公开(公告)号：US06414323B1

公开(公告)日：2002-07-02

申请号：US09523556

申请日：2000-03-10

Applicant: Hideaki Abe ,  Yuuichiro Yamazaki ,  Motosuke Miyoshi

Inventor： Hideaki Abe ,  Yuuichiro Yamazaki ,  Motosuke Miyoshi

IPC: G01N2100

CPC classification number: G01N23/04 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/022 ,  H01J2237/028 ,  H01J2237/182 ,  H01J2237/28

Abstract: There is here disclosed charged particle beam apparatus in which reactant floating in vacuum can efficiently be removed by simple structure. The charged particle beam apparatus of the present invention comprises a pulse tube refrigerator, a refrigerator controller for controlling the refrigerator, a compressor, a high-pressure rotary valve, a low-pressure rotary valve, and an active damper for removing vibration generated in the refrigerator. Since a cold section is disposed between an objective lens and a specimen in a vacuum container, and adsorbs the reactant in the vacuum container, the amount of reactant in the vacuum container can be reduced, the errors of the critical dimension value of a critical dimension SEM are reduced, and measurement precision is improved. Moreover, since a pulse tube is used as the refrigerator for cooling the cold section, the structure of the apparatus can be simplified and miniaturized. Accordingly, the vibration can be suppressed, and the measurement precision can be enhanced, maintenance can be facilitated, and a running cost can be reduced.

Abstract translation: 这里公开了带电粒子束装置，其中通过简单的结构有效地去除浮在真空中的反应物。 本发明的带电粒子束装置包括脉冲管制冷器，用于控制冰箱的冰箱控制器，压缩机，高压旋转阀，低压旋转阀和主动阻尼器，用于去除在 冰箱。 由于在真空容器中在物镜和样品之间设置冷部，并且将真空容器内的反应物吸附，因此能够减少真空容器内的反应物的量，关键尺寸的临界尺寸值的误差 SEM减少，测量精度提高。 此外，由于使用脉冲管作为用于冷却冷部的冷藏库，因此能够简化装置的结构并使其小型化。 因此，能够抑制振动，能够提高测定精度，便于维护，能够降低运转成本。

公开(公告)号：US06326635B1

公开(公告)日：2001-12-04

申请号：US09365589

申请日：1999-07-30

Applicant: Robert Innes ,  Lee H. Veneklasen ,  Allan L. Sagle ,  Sergey Babin ,  Chen Hwa

Inventor： Robert Innes ,  Lee H. Veneklasen ,  Allan L. Sagle ,  Sergey Babin ,  Chen Hwa

IPC: H01J3709

CPC classification number: H01J37/09 ,  H01J2237/028 ,  H01J2237/3175

Abstract: A shield assembly for reducing electron fogging effects in electron beam lithography. This shield, located between an electron beam column final aperture and the beam target, is of multiple vanes with sharp edges pointing towards the electron beam incident point on the target; the vanes are conically shaped and concentric around the electron beam path, which travels through the center of the assembly. Additionally, the sharp edges are such that they present oblique surfaces at the ends of the vanes angled between 10° and 20° relative to the outer vane surface and these oblique surfaces face towards the electron beam path. Furthermore, the shield assembly may also have the vanes angled towards the beam incident point such that the vertex of the conical vane assembly is coincident with the beam incident point.

Abstract translation: 一种用于减少电子束光刻中电子雾效应的屏蔽组件。 位于电子束柱最终孔和束目标之间的该屏蔽具有多个叶片，其尖锐边缘指向靶上的电子束入射点; 叶片是圆锥形的并且围绕电子束路径同心，该电子束路径穿过组件的中心。 此外，锋利的边缘使得它们在叶片的端部呈现相对于外部叶片表面成10°和20°之间的倾斜表面，并且这些倾斜表面朝向电子束路径。 此外，屏蔽组件还可以具有朝向光束入射点成角度的叶片，使得锥形叶片组件的顶点与光束入射点重合。

