公开(公告)号：US07863580B2

公开(公告)日：2011-01-04

申请号：US11760235

申请日：2007-06-08

申请人： Masahiro Hatakeyama ,  Takeshi Murakami ,  Nobuharu Noji ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Satoshi Mori ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama

发明人： Masahiro Hatakeyama ,  Takeshi Murakami ,  Nobuharu Noji ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Satoshi Mori ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama

IPC分类号： G21K1/08 ,  H01J3/14 ,  H01J3/26

CPC分类号： H01J37/153 ,  H01J37/065 ,  H01J2237/061 ,  H01J2237/06375 ,  H01J2237/083 ,  H01J2237/1534 ,  H01J2237/24592 ,  H01J2237/28

摘要： An electron beam apparatus for providing an evaluation of a sample, such as a semiconductor wafer, that includes a micro-pattern with a minimum line width not greater than 0.1 μm with high throughput. A primary electron beam generated by an electron gun is irradiated onto a sample and secondary electrons emanating from the sample are formed into an image on a detector by an image projection optical system. An electron gun 61 has a cathode 1 and a drawing electrode 3, and an electron emission surface 1a of the cathode defines a concave surface. The drawing electrode 3 has a convex surface 3a composed of a partial outer surface of a second sphere facing the electron emission surface 1a of the cathode and an aperture 73 formed through the convex surface for passage of the electrons. An aberration correction optical apparatus comprises two identically sized multi-polar Wien filters arranged such that their centers are in alignment with a ¼ plane position and a ¾ plane position, respectively, along an object plane-image plane segment in the aberration correction optical apparatus, and optical elements having bidirectional focus disposed in an object plane position, an intermediate image-formation plane position and an image plane position, respectively, in the aberration correction optical apparatus.

摘要翻译： 一种用于提供诸如半导体晶片的样品的评估的电子束装置，其包括具有不大于0.1μm的最小线宽的微图案，具有高生产量。 由电子枪产生的一次电子束照射在样品上，从样品发出的二次电子通过图像投影光学系统形成检测器上的图像。 电子枪61具有阴极1和牵伸电极3，阴极的电子发射表面1a限定凹面。 拉制电极3具有由与阴极的电子发射表面1a相对的第二球体的局部外表面和由电子通过凸面形成的孔73构成的凸面3a。 像差校正光学装置包括两个相同尺寸的多极维纳滤光器，其布置成使得它们的中心分别沿着像差校正光学装置中的物平面图像平面段与¼平面位置和¾平面位置对准， 以及分别设置在像差校正光学装置中的物平面位置，中间图像形成面位置和像面位置的具有双向焦点的光学元件。

公开(公告)号：US20100032566A1

公开(公告)日：2010-02-11

申请号：US12537414

申请日：2009-08-07

申请人： Yoshihiko Naito ,  Norio Kimura ,  Kenji Terao ,  Masahiro Hatakeyama ,  Masamitsu Itoh

发明人： Yoshihiko Naito ,  Norio Kimura ,  Kenji Terao ,  Masahiro Hatakeyama ,  Masamitsu Itoh

IPC分类号： G01N23/00

CPC分类号： G01N23/203 ,  G01N2223/652

摘要： A substrate surface inspection method inspects for a defect on a substrate including a plurality of materials on a surface thereof. The inspection method comprises: irradiating the surface of the substrate with an electron beam, a landing energy of the electron beam set such that a contrast between at least two types of materials of the plurality of materials is within a predetermined range; detecting electrons generated by the substrate to acquire a surface image of the substrate, with a pattern formed thereon from the at least two types of materials eliminated or weakened; and detecting the defect from the acquired surface image by detecting as the defect an object image having a contrast by which the object image can be distinguished from a background image in the surface image. Defects present on the substrate surface can be detected easily and precisely by using a cell inspection.

摘要翻译： 基板表面检查方法检查在其表面上包括多种材料的基板上的缺陷。 检查方法包括：用电子束照射基板的表面，电子束的着陆能量设定为使得多种材料中的至少两种类型的材料之间的对比度在预定范围内; 检测由所述基板产生的电子以获得所述基板的表面图像，其中从所述至少两种类型的材料形成在其上的图案被消除或削弱; 并且通过将所述对象图像与所述表面图像中的背景图像区分开来的对比度检测作为缺陷来检测来自所获取的表面图像的缺陷。 通过使用细胞检查，可以容易且准确地检测出存在于基板表面上的缺陷。

公开(公告)号：US20100012838A1

公开(公告)日：2010-01-21

申请号：US12500308

申请日：2009-07-09

申请人： Masahiro Hatakeyama ,  Norio Kimura

发明人： Masahiro Hatakeyama ,  Norio Kimura

IPC分类号： G01N23/00

CPC分类号： G01N23/2251

摘要： A method for inspecting a glass substrate for imprint including a glass substrate with a pattern surface and a transmissive conductive film coating at least part of the pattern surface, includes an electron beam irradiation step of irradiating the pattern surface of the glass substrate for imprint disposed on a stage with an electron beam having a predetermined irradiation area; an electron detection step of simultaneously detecting electrons from the pattern surface by the electron beam irradiation by means of a detection surface with a plurality of pixels; and a defect detection step of obtaining an image of the pattern surface based on the electrons detected by the detection surface and detecting a defect of the pattern surface.

