Abstract:
Described herein is an intelligent remote controlling device. The device can include a six-axis motion sensor to accurately track three dimensional hand motions. For example, the sensors can include a three-axis accelerometer and a three-axis gyroscope. The remote control device can also include a processing unit integrated with the motion sensors in a single module. The processing unit can convert data regarding the hand motion to data regarding a cursor motion for a cursor that will be displayed on a screen of an electronic device. The processing unit can be integrated with the motion sensors in a single module. The processing unit can include at least two modes of functionality corresponding to different types of hand motion: a one to one mode where the cursor directly tracks the hand motion and a non-linear mode that filters data from the motion sensors to eliminate hand jitter.
Abstract:
A baby bottle cover with tactile stimulation design is used to cover a baby bottle, the baby bottle includes a silicone case with an inner surface and an outer surface, and the inner surface defines an inner surface which conforms with the shape of the baby bottle. A plurality of the conical portions is integrally formed on the outer surface of the silicone case. When the baby holds the bottle, the soft conical portions formed on the outer surface of the baby bottle cover come into contact with the baby's hands to promote the development of baby's tactile sense.
Abstract:
The invention provides a semiconductor package. The semiconductor package includes a substrate. A first passivation layer is disposed on the substrate. An under bump metallurgy layer is disposed on the first passivation layer. A passive device is disposed on the under bump metallurgy layer.
Abstract:
Disclosed is a thin film transistor including a gate electrode on a substrate. A gate dielectric layer is disposed on the gate electrode and the substrate, and source/drain electrodes are disposed on the gate dielectric layer overlying two edge parts of the gate electrode. A channel layer is disposed on the gate dielectric layer overlying a center part of the gate electrode, and the channel region contacts the source/drain electrodes. An insulating capping layer overlies the channel layer, wherein the channel layer includes an oxide semiconductor.
Abstract:
A valve structure may include a valve body having a plurality of connecting tubes; a resilient cover, one end of which forming a ring portion and the other of which having a tapered cone portion, and the resilient cover plugs into the connecting tube through the cone portion to form a restricting position; a connecting unit that is tubular, having a tubular connecting section and a plugging section, and the plugging section plugs into the through hole of the resilient cover, so the second stopping surface is against the ring portion of the resilient cover; and a locking cover covering the tubular connecting section of the connecting unit to secure the connecting unit and the resilient cover at the connecting tube of the valve body.
Abstract:
A method for forming a semiconductor structure includes forming a gate stack over a semiconductor substrate in a wafer; forming a recess in the semiconductor substrate and adjacent the gate stack; and performing a selective epitaxial growth to grow a semiconductor material in the recess to form an epitaxy region. The step of performing the selective epitaxial growth includes performing a first growth stage with a first growth-to-etching (E/G) ratio of process gases used in the first growth stage; and performing a second growth stage with a second E/G ratio of process gases used in the second growth stage different from the first E/G ratio.
Abstract:
A semiconductor device comprises a substrate, a dielectric layer, an undoped silicon layer, and a silicon material. The substrate comprises a doped region. The dielectric layer is formed on the substrate and comprises a contact hole, and the contact hole corresponds to the doped region. The undoped silicon layer is formed on the doped region. The silicon material fills the contact hole from the undoped silicon layer.
Abstract:
Packaging process tools and packaging methods for semiconductor devices are disclosed. In one embodiment, a packaging process tool for semiconductor devices includes a mechanical structure including a frame. The frame includes a plurality of apertures adapted to retain a plurality of integrated circuit dies therein. The frame includes at least one hollow region.
Abstract:
A display panel having a display region and a non-display region is provided. The display panel includes a plurality of pixel structures in the display region, and each pixel structure includes a scan line, a data line, a first active device, a pixel electrode, a first insulating layer, a capacitor electrode, and a second insulating layer. The first active device includes a first gate, a first channel, a first source, and a first drain. The second insulating layer covers the first insulating layer and the capacitor electrode and is located between the capacitor electrode and the first drain. At least one driving circuit is disposed in the non-display region and includes at least one second active device. Hence, a relatively thin insulating layer can be disposed between the capacitor electrode and the drain to reduce the area of the capacitor region and to achieve a desired aperture ratio.
Abstract:
A flicker band automated detection system and method are presented. In one embodiment an incidental motion mitigation exposure setting method includes receiving image input information; performing a motion mitigating flicker band automatic detection process; and implementing exposure settings based upon results of the motion mitigating flicker band automatic detection process. The auto flicker band detection process includes performing a motion mitigating process on an illumination intensity indication. Content impacts on an the motion mitigated illumination intensity indication are minimized. The motion mitigated illumination intensity indication is binarized. A correlation of the motion mitigated illumination intensity and a reference illumination intensity frequency is established.