公开(公告)号：US20180277332A1

公开(公告)日：2018-09-27

申请号：US15936074

申请日：2018-03-26

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Toshiyuki IWAHORI

IPC: H01J37/04 ,  H01J37/244 ,  H01J37/22 ,  H01J37/20

CPC classification number: H01J37/045 ,  H01J37/09 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J2237/002 ,  H01J2237/0203 ,  H01J2237/022 ,  H01J2237/028 ,  H01J2237/0458 ,  H01J2237/202 ,  H01J2237/20207 ,  H01J2237/28 ,  H01J2237/31749

Abstract: Disclosed herein is a charged particle beam apparatus (10) includes: a sample chamber (11); a sample stage (31); an electron beam column (13) irradiating a sample S with an electron beam; and a focused ion beam column (14) irradiating the sample S with a focused ion beam. The apparatus (10) includes a displacement member (45) having: an open/close portion provided to be displaceable between an insertion position between a beam emitting end portion of the electron beam column (13) and the sample stage (31), and a withdrawal position away from the insertion position; and a contact portion provided at a contact position capable of contacting the sample S before the beam emitting end portion during operation of the sample stage (31). The apparatus (10) includes: a driving unit 42 displacing the displacement member (45); and a conduction sensor (24) detecting whether the sample is in contact with the contact portion.

公开(公告)号：US09799492B2

公开(公告)日：2017-10-24

申请号：US15227298

申请日：2016-08-03

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Julian Blake

IPC: H01J37/32 ,  H01J37/317 ,  C23C14/22 ,  C23C14/56 ,  C23C16/44 ,  C23C16/50

CPC classification number: H01J37/3244 ,  C23C14/22 ,  C23C14/564 ,  C23C16/4404 ,  C23C16/50 ,  H01J37/3171 ,  H01J37/32477 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/028 ,  H01J2237/0473 ,  H01J2237/0475 ,  H01J2237/057 ,  H01J2237/1207 ,  H01J2237/3321 ,  H01J2237/334

Abstract: Substrate processing systems, such as ion implantation systems, deposition systems and etch systems, having textured silicon liners are disclosed. The silicon liners are textured using a chemical treatment that produces small features, referred to as micropyramids, which may be less than 20 micrometers in height. Despite the fact that these micropyramids are much smaller than the textured features commonly found in graphite liners, the textured silicon is able to hold deposited coatings and resist flaking. Methods for performing preventative maintenance on these substrate processing systems are also disclosed.

公开(公告)号：US09767984B2

公开(公告)日：2017-09-19

申请号：US14502099

申请日：2014-09-30

Applicant: FEI Company

Inventor： Kevin Kagarice ,  Charles Otis ,  N. William Parker

IPC: H01J37/05 ,  H01J37/04

CPC classification number: H01J37/045 ,  H01J37/05 ,  H01J2237/004 ,  H01J2237/028 ,  H01J2237/057 ,  H01J2237/15 ,  H01J2237/28 ,  H01J2237/31745 ,  H01J2237/31749 ,  H01J2237/32

Abstract: A chicane blanker assembly for a charged particle beam system includes an entrance and an exit, at least one neutrals blocking structure, a plurality of chicane deflectors, a beam blanking deflector, and a beam blocking structure. The entrance is configured to accept a beam of charged particles propagating along an axis. The at least one neutrals blocking structure intersects the axis. The plurality of chicane deflectors includes a first chicane deflector, a second chicane deflector, a third chicane deflector, and a fourth chicane deflector sequentially arranged in series between the entrance and the exit and configured to deflect the beam along a path that bypasses the neutrals blocking structure and exits the chicane blanker assembly through the exit. In embodiments, the chicane blanker assembly includes a two neutrals blocking structures. In embodiments, the beam blocking structure is arranged between the third chicane deflector and the fourth chicane deflector.