摘要翻译： 一种检查用于印刷的玻璃基板的方法，包括具有图案表面的玻璃基板和至少部分图案表面的透射导电膜涂层，包括电子束照射步骤，将玻璃基板的图案表面照射设置在 具有预定照射区域的电子束的阶段; 电子检测步骤，通过具有多个像素的检测表面通过电子束照射同时从图案表面检测电子; 以及缺陷检测步骤，基于由检测表面检测的电子获得图案表面的图像并检测图案表面的缺陷。

公开(公告)号：US20090050802A1

公开(公告)日：2009-02-26

申请号：US12162067

申请日：2007-01-24

申请人： Nobuharu Noji ,  Yoshihiko Naito ,  Hirosi Sobukawa ,  Kenji Terao ,  Masahiro Hatakeyama ,  Katsuya Okumura

发明人： Nobuharu Noji ,  Yoshihiko Naito ,  Hirosi Sobukawa ,  Kenji Terao ,  Masahiro Hatakeyama ,  Katsuya Okumura

IPC分类号： G01N23/00

CPC分类号： H01J37/265 ,  G01R31/307 ,  H01J37/04 ,  H01J2237/2441 ,  H01J2237/2446 ,  H01J2237/2594 ,  H01J2237/2817

摘要： Provided is a method and an apparatus for inspecting a sample surface with high accuracy.Provided is a method for inspecting a sample surface by using an electron beam method sample surface inspection apparatus, in which an electron beam generated by an electron gun of the electron beam method sample surface inspection apparatus is irradiated onto the sample surface, and secondary electrons emanating from the sample surface are formed into an image toward an electron detection plane of a detector for inspecting the sample surface, the method characterized in that a condition for forming the secondary electrons into an image on a detection plane of the detector is controlled such that a potential in the sample surface varies in dependence on an amount of the electron beam irradiated onto the sample surface.

摘要翻译： 提供了一种用于高精度地检查样品表面的方法和装置。 提供了一种使用电子束法样品表面检查装置检查样品表面的方法，其中由电子束法样品表面检查装置的电子枪产生的电子束照射到样品表面上，并且发射二次电子 从样品表面形成为检测样品表面的检测器的电子检测面的图像，其特征在于，将检测器的检测面上的二次电子形成为图像的条件进行控制，使得 样品表面的电位根据照射到样品表面上的电子束的量而变化。

公开(公告)号：US07449691B2

公开(公告)日：2008-11-11

申请号：US11435128

申请日：2006-05-17

申请人： Masahiro Hatakeyama ,  Takeshi Murakami ,  Tohru Satake ,  Nobuharu Noji ,  Ichirota Nagahama ,  Yuichiro Yamazaki

发明人： Masahiro Hatakeyama ,  Takeshi Murakami ,  Tohru Satake ,  Nobuharu Noji ,  Ichirota Nagahama ,  Yuichiro Yamazaki

IPC分类号： G01N23/00

CPC分类号： H01J37/244 ,  G01N21/9501 ,  G03F1/84 ,  H01J37/285 ,  H01J2237/2441 ,  H01J2237/2446

摘要： A detecting apparatus for detecting a fine geometry on a surface of a sample, wherein an irradiation beam is irradiated against the sample placed in a different environment different from an atmosphere and a secondary radiation emanated from the sample is detected by a sensor, and wherein the sensor is disposed at an inside of the different environment, a processing device to process detection signals from the sensor is disposed at an outside of the different environment, and a transmission means transmits detection signals from the sensor to the processing device.

