公开(公告)号：US09048072B2

公开(公告)日：2015-06-02

申请号：US13851731

申请日：2013-03-27

Applicant: Micromass UK Limited

Inventor： Emmanuelle Claude ,  Mark W. Towers ,  Kieran Neeson ,  Richard Denny ,  Jeffery M. Brown ,  Paul Murray ,  Mark McDowall

IPC: H01J49/00 ,  H01J49/26 ,  G01N27/62

CPC classification number: H01J49/0031 ,  G01N27/622 ,  H01J49/0027 ,  H01J49/0036 ,  H01J49/004 ,  H01J49/005 ,  H01J49/26 ,  H01J49/40 ,  H01J49/446 ,  H01J2237/05

Abstract: The present invention relates to a method of mass spectrometry, an apparatus adapted to perform the method and a mass spectrometer. More particularly, but not exclusively, the present invention relates to a method of mass spectrometry comprising the step of associating parent and fragmentation ions from a sample by measuring the parent and fragmentation ions from two or more different areas of the sample and identifying changes in the number of parent ions between the areas in the sample, and corresponding changes in the number of fragmentation ions between the two areas.

Abstract translation: 本发明涉及一种质谱法，一种适于执行该方法的设备和一种质谱仪。 更具体地但非唯一地，本发明涉及一种质谱方法，其包括通过测量来自样品的两个或多个不同区域的亲和和离子离子并鉴定样品中的变化的步骤，从样品中分离亲本和断裂离子 样品中区域之间的亲本离子数，以及两个区域之间的分离离子数量的相应变化。

公开(公告)号：US20150001192A1

公开(公告)日：2015-01-01

申请号：US13928264

申请日：2013-06-26

Applicant: Apple Inc.

Inventor： Simon R. Lancaster-Larocque ,  Collin Chan ,  Kensuke Uemura ,  Purwadi Raharjo

IPC: H01J37/317 ,  B23K15/00

CPC classification number: B23K15/00 ,  B23K15/02 ,  B23K20/122 ,  H01J37/05 ,  H01J37/305 ,  H01J2237/05

Abstract: The described embodiments relate generally to adjusting output or conditioning of an electron beam. More specifically various configurations are disclosed that relate to maintaining a footprint of the electron beam incident to a workpiece within a defined energy level. Such a configuration allows the electron beam to heat only specific portions of the workpiece to a superheated state in which intermetallic compounds are dissolved. In one embodiment a mask is disclosed that prevents low energy portions of an electron beam from contacting the workpiece. In another embodiment the electron beam can be focused in a way that maintains the electron beam at an energy level such that substantially all of the electron beam is above a threshold energy level.

Abstract translation: 所描述的实施例一般涉及调整电子束的输出或调节。 更具体地，公开了涉及将入射到工件的电子束的覆盖区保持在限定的能级内的各种构造。 这种构造允许电子束仅将工件的特定部分加热到金属间化合物溶解的过热状态。 在一个实施例中，公开了防止电子束的低能量部分接触工件的掩模。 在另一个实施例中，电子束可以以将电子束维持在能量水平使得基本上所有的电子束都高于阈值能级的方式聚焦。

公开(公告)号：US20140326874A1

公开(公告)日：2014-11-06

申请号：US14279957

申请日：2014-05-16

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Albrecht Glasmachers ,  Alexander Laue ,  Michel Aliman ,  Hubert Mantz ,  Ulrike Zeile ,  Holger Doemer

IPC: H01J37/26 ,  H01J49/10 ,  H01J37/28 ,  H01J3/26

CPC classification number: H01J37/265 ,  H01J3/26 ,  H01J37/244 ,  H01J37/256 ,  H01J37/28 ,  H01J49/063 ,  H01J49/065 ,  H01J49/10 ,  H01J2237/05 ,  H01J2237/2449 ,  H01J2237/2527

Abstract: An apparatus for transmission of energy of an ion to at least one gas particle and/or for transportation of an ion and a particle beam device having an apparatus such as this are disclosed. In particular, a container is provided, in which a gas is arranged which has gas particles, wherein the container has a transport axis. Furthermore, at least one first multipole unit and at least one second multipole unit are provided, which are arranged along the transport axis. The first multipole unit and the second multipole unit are formed by printed circuit boards. Furthermore, an electronic circuit is provided, which provides each multipole unit with a potential, such that a potential gradient is generated, in particular along the transport axis.

