rear wheel angles. The negative feedback system is combined with the feedforward system in various ways to provide desired characteristics of the turning behavior. The negative feedback quantity determined by the negative feedback system may be proportional to the sensed turning behavior, or may be determined in accordance with the difference between the sensed turning behavior, and the reference turning behavior calculated from the vehicle speed and steering input.

摘要翻译： 轮式车辆配备有前馈转向控制系统，其根据驾驶员的转向输入（例如方向盘的角位移）和负反馈系统，通过前车轮或后车轮转向车辆，以及负反馈系统，其感测车轮的转向行为 车辆，例如偏航率或横向加速度，并且以如此减小转弯行为的方向使车辆通过前轮或后轮。 前馈系统可以根据转向输入和转向输入的时间导数的线性组合来控制前轮或后轮的角度方向，或者可以根据转向输入的时间导数来控制前轮和后轮的角度方向 转向输入与前轮和后轮之间的转换功能不同。 负反馈系统与前馈系统以各种方式结合，以提供所需的转向特性。 由负反馈系统确定的负反馈量可以与感测到的转向行为成比例，或者可以根据感测到的转向行为与根据车速和转向输入计算的参考转弯行为之间的差来确定。

公开(公告)号：US4199172A

公开(公告)日：1980-04-22

申请号：US961949

申请日：1978-11-20

申请人： Yukio Fukunaga ,  Ken Kamijo

发明人： Yukio Fukunaga ,  Ken Kamijo

IPC分类号： B60R22/44 ,  B60R22/48 ,  A62B35/00

CPC分类号： B60R22/44

摘要： A seat belt retractor having a tension eliminating mechanism and a belt position memorizing mechanism comprises a shaft on which the belt is wound up when the shaft rotates in one direction, biasing means biasing the shaft to rotate in the one direction, a sun gear fixedly mounted on the shaft, a stationary internal gear mounted around the shaft, a planetary gear operatively interposed between the sun gear and the internal gear, a discal carrier coaxial with the shaft and having thereon a stud on which the planetary gear is journaled an external gear coaxial with the shaft and having a projection which is engageable with another projection formed on the discal carrier when the carrier is rotated relative to the external gear, biasing means biasing the discal carrier to rotate in a direction to allow the projection on the carrier to engage the projection on the external gear, a stopper meshingly engageable with the external gear to lock the same, and an actuator causing the stopper to engage with the external gear when the webbing takes a passenger restraining position.

摘要翻译： 具有张力消除机构和皮带位置记忆机构的安全带卷收器包括轴，当轴在一个方向上旋转时，皮带卷绕在该轴上，偏压装置偏置轴沿一个方向旋转，固定安装的太阳齿轮 在轴上安装有围绕轴的固定内齿轮，可操作地插入在太阳齿轮和内齿轮之间的行星齿轮，与轴同轴的圆盘载体，并在其上具有螺柱，行星齿轮在其上嵌有外齿轮同轴 并且当托架相对于外齿轮旋转时，突起能够与形成在圆盘托架上的另一个突起接合，偏压装置偏置圆盘托架沿允许托架上的突出物接合的方向旋转 外部齿轮上的突起，与外部齿轮啮合的止动件以将其锁定的致动器，以及致动器将止动件e 当带子乘坐限制位置时，带有外部齿轮的行李。

公开(公告)号：US08205625B2

公开(公告)日：2012-06-26

申请号：US11987078

申请日：2007-11-27

申请人： Hideki Tateishi ,  Tsutomu Nakada ,  Akira Susaki ,  Shohei Shima ,  Yukio Fukunaga

发明人： Hideki Tateishi ,  Tsutomu Nakada ,  Akira Susaki ,  Shohei Shima ,  Yukio Fukunaga

IPC分类号： B08B5/00 ,  B08B13/00

CPC分类号： B24B37/04 ,  H01L21/02068 ,  H01L21/02074 ,  H01L21/76814 ,  H01L21/76883

摘要： A surface treatment apparatus of a substrate can clean a substrate surface in the air without employing a vacuum apparatus, and can remove a natural oxide film or an organic material, such as BTA, from the substrate surface without resorting to plasma cleaning. The surface treatment apparatus includes: an inert gas supply section for supplying an inert gas to the whole or part of a substrate surface to form an oxygen-blocking zone; a heating section for keeping the substrate surface at a predetermined temperature; and a cleaning gas supply section for supplying a cleaning gas to the oxygen-blocking zone to clean the substrate surface.

