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    Target for generating positive ions, method of fabricating the same, and treatment apparatus using the target
    21.
    发明授权
    Target for generating positive ions, method of fabricating the same, and treatment apparatus using the target 有权
    用于产生正离子的靶，其制造方法和使用靶的处理装置

    公开(公告)号：US08796639B2

    公开(公告)日：2014-08-05

    申请号：US13919960

    申请日：2013-06-17

    Applicant: Electronics and Telecommunications Research Institute

    Inventor： Moon Youn Jung ,  Hyeon-Bong Pyo ,  Dong-Ho Shin ,  Seunghwan Kim

    IPC: H01J27/24 ,  H01J3/04 ,  H01J27/02

    CPC classification number: H01J3/04 ,  A61N5/10 ,  A61N2005/1088 ,  H01J27/02 ,  H01J27/022 ,  H01J27/24

    Abstract: Provided is an ion beam treatment apparatus. The treatment apparatus includes a target for generating positive ions including a thin film for generating positive ions and nanowires disposed on at least one side of the thin film for generating positive ions, and a laser for emitting a laser beam incident on nanowires to project positive ions to a tumor region of a patient by generating the positive ions from the thin film for generating positive ions. Each of the nanowires may include a metal nanocore and a polymer shell surrounding the metal nanocore. The laser beam incident on the nanowires forms surface plasmon resonance, a near field having an intensity enhanced more than an intensity of the laser beam is formed by the surface plasmon resonance, and the positive ions are emitted from the thin film for generating positive ions by the near field.

    Abstract translation: 提供了一种离子束处理装置。 该处理装置包括用于产生正离子的目标物，其包括用于产生正离子的薄膜和设置在该薄膜的至少一侧上的用于产生正离子的纳米线，以及用于发射入射到纳米线上以投射正离子的激光束的激光 通过从薄膜产生正离子以产生正离子到患者的肿瘤区域。 每个纳米线可以包括金属纳米孔和围绕金属纳米孔的聚合物壳。 入射到纳米线上的激光束形成表面等离子体共振，通过表面等离子体共振形成具有比激光束强度增强的强度的近场，并且从薄膜发射正离子以产生正离子 近场。

    DECELERATION APPARATUS FOR RIBBON AND SPOT BEAMS
    24.
    发明申请
    DECELERATION APPARATUS FOR RIBBON AND SPOT BEAMS 有权
    RIBBON和SPOT BEA的减速装置

    公开(公告)号：US20120097861A1

    公开(公告)日：2012-04-26

    申请号：US13280162

    申请日：2011-10-24

    Applicant: Nicholas White ,  Zhimin Wan ,  Erik Collart

    Inventor： Nicholas White ,  Zhimin Wan ,  Erik Collart

    IPC: H01J3/20 ,  H01J3/14 ,  H01J3/26

    CPC classification number: H01J37/05 ,  H01J3/04 ,  H01J3/26 ,  H01J37/1472 ,  H01J37/3007 ,  H01J37/3171 ,  H01J2237/04756 ,  H01J2237/053 ,  H01J2237/057 ,  H01J2237/151 ,  H01J2237/303 ,  H01J2237/31701

    Abstract: A deceleration apparatus capable of decelerating a short spot beam or a tall. ribbon beam is disclosed. In either case, effects tending to degrade the shape of the beam profile are controlled. Caps to shield the ion beam from external potentials are provided. Electrodes whose position and potentials are adjustable are provided, on opposite sides of the beam, to ensure that the shape of the decelerating and deflecting electric fields does not significantly deviate from the optimum shape, even in the presence of the significant space-charge of high current low-energy beams of heavy ions.