Abstract translation: 公开了一种用于将离子的能量传输到至少一个气体颗粒和/或用于输送离子的装置和具有这样的装置的粒子束装置。 特别地，提供一种容器，其中布置有气体颗粒的气体，其中容器具有输送轴线。 此外，提供沿着输送轴线布置的至少一个第一多极单元和至少一个第二多极单元。 第一多极单元和第二多极单元由印刷电路板形成。 此外，提供了一种电子电路，其为每个多极单元提供电势，使得产生电位梯度，特别是沿输送轴。

公开(公告)号：US08729466B1

公开(公告)日：2014-05-20

申请号：US13804066

申请日：2013-03-14

Applicant: Marian Mankos

Inventor： Marian Mankos

IPC: H01J37/05 ,  G01N23/225 ,  H01J37/29 ,  H01J37/153

CPC classification number: H01J37/026 ,  H01J37/04 ,  H01J37/285 ,  H01J37/29 ,  H01J2237/0042 ,  H01J2237/0044 ,  H01J2237/0492 ,  H01J2237/05 ,  H01J2237/1534 ,  H01J2237/2538

Abstract: One embodiment relates to an apparatus for correcting aberrations introduced when an electron lens forms an image of a specimen and simultaneously forming an electron image using electrons with a narrow range of electron energies from an electron beam with a wide range of energies. A first electron beam source is configured to generate a lower energy electron beam, and a second electron beam source is configured to generate a higher energy electron beam. The higher energy beam is passed through a monochromator comprising an energy-dispersive beam separator, an electron mirror and a knife-edge plate that removes both the high and low energy tail from the propagating beam. Both the lower and higher energy electron beams are deflected by an energy-dispersive beam separator towards the specimen and form overlapping illuminating electron beams. An objective lens accelerates the electrons emitted or scattered by the sample. The electron beam leaving the specimen is deflected towards a first electron mirror by an energy-dispersive beam separator, which introduces an angular dispersion that disperses the electron beam according to its energy. A knife-edge plate, located between the beam separator and first electron mirror, is inserted that removes all of the beam with energy larger and smaller than a selected energy and filters the beam according to energy. One or more electron lenses focus the electron beam at the reflection surface of the first electron mirror so that after the reflection and another deflection by the same energy-dispersive beam separator the electron beam dispersion is removed. The dispersion-free and energy-filtered electron beam is then reflected in a second electron mirror which corrects one or more aberrations of the objective lens. After the second reflection, electrons are deflected by the magnetic beam separator towards the projection optics which forms a magnified, aberration-corrected, energy-filtered image on a viewing screen.

公开(公告)号：US08129679B2

公开(公告)日：2012-03-06

申请号：US12823375

申请日：2010-06-25

Applicant: Paul Mooney

Inventor： Paul Mooney

IPC: H01J37/22

CPC classification number: H01J37/05 ,  H01J37/244 ,  H01J37/26 ,  H01J2237/05 ,  H01J2237/2441 ,  H01J2237/24455 ,  H01J2237/24485 ,  H01J2237/26 ,  H01J2237/2802

Abstract: Methods are disclosed for operating a device having a high energy particle detector wherein the particles create first incoming traversal events, outgoing backscatter events, higher-order in and out events and incoming events caused by particles which backscatter out of the device, hit nearby mechanical structures and are scattered back into the device. Exemplary method steps include discriminating incoming traversal events from outgoing backscatter events, higher-order in and out events and incoming events by limiting dose rate to a level at ensures that separate events do not overlap and discriminating events from background and from other events based on total energy in each event; discriminating backscatter events from incoming traversal events based on electron path shape; or determining that a first event and a second event are coincident with each other and separating incoming form backscatter events based on electron path shape and energy level.

Abstract translation: 公开了用于操作具有高能量粒子检测器的装置的方法，其中颗粒产生第一进入的穿越事件，出射的后向散射事件，高阶进入和离开事件以及由反向散射出装置的颗粒引起的进入事件，撞击附近的机械结构 并分散回设备。 示例性方法步骤包括通过将剂量率限制到一个水平来区分进入的遍历事件与输出的后向散射事件，高阶进入和离开事件以及进入的事件，以确保单独的事件不会与基于总计的背景和来自其他事件的事件重叠和区分事件 每个事件的能量; 基于电子路径形状鉴别反向散射事件与进入的穿越事件; 或者确定第一事件和第二事件彼此重合，并基于电子路径形状和能级分离入射形式的反向散射事件。

公开(公告)号：US07592606B2

公开(公告)日：2009-09-22

申请号：US11779686

申请日：2007-07-18

Applicant: Koji Ishiguro ,  Kaoru Umemura ,  Noriyuki Kaneoka

Inventor： Koji Ishiguro ,  Kaoru Umemura ,  Noriyuki Kaneoka

IPC: G08B21/00

CPC classification number: H01J37/3056 ,  H01J37/3005 ,  H01J37/304 ,  H01J2237/0225 ,  H01J2237/05 ,  H01J2237/24514 ,  H01J2237/248 ,  H01J2237/30455 ,  H01J2237/31744 ,  H01J2237/31745