摘要翻译： 基板的表面处理装置可以在不使用真空装置的情况下清洁空气中的基板表面，并且可以从基板表面去除自然氧化膜或有机材料（例如BTA）而不用等离子体清洗。 表面处理装置包括：惰性气体供给部，用于向基板表面的全部或一部分供给惰性气体，形成阻氧区; 用于将基板表面保持在预定温度的加热部分; 以及清洁气体供给部，用于向氧阻挡区域供给清洁气体以清洁基板表面。

公开(公告)号：US20070034526A1

公开(公告)日：2007-02-15

申请号：US11202684

申请日：2005-08-12

申请人： Natsuki Makino ,  Junji Kunisawa ,  Keisuke Namiki ,  Yukio Fukunaga ,  Katsuyuki Musaka ,  Ray Fang ,  Emanuel Cooper ,  John Cotte ,  Hariklia Deligianni ,  Keith Kwietniak ,  Brett Baker-O'Neal ,  Matteo Flotta ,  Philippe Vereecken

发明人： Natsuki Makino ,  Junji Kunisawa ,  Keisuke Namiki ,  Yukio Fukunaga ,  Katsuyuki Musaka ,  Ray Fang ,  Emanuel Cooper ,  John Cotte ,  Hariklia Deligianni ,  Keith Kwietniak ,  Brett Baker-O'Neal ,  Matteo Flotta ,  Philippe Vereecken

IPC分类号： B23H3/00

CPC分类号： B23H5/08 ,  C25F3/02 ,  C25F7/00

摘要： An electrolytic processing apparatus can planarize uniformly over an entire surface of a substrate under a low pressure without any damages to the substrate. The electrolytic processing apparatus has a substrate holder configured to hold and rotate a substrate having a metal film formed on a surface of the substrate and an electrolytic processing unit configured to perform an electrolytic process on the substrate held by the substrate holder. The electrolytic processing unit has a rotatable processing electrode, a polishing pad attached to the rotatable processing electrode, and a pressing mechanism configured to press the polishing pad against the substrate. The electrolytic processing unit also has a liquid supply mechanism configured to supply an electrolytic processing liquid between the substrate and the rotatable processing electrode, a relative movement mechanism operable to move the substrate and the rotatable processing electrode relative to each other, and a power supply configured to applying a voltage between the rotatable processing electrode and the metal film of the substrate so that the rotatable processing electrode serves as a cathode and the metal film of the substrate serves as an anode.

摘要翻译： 电解处理装置可以在低压下在基板的整个表面上均匀地平坦化，而不会对基板造成任何损坏。 所述电解处理装置具有基板保持件，所述基板保持器被构造成保持和旋转形成在所述基板的表面上的金属膜的基板和被配置为在由所述基板保持器保持的所述基板上进行电解处理的电解处理单元。 电解处理单元具有可旋转的处理电极，附接到可旋转处理电极的抛光垫，以及被配置为将抛光垫压靠在基板上的按压机构。 电解处理单元还具有：液体供给机构，被构造成在基板和可旋转处理电极之间提供电解处理液体;相对移动机构，其可操作以相对于彼此移动基板和可旋转处理电极;电源配置 在可旋转处理电极和基板的金属膜之间施加电压，使得可旋转处理电极用作阴极，并且基板的金属膜用作阳极。

公开(公告)号：US20050245080A1

公开(公告)日：2005-11-03

申请号：US11039967

申请日：2005-01-24

申请人： Xinming Wang ,  Daisuke Takagi ,  Akihiko Tashiro ,  Yukio Fukunaga ,  Akira Fukunaga ,  Akira Owatari ,  Yukiko Nishioka ,  Tsuyoshi Sahoda