摘要翻译： 一种用于检测样品表面上的精细几何形状的检测装置，其中照射束照射放置在不同于大气的不同环境中的样品，并且由传感器检测从样品发出的二次辐射，并且其中 传感器设置在不同环境的内部，处理来自传感器的检测信号的处理装置设置在不同环境的外部，传输装置将检测信号从传感器传送到处理装置。

公开(公告)号：US06909092B2

公开(公告)日：2005-06-21

申请号：US10437889

申请日：2003-05-15

申请人： Ichirota Nagahama ,  Yuichiro Yamazaki ,  Kenji Watanabe ,  Masahiro Hatakeyama ,  Tohru Satake ,  Nobuharu Noji

发明人： Ichirota Nagahama ,  Yuichiro Yamazaki ,  Kenji Watanabe ,  Masahiro Hatakeyama ,  Tohru Satake ,  Nobuharu Noji

IPC分类号： G01N23/225 ,  G01K1/08 ,  G01N23/00 ,  G01Q30/04 ,  G21K7/00 ,  H01J37/05 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01J37/285 ,  H01J37/29 ,  H01L21/66

CPC分类号： H01J37/28 ,  H01J2237/0044 ,  H01J2237/2817

摘要： A defect inspecting apparatus is provided for generating a less distorted test image to reliably observe a surface of a sample for detecting defects thereon. The defect detecting apparatus comprises a primary electron beam source for irradiating a sample, electrostatic lenses for focusing secondary electrons emitted from the surface of the sample irradiated with the primary electron beam, a detector for detecting the secondary electrons, and an image processing unit for processing a signal from the detector. Further, a second electron source may be provided for emitting an electron beam irradiated to the sample, wherein the sample may be irradiated with the electron beam from the second electron source before it is irradiated with the primary electron beam from the first electron source for observing the sample. A device manufacturing method is also provided for inspecting devices under processing with high throughput using the defect detecting apparatus.

摘要翻译： 提供了一种缺陷检查装置，用于产生较小失真的测试图像，以可靠地观察用于检测缺陷的样品表面。 缺陷检测装置包括用于照射样品的一次电子束源，用于聚焦从一次电子束照射的样品的表面发射的二次电子的静电透镜，用于检测二次电子的检测器，以及用于处理的图像处理单元 来自检测器的信号。 此外，可以提供第二电子源用于发射照射到样品的电子束，其中在用来自第一电子源的一次电子束照射之前，可以用来自第二电子源的电子束照射样品，用于观察 例子。 还提供了一种装置制造方法，用于使用缺陷检测装置以高吞吐量检查处理装置。

公开(公告)号：US20050045821A1

公开(公告)日：2005-03-03

申请号：US10754623

申请日：2004-01-12

申请人： Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa ,  Toshifumi Kimba ,  Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Kenichi Suematsu ,  Yutaka Tabe ,  Ryo Tajima ,  Keiichi Tohyama

发明人： Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa ,  Toshifumi Kimba ,  Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Kenichi Suematsu ,  Yutaka Tabe ,  Ryo Tajima ,  Keiichi Tohyama

IPC分类号： G01N23/225 ,  H01J37/05 ,  H01J37/28 ,  G21K7/00 ,  G01N23/00

CPC分类号： H01J37/20 ,  G01N23/2204 ,  G01N23/225 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/202 ,  H01J2237/2441 ,  H01J2237/2446 ,  H01J2237/2801 ,  H01J2237/2817 ,  H01L21/6833 ,  H01L2223/54466

摘要： A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 25••1, then forms an image under a desired magnification in the direction of a sample W to produce a crossover. When the crossover is passed, electrons as noises are removed from the crossover with an aperture, an adjustment is made so that the crossover becomes a parallel electron beam to irradiate the substrate in a desired sectional form. The electron beam is produced such that the unevenness of illuminance is 10% or less. Electrons emitted from the sample W are detected by a detector 25•11.

摘要翻译： 提供了一种用于进一步提高速度的系统，即提高SEM型检查装置中的生产量。 用于检查基板的表面的检查装置产生从电子束源25..1发射的电子的交叉，然后在样品W的方向上以期望的倍率形成图像以产生交叉。 当交叉通过时，作为噪声的电子从具有孔的交叉点移除，进行调整，使得交叉成为平行电子束以以期望的分段形式照射基板。 产生电子束，使照度不均匀为10％以下。 由检测器25.11检测从样品W发射的电子。

公开(公告)号：US06671034B1

公开(公告)日：2003-12-30

申请号：US09301311

申请日：1999-04-29

申请人： Masahiro Hatakeyama ,  Katsunori Ichiki ,  Tohru Satake ,  Yotaro Hatamura ,  Masayuki Nakao

发明人： Masahiro Hatakeyama ,  Katsunori Ichiki ,  Tohru Satake ,  Yotaro Hatamura ,  Masayuki Nakao

IPC分类号： G03B2754

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F1/50 ,  G03F7/0002 ,  G03F7/2014

摘要： The object of the present invention IS to provide an optical imprinting apparatus and method for producing a two-dimensional pattern, having line widths less than the wavelength of an exposure light. The evarnescent (proximity) field effect is adopted to realize the apparatus and method. An optical imprinting apparatus comprises: a container in which light is enclosed therein; an exposure-mask having a proximity field exposure pattern firmly fixed to a section of said container for exposing said exposure pattern on a photo-sensitive material through an evanescent field by said light enclosed therein; and a light source for supplying said light in said container.