Abstract: Provided is a charged particle beam processing apparatus capable of improving yields by suppressing the spread of metal pollution to a semiconductor manufacturing process to a minimum. The charged particle beam processing apparatus includes an ion beam column 1 that is connected to a vacuum vessel 10 and irradiates a sample 35 with an ion beam 11 of nonmetal ion species, a microsampling unit 3 having a probe 16 that extracts a microsample 43 cut out from a sample 35 by the ion beam 11, a gas gun 2 that discharges a gas for bonding the microsample 43 and the probe 16, a pollution measuring beam column 6A that is connected to the same vacuum vessel 10 to which the ion beam column 1 is connected and irradiates an ion beam irradiation traces by the ion beam column 1 with a pollution measuring beam 13, and a detector 7 that detects characteristic X-rays emitted from the ion beam irradiation traces by the ion beam column 1 upon irradiation with the pollution measuring beam 13.

Abstract translation: 提供一种能够通过将半导体制造工序的金属污染的扩散抑制到最小来提高产率的带电粒子束处理装置。 带电粒子束处理装置包括离子束柱1，其连接到真空容器10并用非金属离子种类的离子束11照射样品35，微量取样单元3具有探针16，其提取切出的微量样品43 从样品35通过离子束11，放出用于接合微量样品43和探针16的气体的气枪2，污染测量束柱6A，连接到相同的真空容器10，离子束柱1 用离子束柱1连接并用污染测量光束13照射离子束照射迹线;以及检测器7，其在照射污染物时检测由离子束柱1从离子束照射迹线发射的特征X射线 测量光束13。

公开(公告)号：US20090072164A1

公开(公告)日：2009-03-19

申请号：US12279653

申请日：2007-02-15

Applicant: Seiji Ogata ,  Ryota Fukui ,  Hidekazu Yokoo ,  Tsutomu Nishihashi

Inventor： Seiji Ogata ,  Ryota Fukui ,  Hidekazu Yokoo ,  Tsutomu Nishihashi

IPC: G21K5/00

CPC classification number: H01J37/3171 ,  H01J2237/05 ,  H01J2237/083 ,  H01J2237/31703

Abstract: An ion implanter for manufacturing a single crystal film by extracting a hydrogen ion or a rare-gas ion from an ion source, selects a desired ion with a first sector electromagnet, scanning the ion with a scanner, collimates the ion with a second sector electromagnet, and implants it into a substrate; the ion source is configured to be located close to the entrance side focal point of the first sector electromagnet. In this case, when an aperture of an extraction section of the ion source is circular and entrance side focal points in a deflection surface and a surface perpendicular thereto in the first sector electromagnet are coincident, the ion beam after passing the first sector electromagnet becomes completely parallel in the two surfaces and the spot shape becomes a circle.

Abstract translation: 用于通过从离子源提取氢离子或稀土离子来制造单晶膜的离子注入机，用第一扇形电磁体选择期望的离子，用扫描仪扫描离子，使离子与第二扇形电磁体 ，并将其植入基底; 离子源被配置为位于第一扇区电磁体的入射侧焦点附近。 在这种情况下，当离子源的提取部分的孔径为圆形并且偏转表面中的入射侧焦点和与第一扇形电磁体垂直的入射侧焦点一致时，通过第一扇形电磁体之后的离子束变得完全 平行于两个表面，斑点形状变成圆形。

公开(公告)号：US20090001291A1

公开(公告)日：2009-01-01

申请号：US11957914

申请日：2007-12-17

Applicant: Kyong Bong Rouh ,  Dong Seok Kim

Inventor： Kyong Bong Rouh ,  Dong Seok Kim

IPC: G21K5/00 ,  G21K5/08

CPC classification number: H01J37/3171 ,  H01J37/3172 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/05 ,  H01L21/26513

Abstract: An apparatus and method for partial ion implantation, which desirably provide control over the energy of the implanted dopants, generally includes an ion beam generator, and first and second deceleration units. The first deceleration unit decelerates the energy of an ion beam generated by the ion beam generator; and a subsequent, second deceleration unit further decelerates the energy into different energy levels according to regions of a wafer into which the ions are to be implanted.

