摘要:
To attain a comparatively high breakdown voltage at a high avalanche strength and with the physical size simultaneously being as small as possible, the invention proposes constructing a transistor device in a semiconductor material region in which a first source/drain region is used as a source region and in which the source region has a comparatively reduced surface charge or surface charge density.
摘要:
A panel has a baseplate with an upper first metallic layer and a multiplicity of a vertical semiconductor components. The vertical semiconductor components in each case have a first side with a first load electrode and a control electrode and an opposite second side with a second load electrode. The second side of the semiconductor components is in each case mounted on the metallic layer of the baseplate. The semiconductor components are arranged in such a way that edge sides of adjacent semiconductor components are separated from one another. A second metallic layer is arranged in separating regions between the semiconductor components.
摘要:
A semiconductor wafer is provided with a wiring structure, and semiconductor chip positions arranged in rows and columns. The semiconductor wafer has at least one coating (6) as a self-supporting dimensionally stable substrate layer (4), and/or as a wiring structure composed of conductive, high-temperature-resistant material. The coating material (6) of the substrate layer (4) and/or of the wiring structure has a ternary carbide and/or a ternary nitride and/or carbon.
摘要:
One embodiment of the invention relates to a component arrangement having a semiconductor chip, a chip carrier, a contact piece and a package. The semiconductor chip includes a first load terminal, a second load terminal and a control terminal, with the first load terminal and the second load terminal being arranged on mutually opposite sides of the semiconductor chip. The semiconductor chip is arranged on the chip carrier and is electrically and thermally conductively connected to the first load terminal. The contact piece is arranged on the second load terminal and is electrically and thermally conductively connected to it. The package is formed from a dielectric compound, which surrounds the semiconductor chip, the chip carrier and the contact piece. The chip carrier is exposed on a first side of the package, the contact piece is exposed on a second side of the package opposite the first side. A connecting leg is passed out of the package and is electrically conductively connected to the control terminal. One embodiment of the invention furthermore relates to a component cascade, in which a plurality of component arrangements are arranged on one another in the form of a stack.
摘要:
A semiconductor component having a semiconductor body comprises a blocking pn junction, a source zone of a first conductivity type and bordering on a zone forming the blocking pn junction of a second conductivity type complementary to the first conductivity type, and a drain zone of the first conductivity type. The side of the zone of the second conductivity type faces the drain zone forming a first surface, and in the region between the first surface and a second surface areas of the first and second conductivity type are nested in one another. The areas of the first and second conductivity type are variably so doped that near the first surface doping atoms of the second conductivity type predominate, and near the second surface doping atoms of the first conductivity type predominate. Furthermore a plurality of floating zones of the first and second conductivity type is provided.
摘要:
A semiconductor component includes first and second connection zones formed in a semiconductor body, a channel zone surrounding the second connection zone in the semiconductor body, and a drift path that is formed between the channel zone and the first connection zone and contains a compensation zone. The compensation zone has a complementary conduction type with respect to the drift zone and includes at least two segments. A distance between the two adjacent segments is chosen such that the punch-through voltage between these segments lies in a voltage range that corresponds to the voltage range assumed by the voltage drop across the drift path at currents situated between the rated current and twice the rated current.
摘要:
The invention relates to a method for producing a semiconductor component including semiconductor areas of different conductivity types which are alternately positioned in a semiconductor body. The semiconductor areas of different conductivity types extend at least from one first zone to a position near a second zone. Because of variable doping in trenches and in the trench fillings, an electric field is generated which increases from both the first zone and the second zone.
摘要:
An SOI cell includes a semiconductor body having at least one insulator layer. A polycrystalline zone doped with a dopant of a first conductivity type is grown on the insulator layer. The polycrystalline zone is adjoined outside the region of the insulator layer by a semiconductor region, which is doped with the dopant of the first conduction type that has been diffused out of the polycrystalline zone. A dopant source having a dopant of a second conductivity type is also provided. A zone having the dopant of the second conductivity type is formed by diffusing the dopant out of the dopant source.
摘要:
The invention relates to a field effect-controllable semiconductor component of vertical or lateral design i.e. MOSFETs and IGBTs. In this case, depletion zones and complementary depletion zones of opposite conduction types are introduced in the source-drain load path, in the semiconductor body, i.e. in the inner zone in the case of vertical components and in the drift zone in the case of lateral components, the concentration of the regions doped by the first conduction type corresponding approximately to the concentration of the regions doped by the second conduction type.
摘要:
Semiconductor component, including a semiconductor body having an edge, a surface, a substrate of a first given conductivity type, at least one zone being embedded in a planar manner in the substrate at the surface and being of a second conductivity type opposite the first given type, and insulating layer disposed on the surface, an electrode being in contact with the at least one zone, a channel stopper disposed on the insulating layer outside the at least one zone and in vicinity of the edge of the semiconductor body, the channel stopper being electrically connected to the substrate, and a field plate beind disposed on the insulating layer between the at least one zone and the channel stopper and being electrically connected to the at least one zone, the channel stopper being disposed at an increasing distance from the edge and the surface of the semiconductor body, as seen in direction toward the at least one zone.