摘要翻译： 本发明的目的是提供一种用于产生具有小于曝光光的波长的线宽的二维图案的光学压印装置和方法。 采用实现（邻近）场效应实现装置和方法。 一种光学压印设备包括：容纳在其中的光; 曝光掩模，其具有牢固地固定在所述容器的一部分上的接近场曝光图案，用于通过所述光包围在所述光敏材料上的所述光衰弱场曝光所述曝光图案; 以及用于将所述光提供在所述容器中的光源。

公开(公告)号：US6015976A

公开(公告)日：2000-01-18

申请号：US195254

申请日：1998-11-18

申请人： Masahiro Hatakeyama ,  Katsunori Ichiki ,  Takao Kato ,  Yotaro Hatamura ,  Masayuki Nakao

发明人： Masahiro Hatakeyama ,  Katsunori Ichiki ,  Takao Kato ,  Yotaro Hatamura ,  Masayuki Nakao

IPC分类号： G03F1/00 ,  G03F1/20 ,  G03F7/00 ,  G03F7/20 ,  H01J9/02 ,  H01L21/033 ,  H01L21/308 ,  H01J37/302

CPC分类号： H01L21/3086 ,  G03F7/00 ,  G03F7/001 ,  G03F7/2065 ,  G03F7/70358 ,  H01J9/025 ,  H01L21/0331 ,  H01L21/0337 ,  H01J2209/0223

摘要： Three-dimensional ultra-fine micro-fabricated structures of the order of .mu.m and less are produced for use in advanced optical communication systems and quantum effect devices. Basic components are an energy beam source, a mask member and a specimen stage. The mask member is an independent component, and various combinations of relative movements of the mask member with respect to the beam axis and/or workpiece can be made with high precision to produce curved or slanted surfaces on a workpiece, thereby producing multiple lines or arrays of convex or concave micro-lenses. Other examples of fine-structures include deposition of thin films in a multiple line pattern or in an array pattern. Because of flexibility of fabrication and material, labyrinth seals having curved surfaces with grooved structures can be used as friction reduction devices for bearing components. Fine groove dimensions of the order of nm are possible. Energy beams can be any of fast atomic beams, ion beams, electron beam, laser beams, radiation beams, X-ray beams and radical particle beams. Parallel beams are often used, but when a focused bean is used, a technique of reduced projection imaging can be utilized to produce fine-structures of the order of nm.

摘要翻译： 产生了数量级小于等于30的数量级的三维超细微结构，用于先进的光通信系统和量子效应器件。 基本组件是能量束源，掩模构件和样品台。 掩模构件是独立的部件，并且可以高精度地制造掩模构件相对于射束轴线和/或工件的相对运动的各种组合，以在工件上产生弯曲或倾斜的表面，由此产生多个线或阵列 的凸或微型微透镜。 精细结构的其他实例包括以多线图案或阵列图案沉积薄膜。 由于制造和材料的灵活性，具有带槽结构的曲面的迷宫式密封件可用作轴承部件的摩擦减小装置。 可以使nm的数量级的细槽尺寸。 能量束可以是快速原子束，离子束，电子束，激光束，辐射束，X射线束和自由基粒子束中的任何一种。 通常使用平行光束，但是当使用聚焦光束时，可以利用减少投影成像的技术来产生nm级数的精细结构。

公开(公告)号：US5677011A

公开(公告)日：1997-10-14

申请号：US691366

申请日：1996-08-02

申请人： Masahiro Hatakeyama ,  Chikako Takatou

发明人： Masahiro Hatakeyama ,  Chikako Takatou

IPC分类号： G21K1/00 ,  B23K15/00 ,  B23K17/00 ,  C23F4/00 ,  G03F7/20 ,  H01L21/302 ,  H05H3/02 ,  C08J7/06

CPC分类号： G03F7/2065

摘要： There are disclosed a processing method and a processing apparatus using a fast atom beam to process a micro-sized structure on a desired face and portion of a workpiece having a complex shape. In this invention, an electron beam and/or a focused ion beam is applied to a surface of a workpiece to produce a masking film layer on the workpiece. After that, a fast atom beam is applied to the workpiece remove the surface layer of the workpiece where the masking film layer is not formed.

摘要翻译： 公开了一种使用快速原子束来处理具有复杂形状的工件的所需面和部分上的微尺寸结构的处理方法和处理装置。 在本发明中，电子束和/或聚焦离子束被施加到工件的表面上，以在工件上产生掩模膜层。 之后，将快速原子束施加到工件上去除未形成掩模膜层的工件的表面层。