    Abstract translation: 减速装置，能够使短点梁或高度减速。 公开了带状束。 在任一种情况下，都会控制趋向于降低光束轮廓形状的效果。 提供了用于将离子束屏蔽到外部电位的盖子。 其位置和电位可调的电极设置在梁的相对两侧，以确保减速和偏转电场的形状不会显着偏离最佳形状，即使存在显着的空间电荷高 目前低能量的重离子束。

    Charged particle source with integrated energy filter
    25.
    发明授权
    Charged particle source with integrated energy filter 有权
    带集成能量滤波器的带电粒子源

    公开(公告)号：US07999225B2

    公开(公告)日：2011-08-16

    申请号：US12472259

    申请日：2009-05-26

    Applicant: Alexander Henstra

    Inventor： Alexander Henstra

    IPC: H01J3/26 ,  H01J40/00

    CPC classification number: H01J37/05 ,  H01J3/027 ,  H01J3/04 ,  H01J37/063 ,  H01J2237/045 ,  H01J2237/057 ,  H01J2237/061 ,  H01J2237/08 ,  H01J2237/15 ,  H01J2237/1534

    Abstract: The invention describes a particle source in which energy selection occurs. The energy selection occurs by sending a beam of electrically charged particles 103 eccentrically through a lens 107. As a result of this, energy dispersion will occur in an image formed by the lens. By projecting this image onto a slit 109 in an energy selecting diaphragm 108, it is possible to allow only particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam 113 will have a reduced energy spread. Deflection unit 112 deflects the beam to the optical axis 101. One can also elect to deflect a beam 105 going through the middle of the lens toward the optical axis and having, for example, greater current.The energy dispersed spot is imaged on the slit by a deflector 111. When positioning the energy dispersed spot on the slit, central beam 105 is deflected from the axis to such an extent that it is stopped by the energy selecting diaphragm. Hereby reflections and contamination resulting from this beam in the region after the diaphragm are avoided. Also electron-electron interaction resulting from the electrons from the central beam interacting with the energy filtered beam in the area of deflector 112 is avoided.

    Abstract translation: 本发明描述了发生能量选择的粒子源。 通过透过透镜107偏心地发送带电粒子103的束来进行能量选择。结果，由透镜形成的图像中会发生能量分散。 通过将该图像投影到能量选择膜108中的狭缝109上，可以仅允许能谱范围的有限部分中的粒子通过。 因此，通过的梁113将具有减小的能量扩展。 偏转单元112将光束偏转到光轴101.也可以选择将穿过透镜中间的光束105偏转到光轴并具有例如更大的电流。 能量分散点通过偏转器111在狭缝上成像。当将能量分散光斑定位在狭缝上时，中心光束105从轴线偏转到被能量选择光阑停止的程度。 因此避免了在隔膜之后的区域中由该光束产生的反射和污染。 避免了在偏转器112的区域中与来自中心光束的电子与能量过滤光束相互作用的电子 - 电子相互作用。

    NEGATIVE ION SOURCE METHOD AND APPARATUS USED IN CONJUNCTION WITH A CHARGED PARTICLE CANCER THERAPY SYSTEM
    26.
    发明申请
    NEGATIVE ION SOURCE METHOD AND APPARATUS USED IN CONJUNCTION WITH A CHARGED PARTICLE CANCER THERAPY SYSTEM 有权
    负离子源治疗方法与装置联合使用的负离子癌治疗系统

    公开(公告)号：US20100014639A1

    公开(公告)日：2010-01-21

    申请号：US12567901

    申请日：2009-09-28

    Applicant: Vladimir Balakin

    Inventor： Vladimir Balakin

    IPC: A61N5/10 ,  G21K5/04

    CPC classification number: H01J3/04 ,  H01J27/028 ,  H05H7/04 ,  H05H13/04

    Abstract: The invention comprises a negative ion source method and apparatus used as part of an ion beam injection system, which is used in conjunction with multi-axis charged particle or proton beam radiation therapy of cancerous tumors. The negative ion source preferably includes an inlet port for injection of hydrogen gas into a high temperature plasma chamber. In one embodiment, the plasma chamber includes a magnetic material, which provides a magnetic field barrier between the high temperature plasma chamber and a low temperature plasma region on the opposite side of the magnetic field barrier. An extraction pulse is applied to a negative ion extraction electrode to pull the negative ion beam into a negative ion beam path, which proceeds through a first partial vacuum system, through an ion beam focusing system, into the tandem accelerator, and into a synchrotron.