公开(公告)号：US09572240B2

公开(公告)日：2017-02-14

申请号：US15107824

申请日：2014-12-12

Applicant: USHIO DENKI KABUSHIKI KAISHA

Inventor： Gota Niimi ,  Hironobu Yabuta

IPC: H05G2/00 ,  F21V14/04 ,  H01J37/16 ,  H01J37/32

CPC classification number: H05G2/003 ,  F21V14/04 ,  G03F7/70033 ,  G03F7/70916 ,  H01J37/16 ,  H01J37/3244 ,  H01J37/3266 ,  H01J2237/022 ,  H01J2237/026 ,  H01J2237/028 ,  H05G2/008

Abstract: Disclosed herein a light source apparatus that is capable of suppressing a light transmission rate of a debris trap to be lowered and a reflection rate in a light condenser mirror to be lowered. In the light source apparatus, a shielding member is provided having an aperture is provided in front of a stationary type foil trap to limit a solid angle of light emitted from a high temperature plasma. Furthermore, the stationary type foil trap is provided with a driving mechanism to allow the foil trap to be revolved such that an adhesion part of the debris of the foil trap is deviated from a position of the foil trap facing the aperture.

Abstract translation: 这里公开了一种光源装置，其能够抑制要降低的碎屑陷阱的光透射率和降低聚光镜中的反射率。 在光源装置中，设置有在固定型箔捕获器的前方设置有孔径以限制从高温等离子体发射的光的立体角的屏蔽构件。 此外，固定式箔捕获器设置有驱动机构，以允许箔捕获器旋转，使得箔捕获器的碎屑的粘附部分偏离面向孔的箔捕获器的位置。

公开(公告)号：US20170032924A1

公开(公告)日：2017-02-02

申请号：US14811097

申请日：2015-07-28

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： William Davis Lee ,  Alexandre Likhanskii

IPC: H01J37/05 ,  H01J37/317 ,  H01J37/12

CPC classification number: H01J37/05 ,  H01J37/12 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/028

Abstract: Provided herein are approaches for controlling particle trajectory from a beam-line electrostatic element. In an exemplary approach, a beam-line electrostatic element is disposed along a beam-line of an electrostatic filter (EF), and a voltage is supplied to the beam-line electrostatic element to generate an electrostatic field surrounding the beam-line electrostatic element, agitating a layer of contamination particles formed on the beam-line electrostatic element. A trajectory of a set of particles from the layer of contamination particles is then modified to direct the set of particles to a desired location within the EF. In one approach, the trajectory is controlled by providing an additional electrode adjacent the beam-line electrostatic element, and supplying a voltage to the additional electrode to control a local electrostatic field in proximity to the beam-line electrostatic element. In another approach, the trajectory is influenced by one or more geometric features of the beam-line electrostatic element.

Abstract translation: 本文提供了用于从束线静电元件控制粒子轨迹的方法。 在一个示例性的方法中，沿着静电滤波器（EF）的束线设置光束线静电元件，并且将电压提供给束线静电元件以产生围绕光束线静电元件的静电场 搅拌形成在束线静电元件上的污染颗粒层。 然后修改来自污染颗粒层的一组颗粒的轨迹，以将该组颗粒引导到EF内的期望位置。 在一种方法中，通过提供与束线静电元件相邻的附加电极来控制轨迹，并且向附加电极提供电压以控制靠近束线静电元件的局部静电场。 在另一种方法中，轨迹受到束线静电元件的一个或多个几何特征的影响。

公开(公告)号：US20160093470A1

公开(公告)日：2016-03-31

申请号：US14502099

申请日：2014-09-30

Applicant: FEI Company

Inventor： Kevin Kagarice ,  Charles Otis ,  N. William Parker

IPC: H01J37/32

CPC classification number: H01J37/045 ,  H01J37/05 ,  H01J2237/004 ,  H01J2237/028 ,  H01J2237/057 ,  H01J2237/15 ,  H01J2237/28 ,  H01J2237/31745 ,  H01J2237/31749 ,  H01J2237/32

Abstract: A chicane blanker assembly for a charged particle beam system includes an entrance and an exit, at least one neutrals blocking structure, a plurality of chicane deflectors, a beam blanking deflector, and a beam blocking structure. The entrance is configured to accept a beam of charged particles propagating along an axis. The at least one neutrals blocking structure intersects the axis. The plurality of chicane deflectors includes a first chicane deflector, a second chicane deflector, a third chicane deflector, and a fourth chicane deflector sequentially arranged in series between the entrance and the exit and configured to deflect the beam along a path that bypasses the neutrals blocking structure and exits the chicane blanker assembly through the exit. In embodiments, the chicane blanker assembly includes a two neutrals blocking structures. In embodiments, the beam blocking structure is arranged between the third chicane deflector and the fourth chicane deflector.