发明人： Xinming Wang ,  Daisuke Takagi ,  Akihiko Tashiro ,  Yukio Fukunaga ,  Akira Fukunaga ,  Akira Owatari ,  Yukiko Nishioka ,  Tsuyoshi Sahoda

IPC分类号： C23C18/16 ,  C23C18/18 ,  H01L21/00 ,  H01L21/02 ,  H01L21/288 ,  H01L21/306 ,  H01L21/321 ,  H01L21/768 ,  H01L21/4763 ,  H01L21/44

CPC分类号： H01L21/02068 ,  C23C18/1632 ,  C23C18/1689 ,  C23C18/1844 ,  H01L21/02074 ,  H01L21/288 ,  H01L21/67028 ,  H01L21/76849 ,  H01L21/76874 ,  H01L21/76883

摘要： A substrate processing method can securely form a metal film by electroless plating on an exposed surface of a base metal, such as interconnects, with increased throughput and without the formation of voids in the base metal. The substrate processing method includes: cleaning a surface of a substrate having a base metal formed in the surface with a cleaning solution comprising an aqueous solution of a carboxyl group-containing organic acid or its salt and a surfactant as an additive; bringing the surface of the substrate after the cleaning into contact with a processing solution comprising a mixture of the cleaning solution and a solution containing a catalyst metal ion, thereby applying the catalyst to the surface of the substrate; and forming a metal film by electroless plating on the catalyst-applied surface of the substrate.

摘要翻译： 基板处理方法可以通过在贱金属（例如互连）的暴露表面上通过无电解电镀牢固地形成金属膜，具有增加的生产量并且在母材中不形成空隙。 基板处理方法包括：用包含含羧基的有机酸或其盐和表面活性剂的水溶液作为添加剂的清洗溶液清洗在表面形成的基体金属的基材的表面; 使清洗后的基板的表面与包含清洗液和含有催化剂金属离子的溶液的混合物的处理溶液接触，从而将催化剂施加到基板的表面; 以及通过在基板的催化剂涂覆表面上通过无电镀形成金属膜。

公开(公告)号：US06387182B1

公开(公告)日：2002-05-14

申请号：US09517699

申请日：2000-03-02

申请人： Kuniaki Horie ,  Yukio Fukunaga ,  Naoaki Ogure ,  Tsutomu Nakada ,  Masahito Abe ,  Mitsunao Shibasaki ,  Hidenao Suzuki ,  Yuji Araki ,  Kiwamu Tsukamoto

发明人： Kuniaki Horie ,  Yukio Fukunaga ,  Naoaki Ogure ,  Tsutomu Nakada ,  Masahito Abe ,  Mitsunao Shibasaki ,  Hidenao Suzuki ,  Yuji Araki ,  Kiwamu Tsukamoto

IPC分类号： B05C2100

CPC分类号： C23C16/45574 ,  C23C16/409 ,  C23C16/45514 ,  C23C16/45561 ,  C23C16/45563 ,  C23C16/4557

摘要： A substrate processing apparatus forms a thin film of high-dielectric or ferroelectric such as barium/strontium titanates, or a copper film for wiring on a substrate, and has a gas ejection head for individually introducing at least two gases including a material gas and ejecting the gases toward a substrate to be processed. The gas ejection head has at least two gas passageways for individually introducing the two gases, and at least two temperature control devices for individually controlling temperatures of the gases flowing through the gas passageways.

摘要翻译： 基板处理装置在基板上形成诸如钡/锶钛酸盐或铜箔的高电介质或铁电薄膜，并且具有气体喷射头，用于分别引入包括材料气体的至少两种气体并喷射 朝向待处理基板的气体。 气体喷射头具有用于分别引入两种气体的至少两个气体通道和用于单独控制流过气体通道的气体的温度的至少两个温度控制装置。