    Abstract translation: 本发明包括负离子源方法和用作离子束注入系统的一部分的装置，其与多轴带电粒子或癌肿瘤的质子束放射治疗结合使用。 负离子源优选包括用于将氢气注入高温等离子体室的入口。 在一个实施例中，等离子体室包括磁性材料，其在高温等离子体室与磁场屏障的相对侧上的低温等离子体区域之间提供磁场屏障。 将提取脉冲施加到负离子提取电极，以将负离子束拉入负离子束路径，其通过第一部分真空系统通过离子束聚焦系统进入串联加速器，并进入同步加速器。

    FOCUSED ION BEAM FIELD SOURCE
    27.
    发明申请
    FOCUSED ION BEAM FIELD SOURCE 有权
    聚焦离子束场源

    公开(公告)号：US20090114838A1

    公开(公告)日：2009-05-07

    申请号：US12251917

    申请日：2008-10-15

    Applicant: Paulo Lozano ,  Manuel Martinez-Sanchez

    Inventor： Paulo Lozano ,  Manuel Martinez-Sanchez

    IPC: H01J3/14 ,  H01J27/00

    CPC classification number: H01J3/04 ,  H01J27/26 ,  H01J37/08 ,  H01J2237/0048 ,  H01J2237/08 ,  H01J2237/0815 ,  H01J2237/0822 ,  H01J2237/31749

    Abstract: An apparatus for producing ions can include an emitter having a first end and a second end. The emitter can be coated with an ionic liquid room-temperature molten salt. The apparatus can also include a power supply and a first electrode disposed downstream relative to the first end of the emitter and electrically connected to a first lead of the power supply. The apparatus can also include a second electrode disposed downstream relative to the second end of the emitter and electrically connected to a second lead of the power supply.

    Abstract translation: 用于产生离子的装置可以包括具有第一端和第二端的发射体。 发射体可以用离子液体室温熔融盐涂覆。 该装置还可以包括电源和设置在发射器的第一端的下游并电连接到电源的第一引线的第一电极。 该装置还可以包括设置在发射器的第二端的下游并电连接到电源的第二引线的第二电极。

    Discharge device having cathode with micro hollow array
    29.
    发明授权
    Discharge device having cathode with micro hollow array 失效
    具有阴极和微空心阵列的放电装置

    公开(公告)号：US5686789A

    公开(公告)日：1997-11-11

    申请号：US403477

    申请日：1995-03-14

    Applicant: Karl H. Schoenbach ,  Wojciech W. Byszewski ,  Frank E. Peterkin ,  Amin N. Dharamsi

    Inventor： Karl H. Schoenbach ,  Wojciech W. Byszewski ,  Frank E. Peterkin ,  Amin N. Dharamsi

    IPC: H01J1/02 ,  H01J1/62 ,  H01J27/26 ,  H01J61/06 ,  H01J61/067 ,  H01J61/09 ,  H01J61/12 ,  H01J61/20 ,  H01J61/66 ,  H01J61/72 ,  H01S3/038

    CPC classification number: H01J3/025 ,  H01J1/025 ,  H01J17/04 ,  H01J17/06 ,  H01J27/08 ,  H01J3/04 ,  H01J61/067 ,  H01J61/09 ,  H01J61/12 ,  H01J61/305 ,  H01J61/66 ,  H01J61/72 ,  H01S3/0385 ,  H01J61/78 ,  H01S3/03 ,  H01S3/0382 ,  H01S3/2383