Abstract translation: 一种用于带电粒子束系统的通道消除器组件包括入口和出口，至少一个中性阻挡结构，多个拐角偏转器，光束消隐偏转器和光束阻挡结构。 入口构造成接受沿着轴传播的带电粒子束。 至少一个中性阻挡结构与轴相交。 多个拐角偏转器包括顺序地布置在入口和出口之间并被配置为沿着旁路中性阻塞的路径偏转光束的第一拐角拐弯器，第二拐角偏转器，第三拐角偏转器和第四通道偏转器 结构，并通过出口离开通道阻塞组件。 在实施例中，拐弯夹板组件包括两个中性阻挡结构。 在实施例中，梁阻挡结构布置在第三拐角偏转器和第四通道偏转器之间。

公开(公告)号：US08890066B1

公开(公告)日：2014-11-18

申请号：US11265811

申请日：2005-11-03

Applicant: Yehiel Gotkis ,  Garrett Pickard ,  Stanislaw Marek Borowicz ,  Tzu-Chin Chuang ,  Mehran Nasser-Ghodsi

Inventor： Yehiel Gotkis ,  Garrett Pickard ,  Stanislaw Marek Borowicz ,  Tzu-Chin Chuang ,  Mehran Nasser-Ghodsi

IPC: G21K5/04

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/028

Abstract: One embodiment relates to an electron beam apparatus. The apparatus includes a source for generating an incident electron beam, an electron lens for focusing the incident electron beam so that the beam impinges upon a substrate surface and interacts with surface material so as to cause secondary emission of scattered electrons, and a detector configured to detect the scattered electrons. The apparatus further includes an advantageous device configured to trap the scattered electrons which are emitted at sharp angles relative to the sample surface plane of the substrate surface. Other embodiments are also disclosed.

Abstract translation: 一个实施例涉及电子束装置。 该装置包括用于产生入射电子束的源，用于聚焦入射电子束的电子透镜，使得光束撞击在衬底表面上并与表面材料相互作用以引起散射电子的二次发射;以及检测器，被配置为 检测散射的电子。 该装置还包括有利的装置，其被配置为捕获相对于衬底表面的样品表面平面以锐角发射的散射电子。 还公开了其他实施例。

公开(公告)号：US20140284207A1

公开(公告)日：2014-09-25

申请号：US14218434

申请日：2014-03-18

Applicant: Andre Anders ,  Jonathan Kolbeck

Inventor： Andre Anders ,  Jonathan Kolbeck

IPC: C23C14/35

CPC classification number: C23C14/564 ,  C23C14/35 ,  H01J37/3405 ,  H01J37/3408 ,  H01J37/3447 ,  H01J2237/028

Abstract: This disclosure provides systems, methods, and apparatus related to blocking macroparticles in deposition processes utilizing plasmas. In one aspect, an apparatus includes a cathode, a substrate holder, a first magnet, a second magnet, and a structure. The cathode is configured to generate a plasma. The substrate holder is configured to hold a substrate. The first magnet is disposed proximate a first side of the cathode. The second magnet is disposed proximate a second side of the substrate holder. A magnetic field exists between the first magnet and the second magnet and a flow of the plasma substantially follows the magnetic field. The structure is disposed between the second side of the cathode and the first side of the substrate holder and is positioned proximate a region where the magnetic field between the first magnet and the second magnet is weak.

Abstract translation: 本公开提供了在利用等离子体的沉积过程中与阻挡大颗粒相关的系统，方法和装置。 在一个方面，一种装置包括阴极，衬底保持器，第一磁体，第二磁体和结构。 阴极被配置为产生等离子体。 衬底保持器构造成保持衬底。 第一磁体设置在阴极的第一侧附近。 第二磁体设置在衬底保持器的第二侧附近。 在第一磁体和第二磁体之间存在磁场，并且等离子体的流动基本上跟随磁场。 该结构设置在阴极的第二侧和衬底保持器的第一侧之间，并且位于第一磁体和第二磁体之间的磁场较弱的区域附近。