Abstract translation: 用于部分离子注入的装置和方法，其期望地提供对注入的掺杂剂的能量的控制，通常包括离子束发生器以及第一和第二减速单元。 第一减速单元减速由离子束发生器产生的离子束的能量; 并且随后的第二减速单元根据要离子注入的晶片的区域进一步将能量减速到不同的能级。

公开(公告)号：US06875984B2

公开(公告)日：2005-04-05

申请号：US10621444

申请日：2003-07-18

Applicant: Hiroshi Kakibayashi ,  Shigeyuki Hosoki ,  Yuji Takagi ,  Ryo Miyake ,  Kuniyasu Nakamura ,  Mitsugu Sato ,  Hiroyuki Kobayashi

Inventor： Hiroshi Kakibayashi ,  Shigeyuki Hosoki ,  Yuji Takagi ,  Ryo Miyake ,  Kuniyasu Nakamura ,  Mitsugu Sato ,  Hiroyuki Kobayashi

IPC: G01N23/04 ,  G01N1/28 ,  G01N23/225 ,  G01N33/483 ,  G01N37/00 ,  H01J37/20 ,  H01J37/22 ,  H01J37/26 ,  H01J37/28 ,  H01J49/44

CPC classification number: H01J37/22 ,  H01J37/26 ,  H01J2237/05 ,  H01J2237/2809 ,  H01J2237/2813

Abstract: A bio electron microscope and an observation method which can observe a bio specimen by low damage and high contrast to perform high-accuracy image analysis, and conduct high-throughput specimen preparation. 1) A specimen is observed at an accelerating voltage 1.2 to 4.2 times a critical electron accelerating voltage possible to transmit a specimen obtained under predetermined conditions. 2) An electron energy filter of small and simplified construction is provided between the specimen and an electron detector for imaging by the electron beam in a specified energy region of the electron beams transmitting the specimen. 3) Similarity between an observed image such as virus or protein in the specimen and a reference image such as known virus or protein is subjected to quantitative analysis by image processing. 4) A preparation protocol of the bio specimen is made into a chip using an MEMS technique, which is then mounted on a specimen stage part of an electron microscope to conduct specimen introduction, preparation and transfer onto a specimen holder.

Abstract translation: 一种生物电子显微镜和观察方法，可以通过低损伤和高对比度观察生物样品，进行高精度图像分析，并进行高通量样品制备。 1）在可能传输在预定条件下获得的样品的临界电子加速电压的1.2至4.2倍的加速电压下观察样品。 2）在样品和电子检测器之间提供小而简化结构的电子能过滤器，用于通过电子束在传输样品的电子束的规定能量区域内的电子束进行成像。 3）通过图像处理对样本中的观察图像（例如病毒或蛋白质）与已知病毒或蛋白质等参考图像之间的相似性进行定量分析。 4）使用MEMS技术将生物样品的制备方案制成芯片，然后将其安装在电子显微镜的样品台部分上，以将样品引入，准备和转移到样品架上。

公开(公告)号：US06831280B2

公开(公告)日：2004-12-14

申请号：US10368825

申请日：2003-02-19

Applicant: Ernst F. Scherer

Inventor： Ernst F. Scherer

IPC: G06F1520

CPC classification number: H01J37/3171 ,  G04F10/00 ,  G04F10/10 ,  H01J2237/05 ,  H01J2237/30472

Abstract: Apparatus and methods are disclosed for measuring time delays between pulse streams or other input signals and for measuring ion beam energies in an ion implantation system. A variable delay apparatus is applied to one input signal, and the signals are correlated or compared in a correlator apparatus providing a minimum, maximum, or other ascertainable output signal value when a delay value of the variable delay is representative of the time delay between the first and second input signals. By adjusting or sweeping the variable delay until the ascertainable correlator apparatus output value is obtained, the actual time delay is determined as the dialed-in value of the variable delay that produces the ascertainable correlator output value. The variable delay measurement apparatus and methods may be employed in ion implantation system for measuring ion beam energies using time of flight probes, wherein the system and the time delay measurement apparatus may be calibrated to remove any residual delays of the system, such as delay offsets related to channel imbalance in the system and connecting devices. In addition, a unique error correction method is disclosed, which may be applied to the time delay measurement system measurement to minimize or mitigate errors introduced by electronic components of the system.

Abstract translation: 公开了用于测量脉冲流或其它输入信号之间的时间延迟以及用于在离子注入系统中测量离子束能量的装置和方法。 可变延迟装置被应用于一个输入信号，并且在可变延迟的延迟值表示时间延迟之间的相关器装置中提供最小，最大或其他可确定的输出信号值时，信号被相关或比较 第一和第二输入信号。 通过调整或扫描可变延迟直到获得可确定的相关器装置输出值，实际的时间延迟被确定为产生可确定的相关器输出值的可变延迟的拨入值。 可以使用离子注入系统中的可变延迟测量装置和方法来测量使用飞行时间探针的离子束能量，其中可以校准系统和时间延迟测量装置以消除系统的任何残余延迟，例如延迟偏移 与系统和连接设备的通道不平衡有关。 此外，公开了一种独特的纠错方法，其可以应用于时间延迟测量系统测量，以最小化或减轻由系统的电子部件引入的错误。