    Abstract: A discharge device for operation in a gas at a prescribed pressure includes a cathode having a plurality of micro hollows therein, and an anode spaced from the cathode. Each of the micro hollows has dimensions selected to produce a micro hollow discharge at the prescribed pressure. Preferably, each of the micro hollows has a cross-sectional dimension that is on the order of the mean free path of electrons in the gas. Electrical energy is coupled to the cathode and the anode at a voltage and current for producing micro hollow discharges in each of the micro hollows in the cathode. The discharge device may include a discharge chamber for maintaining the prescribed pressure. A dielectric layer may be disposed on the cathode when the spacing between the cathode and the anode is greater than about the mean free path of electrons in the gas. Applications of the discharge device include fluorescent lamps, excimer lamps, flat fluorescent light sources, miniature gas lasers, electron sources and ion sources.

    Abstract translation: 用于在规定压力下操作气体的放电装置包括其中具有多个微型空腔的​​阴极和与阴极间隔开的阳极。 每个微型空腔具有选定的尺寸以在规定的压力下产生微细的中空排出。 优选地，每个微型空腔的​​横截面尺寸都是气体中电子的平均自由程的数量级。 电能以负极和电流耦合到阴极和阳极，用于在阴极中的每个微型空腔中产生微空心放电。 排出装置可以包括用于维持规定压力的排出室。 当阴极和阳极之间的间隔大于气体中电子的平均自由程时，电介质层可以设置在阴极上。 放电装置的应用包括荧光灯，准分子灯，平面荧光光源，微型气体激光器，电子源和离子源。

    SOURCE HOUSING ASSEMBLY FOR CONTROLLING ION BEAM EXTRACTION STABILITY AND ION BEAM CURRENT
    30.
    发明申请
    SOURCE HOUSING ASSEMBLY FOR CONTROLLING ION BEAM EXTRACTION STABILITY AND ION BEAM CURRENT 有权
    用于控制离子束提取稳定性和离子束电流的源壳体组件

    公开(公告)号：US20160336138A1

    公开(公告)日：2016-11-17

    申请号：US14713573

    申请日：2015-05-15

    Applicant: Varian Semiconductor Equipment Associates, Inc.

    Inventor： Shengwu Chang ,  Jeff Burgess ,  William Leavitt ,  Michael St Peter ,  Matt Mosher ,  Joe Olson ,  Frank Sinclair

    IPC: H01J27/08 ,  H01J9/18 ,  H01J9/385 ,  H01J27/02

    CPC classification number: H01J27/08 ,  H01J3/04 ,  H01J5/02 ,  H01J9/18 ,  H01J9/385 ,  H01J27/024 ,  H01J37/08

    Abstract: Provided herein are approaches for improving ion beam extraction stability and ion beam current for an ion extraction system. In one approach, a source housing assembly may include a source housing surrounding an ion source including an arc chamber, the source housing having an extraction aperture plate mounted at a proximal end thereof. The source housing assembly further includes a vacuum liner disposed within an interior of the source housing to form a barrier around a set of vacuum pumping apertures. As configured, openings in the source housing assembly, other than an opening in the extraction aperture plate, are enclosed by the extraction aperture plate and the vacuum liner, thus ensuring appendix arcs or extraneous ions produced outside the arc chamber remain within the source housing. Just those ions produced within the arc chamber exit the source housing through the opening of the extraction aperture plate.

    Abstract translation: 本文提供了用于改进离子提取系统的离子束提取稳定性和离子束电流的方法。 在一种方法中，源壳体组件可以包括围绕包括电弧室的离子源的源壳体，源壳体具有安装在其近端处的抽吸孔板。 源壳体组件还包括设置在源壳体的内部中以在一组真空泵浦孔周围形成屏障的真空衬套。 根据构造，源壳体组件中除了抽吸孔板中的开口之外的开口被提取孔板和真空衬套包围，从而确保在电弧室外产生的附加电弧或外来离子保留在源壳体内。 恰好在电弧室内产生的那些离子通过提取孔板的开口离开源壳体。

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